JP2000301043A - Rotary coating device - Google Patents

Rotary coating device

Info

Publication number
JP2000301043A
JP2000301043A JP11112755A JP11275599A JP2000301043A JP 2000301043 A JP2000301043 A JP 2000301043A JP 11112755 A JP11112755 A JP 11112755A JP 11275599 A JP11275599 A JP 11275599A JP 2000301043 A JP2000301043 A JP 2000301043A
Authority
JP
Japan
Prior art keywords
coating
head
opening
coating head
circular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11112755A
Other languages
Japanese (ja)
Other versions
JP3585096B2 (en
Inventor
Sumio Harukawa
澄夫 春川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirata Corp
Original Assignee
Hirata Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirata Corp filed Critical Hirata Corp
Priority to JP11275599A priority Critical patent/JP3585096B2/en
Publication of JP2000301043A publication Critical patent/JP2000301043A/en
Application granted granted Critical
Publication of JP3585096B2 publication Critical patent/JP3585096B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To coat with the small quantity of a coating liquid without forming a primary coating film into a round shape at the central part of a rotating base plate or an non-uniform state, which exerts large influence on a secondary coating film, at the time of forming the secondary coating film by the centrifugal force generated by high speed rotation after forming the primary coating film using a coating head. SOLUTION: This coating device is equipped with a rotary table 4 holding a base plate 3 by suction to face a flat coating surface upward and rotating and an elevating device elevating and lowering relatively to the coating head 5, the coating head 5 is divided into a 1st coating head for coating a circular coating surface to have an opening part as the radius and a 2nd coating head for coating a 1st ring-shaped coating surface (b) to have a circular coating surface (a) as the inscribed circle and the same coating surface area as that of the circular coating surface (a) and the coating is performed to uniformize the thickness of the primary coating film by the cooperation of the rotation of the base plate by the rotary table 4 with the quantitative discharge of the coating liquid by the 1st coating head and the 2nd coating head.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、回転式塗布装置に
係り、特に硝子基板や金属板などの平坦な枚葉部材など
の被塗布部材の表面に塗布液を吐出し、塗膜を形成する
ときに、半導体基板や液晶硝子基板やプリント基板およ
びプラズマディスプレイ等の平面な基板上により少ない
塗布液を用いて均一厚さの塗膜を形成するための省液塗
布を実現できる回転式塗布装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary coating apparatus, and more particularly to a coating apparatus which discharges a coating liquid onto a surface of a member to be coated such as a flat sheet member such as a glass substrate or a metal plate to form a coating film. Occasionally, the present invention relates to a rotary coating apparatus capable of realizing a liquid-saving coating for forming a coating film having a uniform thickness using a smaller coating liquid on a flat substrate such as a semiconductor substrate, a liquid crystal glass substrate, a printed substrate, and a plasma display. .

【0002】[0002]

【従来の技術】半導体製造工程や液晶表示装置の製造工
程において基板にレジスト液等を均一に塗布する装置と
してスピンコート法による回転式塗布装置が知られてい
る。
2. Description of the Related Art A rotary coating apparatus using a spin coating method is known as an apparatus for uniformly applying a resist solution or the like to a substrate in a semiconductor manufacturing process or a liquid crystal display device manufacturing process.

【0003】この回転式塗布装置によれば、基板の塗布
面を上にして裏面側を吸引して保持し、低速回転させな
がら、中心に多めの塗布液を落下させ、その後に、高速
回転させることで遠心力の作用により均一に拡散させ、
かつ余分な塗布液を振り切るものであった。このため
に、1枚の基板の塗布有効面に必要な塗膜形成量の数十
倍から百倍近くの塗布液を消費している。塗布液は、多
くの場合極めて高価であるために、その液浪費が大きな
問題であった。
[0003] According to this rotary coating apparatus, a large amount of coating liquid is dropped at the center while rotating at a low speed, and then rotated at a high speed while holding the substrate with the coated surface up and suctioning and holding the back side. By the effect of centrifugal force, it spreads evenly,
In addition, excess coating solution was shaken off. For this reason, a coating liquid that is several tens to nearly one hundred times the amount of the coating film required for the effective coating surface of one substrate is consumed. Since the coating liquid is often extremely expensive, waste of the liquid has been a serious problem.

【0004】そこで、塗布液の消費量を抑制するために
所定幅で塗布がてきる塗布ヘッドを用いた塗布方法が提
案されている。すなわち、特開平4−332116号公
報や特開平7−28715号公報に開示されるように、
平らな塗布面を有する基板に、所定幅の直線状の開口部
を有する塗布ヘッドを用いて塗布液を定量吐出すること
で一次塗布膜を形成し、高速回転にともなう遠心力によ
り一次塗布膜を均一に拡散して二次塗布膜を形成するこ
とで所望する薄膜を形成しようとする技術が知られてい
る。
[0004] In order to suppress the consumption of the coating liquid, there has been proposed a coating method using a coating head capable of coating with a predetermined width. That is, as disclosed in JP-A-4-332116 and JP-A-7-28715,
A primary coating film is formed on a substrate having a flat coating surface by quantitatively discharging a coating liquid using a coating head having a linear opening having a predetermined width, and the primary coating film is formed by centrifugal force accompanying high-speed rotation. A technique for forming a desired thin film by forming a secondary coating film by uniformly diffusing the film is known.

【0005】また、円形基板においては、塗布ヘッドを
基板の回転中心に配置し、基板を回転させることで塗布
有効面のほぼ全域に塗布する方法が知られている。
[0005] Further, in the case of a circular substrate, a method is known in which a coating head is disposed at the center of rotation of the substrate, and the substrate is rotated to apply the coating over substantially the entire area of the effective coating surface.

【0006】しかしながら、半径方向に伸びた塗布ヘッ
ドを用いて得られる一次塗膜は周速度の違いから、中央
部で厚塗りであり基板外周にいくにつれ薄くなるが、高
速回転で得られる二次塗膜の品質は、高速回転前に有効
面全域にいかに塗布液を載せたどうかで決定される。す
なわち、外周部でカスレ現象が起きないような一次塗布
を行なうことから、中央部が高くなる山形の塗布は避け
られれず、液浪費は依然として解消されない。
[0006] However, the primary coating film obtained by using the coating head extending in the radial direction is thick at the center and becomes thinner toward the outer periphery of the substrate due to the difference in the peripheral speed. The quality of the coating film is determined by how the coating liquid is applied over the entire effective surface before high-speed rotation. That is, since the primary coating is performed so as not to cause the fogging phenomenon in the outer peripheral portion, the mountain-shaped coating in which the central portion becomes high cannot be avoided, and the waste of the liquid still cannot be eliminated.

【0007】このように中央部が山形に成る点を改善す
るために、特開昭59−112872号公報や実案登録
3004824号がある。特開昭59−112878号
公報によれば、多数の細孔ノズルを直線状に配置し細孔
径を回転外周に行くほど大きくなるようにしたり、また
外周に行くほど細孔の長さを短くすることで管内抵抗が
低下するようにしたものである。また、実用新案登録3
004824号の技術は塗布ヘッドの開口幅を回転中心
から外周にかけて広げるものである。
[0007] In order to improve such a point that the central portion has a mountain shape, there are Japanese Patent Application Laid-Open No. Sho 59-112873 and Japanese Utility Model Registration No. 300824. According to Japanese Patent Application Laid-Open No. Sho 59-12878, a large number of fine pore nozzles are arranged in a straight line so that the fine pore diameter becomes larger toward the outer circumference of rotation or the length of fine pore becomes shorter toward the outer circumference. Thus, the resistance in the pipe is reduced. In addition, utility model registration 3
The technique of No. 004824 expands the opening width of the coating head from the center of rotation to the outer periphery.

【0008】しかしながら、連通した流路から圧送する
流体は低い抵抗の流路を流れる傾向にあり、特に省液を
目指して微量吐出口を中央部に設け外周部における吐出
口を広くしたり抵抗差をつけようものなら中央部には全
く吐出できない場合がある。開口幅にそれなりの抵抗差
を設け吐出量を制御する方法は限界があり、期待通りの
均一な一次塗布薄膜を得ることは難しい。
However, the fluid to be pressure-fed from the communicating flow paths tends to flow through the flow path having a low resistance. In some cases, it may not be possible to discharge the ink at the center. There is a limit to a method of controlling the discharge amount by providing a certain resistance difference in the opening width, and it is difficult to obtain a uniform primary coating thin film as expected.

