JP2000268630A - Copper powder for conductive paste - Google Patents
Copper powder for conductive pasteInfo
- Publication number
- JP2000268630A JP2000268630A JP11076348A JP7634899A JP2000268630A JP 2000268630 A JP2000268630 A JP 2000268630A JP 11076348 A JP11076348 A JP 11076348A JP 7634899 A JP7634899 A JP 7634899A JP 2000268630 A JP2000268630 A JP 2000268630A
- Authority
- JP
- Japan
- Prior art keywords
- copper powder
- conductive paste
- copper
- viscosity
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 95
- 239000002245 particle Substances 0.000 claims abstract description 65
- 230000009467 reduction Effects 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 35
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 239000010949 copper Substances 0.000 claims abstract description 16
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 claims abstract description 10
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229940112669 cuprous oxide Drugs 0.000 claims abstract description 10
- 239000000725 suspension Substances 0.000 claims abstract description 10
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 8
- 238000009499 grossing Methods 0.000 claims abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 claims abstract description 7
- 239000005750 Copper hydroxide Substances 0.000 claims abstract description 7
- 229910001956 copper hydroxide Inorganic materials 0.000 claims abstract description 7
- 239000003822 epoxy resin Substances 0.000 claims description 9
- 229920000647 polyepoxide Polymers 0.000 claims description 9
- 239000004593 Epoxy Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 239000000539 dimer Substances 0.000 claims description 6
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 238000009826 distribution Methods 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000007900 aqueous suspension Substances 0.000 abstract 1
- 239000011147 inorganic material Substances 0.000 abstract 1
- 239000011368 organic material Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000005243 fluidization Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 2
- 238000004438 BET method Methods 0.000 description 2
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 239000008103 glucose Substances 0.000 description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- -1 glycidyl ester Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
Landscapes
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は,高い充填率でも低
粘性の導電ペーストが得られる銅粉に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper powder capable of obtaining a low-viscosity conductive paste even at a high filling rate.
【0002】[0002]
【従来の技術】従来より,絶縁基板上に導電ペーストを
スクリーン印刷して厚膜回路基板を作製する場合,該導
電ペーストとしては銀系ペーストが主に使用されてきた
が,銅ペーストも使用される傾向にある。銅ペーストは
銀系ペーストに比べて次のような利点があるからであ
る。2. Description of the Related Art Conventionally, when a thick film circuit board is manufactured by screen-printing a conductive paste on an insulating substrate, a silver-based paste has been mainly used as the conductive paste, but a copper paste is also used. Tend to be. This is because copper paste has the following advantages over silver-based paste.
【0003】(1) マイグレーションが起き難いのでショ
ートし難い。 (2) 導体抵抗および高周波損失が小さいので回路の微細
化が可能である。 (3) 耐半田性に優れるので信頼性が高い。 (4) 低コスト化が可能である。(1) It is difficult to cause a short circuit because migration hardly occurs. (2) Since the conductor resistance and high-frequency loss are small, the circuit can be miniaturized. (3) High reliability due to excellent solder resistance. (4) Cost reduction is possible.
【0004】このような利点をもつ銅ペーストは,粒径
が0.1〜10μm程度の銅粉をビヒクル(樹脂)中に
分散させることによって得られる。[0004] A copper paste having such advantages can be obtained by dispersing copper powder having a particle size of about 0.1 to 10 µm in a vehicle (resin).
【0005】銅粉の製造法としては,機械的粉砕法,溶
融銅を噴霧するアトマイズ法,陰極への電解析出法,蒸
発蒸着法,湿式還元法等が知られている。これらはそれ
ぞれ得失があるが,湿式還元法はペースト用に適する粒
径の微細粉を比較的容易に得ることができるので,導電
ペースト用銅粉を製造する場合の主流となっており,例
えば特開平4−116109号公報,特開平2−197
012号公報および特開昭62−99406号公報には
湿式還元法による銅粉の製造法が記載されている。As a method for producing copper powder, there are known a mechanical pulverizing method, an atomizing method in which molten copper is sprayed, an electrolytic deposition method on a cathode, an evaporation deposition method, a wet reduction method, and the like. Although each of these has its advantages and disadvantages, the wet reduction method is a main stream in the production of copper powder for conductive paste, since fine powder having a particle size suitable for paste can be obtained relatively easily. JP-A-4-116109, JP-A-2-197
No. 012 and Japanese Unexamined Patent Publication No. 62-99406 describe a method for producing copper powder by a wet reduction method.
