JP2000315756A - Bonding structure of heat-radiating wiring board - Google Patents

Bonding structure of heat-radiating wiring board

Info

Publication number
JP2000315756A
JP2000315756A JP12314499A JP12314499A JP2000315756A JP 2000315756 A JP2000315756 A JP 2000315756A JP 12314499 A JP12314499 A JP 12314499A JP 12314499 A JP12314499 A JP 12314499A JP 2000315756 A JP2000315756 A JP 2000315756A
Authority
JP
Japan
Prior art keywords
wiring board
heat dissipation
heat
dissipation wiring
semiconductor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12314499A
Other languages
Japanese (ja)
Other versions
JP3583019B2 (en
Inventor
Kazuyuki Kousu
和幸 小薄
Kiyoshi Yokoyama
清 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP12314499A priority Critical patent/JP3583019B2/en
Publication of JP2000315756A publication Critical patent/JP2000315756A/en
Application granted granted Critical
Publication of JP3583019B2 publication Critical patent/JP3583019B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

PROBLEM TO BE SOLVED: To bond a ceramic heat-radiating wiring board and a heat sink by screwing firmly without a possibility of destruction. SOLUTION: A substrate 3 which is composed of ceramics containing at least one or more selected from aluminium nitride and silicon nitride as main ingredients and has round holes at four corners and a heat sink (radiator) 4 disposed thereunder are screwed and bonded via the round holes by using washers 7 with a hardness of 25-70 kgf/mm2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電気自動車、ハイ
ブリッド車、新幹線、地下鉄、通勤電車、エレベータ、
ロボット、クレーンや空調装置等に搭載されるパワーデ
バイスであるIGBT(Insulated Gate Bipolar Transisto
r) や、半導体素子が収容搭載される半導体素子収納用
パッケージや、半導体素子の他にコンデンサや抵抗体等
の各種電子部品が搭載される混成集積回路装置等で、大
電流を流すことが可能な低抵抗配線導体を有する放熱配
線基板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric car, a hybrid car, a bullet train, a subway, a commuter train, an elevator,
IGBT (Insulated Gate Bipolar Transisto) is a power device mounted on robots, cranes, air conditioners, etc.
r), and a large current can flow in a semiconductor device housing package in which semiconductor devices are housed and mounted, or in a hybrid integrated circuit device in which various electronic components such as capacitors and resistors are mounted in addition to semiconductor devices. The present invention relates to a heat dissipation wiring substrate having a low-resistance wiring conductor.

【0002】[0002]

【従来の技術】パワーデバイスは、最も歴史のある半導
体素子であるが、近年、高耐圧化、大電流化、高速・高
周波化、高機能化が著しく進み、IGBT、GTO、I
PM、パワーMOS FET等の高速のMOS系パワー
デバイスが出現するに至った。これらのパワーデバイス
は、自動車、インバータ電車、ストロボ、電子レンジ、
ゴルフカート等に広く利用されている。しかしながら、
環境問題を背景にハイブリッド車、電気自動車が一般に
普及しつつある昨今では、これらのパワーデバイス、特
にIGBTの耐高電圧化、小型化、薄型化、軽量化が要
求されている。
2. Description of the Related Art Power devices are the oldest semiconductor elements. In recent years, however, high breakdown voltage, large current, high speed and high frequency, and high performance have been remarkably advanced, and IGBT, GTO, ITO
High-speed MOS power devices such as PMs and power MOS FETs have appeared. These power devices include cars, inverter trains, strobes, microwaves,
Widely used for golf carts and the like. However,
In recent years, hybrid vehicles and electric vehicles have been widely spread due to environmental problems, and these power devices, particularly IGBTs, are required to have higher withstand voltage, smaller size, thinner, and lighter weight.

【0003】放熱配線基板としては、特開平7−162
157号公報では、『複数の絶縁層からなる多層基板上
にパワー素子を配置し、一以上の絶縁層のパワー素子下
部領域に前記パワー素子の熱伝達用導体を充填したこと
を特徴とする多層基板。』が提案され、特開昭63−1
20448号公報では、放熱用基板として、『低熱膨張
性金属材料の繊維からなる基材に、放熱性の良い金属材
料を含浸させてなる放熱用基板。』が提案されている。
これらの基板は、例えば、半導体素子収納用パッケージ
に適用した場合には、その絶縁基体の凹部底面に半導体
素子をガラスあるいは樹脂、ロウ材等の接着剤を介して
接着固定すると共に、半導体素子の各電極が凹部周辺に
位置する配線導体にワイヤボンディングを介して電気的
に接続され、金属やセラミックスなどからなる蓋体を前
記凹部をふさぐように前記接着剤と同様の封止剤を介し
て接合し、絶縁基体の凹部内に半導体素子を機密に収容
することにより最終製品としての半導体装置としてい
た。これらの基板は絶縁基板として使用され、ランクサ
イド( Alを含浸SiCファイバー) などの放熱板に接
着する事で放熱配線基板を形成していた。図7に従来の
放熱配線基板の模式図を示す。
Japanese Patent Laid-Open No. 7-162 discloses a heat dissipation wiring board.
No. 157 discloses a multi-layer structure in which a power element is arranged on a multilayer substrate composed of a plurality of insulating layers, and a heat transfer conductor of the power element is filled in a lower region of the power element of one or more insulating layers. substrate. Has been proposed, and JP-A-63-1
Japanese Patent Application Laid-Open No. 20448 discloses a heat-radiating substrate, "a heat-radiating substrate obtained by impregnating a base material made of a fiber of a low thermal expansion metal material with a metal material having good heat radiation properties. ] Has been proposed.
When these substrates are applied to, for example, a package for accommodating a semiconductor element, the semiconductor element is bonded and fixed to the bottom surface of the concave portion of the insulating base via an adhesive such as glass, resin, or brazing material, and the semiconductor element Each electrode is electrically connected to a wiring conductor located around the recess through wire bonding, and a cover made of metal, ceramics, or the like is joined via a sealing agent similar to the adhesive so as to cover the recess. Then, the semiconductor device is confidentially accommodated in the concave portion of the insulating base, thereby forming a semiconductor device as a final product. These substrates are used as insulating substrates, and are bonded to a heat radiating plate such as a rank side (Al-impregnated SiC fiber) to form a heat radiating wiring substrate. FIG. 7 is a schematic view of a conventional heat dissipation wiring board.