【0009】そこで、特開平10−284381号公報
に見られるように、塗布ヘッドを用いて縞状または格子
状に塗布した一次塗布膜を形成した後に、高速回転にと
もなう遠心力により一次塗布膜を均一に拡散して二次塗
布膜を形成する装置も提案されている。
Therefore, as disclosed in Japanese Patent Application Laid-Open No. 10-284381, after forming a primary coating film coated in a stripe or grid pattern using a coating head, the primary coating film is formed by centrifugal force accompanying high-speed rotation. An apparatus that uniformly diffuses to form a secondary coating film has also been proposed.

【0010】[0010]

【発明が解決しようとする課題】一方、実用新案登録の
3004824号によれば、基板を回転させつつ塗布ヘ
ッドの開口部の向きを回転基板の半径方向に配置し、外
周方向へ速度制御を行ないながら移動させるようにして
いる。しかしながら、この方法では塗布ヘッドの開口部
の長さを長くすればするほど回転中央部と外周部との吐
出量を工夫する必要がある。また、短くすると塗布完了
までにかなりの時間を要することから、乾燥進行による
厚塗りは避けられないので液効率の点からはまだ改善し
なければならないといった問題がある。さらに、特開平
10−284381号公報に提案された一次塗布膜は、
二次塗布膜を形成するときの高速回転方向に沿うように
塗布されないので、均一化は困難となる。以上のように
スピンコート法による回転式塗布装置で液効率を向上さ
せ、高い精度の二次塗布膜の均一薄膜化を図ることは難
しい。
On the other hand, according to Utility Model Registration No. 300824, the direction of the opening of the coating head is arranged in the radial direction of the rotating substrate while rotating the substrate, and the speed is controlled in the outer peripheral direction. While moving. However, in this method, the longer the length of the opening of the coating head is, the more it is necessary to devise the discharge amount between the rotation center and the outer periphery. Further, if the length is shortened, a considerable time is required until the application is completed. Therefore, there is a problem that thick coating due to the progress of drying is inevitable, so that the solution efficiency still needs to be improved. Furthermore, the primary coating film proposed in JP-A-10-284381 is
Since the coating is not applied along the high-speed rotation direction when forming the secondary coating film, it is difficult to achieve uniformity. As described above, it is difficult to improve the liquid efficiency by the spin coating method using the spin coating method and to achieve uniform thinning of the secondary coating film with high accuracy.

【0011】したがって、本発明は上述した問題点に鑑
みてなされたものであり、塗布ヘッドを用いて一次塗布
膜を形成した後に、高速回転にともなう遠心力により二
次塗布膜を形成する回転式塗布装置において、二次塗布
膜に大きな影響を与える一次塗布膜を塗布するときに、
基板回転の中央部が山形になったり、不均一な状態とな
ることがなく、しかもより少ない塗布液で塗布すること
ができる回転式塗布装置の提供を目的としている。
SUMMARY OF THE INVENTION Accordingly, the present invention has been made in view of the above-described problems, and has been made in view of the above-described problems. In the coating device, when applying a primary coating film that has a large effect on the secondary coating film,
It is an object of the present invention to provide a rotary coating apparatus that can apply a coating liquid with a smaller amount of coating liquid without causing a central portion of the substrate rotation to have a mountain shape or an uneven state.

【0012】[0012]

【課題を解決するための手段】上述の課題を解決し、目
的を達成するために、本発明によれば、平らな塗布面を
有する基板に、所定幅の直線状の開口部を有する塗布ヘ
ッドを用いて塗布液を定量吐出することで一次塗布膜を
形成し、高速回転にともなう遠心力により前記一次塗布
膜を均一に拡散して二次塗布膜を形成する回転式塗布装
置であって、前記塗布面を上にして基板を吸着により保
持し、回転する回転保持手段と、前記塗布ヘッドと前記
回転保持手段とを相対的に昇降する昇降手段と、前記塗
布ヘッドを、前記回転保持手段の回転中心を中心とし、
前記開口部を半径とした円形塗布面を塗布する第1の塗
布ヘッドと、前記円形塗布面の外側において、前記円形
塗布面の回転中心と同じとする少なくとも1つ以上の隣
接する環状塗布面に対して塗布する少なくとも1つ以上
の第2の各塗布ヘッドとに分割するとともに、隣接する
前記円形塗布面及び前記各環状塗布面は内周及び外周で
接し、単位分の回転したときに、前記各塗布ヘッドが前
記円形塗布面及び前記各環状塗布面上に描かれる各軌跡
の単位面積当たりの定量吐出の協動により、前記一次塗
布膜が略同じ厚さとなるように塗布することを特徴とし
ている。
According to the present invention, there is provided a coating head having a linear opening having a predetermined width in a substrate having a flat coating surface. A rotary coating apparatus that forms a primary coating film by discharging a coating liquid at a constant rate by using, and uniformly diffuses the primary coating film by centrifugal force accompanying high-speed rotation to form a secondary coating film, Holding the substrate by suction with the coating surface up, rotating and holding means for rotating, lifting and lowering means for relatively moving up and down the coating head and the rotation holding means, and applying the coating head to the rotation holding means. Centering on the rotation center,
A first coating head that applies a circular coating surface having the opening as a radius, and at least one or more adjacent annular coating surfaces that are the same as the rotation center of the circular coating surface outside the circular coating surface. While dividing into at least one or more second coating heads for coating with respect to each other, the adjacent circular coating surface and each of the annular coating surfaces are in contact at the inner circumference and the outer circumference, and when rotated by a unit, Each coating head is characterized in that the coating is performed so that the primary coating film has substantially the same thickness by the cooperation of the quantitative discharge per unit area of each locus drawn on the circular coating surface and the annular coating surface. I have.

【0013】また、平らな塗布面を有する基板に、所定
幅の直線状の開口部を有する塗布ヘッドを用いて塗布液
を定量吐出して一次塗布膜を形成し、高速回転にともな
う遠心力で前記一次塗布膜を均一に拡散して二次塗布膜
を形成する回転式塗布装置であって、前記塗布面を上に
して基板を吸着して保持し、回転する回転保持手段と、
前記塗布ヘッドと前記回転保持手段とを相対的に昇降す
る昇降手段と、前記塗布ヘッドを、前記回転保持手段の
回転中心を開始位置とし、前記開口部を半径とした円形
塗布面の外周を終点位置とした距離内と、前記円形塗布
面の接線方向に概ね沿う位置を開始位置とし前記円形塗
布面と同じ塗布面積となる環状塗布面の外周円を終点位
置とした距離内において、単位時間当たりの塗布有効面
積が概一定になるように、順次、前記塗布ヘッドの移動
速度を制御して駆動する塗布ヘッド移動手段とを備え、
前記回転保持手段による基板の回転と、前記塗布ヘッド
の前記移動速度による移動に伴う塗布液の定量吐出の協
動とにより、前記一次塗布膜が略同じ厚さとなるように
塗布することを特徴としている。
A primary coating film is formed on a substrate having a flat coating surface by quantitatively discharging a coating liquid using a coating head having a linear opening having a predetermined width, and a primary coating film is formed by centrifugal force accompanying high-speed rotation. A rotary coating device that uniformly diffuses the primary coating film to form a secondary coating film, and holds and holds a substrate with the coating surface facing upward, and a rotation holding unit that rotates.
Elevating means for relatively elevating and lowering the coating head and the rotation holding means, and setting the coating head at the rotation center of the rotation holding means as a start position and ending at the outer periphery of a circular coating surface with the opening as a radius. Within the distance defined as the position, and within the distance defined as the end point, the outer circumferential circle of the annular coating surface having the same coating area as the circular coating surface with the start position being a position substantially along the tangential direction of the circular coating surface, per unit time Coating head moving means for controlling the moving speed of the coating head and driving the coating head so that the coating effective area is substantially constant,
By rotating the substrate by the rotation holding means and cooperating with the quantitative discharge of the coating liquid accompanying the movement of the coating head at the moving speed, the coating is performed so that the primary coating film has substantially the same thickness. I have.

【0014】[0014]

【発明の実施の形態】以下に、本発明の好適な各実施形
態について添付図面を参照して述べる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

【0015】図1は、回転式塗布装置1の全体構成を示
した外観斜視図である。また、図2は、図1に図示の回
転テーブル4と塗布ヘッド5の位置関係を示した平面図
(a)、同正面図(b)、(c)である。
FIG. 1 is an external perspective view showing the entire configuration of the rotary coating apparatus 1. As shown in FIG. FIG. 2 is a plan view (a), a front view (b), and (c) showing the positional relationship between the rotary table 4 and the coating head 5 shown in FIG.

