JP2000504412A - 微細加工製作シリコン羽根型マイクロ流量計 - Google Patents
微細加工製作シリコン羽根型マイクロ流量計Info
- Publication number
- JP2000504412A JP2000504412A JP9526261A JP52626197A JP2000504412A JP 2000504412 A JP2000504412 A JP 2000504412A JP 9526261 A JP9526261 A JP 9526261A JP 52626197 A JP52626197 A JP 52626197A JP 2000504412 A JP2000504412 A JP 2000504412A
- Authority
- JP
- Japan
- Prior art keywords
- flowmeter
- configuration
- flow meter
- frame
- torsion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 20
- 239000010703 silicon Substances 0.000 title claims abstract description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 239000012530 fluid Substances 0.000 claims abstract description 44
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 6
- 238000005452 bending Methods 0.000 claims description 9
- 239000013078 crystal Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 230000003068 static effect Effects 0.000 claims description 2
- 239000002210 silicon-based material Substances 0.000 claims 2
- 238000005459 micromachining Methods 0.000 abstract description 3
- 230000004044 response Effects 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 238000005259 measurement Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011149 active material Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/20—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow
- G01F1/28—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow by drag-force, e.g. vane type or impact flowmeter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/20—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow
- G01F1/22—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow by variable-area meters, e.g. rotameters
- G01F1/26—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by detection of dynamic effects of the flow by variable-area meters, e.g. rotameters of the valve type
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Volume Flow (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.流量計を流れる流体の流量を感知する微細加工製作羽根型流量計であって、 枠と 該枠から内側に突き出る蝶番と 該蝶番により上記枠に接合され、該枠から支持され、外力が加わらないとき静 止位置に置かれ、加えられた力により該静止位置から撓み自在の羽根(ベーン) と 該羽根に当たり且つ羽根の周りを流れる流体により生じた静止位置からの羽根 の撓みを感知する撓み感知手段と を具備し、 上記枠、蝶番、羽根及び撓み感知手段の全ては、微細加工により、基体の半導 体単結晶シリコン層に集積して一体に加工製作される 構成を特徴とする流量計。 2.前記蝶番は、共通軸に沿って整列された前記枠と前記羽根の間にそれぞれ配 置され該羽根を該枠内に支持する対向捩りバーを備え、該捩りバーは羽根を枠内 に支持し、該羽根が共通軸の周りに回転され、それにより上記バーが捩られるよ うにした 構成を特徴とする請求項1に記載の流量計。 3.前記撓み感知手段は、前記捩りバーの少なくとも一つに配置され、前記羽根 の静止位置からの撓みを表す捩れ信号を発生する 構成を特徴とする請求項2に記載の流量計。 4.前記撓み感知手段は、 その一対が前記共通軸と実質的に平行な線に沿って配置される少なくとも4個 の電気的オーム接点と 上記オーム接点の第一の対を一緒にする線に対して直角に向いた上記オーム接 点の第二の対から前記捩れ信号が感知される間に上記第一の対のオーム接点に跨 って電流を加える手段と を備える構成を特徴とする請求項3に記載の流量計。 5.前記オーム接点の対に跨って交流電流(AC)が加えられ、前記捩れ信号が 該ACの包絡線となる 構成を特徴とする請求項4に記載の流量計。 6.前記基体は[100] 結晶方向と[110] 結晶方向を有するシリコン材料であり、 前記捩りバーはn型シリコン層の[110] 結晶方向に向いている 構成を特徴とする請求項2に記載の流量計。 7.前記基体は[100] 結晶方向と[110] 結晶方向を有するシリコン材料であり、 前記捩りバーはp型シリコン層の[100] 結晶方向に向いている 構成を特徴とする請求項2に記載の流量計。 8.前記単結晶シリコン層はSimox ウェーハである 構成を特徴とする請求項2に記載の流量計。 9.前記単結晶シリコン層は絶縁体上にシリコンを形成したウェーハ内にある 構成を特徴とする請求項2に記載の流量計。 10.丸コーナーが前記捩りバーを前記枠に接合する 構成を特徴とする請求項2に記載の流量計。 11.丸コーナーが前記捩りバーを前記羽根に接合する 構成を特徴とする請求項2に記載の流量計。 12.前記捩りバーには炭化珪素又は窒化珪素の層が形成されている 構成を特徴とする請求項2に記載の流量計。 13.前記蝶番は、前記枠と羽根の間に配置され該羽根を枠内に支持する少なく とも一つの撓み体を備え、羽根の静止位置からの撓みが該撓み体を撓ませる 構成を特徴とする請求項1に記載の流量計。 14.前記撓み感知手段は、撓み体に配置され該撓み体の応力に応答して電気信 号を発生する少なくとも一つのピエゾ抵抗を備える 構成を特徴とする請求項13に記載の流量計。 15.前記撓み感知手段は更に、流量計に配置された少なくとも更に三つのピエ ゾ抵抗を備え、全ピエゾ抵抗の中4個はホイートストーンブリッジを形成するよ うに相互接続される 構成を特徴とする請求項14に記載の流量計。 16.前記枠は前記羽根を囲繞する 構成を特徴とする請求項1に記載の流量計。 17.前記羽根は枠より実質的に薄い 構成を特徴とする請求項1に記載の流量計。 18.前記羽根の中心の周りの質量はエッチングにより殆どが除かれる 構成を特徴とする請求項1に記載の流量計。 19.前記羽根の中心の周りの質量はエッチングにより完全に除かれ、羽根が枠 形状となる 構成を特徴とする請求項1に記載の流量計。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1038696P | 1996-01-22 | 1996-01-22 | |