【0004】ラジエター4にランクサイド等からなる放
熱基板12がネジ締めによって接合され、その上に半田
10からなる層を介して両面アルミニウム8貼りの窒化
アルミニウム基板9が絶縁体として接合されている。そ
の上に半導体素子1がマウントされる構造となってい
る。
A radiator 4 is joined to a radiator 4 by a screw, and a heat dissipation board 12 made of, for example, a rank side is joined to the radiator 4. An aluminum nitride board 9 having aluminum 8 on both sides is joined thereto as an insulator via a layer made of solder 10. The semiconductor element 1 is mounted thereon.

【0005】これらの用途に使用される放熱配線基板
は、当然の事ながら半導体素子で発生した熱を効率良く
ラジエターなどのヒートシンクに伝達しなければならな
い。一般的に自動車では、図7に示した構造において、
放熱基板12に丸穴を空け、さらにラジエター4にネジ
穴を空け、M6程度のネジで放熱基板12の四隅を6±
1Nmのトルクでラジエター4に締め付けて固定してい
た。
[0005] The heat radiation wiring board used for these applications naturally needs to efficiently transfer the heat generated in the semiconductor element to a heat sink such as a radiator. Generally, in an automobile, in the structure shown in FIG.
A round hole is made in the heat dissipation board 12, a screw hole is made in the radiator 4, and four corners of the heat dissipation board 12 are formed with M6 screws.
The radiator 4 was fastened and fixed with a torque of 1 Nm.

【0006】しかしながら、前記従来の多段構造の放熱
配線基板では、冷却効率が不十分であり、冷却効率を高
めるために冷媒が流れるラジエターに直接接合されるよ
うな用途、例えば、環境問題への取り組みから登場を余
儀なくされているハイブリッド車、電気自動車には適用
できなかった。
However, the conventional heat dissipation wiring board having a multi-stage structure has insufficient cooling efficiency, and is used in such a manner as to be directly joined to a radiator through which a coolant flows in order to increase the cooling efficiency, for example, to address environmental issues. It could not be applied to hybrid cars and electric cars that have been forced to appear.

【0007】このため、本発明者等は、図8に示すよう
に半導体素子1を搭載した窒化アルミニウム等の放熱配
線基板3を直接ラジエター4にネジで固定する構造を提
案した。
For this reason, the present inventors have proposed a structure in which a heat dissipation wiring board 3 such as aluminum nitride on which a semiconductor element 1 is mounted is directly fixed to a radiator 4 with screws as shown in FIG.

【0008】[0008]

【発明が解決しようとする課題】しかし、図8に示すよ
うに窒化アルミニウム等のセラミックスからなる放熱配
線基板3を直接ネジ6で接合したものでは、ネジ6と放
熱配線基板3との間のワッシャーの硬度が高いと、ネジ
6を締め込む際に片当たりが発生し、ワッシャーの基板
の締め付け部分に割れまたは破損が発生し、固定不可能
になる。また、ワッシャーの硬度が低いと、ワッシャー
が変形しすぎて、ネジ6を締め込むことができないとい
う第一の課題があることが判った。
However, as shown in FIG. 8, when the heat dissipation wiring board 3 made of ceramics such as aluminum nitride is directly joined by screws 6, a washer between the screw 6 and the heat dissipation wiring board 3 is used. If the hardness of the screw 6 is high, the screw 6 may be partially sheared when the screw 6 is tightened, so that the washer may be cracked or damaged at a portion where the substrate is fastened, and cannot be fixed. Also, it was found that if the hardness of the washer was low, the first problem was that the washer was too deformed and the screw 6 could not be tightened.

【0009】また、図8に示す構造では、放熱配線基板
3のそりを考慮していない為、基板中心部分の放熱配線
基板3とラジエター4の密着性が悪く、良好な放熱特性
が得られないという第二の課題があった。
Further, in the structure shown in FIG. 8, since the warpage of the heat dissipation wiring board 3 is not taken into consideration, the adhesiveness between the heat dissipation wiring board 3 and the radiator 4 at the central portion of the board is poor, and good heat dissipation characteristics cannot be obtained. There was a second problem.

【0010】[0010]

【課題を解決する為の手段】前記第一の課題に対し、本
発明は、窒化アルミニウム、窒化珪素の中から選ばれる
少なくとも一種以上を主成分とするセラミックスからな
り、半導体素子を実装するための配線導体層を有し、か
つ四隅に丸穴をあけた放熱配線基板と、その下部に配置
したヒートシンクとを、上記丸穴を介して硬度25〜7
0kg/mm2 のワッシャを用いてネジ締めによって接
合したことを特徴とする。
In order to solve the above-mentioned problems, the present invention is directed to a method for mounting a semiconductor element comprising a ceramic mainly containing at least one selected from aluminum nitride and silicon nitride. A heat-dissipating wiring board having a wiring conductor layer and having round holes at four corners, and a heat sink disposed under the heat-radiating wiring board are hardened through the round holes to have a hardness of 25-7.
It is characterized by being joined by screw tightening using a washer of 0 kg / mm 2 .