【0016】図1において、半導体基板や液晶硝子基板
やプリント基板およびプラズマディスプレイ等の平面な
基板3は、図示のように一対のフォーク16上に載置さ
れた状態で回転式塗布装置1と別の装置間でやり取りす
ることで所望の塗膜が形成される。この装置1の基部2
上には、後述するモータ11の本体側が固定されてい
る。このモータ11の出力軸か、または不図示のモータ
から動力を受けることで矢印方向に低速と高速とで回転
駆動される回転テーブル4が装置1の上方の開口部に設
けられている。この回転テーブル4は、図示のように平
らな円形の吸着面を有しており、その吸着面上において
真空発生装置15からバルブ14を介して真空圧を供給
することで基板3を吸引保持するための無数の吸着孔4
aが設けられている。
In FIG. 1, a flat substrate 3 such as a semiconductor substrate, a liquid crystal glass substrate, a printed substrate, and a plasma display is separately mounted on a pair of forks 16 as shown in FIG. A desired coating film is formed by exchanging between the apparatuses. Base 2 of this device 1
Above, a main body side of a motor 11 described later is fixed. A rotary table 4 is provided at an upper opening of the apparatus 1 and is rotated at low and high speeds in the direction of the arrow by receiving power from the output shaft of the motor 11 or a motor (not shown). The rotary table 4 has a flat circular suction surface as shown in the drawing, and the substrate 3 is suction-held by supplying a vacuum pressure from the vacuum generator 15 via the valve 14 on the suction surface. Countless suction holes 4 for
a is provided.

【0017】上下方向の移動については、基部2に固定
される昇降モータ12の昇降動作で行なう。
The vertical movement is carried out by a lifting operation of a lifting motor 12 fixed to the base 2.

【0018】以上の構成により、回転テーブル4を上方
に配設された塗布ヘッド5に対して相対的に昇降するよ
うにして、後述の塗布を行ない、塗布ヘッド5を退避さ
せてから基板3を不図示のロボット装置のフォーク16
上に載置して移載できるように構成されている。
With the above configuration, the rotating table 4 is moved up and down relatively with respect to the coating head 5 disposed above, so that coating, which will be described later, is performed and the substrate 3 is retracted after the coating head 5 is retracted. Fork 16 of robot device (not shown)
It is configured so that it can be placed and transferred on top.

【0019】回転テーブル4の外周側には、回転テーブ
ル4の高速回転にともない飛散する過剰な塗布液を飛散
防止して回収処理する回収ケース9が設けられている。
On the outer peripheral side of the rotary table 4, there is provided a collecting case 9 for preventing and recovering excess coating liquid which is scattered due to the high-speed rotation of the rotary table 4.

【0020】一方、図示のように5個の同じ塗布ヘッド
5には、塗布液供給装置6からバルブ7を介して供給さ
れる塗布液を導入する配管と、塗布直後に塗布ヘッド5
内部から強制的に塗布液を吸引するサックバルブ8に接
続された配管が設けられており、後述の塗布を可能にし
ている。以上の各バルブとモータは制御装置10に接続
されており、制御装置10からの指示に基づき連動して
動作できるように構成されている。
On the other hand, as shown in the figure, five identical coating heads 5 are provided with a pipe for introducing a coating liquid supplied from a coating liquid supply device 6 via a valve 7 and a coating head 5 immediately after coating.
A pipe connected to a sack valve 8 that forcibly sucks the coating liquid from the inside is provided to enable coating described later. The above-described valves and motors are connected to the control device 10 and are configured to operate in conjunction with each other based on an instruction from the control device 10.

【0021】次に、図2(a)において、各塗布ヘッド
5の配置と塗布原理を説明する。
Next, the arrangement of each coating head 5 and the principle of coating will be described with reference to FIG.

【0022】第1の塗布ヘッド5Aは、一端を回転中心
Oに配置しy方向に幅寸法hの開口部を配置する。この
結果、回転テーブル4が矢印方向に360度分回転する
と、開口部を半径としたπh2の面積の円形塗布面aが
塗布される。
The first coating head 5A has one end located at the rotation center O and an opening having a width h in the y direction. As a result, when the rotary table 4 is rotated by 360 degrees in the direction of the arrow, a circular application surface a having an area of πh 2 with the opening as a radius is applied.

【0023】次に、開口部が円形塗布面aの接線方向に
概ね沿うように配置されて円形塗布面aを内接円とし、
円形塗布面aと同じ塗布面積となる第1の環状塗布面b
を塗布する第2の塗布ヘッド5Bを図示のように配設す
る。
Next, the opening is arranged substantially along the tangential direction of the circular coating surface a to make the circular coating surface a an inscribed circle,
First annular coating surface b having the same coating area as circular coating surface a
A second coating head 5B for coating is provided as shown.

【0024】この第2の塗布ヘッド5Bで塗布される塗
布面積は、直角三角形のピタゴラスの定理により図中の
計算式から求めることができるので、円形塗布面aの面
積であるπh2と同じ面積であるπh2の面積の第1の環
状塗布面bとなる。
The coating area applied by the second coating head 5B can be obtained from the calculation formula in the drawing by the right triangular Pythagorean theorem, so that the area is the same as πh 2 which is the area of the circular coating surface a. Is the first annular coating surface b having an area of πh 2 .

【0025】さらに、この第1の環状塗布面bの外周円
の接線方向に開口部が概ね沿うように配置されること
で、第1の環状塗布面bの外周円を内接円とした第2の
環状塗布面cを塗布する第3の塗布ヘッド5Cをさらに
配設する。
Further, the opening is arranged so as to be substantially tangential to the outer circumferential circle of the first annular coating surface b, so that the outer circumferential circle of the first annular coating surface b has an inscribed circle. A third coating head 5C for coating the second annular coating surface c is further provided.

【0026】以下、同様に開口部が第2の環状塗布面c
の外周円の接線方向に概ね沿うよう開口部が配置される
ことで、第2の環状塗布面cの外周円を内接円とする第
3の環状塗布面dを塗布する第4の塗布ヘッド5Dと、
開口部が第3の環状塗布面dの外周円の接線方向に概ね
沿うように配置されることで、第3の環状塗布面dの外
周円を内接円とする第4の環状塗布面意eを塗布する第
5の塗布ヘッド5Eを配設する。
Hereinafter, the opening is similarly formed on the second annular coating surface c.
The fourth coating head for coating the third annular coating surface d having the outer circumferential circle of the second annular coating surface c as the inscribed circle by arranging the opening portion substantially in the tangential direction of the outer circumferential circle of 5D,
The opening is arranged so as to substantially follow the tangential direction of the outer circumferential circle of the third annular coating surface d, so that the outer circumferential circle of the third annular coating surface d is an inscribed circle. A fifth coating head 5E for coating e is provided.

【0027】以上のように同じ塗布ヘッド5を図中のx
軸方向に平行移動するように配置する。以上の各塗布ヘ
ッド5A〜5Eを同じ長さ同じ開口幅の定量吐出可能な
スロットノズルとして塗布流体を塗布しつつ1回転させ
ると、全て等量塗布されることになる。円盤Pに描いた
円a円環b,c,d,eには各々の塗布ヘッドで、図2
(b)に示すように回転中心○を中心とした各a,b,
c,d,eの塗布面に塗布した塗布液の各平均膜厚は略
等しくなる。
As described above, the same coating head 5 is moved to x in FIG.
Arrange so as to translate in the axial direction. When each of the above coating heads 5A to 5E is rotated once while applying a coating fluid as a slot nozzle capable of quantitative discharge with the same length and the same opening width, all the coating is performed in the same amount. The circles a, b, c, d and e drawn on the disk P are each coated with a coating head as shown in FIG.
As shown in (b), each of a, b,
The average film thicknesses of the coating liquids applied to the coating surfaces of c, d, and e are substantially equal.

【0028】この結果、比較のために破線で図示した従
来の塗布ヘッド105で塗布した場合の破線図示の膜厚
分布である図2(c)とは比較にならないほど平均化し
た平均厚みTの一次塗布膜を形成でき、その後に高速回
転して均一塗膜を形成でき、しかも余剰な塗布液もきわ
めて少なくなる。
As a result, the average thickness T was averaged so as to be incomparable with FIG. 2 (c), which is the film thickness distribution shown by the broken line when the coating was performed by the conventional coating head 105 shown by the broken line for comparison. A primary coating film can be formed, and thereafter a high-speed rotation can be performed to form a uniform coating film, and the amount of excess coating liquid is extremely reduced.