US60/010,386 | 1996-01-22 | ||
PCT/US1997/000875 WO1997026527A1 (en) | 1996-01-22 | 1997-01-21 | Vane-type micromachined silicon micro-flow meter |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000504412A true JP2000504412A (ja) | 2000-04-11 |
JP3580827B2 JP3580827B2 (ja) | 2004-10-27 |
Family
ID=21745529
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52626197A Expired - Fee Related JP3580827B2 (ja) | 1996-01-22 | 1997-01-21 | 微細加工製作シリコン羽根型マイクロ流量計 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5895866A (ja) |
EP (1) | EP0912883B1 (ja) |
JP (1) | JP3580827B2 (ja) |
DE (1) | DE69721000T2 (ja) |
WO (1) | WO1997026527A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014167459A (ja) * | 2013-01-31 | 2014-09-11 | Fujikura Ltd | 流量検出センサ |
JP2015004647A (ja) * | 2013-06-24 | 2015-01-08 | 株式会社フジクラ | 流量センサ及び流量検出システム |
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WO2000013210A2 (en) | 1998-09-02 | 2000-03-09 | Xros, Inc. | Micromachined members coupled for relative rotation by torsional flexure hinges |
US6269685B1 (en) | 1999-09-23 | 2001-08-07 | Ut Battelle, Llc | Viscosity measuring using microcantilevers |
US6467879B1 (en) | 2000-10-16 | 2002-10-22 | Xerox Corporation | Method and apparatus for preventing degradation of electrostatically actuated devices |
US20040073175A1 (en) * | 2002-01-07 | 2004-04-15 | Jacobson James D. | Infusion system |
US7024945B2 (en) * | 2002-02-22 | 2006-04-11 | Compumedics Limited | Flow sensing apparatus |
EP1547189A4 (en) * | 2002-08-03 | 2006-11-08 | Siverta Inc | INTEGRATED AND SEALED SWITCH FOR MICRO-ELECTRO-MECHANICAL SYSTEMS |
KR20060133057A (ko) * | 2004-04-12 | 2006-12-22 | 시베르타 인코퍼레이티드 | 단극쌍투 mems 스위치 |
US9079762B2 (en) | 2006-09-22 | 2015-07-14 | Ethicon Endo-Surgery, Inc. | Micro-electromechanical device |
US7561317B2 (en) | 2006-11-03 | 2009-07-14 | Ethicon Endo-Surgery, Inc. | Resonant Fourier scanning |
US7713265B2 (en) | 2006-12-22 | 2010-05-11 | Ethicon Endo-Surgery, Inc. | Apparatus and method for medically treating a tattoo |
US8273015B2 (en) | 2007-01-09 | 2012-09-25 | Ethicon Endo-Surgery, Inc. | Methods for imaging the anatomy with an anatomically secured scanner assembly |
US8801606B2 (en) | 2007-01-09 | 2014-08-12 | Ethicon Endo-Surgery, Inc. | Method of in vivo monitoring using an imaging system including scanned beam imaging unit |
US7589316B2 (en) | 2007-01-18 | 2009-09-15 | Ethicon Endo-Surgery, Inc. | Scanning beam imaging with adjustable detector sensitivity or gain |
US8216214B2 (en) | 2007-03-12 | 2012-07-10 | Ethicon Endo-Surgery, Inc. | Power modulation of a scanning beam for imaging, therapy, and/or diagnosis |
US7995045B2 (en) | 2007-04-13 | 2011-08-09 | Ethicon Endo-Surgery, Inc. | Combined SBI and conventional image processor |
US8626271B2 (en) | 2007-04-13 | 2014-01-07 | Ethicon Endo-Surgery, Inc. | System and method using fluorescence to examine within a patient's anatomy |
US8160678B2 (en) | 2007-06-18 | 2012-04-17 | Ethicon Endo-Surgery, Inc. | Methods and devices for repairing damaged or diseased tissue using a scanning beam assembly |