【0011】また、第二の課題に対し、本発明は、窒化
アルミニウム、窒化珪素の中から選ばれる少なくとも一
種以上を主成分とするセラミックスからなり、半導体素
子を実装するための配線導体層を有し、厚さ0.3mm
以上、面積30cm2 以上の放熱配線基板を、ヒートシ
ンクとの接合面側が凸となるように反り量20〜600
μmで反らせたことを特徴とする。
[0011] In order to solve the second problem, the present invention provides a wiring conductor layer for mounting a semiconductor element, comprising a ceramic containing at least one selected from aluminum nitride and silicon nitride as a main component. 0.3mm thick
As described above, the heat dissipation wiring board having an area of 30 cm 2 or more is warped in an amount of 20 to 600 so that the bonding surface side with the heat sink becomes convex.
It is characterized in that it is warped by μm.

【0012】本発明の放熱基板であれば、下に凸のそり
を持った基板をヒートシンクに締め付けるので、放熱基
板とヒートシンクとの密着性が良く、特に放熱基板中央
部の密着性が良くなる為、ヒートシンクとのネジ締め接
合による熱抵抗の少ない放熱配線基板が提供される。
According to the heat dissipation board of the present invention, since the board having the downwardly projecting warp is fastened to the heat sink, the adhesion between the heat dissipation board and the heat sink is improved, and particularly the adhesion at the center of the heat dissipation board is improved. Thus, a heat dissipation wiring board having low thermal resistance due to screw fastening with a heat sink is provided.

【0013】[0013]

【発明の実施の形態】本発明による放熱配線基板3の平
面図および断面図を図1、2に示す。
1 and 2 are a plan view and a sectional view of a heat dissipation wiring board 3 according to the present invention.

【0014】図1に示すように、放熱配線基板3の四隅
にはM6(直径6mm)程度のネジ穴5が形成され、中
央部には不図示の半導体素子を搭載するための低抵抗の
配線導体層2が載置されている。また、図2(a)に
は、ラジエター4に本発明の放熱配線基板3がネジ6に
て直接ネジ締め接合されている様子を示してある。図2
(b)は、本発明のワッシャ7の構造を示した平面図と
側面図である。
As shown in FIG. 1, screw holes 5 of about M6 (diameter 6 mm) are formed at four corners of the heat dissipation wiring board 3, and a low-resistance wiring for mounting a semiconductor element (not shown) is formed in the center. The conductor layer 2 is placed. FIG. 2A shows a state in which the heat dissipation wiring board 3 of the present invention is directly screwed to the radiator 4 with the screws 6. FIG.
(B) is the top view and side view which showed the structure of the washer 7 of this invention.

【0015】放熱配線基板3を構成する材質は、熱伝導
性が良好で電気絶縁性良な窒化珪素、窒化アルミニウム
から選ばれる一種以上を主成分とするセラミックスであ
ることが望ましい。また、その主たる焼結助剤として
は、酸化エルビウム、酸化イットリウム、酸化イッテル
ビウムの中から選ばれる一種以上であることが望まし
い。主焼結助剤を酸化エルビウム、酸化イットリウム、
酸化イッテルビウムの中から選ばれる少なくとも一種と
した理由は、本発明者らの知見では、窒化アルミニウム
からなる放熱配線基板3の強度、破壊靱性がこれらの焼
結助剤を使用した場合に最も大きくなるからである。そ
して、このことは、固定する際の割れまたは破損の防止
に大きく寄与する。
The material constituting the heat dissipation wiring board 3 is desirably a ceramic mainly composed of at least one selected from silicon nitride and aluminum nitride having good thermal conductivity and good electrical insulation. The main sintering aid is desirably at least one selected from erbium oxide, yttrium oxide, and ytterbium oxide. The main sintering aids are erbium oxide, yttrium oxide,
The reason for using at least one selected from ytterbium oxide is that, based on the knowledge of the present inventors, the strength and fracture toughness of the heat dissipation wiring board 3 made of aluminum nitride are greatest when these sintering aids are used. Because. And this greatly contributes to prevention of cracking or breakage during fixing.

【0016】上記の材質からなる放熱配線基板3とその
下部に配置したヒートシンクであるラジエータ4とがそ
のネジ穴5を介してネジ締めによって一体化されてお
り、ネジ締めを行う際に使用するワッシャ7の硬度は、
25〜70kg/mm2 としてある。
The heat-dissipating wiring board 3 made of the above-mentioned material and the radiator 4 as a heat sink disposed under the heat-dissipating wiring board 3 are integrated by screwing through the screw holes 5, and a washer used for screw tightening. The hardness of 7 is
It is set to 25 to 70 kg / mm 2 .

【0017】その理由は、マイクロビッカース硬度が7
0kg/mm2 以上のワッシャ7を使用した場合には、
図6(c)に示すようにワッシャ7が固すぎる為、ネジ
6を締めつけていった際にネジ6が変形せずに放熱配線
基板3の締め付け部分のうねりを吸収できない為、ある
一点に集中荷重が発生し、放熱配線基板3自体がこの集
中荷重に耐えきれなくなり放熱配線基板3に割れまたは
破損が発生する。
The reason is that the micro Vickers hardness is 7
When a washer 7 of 0 kg / mm 2 or more is used,
As shown in FIG. 6C, since the washer 7 is too hard, the screw 6 is not deformed when the screw 6 is tightened, and the undulation of the tightened portion of the heat radiation wiring board 3 cannot be absorbed. A load is generated, and the heat dissipation wiring board 3 itself cannot withstand this concentrated load, and the heat dissipation wiring board 3 is cracked or damaged.