【0029】つまり1本の塗布面積の半径もしくは直径
を有するスロットを回転中心位置にその端部もしくは中
央部に配置し回転する基板に塗布させて形成したときの
破線図示の膜厚分布を外周部に形成する塗膜の勾配(本
案環状円eの勾配)と等しくなるようにした場合に顕著
に相違することになる。
That is, when a slot having a radius or diameter of one coating area is arranged at the center of rotation at the end or center thereof and applied to the rotating substrate, the film thickness distribution shown by the broken line is represented by the outer peripheral portion. In this case, the difference is remarkably different when the gradient is made equal to the gradient of the coating film formed on the substrate (the gradient of the annular circle e in the present invention).

【0030】このようにして塗布有効面を等面積に分割
できるような等量吐出塗布ヘッドにより塗布することに
より、概ね等厚の薄膜塗布が可能となる。また、図面で
は接線方向に沿うように直交して塗布ヘッドの開口部が
配置される要図を示したが、y軸に対してそれぞれが傾
斜するようにしても良い。
[0030] In this manner, by applying a coating by an equal-amount discharge coating head that can divide the effective coating surface into equal areas, it is possible to apply a thin film having approximately the same thickness. Further, although the drawings show that the openings of the coating head are arranged orthogonally along the tangential direction, they may be inclined with respect to the y-axis.

【0031】図3は、塗布ヘッド5の断面図であり、
(a)は開口部の長手方向に破断して示した横断面図で
あり、(b)は開口部に直交して破断して図示した縦断
面図である。
FIG. 3 is a sectional view of the coating head 5.
FIG. 2A is a cross-sectional view cut along the longitudinal direction of the opening, and FIG. 2B is a vertical cross-sectional view cut off orthogonal to the opening.

【0032】図3において、各塗布ヘッド5A〜5Eは
図示のように3枚の異なる厚さを有するスペーサ部材1
7を介在して不図示のボルトナットにより重ねるように
して完成される。完成後には、互いに連通するとともに
上記の供給装置6とサックバルブ8に出入口が接続され
るようにした流路18が形成される。この流路と18に
より、各塗布ヘッドの空間部19内に塗布液を同じよう
に安定供給する。空間部19はスロット20の開口部に
連通しており先端から矢印方向に同量吐出できるように
している。
In FIG. 3, each of the coating heads 5A to 5E has three spacer members 1 having different thicknesses as shown.
7 are completed with bolts and nuts (not shown) interposed therebetween. After completion, a flow path 18 is formed, which communicates with each other and is connected to the inlet and outlet of the supply device 6 and the sack valve 8. The coating liquid is supplied stably into the space 19 of each coating head in the same manner by the channels and 18. The space 19 communicates with the opening of the slot 20 so that the same amount can be discharged from the tip in the direction of the arrow.

【0033】以上のように各塗布ヘッドは、幅寸法W
(即ち開口部の幅寸法h)のスロットを形成するスリッ
ト20の開口部に連通し開口部の上部に開口長とほぼ同
等の長さを持ち、圧力流体をスロット部に安定して送り
出すことができる。このような塗布ヘッドを複数個と塗
布ヘッドを適当な間隔で配置した集合塗布ヘッドとし
て、開閉バルブのオンオフにより塗布液の供給タイミン
グを制御する。また排出口にも開閉バルブを設けてい
る。スロット間隙が十分に狭くスロット高さを十分に高
くして、排出ロのバルブを開き(大気圧)注入口から液
を供給すると、スロット内壁抵抗により、液は貫通口を
通して各塗布ヘッドの空間部19に満ち、排出口に至
る。
As described above, each coating head has a width W
It is possible to communicate with the opening of the slit 20 forming a slot having a width (h) of the opening and having a length substantially equal to the opening length at the upper part of the opening so that the pressure fluid can be sent out stably to the slot. it can. As a collective coating head in which a plurality of such coating heads and the coating heads are arranged at appropriate intervals, the supply timing of the coating liquid is controlled by turning on / off a valve. An open / close valve is also provided at the outlet. When the slot gap is sufficiently narrow and the height of the slot is sufficiently high, the valve of the discharge port is opened and the liquid is supplied from the inlet (atmospheric pressure). It is full of 19 and reaches the outlet.

【0034】そこで、排出口の開閉バルブを閉じると液
はスロット先端部より吐出されるようになる。これを数
回繰り返すと塗布ヘッド内には気泡が存在しない液で満
タンになった状態を作り出すことができる。そこで、供
給ロの開閉バルブを閉じ、排出ロの開閉バルブの先に設
けたサックバルブにより液を吸引すると、吐出開口部先
端部の液はスロット内に引き込むことができるので、直
後に排出口の開閉バルブを閉じる。この状態になると塗
布作業を開始できる待機状態となる。なお、供給口への
流体供給は一定の圧力で供給されるものであれば、いか
なる手段を用いても良い。
Then, when the open / close valve of the discharge port is closed, the liquid is discharged from the end of the slot. By repeating this several times, it is possible to create a state in which the coating head is filled with a liquid having no air bubbles. Then, when the on-off valve of the supply unit is closed and the liquid is sucked by the sack valve provided at the end of the on-off valve of the discharge unit, the liquid at the tip of the discharge opening can be drawn into the slot. Close the open / close valve. In this state, the apparatus enters a standby state in which the application operation can be started. In addition, any means may be used as long as the fluid is supplied to the supply port at a constant pressure.

【0035】このような構成の塗布ヘッドの開口部の先
端部と回転する基板の塗布面との間隙を所定値にするた
めに相対的に昇降させつつ塗布を行なうが、その昇降タ
イミングは塗布ヘッドの供給バルブを開き、塗布ヘッド
先端に塗布液が滲み出て小さな液玉を連続的に形成した
直後であればより良い。
Coating is performed while the coating head is relatively raised and lowered in order to set a gap between the tip of the opening of the coating head having the above configuration and the coating surface of the rotating substrate at a predetermined value. It is better if the supply valve is opened immediately after the application liquid seeps out to the tip of the application head and small liquid droplets are continuously formed.

【0036】このようにして基板3が360度回転以上
するまで塗布を行い、定められた回転角度に達すると液
注入口の手前に設けた開閉バルブ7を閉じ、また、液排
出口から液の吸引を行ない、昇降手段にて塗布ヘッドも
しくは塗布される基板3を昇降移動させる。このように
して形成された塗布面は塗布ヘッドの設置数に見合う小
さな波紋波の塗膜が形成されることになり、各波紋状の
塗布面間の平均膜厚Tは同じ厚みとなり、塗布有効面の
ほぼ全域が塗布液で濡らされた状態となった一次塗布膜
を得ることができる。この後に、基板を所定時間の高速
回転させるように回転テーブル4の回転数を制御するこ
とで所望する均一膜厚の二次塗布膜を得ることができ
る。
In this manner, the coating is performed until the substrate 3 rotates 360 degrees or more, and when the rotation angle reaches a predetermined rotation angle, the opening / closing valve 7 provided in front of the liquid inlet is closed, and the liquid is discharged from the liquid outlet. The suction is performed, and the application head or the substrate 3 to be applied is moved up and down by the elevating means. On the coating surface formed in this way, a small rippled coating film corresponding to the number of coating heads to be installed is formed, and the average film thickness T between the rippled coating surfaces becomes the same thickness, so that the coating is effective. It is possible to obtain a primary coating film in which almost the entire surface is wet with the coating liquid. Thereafter, by controlling the number of rotations of the turntable 4 so that the substrate is rotated at a high speed for a predetermined time, a secondary coating film having a desired uniform film thickness can be obtained.

【0037】ここで、以上のように集合塗布ヘッドにお
ける各塗布ヘッドの開口部の幅寸法を半径と同じように
設定することにより、従来のように回転テーブルの直径
分の開口部を有する塗布ヘッドの製造に比べて、スリッ
ト開口部の先端の直線性を確保する部分が短くなるの
で、製造工程が非常に簡単になる。
Here, as described above, by setting the width of the opening of each coating head in the collective coating head to be the same as the radius, the coating head having the opening corresponding to the diameter of the rotary table as in the prior art. Since the portion for ensuring the linearity of the tip of the slit opening is shorter than in the case of the manufacturing method, the manufacturing process is greatly simplified.

