JP2000507744A - Qスイッチ半導体レーザ - Google Patents
Qスイッチ半導体レーザInfo
- Publication number
- JP2000507744A JP2000507744A JP9534834A JP53483497A JP2000507744A JP 2000507744 A JP2000507744 A JP 2000507744A JP 9534834 A JP9534834 A JP 9534834A JP 53483497 A JP53483497 A JP 53483497A JP 2000507744 A JP2000507744 A JP 2000507744A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- laser
- resonator
- wavelength
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 80
- 230000003287 optical effect Effects 0.000 claims description 14
- 238000002347 injection Methods 0.000 claims description 7
- 239000007924 injection Substances 0.000 claims description 7
- 230000005855 radiation Effects 0.000 claims description 5
- 125000006850 spacer group Chemical group 0.000 claims description 2
- 238000002310 reflectometry Methods 0.000 abstract description 13
- 230000003321 amplification Effects 0.000 abstract description 3
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 3
- 230000003595 spectral effect Effects 0.000 description 13
- 239000002800 charge carrier Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 238000005086 pumping Methods 0.000 description 8
- 230000009471 action Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 4
- 229910004205 SiNX Inorganic materials 0.000 description 4
- 230000002860 competitive effect Effects 0.000 description 4
- 230000000875 corresponding effect Effects 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 238000011326 mechanical measurement Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 230000000414 obstructive effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/082—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0608—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0615—Q-switching, i.e. in which the quality factor of the optical resonator is rapidly changed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06253—Pulse modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06258—Controlling the frequency of the radiation with DFB-structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 少なくとも1つの一定にポンピングされる能動的、活性媒質と、2つの光学 的に結合された共振器とからなるQスイッチ半導体レーザにおいて、 −少なくとも1つの共振器が受動的共振器として構成され、 −両共振器は、バーニャないしノギス方式(No nius Prinzi p)に相応する種々異なるモードを有し、 少なくとも1つの共振器ミラーが2重共振器により選択されたレーザ波長の 領域にて著しく分散性の れていることを特徴とするQスイッチ半導体レーザ。 、電気的に屈折率に関して整合可能なDFB格子として構成されていることを特 徴とする請求の範囲1記載の半導体レーザ。 3. 著しく分散性の反射特性を有する反射器(R)は、電気的に屈折率に関して 整合可能なDBR格子として構成されていることを特徴とする請求の範囲1記載 の半導体レーザ。 4. 反射器(R)は超格子−構造を有することを特徴とする請求の範囲2又は3 記載の半導体レーザ。 R)を、狭帯域干渉フィルタとしてレーザファセット、フェーセット(facet)上 に構成する請求の範囲1記載の半導体レーザ。 6. 共振器が光学的に一定にポンピングされた活性媒質の上方に配置されたDF B格子を有する能動的レーザセクション(L)として構成され、そして、第2共 振器は、受動的セクション(p)として能動的レーザセクション(L)と分散性 反射器(R)との間に設けられている請求の範囲1から5までのうち少なくとも 1項記載の半導体レーザ。 7. 共振器が光学的に一定にポンピングされた活性媒質の上方に配置されたDF B格子を有する能動的レーザセクションとして構成され、受動的セクション(p )として構成された第2の共振器(p)と、分散性反射器(R)との間に設けら れている請求の範囲1から5までのうち少なくとも1項記載の半導体レーザ。 8. 能動的レーザセクション(L)として構成された共振器内にて設けられたD FB格子がブラッグ波長を有し、該ブラッグ波長は、反射器のDFB又はDBR 格子の波長に対してほぼストップバンド幅だけ短波長又は長波長的にずれている 請求項2、3及び6又は7記載の半導体レーザ。 9. 受動的及び能動的共振器が、反射性衝き合わせ個 所(8)により相互に分離され、両共振器は、2つの反射器により画定形成され ている請求の範囲1から5までのうち少なくとも1項記載の半導体レーザ。 10.電気的制御のほかに付加的に少なくとも1つのセクションが選択的に作動可 能なヒータを有する請求項1、6、7又は9のうちいずれか1項記載の半導体レ ーザ。 11.受動的共振器はレーザ状のヘテロ構造を有し、該ヘテロ構造は、電流注入を 用いてのレーザ放射の波長の際トランスペアレンシイに調整セッティングされて いる請求項1、6、7又は9のうちいずれか1項記載の半導体レーザ。 12.2つの別個に電気的に可制御の2つのセクションから成る受動的共振器がス ペーサとして構成されている請求項1、6、7又は9のうちいずれか1項記載の 半導体レーザ。 13.受動的共振器の2つの別個に電気的に可制御のセクションのうちの1つがレ ーザ状のヘテロ構造を有し、該ヘテロ構造は、電流注入を用いてレーザ放射の波 長の際トランスペアレンシイに調整セッティングされている請求項12記載の半 導体レーザ。 14.個々のセクションは、選択的に種々の高周波電気信号で制御されるように構 成されている請求項1から13までのうち少なくとも1項記載の半導体レー ザ。 15.半導体レーザ構造の層平面内にて、レーザ軸に対して横断方向に導波路構造 は少なくとも半導体レーザの1つのセクションへ導かれており、該1つのセクシ ョンを介して、光信号が選択的に当該セクション内へ入射されるように構成され ている請求項1から14までのうち少なくとも1項記載の半導体レーザ。 16.光学的窓を有するか又はセミトランスペアレントに構成された少なくとも1 つのセクションの電気コンタクト内に光信号が当該のセクション内へ選択的に入 射されるように構成されている請求項1から15までのうち少なくとも1項記載 の半導体レーザ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19613704.7 | 1996-03-29 | ||