【0018】また、ワッシャ7のマイクロビッカース硬
度が25kg/mm2 以下では、図6(a)に示すよう
にワッシャ7が柔らかすぎて変形しすぎてしまうため、
固定が不可能になる。
If the micro Vickers hardness of the washer 7 is 25 kg / mm 2 or less, the washer 7 is too soft and deformed too much as shown in FIG.
Fixation becomes impossible.

【0019】具体的なワッシャ7の材質としては、アル
ミニウムや意図的に10%程度の気孔率を持たせた銅な
どが好ましい。また、ここで言うワッシャ7の硬度と
は、マイクロビッカース硬度計で荷重100g、時間1
5秒の条件で測定した値である。
As a specific material of the washer 7, aluminum or copper having a porosity of approximately 10% is preferably used. In addition, the hardness of the washer 7 referred to herein is a load of 100 g and a time of 1 with a micro Vickers hardness meter.
This is a value measured under the condition of 5 seconds.

【0020】本発明の放熱配線基板3は、半導体素子1
実装のための配線導体層2としてCu、Al、Agの中
から選ばれる少なくとも一種以上の金属箔が前記セラミ
ックス基板上で一体化されていることが望ましい。ま
た、本発明をパワーモジュールとして使用する場合に
は、バスバー用としてCu、Al、W、Moの中から選
ばれる少なくとも一種以上の金属層が前記放熱配線基板
3上で一体化されていることが望ましい。
The heat radiation wiring board 3 of the present invention
It is desirable that at least one or more metal foils selected from Cu, Al, and Ag are integrated on the ceramic substrate as the wiring conductor layer 2 for mounting. When the present invention is used as a power module, at least one or more metal layers selected from Cu, Al, W, and Mo for a bus bar may be integrated on the heat dissipation wiring board 3. desirable.

【0021】次に、第二の発明について説明する。図3
に示すように、理想的な放熱配線基板3の構造と放熱配
線基板3を固定する相手材との密着性を鋭意検討の結
果、厚さ0.3mm以上、面積30cm2 以上である窒
化アルミニウム、窒化珪素の中から選ばれる少なくとも
一種以上からなるセラミック製の放熱配線基板3であっ
て、放熱配線基板3の反り方向がヒートシンクとの接合
面側に凸であり、なおかつその反り量が600μm以
下、20μm以上である放熱配線基板3が最適である事
を見出した。
Next, the second invention will be described. FIG.
As shown in the figure, as a result of diligent studies on the ideal structure of the heat dissipation wiring board 3 and the adhesion between the heat dissipation wiring board 3 and the mating member to which the heat dissipation wiring board 3 is fixed, aluminum nitride having a thickness of 0.3 mm or more and an area of 30 cm 2 or more, A ceramic heat dissipation wiring board 3 made of at least one kind selected from silicon nitride, wherein a direction of warpage of the heat dissipation wiring board 3 is convex toward a bonding surface side with a heat sink, and the amount of warpage is 600 μm or less; It has been found that the heat dissipation wiring board 3 having a thickness of 20 μm or more is optimal.

【0022】即ち、図3(a)に示すように下に凸の反
りを持つ放熱配線基板3を用い、図3(b)に示すよう
にヒートシンクであるラジエータ4に締め付ける事によ
り、放熱配線基板3の中央部の密着性を良くし、放熱配
線基板3全体で浮き部のない密着性を実現する事ができ
るからである。逆に下に凹では、いくら放熱配線基板3
の四隅を締め付けても、中央部に浮き部が発生し、さら
に中央部分を締め付けても放熱配線基板3全体でみれ
ば、浮き部の発生は解消できないからである。
That is, as shown in FIG. 3A, a radiator wiring board 3 having a downwardly convex warp is used, and the radiator 4 as a heat sink is tightened as shown in FIG. This is because it is possible to improve the adhesiveness at the central portion of the substrate 3 and realize the adhesiveness without a floating portion in the entire heat radiation wiring board 3. Conversely, if it is recessed downward,
This is because even if the four corners are tightened, a floating portion is generated at the central portion, and even if the central portion is further tightened, the floating portion cannot be eliminated from the viewpoint of the entire heat dissipation wiring board 3.

【0023】なおかつ下に凸の反り量が基板全体に対し
20μm以下では、中央部の密着性が損なわれ、600
μm以上では、放熱配線基板3をねじ止めにて固定する
際に放熱配線基板3に割れが発生する。厚さ0.3mm
以上、面積30cm2 以上と形状を限定した理由は、こ
れより小さいあるいは薄い放熱配線基板3では、その放
熱特性が特に放熱配線基板3の反りに依存しないからで
ある。
If the amount of warpage of the downward projection is 20 μm or less with respect to the entire substrate, the adhesion at the central portion is impaired, and
Above μm, the heat dissipation wiring board 3 is cracked when the heat dissipation wiring board 3 is fixed by screws. 0.3mm thick
The reason why the shape is limited to the area of 30 cm 2 or more is that the heat radiation characteristics of the smaller or thinner heat radiation wiring board 3 do not particularly depend on the warpage of the heat radiation wiring board 3.

【0024】また、本発明を放熱配線基板3として使用
する場合には、半導体素子1実装のための配線導体層2
としてCu、Al、Agの中から選ばれる少なくとも一
種以上の金属箔が前記放熱配線基板3上で一体化されて
いることが望ましい。
When the present invention is used as the heat dissipation wiring board 3, the wiring conductor layer 2 for mounting the semiconductor element 1
Preferably, at least one or more metal foils selected from Cu, Al, and Ag are integrated on the heat dissipation wiring board 3.