【0006】湿式還元法による銅粉の製法は,水中で析
出させた水酸化銅を亜酸化銅に一次還元し,次いでこの
亜酸化銅を金属銅に二次還元することを要旨とするもの
であり,一次還元剤としてはブドウ糖,二次還元剤とし
て抱水ヒドラジン等が使用される。そのさい,水酸化銅
の析出工程,一次還元工程および二次還元工程の条件設
定により,得られる銅粉の粒径や粒子形状を制御するこ
とができ,導電ペースト用に適する粒径のものを安定し
て製造できる利点がある。本発明者らは先に特願平10
−323866号において,一次還元工程と二次還元工
程の間で,酸素含有ガス吹込みによる酸化処理を行う方
法を提案した。この酸化処理により粒径の揃った銅粉を
得ることができ,一層,粒径制御と粒子形状制御が精密
化できるようになった。[0006] The method of producing copper powder by the wet reduction method is based on the concept that copper hydroxide precipitated in water is primarily reduced to cuprous oxide, and then this cuprous oxide is secondarily reduced to metallic copper. In addition, glucose is used as a primary reducing agent, and hydrazine hydrate is used as a secondary reducing agent. At this time, the particle size and particle shape of the obtained copper powder can be controlled by setting the conditions of the copper hydroxide precipitation step, the primary reduction step, and the secondary reduction step. There is an advantage that it can be manufactured stably. The present inventors have previously described Japanese Patent Application No.
No. 323866 proposes a method of performing an oxidation treatment by blowing oxygen-containing gas between the primary reduction step and the secondary reduction step. By this oxidation treatment, a copper powder having a uniform particle size can be obtained, and the control of the particle size and the control of the particle shape can be further refined.
【0007】[0007]
【発明が解決しようとする課題】湿式還元法では導電ペ
ーストに適した粒径の銅粉が製造できるとしても,その
銅粉は,適正な粘性をもつ導電ペーストを得ようとする
場合には問題があった。導電ペーストの粘性は,使用す
る樹脂自身の粘性,銅粉の充填率(フイラー値)および
銅粉の粒度分布等が関与するが,湿式還元法による銅粉
では,導電ペーストの粘性が高くなる傾向がある。すな
わち,湿式還元法による銅粉では,粒径が適正に制御で
きても,それだけでは導電ペーストの粘性を低下させる
ことには限界があることがわかった。Although the wet reduction method can produce copper powder having a particle size suitable for a conductive paste, the copper powder has a problem in obtaining a conductive paste having an appropriate viscosity. was there. The viscosity of the conductive paste depends on the viscosity of the resin used, the filling rate (filler value) of the copper powder, the particle size distribution of the copper powder, and the like. There is. In other words, it was found that there is a limit in reducing the viscosity of the conductive paste by the wet reduction method even if the particle size can be properly controlled.
【0008】したがって,本発明はこのような問題を解
決し,湿式還元法による銅粉を用いた場合でも,導電ペ
ーストにとって必要な粘性を確保できる銅粉を得ること
を課題としたものである。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve such a problem and to obtain a copper powder capable of securing a viscosity required for a conductive paste even when a copper powder obtained by a wet reduction method is used.
【0009】[0009]
【課題を解決するための手段】前記の課題を解決すべく
本発明者らは鋭意研究を重ねたところ,湿式還元法で得
られた銅粉に対して銅粉同士を機械的に衝突させる処理
を施し,粒径や粒度分布および比表面積はそれほど変化
させないで,粒子表面を平滑化させると,導電ペースト
の粘性を著しく低下させることができることを見い出し
た。すなわち,粒子表面に存在する凸凹や角張った部分
を,粒径や粒度分布を実質上変化させないで,粒子同士
の衝突により滑らかにするのであり,この処理は,粒子
を機械的に流動化させることができる装置を用いて行う
ことができる。Means for Solving the Problems The inventors of the present invention have conducted intensive studies in order to solve the above-mentioned problems. As a result, the copper powder obtained by the wet reduction method is mechanically collided with the copper powder. It has been found that the viscosity of the conductive paste can be significantly reduced by smoothing the particle surface without changing the particle size, particle size distribution and specific surface area so much. In other words, the irregularities and angular portions existing on the particle surface are smoothed by the collision of the particles without substantially changing the particle size or the particle size distribution. This process involves mechanically fluidizing the particles. It can be performed using a device capable of performing the above.