【0038】図4(a)〜(e)は、塗布ヘッドの配置
図である。本図において、上述したものは、中央部に位
置する開口部の一端を回転中心に位置決めして、他の一
端が描く円に対して概外接するように順次スロットの開
口部を配置するようにしたもので、中央部のスロットの
開口部の幅寸法hは描く円の半径であり、理論上では上
記のように波紋状態で一次塗膜を形成できるものであっ
た。図4(b)は、各塗布ヘッド5の開口部の幅にh1
分余分な大きな開口幅を設けたものであって、このよう
にすることで波紋の重なり部分をより均一にできる。ま
た、図4(c)は、開口部の幅寸法が2hにしたもので
あり、中央部スロット開ロの中心を回転中心に配置する
と描く円の直径となるようにしている。また、図4
(d)は、塗布ヘッドの中央部のスロット開口部の幅寸
法を他の塗布ヘッドの2倍である2hとし、回転中心点
を中心にして点対称位置に幅寸法hの開口部の塗布ヘッ
ドを2組分配置したものである。そして、図4(e)
は、塗布ヘッドの中央部のスロット開口部の幅寸法を他
の塗布ヘッドの2倍である2hとし、この中心の塗布ヘ
ッドの開口部の線対称位置に幅寸法hの開口部の塗布ヘ
ッドを2組分配置したものである。
FIGS. 4A to 4E are layout diagrams of the coating head. In the drawing, the above-described arrangement is such that one end of the opening located at the center is positioned at the center of rotation, and the openings of the slots are sequentially arranged so as to substantially circumscribe the circle drawn by the other end. The width dimension h of the opening of the central slot is the radius of the circle to be drawn. In theory, the primary coating film could be formed in a rippled state as described above. FIG. 4B shows that the width of the opening of each coating head 5 is h1.
The extra large opening width is provided, so that the overlapping portion of the ripples can be made more uniform. In FIG. 4C, the width of the opening is set to 2 h, and the diameter of the circle drawn when the center of the central slot opening is located at the center of rotation is set. FIG.
(D), the width dimension of the slot opening at the center of the coating head is 2h, which is twice that of the other coating heads, and the coating head having the width dimension h at a point symmetric position about the rotation center point. Are arranged for two sets. Then, FIG.
Sets the width of the slot opening at the center of the coating head to 2h, which is twice that of the other coating heads, and places the coating head of the opening having the width dimension h at a line symmetrical position of the opening of the center coating head. Two sets are arranged.

【0039】図4(d)、(e)に図示のように塗布ヘ
ッドを配置することで、図4(a)〜(c)において塗
布時の回転角度が360度以上必要であったものが、1
80度以上であれば良いことになる。
By disposing the coating head as shown in FIGS. 4 (d) and 4 (e), the rotation angle at the time of coating was required to be 360 ° or more in FIGS. 4 (a) to 4 (c). , 1
It is sufficient if the angle is 80 degrees or more.

【0040】なお、以上のような構成にした塗布ヘッド
の中央に位置するスロット開口部は他のスロット開口部
と必ずしも平行に配置せず角度を設けたり、直交させて
も何ら原理に変わらないことはいうまでもない。
It should be noted that the slot opening located at the center of the coating head having the above-described configuration is not necessarily arranged in parallel with other slot openings, and that the principle is not changed even if an angle is provided or the slot opening is orthogonal. Needless to say.

【0041】次に、図5(a)は、図示のような矩形の
基板3に対して、図5で示した塗布ヘッド5で塗布を行
なったときの各塗布ヘッドが描く塗布円と回転する基板
の状態を説明した図である。図5(b)は、塗布ヘッド
5Dおよび塗布ヘッド5Eを取り去り塗布ヘッド5C延
長し、また図5(c)は塗布ヘッド5Cを2倍に延長し
た図である。
Next, FIG. 5 (a) shows a coating circle drawn by each coating head when the coating head 5 shown in FIG. 5 performs coating on a rectangular substrate 3 as shown. FIG. 3 is a diagram illustrating a state of a substrate. FIG. 5B is a diagram in which the coating head 5D and the coating head 5E are removed and the coating head 5C is extended, and FIG. 5C is a diagram in which the coating head 5C is doubled.

【0042】図5(a)と図5(c)で1サイクル塗布
動作に消費する液吐出量を比較すると、図5(a)の塗
布量を「5」としたとき、図5(c)では「4」とな
る。また図5(c)の塗布ヘッド5Cは環状塗布面eの
外に一部をはみ出しているので、この環状塗布円e内に
収めると図5(b)に示すように「4」以下の塗布量と
なる。図5(b)の塗布ヘッド5Cは環状円c,d,e
に塗布することになるが、円形塗布面aおよび環状塗布
円bにおける平均塗布膜厚は等しく環状塗布面cの平均
膜厚も一部若干厚め気味であるがほぼ環状塗布面a,b
に等しくなる。
5A and FIG. 5C, a comparison is made between the liquid discharge amounts consumed in one-cycle coating operation. Assuming that the coating amount in FIG. 5A is "5", FIG. Then, it becomes "4". Further, since the coating head 5C in FIG. 5C partially protrudes outside the annular coating surface e, if the coating head 5C is accommodated in the annular coating circle e, as shown in FIG. Amount. The coating head 5C shown in FIG. 5B has annular circles c, d, and e.
Although the average coating thickness on the circular coating surface a and the circular coating circle b is the same and the average coating thickness on the annular coating surface c is slightly thicker, the annular coating surfaces a and b
Is equal to

【0043】環状塗布面dおよびcでは塗布ヘッド5C
のδ、η分の開口部で基板に塗布を行なうことになる
が、基板3上における塗布有効面積は環状塗布面dの数
分の1であり、環状塗布面eの数十分の1となる。即
ち、図5(b)の例に示したように塗布ヘッド5Cの長
さを適当な長さにすることで、液効率の高い塗布が実現
できることになる。
In the annular coating surfaces d and c, the coating head 5C
Is applied to the substrate at the openings of δ and η, but the effective area of application on the substrate 3 is a fraction of the annular coating surface d, and is several tenths of the annular coating surface e. Become. That is, as shown in the example of FIG. 5B, by setting the length of the coating head 5C to an appropriate length, coating with high liquid efficiency can be realized.

【0044】また、図5(b)の例では塗布ヘッド5C
の一端を延長したが、基板3のサイズや開口部の長さ次
第では塗布ヘッド5Cの両端を適宜延長したり塗布ヘッ
ド5Cの配置を塗布ヘッド5B方向に寄せて、外周部の
塗布膜を厚く塗り、高速回転で拡散させることができ
る。また、塗布ヘッド5の数や開口部の幅寸法や液供給
圧力等は、基板の形状、サイズ、所望膜の厚み、塗布対
象液の粘性等から適宜選定されることは言うまでもな
い。
In the example of FIG. 5B, the coating head 5C
However, depending on the size of the substrate 3 and the length of the opening, both ends of the coating head 5C are appropriately extended or the arrangement of the coating head 5C is moved toward the coating head 5B, so that the coating film on the outer peripheral portion is thickened. It can be spread and spread at high speed. Needless to say, the number of coating heads 5, the width of the opening, the liquid supply pressure, and the like are appropriately selected from the shape and size of the substrate, the desired thickness of the film, the viscosity of the liquid to be coated, and the like.

【0045】塗布ヘッド5の開口長さは、図6(a)の
横断面図と縦断面図(b)に図示のように、2つの壁面
間にシム21を挟みボルト22で締め付けて塗布ヘッド
5を形成するようにすれば、シム交換で開口長および開
口位置、さらに開口幅Wを容易に変更することが可能で
ある。もちろん塗布ヘッドを構成する全ての塗布ヘッド
のシムは等厚であることはいうまでもない。
The length of the opening of the coating head 5 is determined by sandwiching a shim 21 between two wall surfaces and tightening with a bolt 22 as shown in the cross-sectional view and the vertical cross-sectional view (b) of FIG. By forming 5, the opening length and the opening position, and the opening width W can be easily changed by shim exchange. Of course, it goes without saying that the shims of all the coating heads constituting the coating head have the same thickness.

【0046】次に、図7は、第2実施形態の回転式塗布
装置の動作原理図を示した平面図である。また、図8は
塗布ヘッドの動きを示した正面図であって、待機位置
(a)、塗布開始位置(b)及び基板取り出し位置を示
した図である。
Next, FIG. 7 is a plan view showing the principle of operation of the rotary coating apparatus according to the second embodiment. FIG. 8 is a front view showing the movement of the coating head, showing a standby position (a), a coating start position (b), and a substrate removal position.