【0025】さらに、本発明をパワーモジュールとして
使用する場合には、バスバー用としてCu、Al、W、
Moの中から選ばれる少なくとも一種以上の金属層が前
記放熱配線基板3上で一体化されていることが望まし
い。
Further, when the present invention is used as a power module, Cu, Al, W,
It is desirable that at least one or more metal layers selected from Mo are integrated on the heat dissipation wiring board 3.

【0026】上記放熱配線基板3を構成する窒化アルミ
ニウム又は窒化ケイ素の主焼結助剤が、酸化イットリウ
ム、酸化エルビウム、酸化イッテルビウムの中から選ば
れる少なくとも一種以上であることを特徴とする。これ
は、本発明者らの知見では、窒化アルミニウム、窒化ケ
イ素ともにこの焼結助剤を使用した場合がもっとも破壊
靱性、破壊強度が向上するため、本発明の用途に好まし
い。
The heat sintering wiring board 3 is characterized in that the main sintering aid of aluminum nitride or silicon nitride is at least one selected from yttrium oxide, erbium oxide and ytterbium oxide. According to the findings of the present inventors, the use of this sintering aid for both aluminum nitride and silicon nitride most improves fracture toughness and fracture strength, and is therefore preferred for use in the present invention.

【0027】以上の図3の実施形態において、放熱配線
基板3と相手材との固定方法には以下の二種類がある。
一つは、図4に示すように、放熱配線基板3に一カ所以
上のネジ穴5を形成し、そのネジ穴5にM6のネジ6で
5Nm以上の締め付けトルクで締め付ける固定構造であ
り、他方は図5に示すように、放熱配線基板3を固定す
る相手材に二カ所以上の貫通穴を形成し、その貫通穴に
M6のネジ6で5Nm以上の締め付けトルクで固定金具
11を締め付け、その固定金具11で放熱配線基板3を
固定する固定構造である。
In the embodiment of FIG. 3 described above, there are the following two methods for fixing the heat dissipation wiring board 3 to the mating member.
One is a fixing structure in which one or more screw holes 5 are formed in the heat dissipation wiring board 3 and the M6 screws 6 are tightened to the screw holes 5 with a tightening torque of 5 Nm or more as shown in FIG. As shown in FIG. 5, two or more through-holes are formed in a mating member for fixing the heat dissipation wiring board 3, and M6 screws 6 are used to fasten the fixing bracket 11 to the through-holes with a tightening torque of 5 Nm or more. This is a fixing structure in which the heat dissipation wiring board 3 is fixed by the fixing metal 11.

【0028】以下、本発明の放熱配線基板の製造方法を
図3を用いて説明する。
Hereinafter, a method for manufacturing a heat dissipation wiring board according to the present invention will be described with reference to FIG.

【0029】窒化アルミニウムと焼結助剤からなるセラ
ミックス粉末に所定のバインダーを添加し、ドクターブ
レード法によりテープ成形して得られたテープ上に、W
を主成分とするペーストをプリントした。しかる後に脱
脂工程を通した後、窒素雰囲気中1650〜1800℃
で焼成し、Wメタライズを有する窒化アルミニウム基板
を得た。その後、Wメタライズ上にNiメッキを施し、
半導体素子実装のための低抵抗導体2として銅板2を活
性金属法にて接合した。この際20μm〜600μmの
「下に凸」の反りを得るためには、低抵抗導体2を接合
する際の窒化アルミニウムからなる放熱配線基板3と低
抵抗導体2のヤング率、熱膨張係数の差を考慮し、低抵
抗導体2と窒化アルミニウムからなる放熱配線基板3を
焼き付ける際にどのくらいの反りが発生するかを予測し
なければならない。特に低抵抗導体2の厚み、面積、形
状に留意しなければならない。これらと窒化アルミニウ
ムからなる放熱配線基板3の強度、厚みとの相乗効果で
反り量が決定される。
A predetermined binder is added to a ceramic powder comprising aluminum nitride and a sintering aid, and W is formed on a tape obtained by tape forming by a doctor blade method.
Was printed as a main component. Then, after passing through a degreasing step, 1650 to 1800 ° C. in a nitrogen atmosphere
To obtain an aluminum nitride substrate having W metallization. Then, Ni plating on the W metallization,
A copper plate 2 was joined as a low resistance conductor 2 for mounting a semiconductor element by an active metal method. At this time, in order to obtain a “downward convex” warp of 20 μm to 600 μm, the difference between the Young's modulus and the coefficient of thermal expansion between the heat dissipation wiring board 3 made of aluminum nitride and the low resistance conductor 2 when the low resistance conductor 2 is joined. In consideration of the above, it is necessary to predict how much warpage will occur when the heat-dissipating wiring board 3 made of the low-resistance conductor 2 and aluminum nitride is burned. In particular, attention must be paid to the thickness, area, and shape of the low-resistance conductor 2. The amount of warpage is determined by a synergistic effect of the above and the strength and thickness of the heat dissipation wiring board 3 made of aluminum nitride.