【0010】したがって本発明は,湿式還元法で製造さ
れた銅粉に,粒子同士を機械的に衝突させる表面平滑化
処理が施された導電ペースト用銅粉を提供するものであ
る。本発明の銅粉は平均粒径が0.1〜10μmであ
り,また,ダイマー酸をグリシジルエステル化したエポ
キシ当量が446で且つ25℃での粘度730cpsの
エポキシ樹脂8重量%に,本発明の銅粉92重量%を混
練し,この混練物の粘度をE型粘度計を用いて10rp
mで測定したとき,300Pa・sec以下の粘度を示
す。[0010] Accordingly, the present invention provides a copper powder for a conductive paste obtained by subjecting a copper powder produced by a wet reduction method to a surface smoothing treatment for causing particles to mechanically collide with each other. The copper powder of the present invention has an average particle size of 0.1 to 10 μm, and has an epoxy equivalent of glycidyl esterified dimer acid of 446 and an epoxy resin having a viscosity of 730 cps at 25 ° C. of 8% by weight. 92% by weight of copper powder was kneaded, and the viscosity of the kneaded material was measured at 10 rpm using an E-type viscometer.
It shows a viscosity of 300 Pa · sec or less when measured in m.
【0011】[0011]
【発明の実施の形態】前述のように,水酸化銅を水に懸
濁させた懸濁液に還元剤を添加して亜酸化銅に一次還元
し,この亜酸化銅を水に懸濁させた懸濁液に還元剤を添
加して金属銅に二次還元するいわゆる湿式還元法で製造
される銅粉は,粒径や粒子形状も導電ペースト用として
適したものが得られる。例えば,平均粒径が0.1〜1
0μm好ましくは3〜10μm更に好ましくは4〜8μ
mで,比表面積(BET法で測定して)が0.1〜10
m2/g 好ましくは0.1〜1.0m2/g のものが安定し
て得られる。しかし,その粒子はたとえ球状に近い形状
を有していても,実際には平らな結晶面が多面的に露出
した多面体形状を有しており,このために結晶面の辺で
は角張りがあり,全体としては粒子表面は凸凹した状態
となっている。このような角張りのある表面状態は,ア
トマイズ粉のように溶融処理されたものとは基本的に相
違している。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As described above, a reducing agent is added to a suspension of copper hydroxide in water to perform primary reduction to cuprous oxide, and the cuprous oxide is suspended in water. The copper powder produced by the so-called wet reduction method in which a reducing agent is added to the suspension to perform secondary reduction to metallic copper has a particle size and a particle shape suitable for a conductive paste. For example, when the average particle size is 0.1 to 1
0 μm, preferably 3 to 10 μm, more preferably 4 to 8 μm
m, the specific surface area (measured by the BET method) is 0.1 to 10
m 2 / g preferably those of 0.1~1.0m 2 / g can be stably obtained. However, even if the particles have a shape close to a sphere, they actually have a polyhedral shape with flat crystal faces exposed polyhedrally. As a whole, the particle surface is in an uneven state. Such a squared surface state is fundamentally different from a melt-processed surface such as atomized powder.
【0012】そして,このような角張り(凹凸)がある
ことが,導電ペーストの粘性を下げるのに支障となるこ
とがわかった。すなわち湿式還元法で得られた銅粉が,
導電ペーストの粘性を下げることのできない理由はここ
にある。本発明者らは,該銅粉に対して粒径や比表面積
等は変化させないで,該角張り部分を滑らかな曲面にす
ると,導電ペーストの粘性を著しく下げることができる
ことを見い出した。すなわち,樹脂に分散させる前に,
粒子同士を機械的に衝突させるような前処理を行ない,
角張り部分を減らして滑らかな曲面をもつ粒子としてか
ら,樹脂に分散させると,処理前のものに比べて著しく
粘性を低下させることができることがわかった。It has been found that the presence of such squareness (unevenness) hinders the lowering of the viscosity of the conductive paste. That is, the copper powder obtained by the wet reduction method is
This is why the viscosity of the conductive paste cannot be reduced. The present inventors have found that the viscosity of the conductive paste can be significantly reduced by making the squared portion a smooth curved surface without changing the particle size or specific surface area of the copper powder. That is, before dispersing in the resin,
A pretreatment is performed to mechanically collide the particles,
It was found that the viscosity can be significantly reduced when the particles are dispersed in resin after reducing the squared portions to form particles with smooth curved surfaces, compared to those before treatment.