【0047】先ず図8において既に説明済みの構成部品
については同様の符号を附して説明を割愛すると、塗布
ヘッド5は、1つのみが図8において不図示のヘッド移
動昇降機構に搭載されている。この塗布ヘッド5には距
離センサ26が固定されており、基板3と開口部の間の
距離を測定しつつ移動して、図8に図示のように基板3
上への移動に伴う塗布が行なえるように構成されてい
る。また、上述のモータ11の出力軸となるボールスプ
ライン軸30(破線図示)の上端に固定されている回転
テーブル4は、図示のように昇降モータ12への通電に
伴い上方に移動されるとともに、図8(c)の位置にお
いて不図示のロボット装置の一対のフォーク16が回転
テーブル4の外周面の側面であって基板3の下方に潜入
するようにして、基板3を載置できるように構成されて
いる。
First, the components already described in FIG. 8 are denoted by the same reference numerals and description thereof will be omitted. Only one coating head 5 is mounted on a head moving elevating mechanism not shown in FIG. I have. A distance sensor 26 is fixed to the coating head 5, moves while measuring the distance between the substrate 3 and the opening, and moves as shown in FIG.
It is configured so that application can be performed in accordance with the upward movement. Further, the rotary table 4 fixed to the upper end of the ball spline shaft 30 (shown by a broken line) serving as the output shaft of the above-described motor 11 is moved upward along with the energization of the lifting motor 12 as shown in FIG. At the position shown in FIG. 8C, the pair of forks 16 of the robot device (not shown) is placed on the side surface of the outer peripheral surface of the rotary table 4 and under the substrate 3 so that the substrate 3 can be placed. Have been.

【0048】図7において、上述した各塗布ヘッド5の
開口部の幅寸法は等しく塗布ヘッド5Aの一端が回転中
心に配置され他端が円形塗布面aの外周面まで塗布する
ようにしたものであったが、このときの、各塗布ヘッド
5A〜5Eの間隔の比は塗布ヘッド5A、5B間の長さ
ABであるhを「1」としたとき直角三角形のピタゴラ
スの定理から次のようになる。
In FIG. 7, the width of the opening of each coating head 5 is equal, and one end of the coating head 5A is arranged at the center of rotation, and the other end is applied to the outer peripheral surface of the circular coating surface a. However, at this time, the ratio of the distance between the coating heads 5A to 5E is as follows from the Pythagorean theorem of a right-angled triangle when h, which is the length AB between the coating heads 5A and 5B, is "1". Become.

【0049】AB:BC:CD:DE:DF:・・・=
1:√2−1:√3−√2:√4−√3:√5−√4:
・・・√n−√n−1 したがって、これらの塗布ヘッド間の各距離AB、B
C、CD、DE、DF間を塗布ヘッド5が移動する時間
が等しくなるように移動速度制御を行なえば、単位時間
当たりの塗布ヘッドの吐出量および基板回転数が一定で
ある条件下において、塗布面a、b、c、d、…のほぼ
全域の塗布膜厚は一定になることになる。そこで、図7
において破線で図示される個所を基点及び終点とするよ
うに同じ塗布ヘッド5の移動制御を行なうようにしてい
る。ただし、塗布開始点と完了点近傍では多少ばらつく
ことになる。
AB: BC: CD: DE: DF:... =
1: √2-1: √3-√2: √4-√3: √5-√4:
... Δn−Δn−1 Therefore, each distance AB, B between these coating heads
If the moving speed is controlled so that the moving time of the coating head 5 between C, CD, DE, and DF is equal, the coating speed can be reduced under the condition that the discharge amount of the coating head per unit time and the substrate rotation speed are constant. .. Will be constant over substantially the entire surface a, b, c, d,. Therefore, FIG.
, The movement control of the same application head 5 is performed so that the locations indicated by the broken lines are set as the base point and the end point. However, there is some variation near the application start point and the application end point.

【0050】以上の塗布動作には2通りあり、回転中央
部から塗布を開始する方法と外周部から開始する方法が
ある。回転中央部から開始する場合には、図7(b)に
図示のように低速回転する基板3の上方待機位置P1か
ら、液吐出を開始しつつ塗布ヘッドを下降させつつ高速
で斜めに移動し回転中心の手前位置P2で塗布液を基板
3の表面にランディングさせて、回転中心位置から終点
まで減速制御を行ない塗布する。終点位置は基板内でも
基板3の外側でも良い。
There are two types of coating operations described above, including a method of starting coating from the center of rotation and a method of starting coating from the outer periphery. In the case of starting from the center of rotation, as shown in FIG. 7B, from the upper standby position P1 of the substrate 3 rotating at a low speed, the application head is moved obliquely at a high speed while lowering the application head while starting liquid discharge. The coating liquid is landed on the surface of the substrate 3 at a position P2 before the rotation center, and deceleration control is performed from the rotation center position to the end point to perform coating. The end point position may be inside the substrate or outside the substrate 3.

【0051】また、基板3の外周側から開始する場合
は、図7(a)に示したE位置から開始し、回転してい
る基板表面と塗布ヘッド先端を所定の間隙に設定し、塗
布液吐出を開始して、回転中心に向って移動する方法で
ある。この開始時に塗布ヘッドは停止状態となってお
り、徐々に加速し、回転中心または中心をオーバーした
位置で塗布ヘッドを上昇させるように駆動される。
When starting from the outer peripheral side of the substrate 3, starting from the position E shown in FIG. 7A, the surface of the rotating substrate and the tip of the coating head are set at a predetermined gap, and the coating liquid is set. This is a method of starting ejection and moving toward the center of rotation. At the start, the coating head is in a stopped state, is gradually accelerated, and is driven so as to raise the coating head at a position where the rotation center or the center is exceeded.

【0052】このような回転する基板に加減速の速度制
御を行ないながら移動塗布を開始すると、上記のいずれ
の方法においても開始部および終点部を除きほぼ均一な
一次塗布を行なうことが可能となる。この後に、高速回
転させることで所望する均一な二次塗膜を得ることがで
きる。
When moving coating is started while controlling the speed of acceleration / deceleration on such a rotating substrate, it is possible to perform substantially uniform primary coating except for the start and end points in any of the above methods. . Thereafter, by rotating at a high speed, a desired uniform secondary coating film can be obtained.

【0053】以上のように塗布することで、余剰な塗布
液は不要となり液効率の高い省液塗布が実現できること
になる。塗布ヘッド5の長さおよび塗布ヘッド端部の位
置は例えば図5に示したように適宜選定すれば良く、従
来の回転式塗布装置の塗布ヘッドより低コストで製造で
きる短尺塗布ヘッドの使用が可能となる。また、この方
法は円形基板の省液塗布法として有効であるばかりでな
く、矩形基板であっても、回転外周部近傍の速度を適宜
制御することで省液効果が高くなることはいうまでもな
い。
By applying as described above, a surplus coating liquid is not required, and liquid-saving coating with high liquid efficiency can be realized. The length of the coating head 5 and the position of the coating head end may be appropriately selected, for example, as shown in FIG. 5, and a short coating head that can be manufactured at lower cost than the coating head of a conventional rotary coating device can be used. Becomes In addition, this method is not only effective as a liquid-saving coating method for a circular substrate, but also for a rectangular substrate, the liquid-saving effect is improved by appropriately controlling the speed in the vicinity of the rotation outer peripheral portion. Absent.

【0054】ここで、塗布ヘッドの先端開口部と基板の
塗布表面の間隙は、薄膜塗布を追求すればするほど重要
な要素となる。数μm厚のウエット膜塗布を行なうとき
の間隙は数十μm±20μm程度がよく、それ以下にな
ると塗布ヘッド先端と基板表面に形成される液溜りで塗
布ヘッドの先端部以外が汚損される可能性が高くなり、
連続生産する作業において、その汚損液が次の対象物を
汚損する虞がある。
Here, the gap between the tip opening of the coating head and the coating surface of the substrate becomes a more important factor as the thin film coating is pursued. When applying a wet film with a thickness of several μm, the gap should be about several tens μm ± 20 μm. If it is less than this, liquids formed on the tip of the coating head and the surface of the substrate may contaminate the area other than the tip of the coating head. Nature,
In a continuous production operation, the fouling liquid may contaminate the next object.

【0055】また、それ以上になると塗布先端から基板
表面に至るまでのカーテン状の流体を表面張力で塗布ヘ
ッド開口長全域に連続して形成することが難しくなり一
部が切れる可能性が高くなる。さらに基板3の板厚は1
0〜20μmほどロットにより異なる。このことから、
上述のように距離センサ26でモニターして基板表面の
高さを検出し適切な間隙を基板1枚毎に設定することは
薄膜塗布を行なうときに、一次塗布膜の品質と液効率を
向上させる上で重要となる。
Further, if it is larger than that, it is difficult to continuously form a curtain-shaped fluid from the coating tip to the substrate surface over the entire opening length of the coating head due to the surface tension, and the possibility of partial breakage increases. . Further, the thickness of the substrate 3 is 1
It varies from lot to lot by about 0 to 20 μm. From this,
As described above, monitoring the distance with the distance sensor 26 to detect the height of the substrate surface and setting an appropriate gap for each substrate improves the quality and liquid efficiency of the primary coating film when performing thin film coating. Important above.