【0030】[0030]

【実施例】実施例1 以下に第一の発明についての具体的実施例を示す。窒化
アルミニウムと焼結助剤からなるセラミックス粉末に所
定のバインダーを添加し、ドクターブレード法によりテ
ープ成形して得られたテープ上に、Wを主成分とするペ
ーストをプリントした。しかる後に脱脂工程を通した
後、窒素雰囲気中1650〜1800℃で焼成し、Wメ
タライズを有する窒化アルミニウムからなる放熱配線基
板3を得た。
Embodiment 1 A specific embodiment of the first invention will be described below. A paste containing W as a main component was printed on a tape obtained by adding a predetermined binder to a ceramic powder composed of aluminum nitride and a sintering aid and forming the tape by a doctor blade method. Then, after passing through a degreasing step, it was baked at 1650 to 1800 ° C. in a nitrogen atmosphere to obtain a heat dissipation wiring substrate 3 made of aluminum nitride having W metallization.

【0031】その後、Wメタライズ上にNiメッキを施
し、半導体素子実装のための配線導体層2として銅板を
活性金属法にて接合した。放熱配線基板3の締め付け方
法は、図1、2に示すように四隅をワッシャ7を介して
ネジ締めして固定した。
Thereafter, Ni plating was applied on the W metallization, and a copper plate was bonded as a wiring conductor layer 2 for mounting a semiconductor element by an active metal method. As shown in FIGS. 1 and 2, the heat dissipation wiring board 3 was fastened with screws at four corners via washers 7 and fixed.

【0032】締め付けトルクは各々表1に示した。ま
た、本実施例に用いたワッシャーの形状は、図2(b)
に示すように外径12mm、内径7mm、厚み0.5m
mであった。ラジエータ4には、本発明の放熱配線基板
3がネジ6によって直接ねじ締め接合されている。その
ネジを締めつける際のトルクレンチで測定したトルクを
締め付け結果の欄に示した。
The tightening torques are shown in Table 1. Further, the shape of the washer used in this embodiment is shown in FIG.
Outer diameter 12mm, inner diameter 7mm, thickness 0.5m as shown in
m. The heat dissipation wiring board 3 of the present invention is directly screwed to the radiator 4 by screws 6. The torque measured with a torque wrench when tightening the screw is shown in the column of tightening result.

【0033】表1に示したように、ワッシャ硬度80k
g/mm2 のNo.8は締め付けトルク2Nmで破損し
た。また、ワッシャ硬度20kg/mm2 のNo.7は
締め付けができなかった。これに対し、本発明の範囲の
ワッシャ硬度25〜72kg/mm2 であるNo.1〜
6は、締め付けトルク6〜12Nmで良好な締め付けが
できた。
As shown in Table 1, the washer hardness was 80 k.
g / mm 2 . No. 8 was broken by a tightening torque of 2 Nm. In addition, No. 2 having a washer hardness of 20 kg / mm 2 . 7 could not be tightened. On the other hand, No. 2 having a washer hardness of 25 to 72 kg / mm 2 in the range of the present invention. 1 to
In No. 6, good tightening was possible with a tightening torque of 6 to 12 Nm.

【0034】また、主焼結助剤をNd2 3 としたN
o.9は、ワッシャ硬度が本発明の範囲内の50kg/
mm2 のものを用いても、締め付けトルク3Nmで放熱
配線基板3に割れが発生した。これに対し、No.1〜
6に示したようにY2 3 、Yb2 3 、Er2 3
主焼結助剤に用いたものは、締め付けトルク6〜12N
mで良好な締め付けができた。
In addition, Nd 2 O 3 was used as the main sintering aid.
o. 9 is 50 kg / with a washer hardness within the range of the present invention.
Even when a substrate having a thickness of 2 mm 2 was used, cracks occurred in the heat dissipation wiring board 3 with a tightening torque of 3 Nm. On the other hand, no. 1 to
6 Y 2 O 3 as shown in, Yb 2 O 3, Er 2 O 3 that using the Omosho Yuisuke agents, tightening torque 6~12N
m, good tightening was achieved.

【0035】[0035]

【表1】 [Table 1]

【0036】実施例2 以下に第2の発明に関する具体的実施例を示す。窒化ア
ルミニウムと焼結助剤からなるセラミックス粉末に所定
のバインダーを添加し、ドクターブレード法によりテー
プ成形して得られたテープ上に、Wを主成分とするペー
ストをプリントした。しかる後に脱脂工程を通した後、
窒素雰囲気中1650〜1800℃で焼成し、Wメタラ
イズを有する窒化アルミニウムからなる放熱配線導体基
板3を得た。
Embodiment 2 A specific embodiment according to the second invention will be described below. A paste containing W as a main component was printed on a tape obtained by adding a predetermined binder to a ceramic powder composed of aluminum nitride and a sintering aid and forming the tape by a doctor blade method. After passing through the degreasing process,
It was fired at 1650 to 1800 ° C. in a nitrogen atmosphere to obtain a heat dissipation wiring conductor substrate 3 made of aluminum nitride having W metallization.

【0037】その後、Wメタライズ上にNiメッキを施
し、半導体素子実装のための配線導体層2として銅板を
活性金属法にて接合した。放熱配線基板3の締め付け方
法は、図3に示すように四隅をワッシャ7を介してネジ
締めして固定した。基板の厚みは1.5mm、面積は5
0cm2 とした。
Thereafter, Ni plating was applied on the W metallization, and a copper plate was bonded as a wiring conductor layer 2 for mounting a semiconductor element by an active metal method. As shown in FIG. 3, the heat dissipation wiring board 3 was fixed by screwing four corners via washers 7. The thickness of the substrate is 1.5 mm and the area is 5
0 cm 2 .