【0013】この処理は粉体の流動化によって行うこと
ができ,この流動化は機械的に粉体を流動化させる装
置,例えば筒型高速攪拌機(流動ミキサー)によるのが
便利である。すなわち,各粒子に運動量を与え,その運
動する粒子同士を互いに衝突させることにより,粒子表
面の角張り部分を平滑化する処法によれば,粒径と比表
面積は殆んど変化させずに,各粒子の表面を滑らかにす
ることができる。筒型高速攪拌機は,筒状の密閉容器
(軸を垂直方向にした円筒型容器)の内部下方に設けた
回転羽根によって粉体に遠心力と浮揚力を与えることが
でき,これにより容器内を粉体が流動するので,この流
動の間に表面が平滑化される。This treatment can be carried out by fluidizing the powder, and the fluidization is conveniently carried out by a device for mechanically fluidizing the powder, for example, a cylindrical high-speed stirrer (fluid mixer). In other words, according to the method of imparting momentum to each particle and causing the moving particles to collide with each other to smooth the angular portion of the particle surface, the particle size and specific surface area are hardly changed. , The surface of each particle can be smoothed. The cylindrical high-speed stirrer can apply centrifugal force and buoyancy to the powder by rotating blades provided below the inside of a cylindrical closed container (a cylindrical container whose axis is perpendicular to the axis). As the powder flows, the surface is smoothed during this flow.
【0014】湿式還元法の最終段階では,液中で生成し
た金属銅の微粉を液から分離し,分離された固形分から
水分が除去されるが,この乾燥処理された状態ではいわ
ゆるケーキ状となっているので,これを解砕機で解砕処
理し,粒子同士をばらばらに単離することが必要であ
る。解砕機では付着している粒子に衝撃を付与して互い
に解離させるが,解離した粒子は最終還元された状態の
粒子形状にほぼ復元しており,この解砕処理では粒子表
面の凹凸が除去されて表面が平滑になることはあまり期
待できない。このため,銅粉ケーキを解砕して得た銅粉
ままでは,樹脂に分散させたときに高い粘性を示すよう
になる。例えば,後記の実施例に示すように,ダイマー
酸をグリシジルエステル化したエポキシ当量が446g/
eqで且つ25℃粘度が730cpsのエポキシ樹脂8重
量%に対し,この解砕した銅粉92重量%を混練し,E
型粘度計を用いてこの混練物の粘度を10rpmで測定
した場合,通常は400Pa・sec以上の粘度を示す
ようになり,300Pa・sec以下,場合によっては
200Pa・sec以下と言った低粘度は到底望めな
い。In the final stage of the wet reduction method, fine metallic copper powder generated in the liquid is separated from the liquid, and water is removed from the separated solid content. Therefore, it is necessary to disintegrate the particles with a disintegrator and separate the particles from each other. In the disintegrator, the attached particles are impacted to dissociate from each other, but the dissociated particles are almost restored to the final reduced particle shape. In this disintegration process, the irregularities on the particle surface are removed. It cannot be expected that the surface will be smooth. For this reason, the copper powder obtained by crushing the copper powder cake has a high viscosity when dispersed in a resin. For example, as shown in the examples below, the glycidyl esterified dimer acid has an epoxy equivalent of 446 g /
The crushed copper powder (92% by weight) was kneaded with 8% by weight of an epoxy resin having a viscosity of 730 cps at 25 ° C.
When the viscosity of this kneaded material is measured at 10 rpm using a mold viscometer, the kneaded product usually shows a viscosity of 400 Pa · sec or more, and a low viscosity of 300 Pa · sec or less, and in some cases, 200 Pa · sec or less. I can not hope at all.
【0015】これに対し,前記のように粒子同士を機械
的に衝突させて表面平滑化処理を施した銅粉の場合に
は,同じ湿式還元法で得られたものであるにしても,前
記同様ダイマー酸をグリシジルエステル化したエポキシ
当量が446g/eqで且つ25℃粘度が730cpsのエ
ポキシ樹脂8重量%に対し,この表面平滑化処理した銅
粉92重量%を混練し,E型粘度計を用いてこの混練物
の粘度を10rpmで測定した場合,通常は300Pa
・sec以下,さらには250Pa・sec以下,場合
によってはさらに200Pa・sec以下と言った低粘
性を示すことがわかった。On the other hand, in the case of copper powder which has been subjected to surface smoothing treatment by mechanically colliding particles with each other as described above, even if it is obtained by the same wet reduction method, Similarly, 92% by weight of this surface-smoothed copper powder was kneaded with 8% by weight of epoxy resin having an epoxy equivalent of 446 g / eq and a viscosity of 730 cps at 25 ° C. obtained by dimer acid glycidyl esterification. When the viscosity of the kneaded material is measured at 10 rpm using
Sec or less, more preferably 250 Pa · sec or less, and in some cases even 200 Pa · sec or less.