【0056】以上のように使用される塗布ヘッドは、上
記のようにスリット状の開口部から吐出するに留まら
ず、図9(a)から(c)に図示のように開口形状は多
数の細孔23を略直線状に設けたノズルであってもよ
い。すなわち、塗布ヘッドから流体を吐出する際の流体
の状態を説明すると、塗布ヘッドノズル内に液先端を収
納した状態の流体を吐出すると、吐出流体は先ず塗布ヘ
ッド先端に微少な半球状の液玉を形成することになる。
この半球状の液玉を開口部全域にわたり形成した後に、
ヘッド先端と基板の間隔を所定の値に短縮すると液玉は
つぶれて、塗布ヘッド開口全長に連続した液ダマリの膜
を形成することになる。この状態から塗布ヘッドもしく
は基板を相対的に走行させると、つぶされた液玉(厚塗
りの余剰液)は走行動作で引伸ばされることになる。こ
のようにして先端部に形成される液玉は直径0.数mm
以下の小玉をほぼ等間隔に並べることができたとき塗布
品質は高いことが確認されている。
The coating head used as described above does not only discharge from the slit-shaped opening as described above, but also has a large number of fine shapes as shown in FIGS. 9 (a) to 9 (c). A nozzle in which the holes 23 are provided substantially linearly may be used. That is, the state of the fluid when the fluid is ejected from the application head will be described. When the fluid in the state where the liquid tip is housed in the application head nozzle is ejected, the ejected fluid firstly has a minute hemispherical liquid droplet at the tip of the application head. Will be formed.
After forming this hemispherical liquid ball over the entire opening,
When the distance between the head tip and the substrate is reduced to a predetermined value, the liquid ball is crushed and a liquid sump film is formed continuously over the entire length of the coating head opening. When the application head or the substrate is relatively moved from this state, the crushed liquid ball (thick coating excess liquid) is stretched by the traveling operation. The liquid ball formed at the tip in this way has a diameter of 0. Several mm
It has been confirmed that the coating quality is high when the following small balls can be arranged at substantially equal intervals.

【0057】図9に図示の細孔ノズルについても同様で
あり、流体吐出時には多数のピンホール先端に半球状の
液玉を多数形成し、基板表面と所定の間隙になるように
すると、連続した液溜りを開口部全長に渡り形成できる
ようになる。このような塗布ヘッドノズルの構造におい
て、ピンホールの細孔23を定ピッチ配列し、図9
(a)に図示のように細孔を先端まで設けるか、図9
(b)に図示のように端部に更に細状の連続した塗布ヘ
ッドを設けるようにしても良い。
The same applies to the micropore nozzle shown in FIG. 9. When a large number of hemispherical liquid balls are formed at the tips of a large number of pinholes at the time of discharging the fluid, a predetermined gap from the substrate surface is obtained. The liquid pool can be formed over the entire length of the opening. In such a structure of the coating head nozzle, the fine holes 23 of the pinholes are arranged at a constant pitch.
FIG. 9 (a) shows that the pores are provided up to the tip as shown in FIG.
As shown in FIG. 2B, a thinner continuous coating head may be provided at the end.

【0058】このような細孔形状にすると、一体のブロ
ック加工で吐出部を作成できることから、製作コストを
減ずることができ、取り扱いを容易にできる効果があ
る。
With such a pore shape, the discharge portion can be formed by integral block processing, so that the production cost can be reduced and the handling can be facilitated.

【0059】ブロックは必ずしも一体でなく2分割した
ものでも良い。また細孔形状は丸穴に限らず角穴でも良
く、同一形状の細孔であれば形状を問わない。
The block is not necessarily integral but may be divided into two. The shape of the pores is not limited to a round hole, but may be a square hole.

【0060】以上のように、モータを使用することで低
速回転する基板に少ない塗布液で概ね均一で基板中央部
が山形にならない一次塗膜をすばやく得るとともに、低
騒音、低振動の省液塗膜を得ることができさらなる品質
向上を実現できる。
As described above, by using a motor, a primary coating film that is substantially uniform and does not form a mountain at the center of the substrate can be quickly obtained with a small amount of coating solution on a substrate that rotates at a low speed. A film can be obtained and further quality improvement can be realized.

【0061】[0061]

【発明の効果】以上説明したように、本発明によれば、
塗布ヘッドを用いて一次塗布膜を形成した後に、高速回
転にともなう遠心力により二次塗布膜を形成する回転式
塗布装置において、二次塗布膜に大きな影響を与える一
次塗布膜を塗布するときに、基板回転の中央部が山形に
なったり、不均一な状態となることがなく、しかもより
少ない塗布液で塗布することができる回転式塗布装置を
提供することができる。
As described above, according to the present invention,
After forming a primary coating film using a coating head, when applying a primary coating film that has a large effect on the secondary coating film in a rotary coating device that forms a secondary coating film by centrifugal force accompanying high speed rotation In addition, it is possible to provide a rotary coating apparatus that can perform coating with a smaller amount of coating liquid without causing a central portion of the substrate rotation to have a mountain shape or an uneven state.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1の実施形態の回転式塗布装置の外観斜視図
である。
FIG. 1 is an external perspective view of a rotary coating device according to a first embodiment.

【図2】(a)図1の塗布動作原理を示す平面図、
(b)図2(a)の正面図、(c)従来の塗膜との比較
を示した正面図である。
2A is a plan view showing the principle of the coating operation in FIG. 1,
2B is a front view of FIG. 2A and FIG. 2C is a front view showing a comparison with a conventional coating film.

【図3】(a)塗布ヘッドの横断面図、(b)塗布ヘッ
ドの縦断面図である。
3A is a cross-sectional view of a coating head, and FIG. 3B is a vertical cross-sectional view of the coating head.

【図4】(a)〜(e)別実施形態の塗布動作原理を示
す平面図である。
FIGS. 4A to 4E are plan views illustrating the principle of a coating operation according to another embodiment.

【図5】(a)〜(c)別実施形態の塗布動作原理を示
す平面図である。
5 (a) to 5 (c) are plan views showing the coating operation principle of another embodiment.

【図6】(a)塗布ヘッドの横断面図、(b)塗布ヘッ
ドの縦断面図である。
6A is a cross-sectional view of the coating head, and FIG. 6B is a vertical cross-sectional view of the coating head.

【図7】(a)第2の実施形態の回転式塗布装置の塗布
動作原理を示す平面図、(b)塗布ヘッドの動作状態図
である。
7A is a plan view illustrating a principle of a coating operation of a rotary coating apparatus according to a second embodiment, and FIG. 7B is an operation state diagram of a coating head.

【図8】(a)〜(c)塗布装置の動作説明の正面図で
ある。
FIGS. 8A to 8C are front views illustrating the operation of the coating apparatus.

【図9】(a)塗布ヘッドの横断面図、(b)塗布ヘッ
ドの縦断面図である。
9A is a cross-sectional view of a coating head, and FIG. 9B is a vertical cross-sectional view of the coating head.