【0038】本発明者らが行った放熱試験とは、セラミ
ックス基板の四隅に直径8mmの丸穴を開け、疑似ラジ
エターとして厚み20mmのアルミニウムブロックを用
意し、アルミニウムブロックにM6のネジ穴を開け、M
6六角穴付きボルトをトルクレンチでアルミニウムブロ
ックに締め付けることにより、放熱配線基板3を固定し
た。その後、実際に放熱配線基板3にヒータにて熱を加
え、放熱配線基板3上の温度とアルミブロックの反対側
の温度を測定し、その温度差を測定した。実施例には、
もっとも放熱特性の良かった600μmの際の温度差を
1.00とし、比で温度差を表した。放熱配線基板から
の発熱がアルミニウムブロック側へうまく伝達されない
と、放熱配線基板の温度が上昇するので、温度差の比が
1.00を越えて大きくなるに従い、放熱特性が悪くな
ることを示している。
The heat radiation test carried out by the present inventors is as follows. A round hole having a diameter of 8 mm is formed in each of the four corners of a ceramic substrate, an aluminum block having a thickness of 20 mm is prepared as a pseudo radiator, and an M6 screw hole is formed in the aluminum block. M
The heat dissipation wiring board 3 was fixed by tightening a hexagon socket head cap screw to the aluminum block with a torque wrench. Thereafter, heat was actually applied to the heat dissipation wiring board 3 by a heater, the temperature on the heat dissipation wiring board 3 and the temperature on the opposite side of the aluminum block were measured, and the temperature difference was measured. Examples include:
The temperature difference at 600 μm where the heat radiation characteristic was the best was set to 1.00, and the temperature difference was expressed as a ratio. If the heat from the heat-dissipating wiring board is not transmitted to the aluminum block side properly, the temperature of the heat-dissipating wiring board rises. As the ratio of the temperature difference exceeds 1.00, the heat-dissipating characteristics deteriorate. I have.

【0039】その結果を表2に示した。表2から判るよ
うに、反り量が本発明の請求範囲外の250μmのN
o.7は、締め付けにより放熱配線基板3が割れてしま
う。また、反り方向が「上に凸」であるNo.8は、放
熱特性が1.50と低下する。反り方向が「下に凸」で
あるが反り量が10μmと小さ過ぎる場合、やはり放熱
特性が1.65と低下する。これに対し、本発明の請求
範囲内であるNo.1〜6、即ち反り方向が「下に凸」
であり反り量が20〜200μmである放熱配線基板3
は、割れの発生もなく放熱特性も1.00〜1.10と
良好であることが判った。
The results are shown in Table 2. As can be seen from Table 2, the amount of warpage was 250 μm N outside the scope of the present invention.
o. In No. 7, the heat dissipation wiring board 3 is broken by the tightening. In the case of No. 1 in which the warp direction is “convex upward”. In No. 8, the heat radiation characteristic is reduced to 1.50. If the warping direction is “convex downward”, but the amount of warpage is too small, such as 10 μm, the heat radiation characteristic also decreases to 1.65. On the other hand, No. 3 which is within the scope of the present invention. 1 to 6, ie, the warp direction is “convex downward”
Heat dissipation wiring board 3 having a warpage of 20 to 200 μm
It was found that no cracks were generated and the heat radiation characteristics were good at 1.00 to 1.10.

【0040】[0040]

【表2】 [Table 2]

【0041】[0041]

【発明の効果】窒化アルミニウム、窒化珪素の中から選
ばれる少なくとも一種以上を主成分とするセラミックス
からなり、半導体素子を実装するための配線導体層を有
し、かつ四隅に丸穴を備えた放熱配線基板と、その下部
に配置したヒートシンクとを、上記丸穴を介して硬度2
5〜70kgf/mm2 のワッシャを用いてネジ締めに
よって接合したことにより、基板の割れや破損を生じる
ことなく、放熱配線基板とヒートシンクを強固い接合す
ることができる。
According to the present invention, there is provided a heat radiator comprising a ceramic having at least one selected from aluminum nitride and silicon nitride as a main component, having a wiring conductor layer for mounting a semiconductor element, and having round holes at four corners. The wiring board and the heat sink disposed under the wiring board are hardened with a hardness of 2 through the round holes.
By joining with a screw using a washer of 5 to 70 kgf / mm 2 , the heat dissipation wiring board and the heat sink can be firmly joined without causing breakage or breakage of the board.

【0042】また、厚さ0.3mm以上、面積30cm
2 以上である窒化アルミニウム、窒化珪素の中から選ば
れる少なくとも一種以上を主成分とするセラミックスか
らなる放熱配線基板であって、基板の反り方向がヒート
シンクとの接合面側に凸となっており、その反り量が6
00μm以下、20μm以上であることにより、放熱配
線基板の割れや破損がなく放熱特性良好な放熱配線基板
の接合構造を提供することができる。
Further, the thickness is 0.3 mm or more, and the area is 30 cm.
Aluminum nitride that is 2 or more, a heat dissipation wiring board made of ceramics containing at least one or more selected from silicon nitride as a main component, wherein the warping direction of the substrate is convex on the bonding surface side with the heat sink, The warpage is 6
When the thickness is not more than 00 μm and not less than 20 μm, it is possible to provide a joint structure of a heat radiation wiring board having good heat radiation characteristics without cracking or breakage of the heat radiation wiring board.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の放熱配線基板の接合構造を示す平面図
である。
FIG. 1 is a plan view showing a joint structure of a heat dissipation wiring board of the present invention.

【図2】(a)は本発明の放熱配線基板の接合構造を示
す断面図、(b)はこれに用いるワッシャを示す図であ
る。
FIG. 2A is a cross-sectional view showing a joint structure of a heat dissipation wiring board of the present invention, and FIG. 2B is a view showing a washer used for this.

