JP2000314955A5 - - Google Patents

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Publication number
JP2000314955A5
JP2000314955A5 JP1999124529A JP12452999A JP2000314955A5 JP 2000314955 A5 JP2000314955 A5 JP 2000314955A5 JP 1999124529 A JP1999124529 A JP 1999124529A JP 12452999 A JP12452999 A JP 12452999A JP 2000314955 A5 JP2000314955 A5 JP 2000314955A5
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JP
Japan
Prior art keywords
exposure
light
mask
pattern
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999124529A
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English (en)
Japanese (ja)
Other versions
JP4323616B2 (ja
JP2000314955A (ja
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Publication date
Application filed filed Critical
Priority to JP12452999A priority Critical patent/JP4323616B2/ja
Priority claimed from JP12452999A external-priority patent/JP4323616B2/ja
Publication of JP2000314955A publication Critical patent/JP2000314955A/ja
Publication of JP2000314955A5 publication Critical patent/JP2000314955A5/ja
Application granted granted Critical
Publication of JP4323616B2 publication Critical patent/JP4323616B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP12452999A 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置 Expired - Fee Related JP4323616B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12452999A JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12452999A JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Publications (3)

Publication Number Publication Date
JP2000314955A JP2000314955A (ja) 2000-11-14
JP2000314955A5 true JP2000314955A5 (enrdf_load_stackoverflow) 2006-06-15
JP4323616B2 JP4323616B2 (ja) 2009-09-02

Family

ID=14887742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12452999A Expired - Fee Related JP4323616B2 (ja) 1999-04-30 1999-04-30 エバネッセント光露光マスク及びエバネッセント光露光装置

Country Status (1)

Country Link
JP (1) JP4323616B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3334685B2 (ja) 1999-06-30 2002-10-15 日本電気株式会社 露光方法
JP3715973B2 (ja) 2002-05-07 2005-11-16 キヤノン株式会社 近接場光露光用のフォトマスク、該フォトマスクを用いたパターン作製方法およびパターン作製装置
WO2004040392A1 (ja) * 2002-11-01 2004-05-13 Waseda University マイクロシステム、並びに、微小開口膜、及び生体分子間相互作用解析装置とその解析方法
CN113238454B (zh) * 2021-03-30 2024-07-19 上海华力微电子有限公司 光掩模结构和光刻设备

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