DE19613704 | 1996-03-29 | ||
PCT/DE1997/000696 WO1997037406A1 (de) | 1996-03-29 | 1997-03-27 | Gütegesteuerter halbleiterlaser |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000507744A true JP2000507744A (ja) | 2000-06-20 |
JP3976788B2 JP3976788B2 (ja) | 2007-09-19 |
Family
ID=7790589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53483497A Expired - Fee Related JP3976788B2 (ja) | 1996-03-29 | 1997-03-27 | Qスイッチ半導体レーザ |
Country Status (7)
Country | Link |
---|---|
US (1) | US6215805B1 (ja) |
EP (1) | EP0890204B1 (ja) |
JP (1) | JP3976788B2 (ja) |
CA (1) | CA2250509A1 (ja) |
DE (2) | DE19714384A1 (ja) |
HK (1) | HK1019824A1 (ja) |
WO (1) | WO1997037406A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004241627A (ja) * | 2003-02-06 | 2004-08-26 | Mitsubishi Electric Corp | 半導体レーザ、半導体レーザの駆動方法および波長変換素子 |
JP2006324300A (ja) * | 2005-05-17 | 2006-11-30 | Mitsubishi Electric Corp | 半導体レーザ |
JP2007042737A (ja) * | 2005-08-01 | 2007-02-15 | Mitsubishi Electric Corp | 半導体レーザ |
WO2009001861A1 (ja) * | 2007-06-25 | 2008-12-31 | Nippon Telegraph And Telephone Corporation | 光変調信号生成装置および光変調信号生成方法 |
JP2019530987A (ja) * | 2016-10-17 | 2019-10-24 | サントル ナショナル ドゥ ラ ルシェルシュ シアンティフィック | レーザ光源およびその製造方法 |
US10587092B2 (en) | 2016-08-23 | 2020-03-10 | Sony Corporation | Semiconductor laser, electronic apparatus, and method of driving semiconductor laser |
US10680406B2 (en) | 2016-08-25 | 2020-06-09 | Sony Corporation | Semiconductor laser, electronic apparatus, and method of driving semiconductor laser |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6842466B1 (en) * | 2000-07-18 | 2005-01-11 | Nanyang Technological University | Semiconductor passive Q-switch providing variable outputs |
US6423963B1 (en) | 2000-07-26 | 2002-07-23 | Onetta, Inc. | Safety latch for Raman amplifiers |
US6456429B1 (en) | 2000-11-15 | 2002-09-24 | Onetta, Inc. | Double-pass optical amplifier |
US6433921B1 (en) | 2001-01-12 | 2002-08-13 | Onetta, Inc. | Multiwavelength pumps for raman amplifier systems |
US6731424B1 (en) | 2001-03-15 | 2004-05-04 | Onetta, Inc. | Dynamic gain flattening in an optical communication system |
DE10118959B4 (de) * | 2001-04-10 | 2006-08-31 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Ansteuerung eines 3R Regenerators |
DE10118958B4 (de) * | 2001-04-10 | 2006-11-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optischer 3R Regenerator mit Wellenlängenumsetzung |
DE10118965B4 (de) * | 2001-04-10 | 2007-03-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Abstimmbarer, selbstpulsierender Mehrsektions-Laser zur optischen Taktfrequenzerzeugung und dessen Verwendung |
US20050233997A1 (en) * | 2001-05-18 | 2005-10-20 | Sirna Therapeutics, Inc. | RNA interference mediated inhibition of matrix metalloproteinase 13 (MMP13) gene expression using short interfering nucleic acid (siNA) |
US6583926B1 (en) | 2001-08-21 | 2003-06-24 | Onetta, Inc. | Optical amplifiers with age-based pump current limiters |
US6731427B1 (en) | 2001-09-06 | 2004-05-04 | Onetta, Inc. | Semiconductor optical amplifier systems |
KR100453814B1 (ko) * | 2002-02-07 | 2004-10-20 | 한국전자통신연구원 | 이종 회절격자를 가지는 반도체 광소자 및 그 제조 방법 |
KR100541913B1 (ko) * | 2003-05-02 | 2006-01-10 | 한국전자통신연구원 | 추출 격자 브래그 반사기와 결합된 추출 격자 분포궤환파장가변 반도체 레이저 |
US20060014453A1 (en) * | 2004-07-14 | 2006-01-19 | Maia Maria L | Flexible sign substrate with black in back |
US7447246B2 (en) * | 2004-10-27 | 2008-11-04 | Jian-Jun He | Q-modulated semiconductor laser |