【図3】(a)は本発明の放熱配線基板のネジ締め前の
状態を示す断面図であり、(b)はネジ締め後の状態を
示す断面図である。
FIG. 3A is a cross-sectional view showing a state before screwing of a heat dissipation wiring board of the present invention, and FIG. 3B is a cross-sectional view showing a state after screwing.

【図4】本発明の放熱配線基板の接合構造を示す平面図
である。
FIG. 4 is a plan view showing a joint structure of the heat dissipation wiring board of the present invention.

【図5】本発明の放熱配線基板の接合構造の他の実施形
態を示す平面図である。
FIG. 5 is a plan view showing another embodiment of the joint structure of the heat dissipation wiring board of the present invention.

【図6】(a)〜(c)はワッシャの硬度と固定状態を
説明するための断面図である。
FIGS. 6A to 6C are cross-sectional views for explaining the hardness and the fixed state of the washer.

【図7】従来の放熱配線基板を示す断面図である。FIG. 7 is a cross-sectional view showing a conventional heat dissipation wiring board.

【図8】従来の放熱配線基板を示す断面図である。FIG. 8 is a cross-sectional view showing a conventional heat dissipation wiring board.

【符号の説明】[Explanation of symbols]

1:半導体素子 2:低抵抗導体 3:放熱配線基板 4:ラジエータ 5:ネジ穴 6:ネジ 7:ワッシャー 8:アルミニウム 9:窒化アルミニウム基板 10:半田 11:固定金具 12:放熱基板 1: Semiconductor element 2: Low resistance conductor 3: Heat dissipation wiring board 4: Radiator 5: Screw hole 6: Screw 7: Washer 8: Aluminum 9: Aluminum nitride board 10: Solder 11: Fixture 12: Heat dissipation board

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】窒化アルミニウム、窒化珪素の少なくとも
一種を主成分とするセラミックスからなり、半導体素子
実装のための配線導体層を備えるとともに、四隅に丸穴
を有する放熱配線基板と、その下部に配置したヒートシ
ンクとを、上記丸穴を介して硬度25〜70kgf/m
2 のワッシャを用いて、ネジ締めによって接合したこ
とを特徴とする放熱配線基板の接合構造。
1. A heat-dissipating wiring board comprising a wiring conductor layer for mounting a semiconductor element and having round holes at four corners, comprising a ceramic mainly composed of at least one of aluminum nitride and silicon nitride. And the heat sink having the hardness of 25 to 70 kgf / m through the round hole.
with washer m 2, the junction structure of heat radiating wiring board, characterized in that joined by screwing.
【請求項2】窒化アルミニウム、窒化珪素の少なくとも
一種を主成分とするセラミックスからなり、半導体素子
実装のための配線導体層を備えた放熱配線基板と、その
下部に配置したヒートシンクとを接合する構造におい
て、上記放熱配線基板は、厚さ0.3mm以上、面積3
0cm2 以上であり、かつ上記ヒートシンクとの接合面
側が凸となるように20〜600μmの反り量で反って
いることを特徴とする放熱配線基板の接合構造。
2. A structure in which a heat-dissipating wiring board made of ceramics containing at least one of aluminum nitride and silicon nitride as a main component and provided with a wiring conductor layer for mounting a semiconductor element is joined to a heat sink disposed thereunder. Wherein the heat dissipation wiring board has a thickness of 0.3 mm or more and an area of 3
A bonding structure for a heat-radiating wiring board, which is not less than 0 cm < 2 > and is warped by a warpage of 20 to 600 [mu] m so that a bonding surface side with the heat sink is convex.
【請求項3】半導体素子実装のための配線導体層として
Cu、Al、Agの少なくとも一種以上の金属箔が上記
放熱配線基板上に形成されていることを特徴とする請求
項1または2記載の放熱配線基板の接合構造。
3. The heat dissipation wiring board according to claim 1, wherein at least one metal foil of Cu, Al, Ag is formed as a wiring conductor layer for mounting a semiconductor element. Joint structure of heat dissipation wiring board.
【請求項4】上記放熱配線基板上に、バスバー用として
Cu、Al、W、Moの少なくとも一種以上の金属層が
形成されていることを特徴とする請求項1または2記載
の放熱配線基板の接合構造。
4. The heat dissipation wiring board according to claim 1, wherein at least one metal layer of Cu, Al, W, and Mo is formed on the heat dissipation wiring board for bus bars. Joint structure.
【請求項5】上記放熱配線基板を成すセラミックスの主
焼結助剤が酸化イットリウム、酸化エルビウム、酸化イ
ッテルビウムの少なくとも一種以上であることを特徴と
する請求項1または2記載の放熱配線基板の接合構造。
5. The bonding of a heat dissipation wiring board according to claim 1, wherein the main sintering aid for ceramics constituting said heat dissipation wiring board is at least one of yttrium oxide, erbium oxide and ytterbium oxide. Construction.
JP12314499A 1999-04-28 1999-04-28 Joint structure of heat dissipation wiring board Expired - Fee Related JP3583019B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012015321A (en) * 2010-06-30 2012-01-19 Taiheiyo Cement Corp Metal-ceramic composite board material
JP2017045979A (en) * 2015-08-27 2017-03-02 西村陶業株式会社 Heat radiating member, power semiconductor module, and led package

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010153803A (en) 2008-11-28 2010-07-08 Toshiba Lighting & Technology Corp Electronic component mounting module and electrical apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012015321A (en) * 2010-06-30 2012-01-19 Taiheiyo Cement Corp Metal-ceramic composite board material
JP2017045979A (en) * 2015-08-27 2017-03-02 西村陶業株式会社 Heat radiating member, power semiconductor module, and led package

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