【0016】また,湿式還元法で製造された銅粉に,無
機物または有機物を被覆したうえ,粒子同士を機械的に
衝突させる表面平滑化処理を施した場合にも,同様に低
粘性を示すことがわかった。導電ペースト用銅粉におい
ては,導電率をさらに向上させるために銀等の金属で銅
粉表面を被覆したり,表面酸化を防止するためにカルボ
ン酸例えばステアリン酸等の有機化合物で被覆すること
も有利であり,このような被覆処理は,湿式還元法によ
る銅粉の製造の場合にはその最終的な段階で行うことが
できる。そして,この被覆処理を施した銅粉に対して,
前記同様に粒子同士を機械的に衝突させて表面平滑化処
理を行なった場合には,被覆された部分を損傷すること
なく表面を平滑化することができ,したがって,被覆し
たことによる特性を具備したまま,低粘性の導電ペース
トが得られることがわかった。[0016] Further, when copper powder produced by the wet reduction method is coated with an inorganic or organic substance and then subjected to a surface smoothing treatment for causing particles to collide with each other mechanically, the copper powder also exhibits low viscosity. I understood. In the case of copper powder for conductive paste, the surface of the copper powder may be coated with a metal such as silver to further improve the electrical conductivity, or may be coated with an organic compound such as carboxylic acid such as stearic acid to prevent surface oxidation. Advantageously, such a coating treatment can be performed at the final stage in the case of the production of copper powder by the wet reduction method. And, for this coated copper powder,
When the surface is smoothed by mechanically colliding particles with each other in the same manner as described above, the surface can be smoothed without damaging the coated portion, and therefore, the characteristics due to the coating are provided. As a result, it was found that a low-viscosity conductive paste was obtained.
【0017】[0017]
【実施例】硫酸銅水溶液と苛性ソーダ水溶液を,銅1モ
ルに対し苛性ソーダ1.25モルの当量比で混合し,水
酸化銅が析出した懸濁液を得る。この懸濁液にブドウ糖
液を当量以上添加し,添加後30分間で液の温度を70
℃まで昇温したあと,15分間保持し水酸化銅を亜酸化
銅に一次還元する。ここまでの処理操作は全て窒素雰囲
気下で行う。この液中に空気をバブリングさせて酸化処
理したあと,窒素雰囲気中で2日間静置後に上澄液を除
去して沈殿をほぼ全量採取し,この沈殿物に純水を追加
し,得られた懸濁液に抱水ヒドラジンを当量以上添加し
て金属銅にまで二次還元する。反応終了後の懸濁液を固
液分離し,固形分を120℃の窒素雰囲気中で乾燥し,
銅粉ケーキを得る。EXAMPLE A copper sulfate aqueous solution and a caustic soda aqueous solution are mixed at an equivalent ratio of 1.25 mol of caustic soda to 1 mol of copper to obtain a suspension in which copper hydroxide is precipitated. A glucose solution is added to the suspension in an equivalent amount or more, and the temperature of the solution is increased to 70 in 30 minutes after the addition.
After the temperature was raised to ℃, the mixture was maintained for 15 minutes to primarily reduce copper hydroxide to cuprous oxide. All the processing operations so far are performed in a nitrogen atmosphere. After oxidizing by bubbling air into the solution, the solution was allowed to stand in a nitrogen atmosphere for 2 days, the supernatant was removed, almost all of the precipitate was collected, and pure water was added to the precipitate. Hydrazine hydrate is added to the suspension in an equivalent amount or more for secondary reduction to copper metal. After completion of the reaction, the suspension was subjected to solid-liquid separation, and the solid content was dried in a nitrogen atmosphere at 120 ° C.
Obtain a copper powder cake.
【0018】以上の湿式還元法による銅粉の製法におい
て,空気バブリングの酸化処理の時間だけを変えて,
A,BおよびCの3種類の銅粉ケーキを得た。得られた
各ケーキをいずれも二分し,一方は解砕機に装入し,窒
素雰囲気中で解砕処理して銅粉A1,B1およびC1を
得た。他方は,筒型高速攪拌機に装入し,窒素雰囲気中
で流動化処理して銅粉A2,B2およびC2を得た。In the above-mentioned method for producing copper powder by the wet reduction method, only the time for the oxidation treatment of air bubbling is changed.
Three types of copper powder cakes A, B and C were obtained. Each of the obtained cakes was bisected, and one was charged into a crusher and crushed in a nitrogen atmosphere to obtain copper powders A1, B1 and C1. The other was charged into a cylindrical high-speed stirrer and fluidized in a nitrogen atmosphere to obtain copper powders A2, B2 and C2.