【符号の説明】[Explanation of symbols]

1 回転式塗布装置 2 基部 3 基板 4 回転テーブル 5 塗布ヘッド DESCRIPTION OF SYMBOLS 1 Rotary coating device 2 Base 3 Substrate 4 Rotary table 5 Coating head

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 平らな塗布面を有する基板に、所定幅の
直線状の開口部を有する塗布ヘッドを用いて塗布液を定
量吐出することで一次塗布膜を形成し、高速回転にとも
なう遠心力により前記一次塗布膜を均一に拡散して二次
塗布膜を形成する回転式塗布装置であって、 前記塗布面を上にして基板を吸着により保持し、回転す
る回転保持手段と、 前記塗布ヘッドと前記回転保持手段とを相対的に昇降す
る昇降手段と、 前記塗布ヘッドを、 前記回転保持手段の回転中心を中心とし、前記開口部を
半径とした円形塗布面を塗布する第1の塗布ヘッドと、 前記円形塗布面の外側において、前記円形塗布面の回転
中心と同じとする少なくとも1つ以上の隣接する環状塗
布面に対して塗布する少なくとも1つ以上の第2の各塗
布ヘッドとに分割するとともに、 隣接する前記円形塗布面及び前記各環状塗布面は内周及
び外周で接し、 単位分の回転したときに、前記各塗布ヘッドが前記円形
塗布面及び前記各環状塗布面上に描かれる各軌跡の単位
面積当たりの定量吐出の協動により、前記一次塗布膜が
略同じ厚さとなるように塗布することを特徴とする回転
式塗布装置。
1. A primary coating film is formed on a substrate having a flat coating surface by using a coating head having a linear opening with a predetermined width to discharge a coating liquid, thereby forming a primary coating film, and a centrifugal force associated with high-speed rotation. A rotary coating device that uniformly diffuses the primary coating film to form a secondary coating film, thereby holding a substrate by suction with the coating surface facing upward and rotating, and the coating head. A lifting / lowering unit for relatively moving the rotation holding unit up and down; a first coating head for coating the coating head on a circular coating surface with the opening as a radius around the rotation center of the rotation holding unit. And at least one or more second coating heads that apply to at least one or more adjacent annular coating surfaces that are the same as the rotation center of the circular coating surface outside the circular coating surface. Then The adjacent circular coating surface and each of the annular coating surfaces are in contact at the inner and outer circumferences, and when rotated by a unit, each of the coating heads is drawn on the circular coating surface and each of the annular coating surfaces. A rotary coating apparatus, wherein the primary coating film is coated so as to have substantially the same thickness by the cooperation of a fixed amount discharge per unit area of the trajectory.
【請求項2】 前記1の塗布ヘッドと前記第2の各塗布
ヘッドの開口部の幅と向きを調整して、前記円形塗布面
及び前記各環状塗布面上に描かれる各軌跡の塗布面積を
等しくすることを特徴とする請求項1に記載の回転式塗
布装置。
2. The application area of each locus drawn on the circular application surface and the annular application surface by adjusting the width and direction of the opening of the first application head and the second application head. 2. The rotary coating device according to claim 1, wherein the rotation type coating device is set equal.
【請求項3】 前記第2の各塗布ヘッドが前記環状塗布
面の内周の接線方向に沿うようにして、前記第1及び前
記第2の各塗布ヘッドの開口部の幅寸法を等しくし、前
記円形塗布面及び前記各環状塗布面上に描かれる各軌跡
の塗布面積を等しくすることを特徴とする請求項2に記
載の回転式塗布装置。
3. The width of the opening of each of the first and second coating heads is made equal so that each of the second coating heads extends along the tangential direction of the inner periphery of the annular coating surface, 3. The rotary coating apparatus according to claim 2, wherein the application area of each locus drawn on the circular coating surface and each of the annular coating surfaces is made equal.
【請求項4】 前記第1の塗布ヘッドと、前記第2の各
塗布ヘッドとを一体的に設けるとともに、夫々に連通す
る塗布液供給路を前記開口部に対して略直交するように
設けた集合塗布ヘッドとすることを特徴とする請求項3
に記載の回転式塗布装置。
4. The first coating head and the second coating head are integrally provided, and a coating liquid supply path communicating with each of the first coating head and the second coating head is provided so as to be substantially orthogonal to the opening. 4. A collective coating head.
4. The rotary coating apparatus according to 1.
【請求項5】 前記集合塗布ヘッドにおける各塗布ヘッ
ドの開口部の幅寸法を、前記半径よりも大きく設定する
ことを特徴とする請求項4に記載の回転式塗布装置。
5. The rotary coating apparatus according to claim 4, wherein a width dimension of an opening of each coating head in the collective coating head is set to be larger than the radius.
【請求項6】 前記集合塗布ヘッドにおける各塗布ヘッ
ドの開口部の幅寸法を、前記半径の略二倍に設定するこ
とを特徴とする請求項4に記載の回転式塗布装置。
6. The rotary coating apparatus according to claim 4, wherein a width dimension of an opening of each coating head in the collective coating head is set to approximately twice the radius.
【請求項7】 前記集合塗布ヘッドにおける前記第1の
塗布ヘッドの開口部の幅寸法を前記半径の略二倍に設定
し、前記第2の各塗布ヘッドの開口部の幅寸法を前記半
径に設定するとともに、前記第1の塗布ヘッドの線対称
位置にそれぞれ配設したことを特徴とする請求項4に記
載の回転式塗布装置。
7. The width of the opening of the first coating head in the collective coating head is set to approximately twice the radius, and the width of the opening of each of the second coating heads is set to the radius. The rotary coating apparatus according to claim 4, wherein the rotary coating apparatus is set and arranged at line-symmetric positions of the first coating head.
【請求項8】 平らな塗布面を有する基板に、所定幅の
直線状の開口部を有する塗布ヘッドを用いて塗布液を定
量吐出して一次塗布膜を形成し、高速回転にともなう遠
心力で前記一次塗布膜を均一に拡散して二次塗布膜を形
成する回転式塗布装置であって、 前記塗布面を上にして基板を吸着して保持し、回転する
回転保持手段と、 前記塗布ヘッドと前記回転保持手段とを相対的に昇降す
る昇降手段と、 前記塗布ヘッドを、 前記回転保持手段の回転中心を開始位置とし、前記開口
部を半径とした円形塗布面の外周を終点位置とした距離
内と、 前記円形塗布面の接線方向に概ね沿う位置を開始位置と
し前記円形塗布面と同じ塗布面積となる環状塗布面の外
周円を終点位置とした距離内において、単位時間当たり
の塗布有効面積が概一定になるように、順次、前記塗布
ヘッドの移動速度を制御して駆動する塗布ヘッド移動手
段とを備え、 前記回転保持手段による基板の回転と、前記塗布ヘッド
の前記移動速度による移動に伴う塗布液の定量吐出の協
動とにより、前記一次塗布膜が略同じ厚さとなるように
塗布することを特徴とする回転式塗布装置。
8. A primary coating film is formed by quantitatively discharging a coating liquid onto a substrate having a flat coating surface using a coating head having a linear opening having a predetermined width, and a primary coating film is formed by centrifugal force accompanying high-speed rotation. A rotary coating device that uniformly diffuses the primary coating film to form a secondary coating film, wherein the coating head is rotated while holding the substrate with the coating surface facing upward, and the coating head. Lifting means for relatively lifting and lowering the rotation holding means, and the coating head, the rotation center of the rotation holding means as the start position, the outer periphery of the circular coating surface with the opening radius as the end point position Within the distance, and within the distance with the position substantially along the tangential direction of the circular coating surface as the start position and the outer circumferential circle of the annular coating surface having the same coating area as the circular coating surface as the end point, the coating is effective per unit time. The area is almost constant And a coating head moving means for controlling the moving speed of the coating head to drive the substrate sequentially. The rotation of the substrate by the rotation holding means and the quantitative discharge of the coating liquid accompanying the movement of the coating head at the moving speed. The first coating film is applied so as to have substantially the same thickness in cooperation with each other.
【請求項9】 前記円形塗布面の外周側に位置する環状
塗布面をさらに塗布することを特徴とする請求項8に記
載の回転式塗布装置。
9. The rotary coating apparatus according to claim 8, wherein an annular coating surface located on the outer peripheral side of the circular coating surface is further applied.
【請求項10】 前記塗布面までの距離を検出する検出
手段を設け、 前記塗布ヘッド移動手段の塗布ヘッドの吐出部先端と前
記塗布面との間隙を前記昇降手段で所定の間隙に設定可
能にしたことを特徴とする請求項8に記載の回転式塗布
装置。
10. A detecting means for detecting a distance to the coating surface, wherein a gap between a tip of a discharge part of a coating head of the coating head moving means and the coating surface can be set to a predetermined gap by the elevating means. 9. The rotary coating device according to claim 8, wherein the coating is performed.
【請求項11】 前記開口部は、流路に連通するスリッ
トノズルであることを特徴とする請求項1乃至9のいず
れか1項に記載の回転式塗布装置。
11. The rotary coating apparatus according to claim 1, wherein the opening is a slit nozzle communicating with a flow path.
【請求項12】 前記開口部は、流路に連通する多数の
細孔を略直線状に設けたノズルであることを特徴とする
請求項1乃至9のいずれか1項に記載の回転式塗布装
置。
12. The rotary coating according to claim 1, wherein the opening is a nozzle provided with a large number of fine holes communicating with a flow path in a substantially straight line. apparatus.
JP11275599A 1999-04-20 1999-04-20 Rotary coating device Expired - Fee Related JP3585096B2 (en)

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