US7982776B2 (en) | 2007-07-13 | 2011-07-19 | Ethicon Endo-Surgery, Inc. | SBI motion artifact removal apparatus and method |
US9125552B2 (en) | 2007-07-31 | 2015-09-08 | Ethicon Endo-Surgery, Inc. | Optical scanning module and means for attaching the module to medical instruments for introducing the module into the anatomy |
US7983739B2 (en) | 2007-08-27 | 2011-07-19 | Ethicon Endo-Surgery, Inc. | Position tracking and control for a scanning assembly |
US7925333B2 (en) | 2007-08-28 | 2011-04-12 | Ethicon Endo-Surgery, Inc. | Medical device including scanned beam unit with operational control features |
US7921731B2 (en) * | 2007-12-03 | 2011-04-12 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Two-axis direct fluid shear stress sensor |
US8050520B2 (en) | 2008-03-27 | 2011-11-01 | Ethicon Endo-Surgery, Inc. | Method for creating a pixel image from sampled data of a scanned beam imager |
US8332014B2 (en) | 2008-04-25 | 2012-12-11 | Ethicon Endo-Surgery, Inc. | Scanned beam device and method using same which measures the reflectance of patient tissue |
US8371160B2 (en) * | 2009-12-16 | 2013-02-12 | Meggitt (San Juan Capistrano), Inc. | Weatherized direct-mount absolute pressure sensor |
US20140069207A1 (en) | 2011-03-18 | 2014-03-13 | Soneter, LLC | Methods and apparatus for fluid flow measurement |
EP3163275B1 (en) * | 2014-06-25 | 2018-11-14 | Seiko Instruments Inc. | Pressure change measuring apparatus and pressure change measuring method |
DE102015000064B3 (de) | 2015-01-12 | 2016-03-31 | Carl Von Ossietzky Universität Oldenburg | Vorrichtung und Verfahren zum Bestimmen mindestens eines Parameters einer Strömung eines Fluids und deren Verwendung |
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JPS61138125A (ja) * | 1984-12-10 | 1986-06-25 | Nippon Denso Co Ltd | 流速検出器 |
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- 1997-01-21 JP JP52626197A patent/JP3580827B2/ja not_active Expired - Fee Related
- 1997-01-21 EP EP97904818A patent/EP0912883B1/en not_active Expired - Lifetime
- 1997-01-21 WO PCT/US1997/000875 patent/WO1997026527A1/en active IP Right Grant
- 1997-01-21 DE DE69721000T patent/DE69721000T2/de not_active Expired - Fee Related
- 1997-01-21 US US08/786,534 patent/US5895866A/en not_active Expired - Fee Related
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JPS61138125A (ja) * | 1984-12-10 | 1986-06-25 | Nippon Denso Co Ltd | 流速検出器 |
JPH0470516A (ja) * | 1990-07-12 | 1992-03-05 | Yazaki Corp | 半導体流量センサ |
JPH06324074A (ja) * | 1993-05-13 | 1994-11-25 | Omron Corp | ピエゾ抵抗変化検出方式センサ、モジュール、振動検出機能付き機器、ボイラの物理量検出装置、気体用物理量検出装置及び異常状態検出装置 |
JPH09512904A (ja) * | 1994-03-08 | 1997-12-22 | ニューカーマンズ、アーモンド、ピー. | 一体化センサを備えたモノリシックシリコン・レートジャイロ |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014167459A (ja) * | 2013-01-31 | 2014-09-11 | Fujikura Ltd | 流量検出センサ |
JP2015004647A (ja) * | 2013-06-24 | 2015-01-08 | 株式会社フジクラ | 流量センサ及び流量検出システム |
Also Published As
Publication number | Publication date |
---|---|
DE69721000T2 (de) | 2003-11-13 |
DE69721000D1 (de) | 2003-05-22 |
EP0912883A1 (en) | 1999-05-06 |
US5895866A (en) | 1999-04-20 |
WO1997026527A1 (en) | 1997-07-24 |
EP0912883B1 (en) | 2003-04-16 |
EP0912883A4 (ja) | 1999-05-06 |
JP3580827B2 (ja) | 2004-10-27 |
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