【0019】解砕処理に用いた解砕機は,スイングする
ハンマーを内装した衝撃式粉砕機であり,凝集乾燥した
銅粉ケーキを湿式還元法の最終工程で得られた微細粒子
に解砕するが,粒子表面を平滑化する機能は殆んど有し
ない。流動化処理に用いた筒型高速攪拌機は,軸を垂直
にした円筒容器の底部に2枚の回転羽根をもつミキサー
であり,該羽根の回転により遠心力を付与された粉体は
上方向に流動し,この流動の間に粒子同士が衝突を繰り
返すことにより,粒子表面の凹凸が平滑化される。The crusher used in the crushing process is an impact crusher equipped with a swinging hammer, and crushes the coagulated and dried copper powder cake into fine particles obtained in the final step of the wet reduction method. Has almost no function of smoothing the particle surface. The cylindrical high-speed stirrer used in the fluidization treatment is a mixer having two rotating blades at the bottom of a cylindrical container with a vertical axis, and the powder given centrifugal force by the rotation of the blades moves upward. The particles flow and the particles repeatedly collide with each other during this flow, so that the irregularities on the particle surface are smoothed.
【0020】銅粉ケーキAを解砕処理した銅粉A1と,
流動化処理した銅粉A2の電子顕微鏡SEM像(aは2
000倍,bは5000倍)を図1と図2に示した。同
じく銅粉ケーキBおよびCを解砕処理した銅粉B1およ
びC1と,流動化処理した銅粉B2およびC2の電子顕
微鏡SEM像(aは2000倍,bは5000倍)を図
3〜4および図5〜6に示した。また,これらのSEM
像から各銅粉の平均粒径を調査すると共に,BET法に
よる比表面積,かさ密度およびTAP密度を測定し,そ
れらの結果を表1に示した。A copper powder A1 obtained by crushing a copper powder cake A;
Electron microscope SEM image of fluidized copper powder A2 (a is 2
000 times and b is 5000 times) are shown in FIG. 1 and FIG. FIGS. 3 to 4 show electron microscope SEM images (a is 2000 times, b is 5000 times) of copper powders B1 and C1 obtained by crushing copper powder cakes B and C, and copper powders B2 and C2 obtained by fluidization. This is shown in FIGS. In addition, these SEM
The average particle size of each copper powder was investigated from the images, and the specific surface area, bulk density, and TAP density were measured by the BET method, and the results are shown in Table 1.
【0021】また,各銅粉8重量%をエポキシ樹脂92
重量%に振動型ミキサーで混練し,得られたペーストの
粘度を測定した。エポキシ樹脂としては,ダイマー酸を
グリシジルエステル化したエポキシ当量が446g/eqで
且つ25℃粘度が730cpsのエポキシ樹脂を使用
し,混練条件も各銅粉について一定とし, 各ペーストの
粘度はE型粘度計を用いて回転速度10rpm のもとで2
5℃で測定した。その結果も表1に併記した。Further, 8% by weight of each copper powder is mixed with an epoxy resin 92
The resulting paste was kneaded with a vibrating mixer to measure the viscosity of the obtained paste. As the epoxy resin, an epoxy resin obtained by dimer acid glycidyl esterification and having an epoxy equivalent of 446 g / eq and a viscosity of 730 cps at 25 ° C. was used. The kneading conditions were constant for each copper powder, and the viscosity of each paste was E-type viscosity. Using a meter at a rotation speed of 10 rpm
It was measured at 5 ° C. The results are also shown in Table 1.
【0022】[0022]
【表1】 [Table 1]
【0023】表1の結果から,流動化処理した銅粉A
2,B2およびC2は,流動化処理しない銅粉A1,B
1およびC1に比べて,平均粒径,比表面積,かさ密度
およびTAP密度はそれほど変わらないが,樹脂と混練
したときのペーストの粘度は著しく低下していることが
わかる。粒径や比表面積がそれほど変化しないのにペー
ストの粘度が低下したのは,図1と図2,図3と図4お
よび図5と図6の比較から明らかなように,流動化処理
したものは粒子表面の角張りが除去されて滑らかな曲面
となったからであると見てよい。From the results shown in Table 1, the fluidized copper powder A
2, B2 and C2 are copper powders A1, B which are not fluidized
It can be seen that the average particle size, specific surface area, bulk density and TAP density are not so different from those of Nos. 1 and C1, but the viscosity of the paste when kneaded with the resin is significantly reduced. The decrease in the viscosity of the paste although the particle size and specific surface area did not change so much was apparent from the comparison between FIGS. 1 and 2, FIGS. 3 and 4, and FIGS. Can be considered to be due to the fact that the squareness of the particle surface was removed to form a smooth curved surface.
