JP2001023928A5 - - Google Patents

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Publication number
JP2001023928A5
JP2001023928A5 JP1999195475A JP19547599A JP2001023928A5 JP 2001023928 A5 JP2001023928 A5 JP 2001023928A5 JP 1999195475 A JP1999195475 A JP 1999195475A JP 19547599 A JP19547599 A JP 19547599A JP 2001023928 A5 JP2001023928 A5 JP 2001023928A5
Authority
JP
Japan
Prior art keywords
heat
resistant metal
metal layer
compound semiconductor
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999195475A
Other languages
English (en)
Japanese (ja)
Other versions
JP4147441B2 (ja
JP2001023928A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP19547599A priority Critical patent/JP4147441B2/ja
Priority claimed from JP19547599A external-priority patent/JP4147441B2/ja
Publication of JP2001023928A publication Critical patent/JP2001023928A/ja
Publication of JP2001023928A5 publication Critical patent/JP2001023928A5/ja
Application granted granted Critical
Publication of JP4147441B2 publication Critical patent/JP4147441B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP19547599A 1999-07-09 1999-07-09 化合物半導体装置 Expired - Fee Related JP4147441B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19547599A JP4147441B2 (ja) 1999-07-09 1999-07-09 化合物半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19547599A JP4147441B2 (ja) 1999-07-09 1999-07-09 化合物半導体装置

Publications (3)

Publication Number Publication Date
JP2001023928A JP2001023928A (ja) 2001-01-26
JP2001023928A5 true JP2001023928A5 (enExample) 2006-08-17
JP4147441B2 JP4147441B2 (ja) 2008-09-10

Family

ID=16341712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19547599A Expired - Fee Related JP4147441B2 (ja) 1999-07-09 1999-07-09 化合物半導体装置

Country Status (1)

Country Link
JP (1) JP4147441B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6019659B2 (ja) 2012-03-27 2016-11-02 富士通株式会社 無呼吸状態判定装置，無呼吸状態判定方法，及び無呼吸状態判定プログラム
WO2021137931A1 (en) 2020-01-02 2021-07-08 Raytheon Company X-ray shielding deposition method for electron-beam deposited coatings

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