JP2000347420A - レジストパターン形成方法 - Google Patents

レジストパターン形成方法

Info

Publication number
JP2000347420A
JP2000347420A JP11157470A JP15747099A JP2000347420A JP 2000347420 A JP2000347420 A JP 2000347420A JP 11157470 A JP11157470 A JP 11157470A JP 15747099 A JP15747099 A JP 15747099A JP 2000347420 A JP2000347420 A JP 2000347420A
Authority
JP
Japan
Prior art keywords
resist
hole
substrate
pattern
exposure light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11157470A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000347420A5 (enExample
Inventor
Toshihiko Tanaka
稔彦 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11157470A priority Critical patent/JP2000347420A/ja
Publication of JP2000347420A publication Critical patent/JP2000347420A/ja
Publication of JP2000347420A5 publication Critical patent/JP2000347420A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP11157470A 1999-06-04 1999-06-04 レジストパターン形成方法 Pending JP2000347420A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11157470A JP2000347420A (ja) 1999-06-04 1999-06-04 レジストパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11157470A JP2000347420A (ja) 1999-06-04 1999-06-04 レジストパターン形成方法

Publications (2)

Publication Number Publication Date
JP2000347420A true JP2000347420A (ja) 2000-12-15
JP2000347420A5 JP2000347420A5 (enExample) 2004-09-02

Family

ID=15650388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11157470A Pending JP2000347420A (ja) 1999-06-04 1999-06-04 レジストパターン形成方法

Country Status (1)

Country Link
JP (1) JP2000347420A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101172313B1 (ko) 2006-02-23 2012-08-14 에스케이하이닉스 주식회사 반도체 소자의 제조방법
JP2016213444A (ja) * 2015-04-10 2016-12-15 東京エレクトロン株式会社 イメージ反転、誘導自己組織化、および選択的堆積を補助するための、サブ解像度開口部の使用
KR20170117464A (ko) * 2015-02-21 2017-10-23 도쿄엘렉트론가부시키가이샤 오정렬 에러 보호를 포함하는 패터닝 방법

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101172313B1 (ko) 2006-02-23 2012-08-14 에스케이하이닉스 주식회사 반도체 소자의 제조방법
KR20170117464A (ko) * 2015-02-21 2017-10-23 도쿄엘렉트론가부시키가이샤 오정렬 에러 보호를 포함하는 패터닝 방법
KR102545448B1 (ko) * 2015-02-21 2023-06-19 도쿄엘렉트론가부시키가이샤 오정렬 에러 보호를 포함하는 패터닝 방법
JP2016213444A (ja) * 2015-04-10 2016-12-15 東京エレクトロン株式会社 イメージ反転、誘導自己組織化、および選択的堆積を補助するための、サブ解像度開口部の使用
JP2020092274A (ja) * 2015-04-10 2020-06-11 東京エレクトロン株式会社 イメージ反転、誘導自己組織化、および選択的堆積を補助するための、サブ解像度開口部の使用
JP7209429B2 (ja) 2015-04-10 2023-01-20 東京エレクトロン株式会社 イメージ反転、誘導自己組織化、および選択的堆積を補助するための、サブ解像度開口部の使用

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