【0024】[0024]
【発明の効果】以上説明したように,本発明によると,
高い充填率で樹脂に混練しても粘度の低いペーストにす
ることができる銅粉を湿式還元法で製造することがで
き,その結果,高品質の銅ペーストを安定して得ること
ができる。As described above, according to the present invention,
A copper powder that can be converted into a paste having a low viscosity even when kneaded with a resin at a high filling rate can be produced by a wet reduction method, and as a result, a high-quality copper paste can be stably obtained.
【図面の簡単な説明】[Brief description of the drawings]
【図1】銅粉ケーキAを解砕処理して得た銅粉A1の電
子顕微鏡SEM像であり,図1の(a)は2000倍,
図1の(b)は5000倍のものである。FIG. 1 is an electron microscopic SEM image of copper powder A1 obtained by crushing copper powder cake A. FIG.
(B) of FIG. 1 is 5000 times.
【図2】銅粉ケーキAを流動化処理して得た銅粉A2の
電子顕微鏡SEM像であり,図2の(a)は2000
倍,図2の(b)は5000倍のものである。FIG. 2 is an electron microscope SEM image of copper powder A2 obtained by fluidizing copper powder cake A, and FIG.
2 (b) is 5000 times.
【図3】銅粉ケーキBを解砕処理して得た銅粉B1の電
子顕微鏡SEM像であり,図3の(a)は2000倍,
図3の(b)は5000倍のものである。FIG. 3 is an electron microscope SEM image of copper powder B1 obtained by crushing copper powder cake B. FIG.
(B) of FIG. 3 is 5000 times.
【図4】銅粉ケーキBを流動化処理して得た銅粉B2の
電子顕微鏡SEM像であり,図4の(a)は2000
倍,図4の(b)は5000倍のものである。FIG. 4 is an SEM image of copper powder B2 obtained by fluidizing copper powder cake B, and FIG.
4 (b) is 5000 times.
【図5】銅粉ケーキCを解砕処理して得た銅粉C1の電
子顕微鏡SEM像であり,図5の(a)は2000倍,
図5の(b)は5000倍のものである。5 is a scanning electron microscope (SEM) image of copper powder C1 obtained by crushing copper powder cake C. FIG.
(B) of FIG. 5 is 5000 times.
【図6】銅粉ケーキCを流動化処理して得た銅粉C2の
電子顕微鏡SEM像であり,図6の(a)は2000
倍,図6の(b)は5000倍のものである。6 is a scanning electron microscope (SEM) image of copper powder C2 obtained by fluidizing copper powder cake C. FIG.
6 (b) is 5000 times.
【手続補正書】[Procedure amendment]
【提出日】平成11年12月15日(1999.12.
15)[Submission date] December 15, 1999 (1999.12.
15)
【手続補正1】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0021[Correction target item name] 0021
【補正方法】変更[Correction method] Change
【補正内容】[Correction contents]
【0021】 また,各銅粉92重量%をエポキシ樹脂
8重量%に振動型ミキサーで混練し,得られたペースト
の粘度を測定した。エポキシ樹脂としては,ダイマー酸
をグリシジルエステル化したエポキシ当量が446g/eq
で且つ25℃粘度が730cpsのエポキシ樹脂を使用
し,混練条件も各銅粉について一定とし, 各ペーストの
粘度はE型粘度計を用いて回転速度10rpm のもとで2
5℃で測定した。その結果も表1に併記した。Further, 92 % by weight of each copper powder is made of an epoxy resin.
The mixture was kneaded to 8 % by weight with a vibration mixer, and the viscosity of the obtained paste was measured. The epoxy equivalent of glycidyl ester of dimer acid is 446g / eq.
And an epoxy resin having a viscosity of 730 cps at 25 ° C., and the kneading conditions were fixed for each copper powder.
It was measured at 5 ° C. The results are also shown in Table 1.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01B 1/22 H01B 1/22 A 13/00 503 13/00 503C (72)発明者 三好 宏昌 東京都千代田区丸の内1丁目8番2号 同 和鉱業株式会社内 Fターム(参考) 4K017 AA01 BA05 CA07 DA01 DA09 EA03 EA13 EH03 EH16 4K018 BA02 BB04 BC08 BC09 BC28 BC29 BD04 5G301 DA06 DA57 DD01 DE03 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01B 1/22 H01B 1/22 A 13/00 503 13/00 503C (72) Inventor Hiromasa Miyoshi Chiyoda, Tokyo 1-8-2, Marunouchi-ku F-term in Dowa Mining Co., Ltd. (Reference) 4K017 AA01 BA05 CA07 DA01 DA09 EA03 EA13 EH03 EH16 4K018 BA02 BB04 BC08 BC09 BC28 BC29 BD04 5G301 DA06 DA57 DD01 DE03
Claims (6)
士を機械的に衝突させる表面平滑化処理が施された導電
ペースト用銅粉。1. A copper powder for a conductive paste obtained by subjecting a copper powder produced by a wet reduction method to a surface smoothing treatment for causing particles to mechanically collide with each other.