US20060104321A1 (en) * | 2004-11-15 | 2006-05-18 | Lightip Technologies Inc. | Q-modulated semiconductor laser with electro-absorptive grating structures |
US20060270298A1 (en) * | 2005-05-25 | 2006-11-30 | Cooley, Incorporated | Textured and printed membrane that simulates fabric |
CN100428589C (zh) * | 2006-04-24 | 2008-10-22 | 何建军 | Q-调制半导体激光器 |
GB2437593A (en) * | 2006-04-25 | 2007-10-31 | Jian-Jun He | A q-modulated semiconductor laser |
CN100377453C (zh) * | 2006-05-12 | 2008-03-26 | 何建军 | 带有电吸收光栅结构的q-调制半导体激光器 |
US7593436B2 (en) * | 2006-06-16 | 2009-09-22 | Vi Systems Gmbh | Electrooptically Bragg-reflector stopband-tunable optoelectronic device for high-speed data transfer |
US20080018988A1 (en) * | 2006-07-24 | 2008-01-24 | Andrew Davidson | Light source with tailored output spectrum |
US7508858B2 (en) * | 2007-04-30 | 2009-03-24 | The Research Foundation Of State University Of New York | Detuned duo-cavity laser-modulator device and method with detuning selected to minimize change in reflectivity |
JP4626686B2 (ja) * | 2008-08-14 | 2011-02-09 | ソニー株式会社 | 面発光型半導体レーザ |
DE102017208705A1 (de) * | 2017-05-23 | 2018-11-29 | Robert Bosch Gmbh | Sendeeinheit zur Emission von Strahlung in die Umgebung |
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JPS60263490A (ja) * | 1984-06-12 | 1985-12-26 | Matsushita Electric Ind Co Ltd | 半導体レ−ザ装置 |
US5132977A (en) * | 1989-09-07 | 1992-07-21 | Massachusetts Institute Of Technology | Coupled-cavity Q-switched laser |
US4982405A (en) * | 1989-09-07 | 1991-01-01 | Massachusette Institute Of Technology | Coupled-cavity Q-switched laser |
US5408481A (en) * | 1992-10-26 | 1995-04-18 | The United States Of America As Represented By The Secretary Of The Navy | Intracavity sum frequency generation using a tunable laser containing an active mirror |
JP2546133B2 (ja) * | 1993-04-30 | 1996-10-23 | 日本電気株式会社 | 狭帯域化面発光レーザ |
US5461637A (en) * | 1994-03-16 | 1995-10-24 | Micracor, Inc. | High brightness, vertical cavity semiconductor lasers |
US5530711A (en) * | 1994-09-01 | 1996-06-25 | The United States Of America As Represented By The Secretary Of The Navy | Low threshold diode-pumped tunable dye laser |
-
1997
- 1997-03-27 CA CA002250509A patent/CA2250509A1/en not_active Abandoned
- 1997-03-27 DE DE19714384A patent/DE19714384A1/de not_active Withdrawn
- 1997-03-27 DE DE59700897T patent/DE59700897D1/de not_active Expired - Lifetime
- 1997-03-27 JP JP53483497A patent/JP3976788B2/ja not_active Expired - Fee Related
- 1997-03-27 EP EP97920587A patent/EP0890204B1/de not_active Expired - Lifetime
- 1997-03-27 WO PCT/DE1997/000696 patent/WO1997037406A1/de active IP Right Grant
- 1997-03-27 US US09/155,583 patent/US6215805B1/en not_active Expired - Lifetime
-
1999
- 1999-07-13 HK HK99103020A patent/HK1019824A1/xx not_active IP Right Cessation
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004241627A (ja) * | 2003-02-06 | 2004-08-26 | Mitsubishi Electric Corp | 半導体レーザ、半導体レーザの駆動方法および波長変換素子 |
JP2006324300A (ja) * | 2005-05-17 | 2006-11-30 | Mitsubishi Electric Corp | 半導体レーザ |
JP4606248B2 (ja) * | 2005-05-17 | 2011-01-05 | 三菱電機株式会社 | 半導体レーザ |
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Also Published As
Publication number | Publication date |
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EP0890204B1 (de) | 1999-12-22 |
US6215805B1 (en) | 2001-04-10 |
WO1997037406A1 (de) | 1997-10-09 |
CA2250509A1 (en) | 1997-10-09 |
EP0890204A1 (de) | 1999-01-13 |
DE59700897D1 (de) | 2000-01-27 |
HK1019824A1 (en) | 2000-02-25 |
JP3976788B2 (ja) | 2007-09-19 |
DE19714384A1 (de) | 1997-10-30 |
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