項1に記載の導電ペースト用銅粉。2. The copper powder for a conductive paste according to claim 1, having an average particle size of 0.1 to 10 μm.
た懸濁液に還元剤を添加して亜酸化銅に一次還元し,こ
の亜酸化銅を水に懸濁させた懸濁液に還元剤を添加して
金属銅に二次還元する方法である請求項1または2に記
載の導電ペースト用銅粉。3. In the wet reduction method, a reducing agent is added to a suspension in which copper hydroxide is suspended in water to perform primary reduction to cuprous oxide, and the suspension is prepared by suspending the cuprous oxide in water. The copper powder for a conductive paste according to claim 1 or 2, wherein the method is a method in which a reducing agent is added to the suspension to perform a secondary reduction to metallic copper.
処理を有する請求項3に記載の導電ペースト用銅粉。4. The copper powder for a conductive paste according to claim 3, wherein an oxidation treatment is provided between the first reduction treatment and the second reduction treatment.
または有機物を被覆したうえ,粒子同士を機械的に衝突
させる表面平滑化処理を施した導電ペースト用銅粉。5. A copper powder for a conductive paste obtained by coating a copper powder produced by a wet reduction method with an inorganic or organic substance and subjecting the particles to mechanical collision with each other.
エポキシ当量が446g/eqで且つ25℃粘度が730c
psのエポキシ樹脂8重量%に,対象銅粉92重量%を
混練し,この混練物の粘度をE型粘度計を用いて10r
pmで測定したとき,300Pa・sec以下の粘度を
示す導電ペースト用銅粉。6. The glycidyl esterified dimer acid has an epoxy equivalent of 446 g / eq and a viscosity of 730 c at 25 ° C.
92% by weight of the target copper powder is kneaded with 8% by weight of a ps epoxy resin, and the viscosity of the kneaded material is measured at 10 r using an E-type viscometer.
Copper powder for conductive paste having a viscosity of 300 Pa · sec or less when measured in pm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP07634899A JP3932336B2 (en) | 1999-03-19 | 1999-03-19 | Method for producing copper powder for conductive paste |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP07634899A JP3932336B2 (en) | 1999-03-19 | 1999-03-19 | Method for producing copper powder for conductive paste |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007001531A Division JP4524477B2 (en) | 2007-01-09 | 2007-01-09 | Copper powder for conductive paste |
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JP2000268630A true JP2000268630A (en) | 2000-09-29 |
JP3932336B2 JP3932336B2 (en) | 2007-06-20 |
Family
ID=13602863
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---|---|---|---|---|
JP2002245849A (en) * | 2001-02-13 | 2002-08-30 | Dowa Mining Co Ltd | Conductive filter for conductive paste and manufacturing method of the same |
JP2003027102A (en) * | 2001-07-06 | 2003-01-29 | Mitsui Mining & Smelting Co Ltd | Silver-coated metal powder, method for manufacturing the same, conductive paste using the same, and printed wiring board containing conductor formed by using the conductive paste |
JP2004169056A (en) * | 2002-11-15 | 2004-06-17 | Mitsui Mining & Smelting Co Ltd | Copper powder for conductive paste, conductive paste, and method for manufacturing copper powder for conductive paste |
WO2009097835A1 (en) * | 2008-02-06 | 2009-08-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing a metal powder and metal powder produced by this method |
CN113165065A (en) * | 2018-12-04 | 2021-07-23 | Mec株式会社 | Copper powder for laminated molding, method for producing laminated molded article, and laminated molded article |
JP2021134423A (en) * | 2020-02-28 | 2021-09-13 | 三菱マテリアル株式会社 | Copper alloy powder for laminated molding, and manufacturing method thereof |
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1999
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002245849A (en) * | 2001-02-13 | 2002-08-30 | Dowa Mining Co Ltd | Conductive filter for conductive paste and manufacturing method of the same |
JP2003027102A (en) * | 2001-07-06 | 2003-01-29 | Mitsui Mining & Smelting Co Ltd | Silver-coated metal powder, method for manufacturing the same, conductive paste using the same, and printed wiring board containing conductor formed by using the conductive paste |
JP2004169056A (en) * | 2002-11-15 | 2004-06-17 | Mitsui Mining & Smelting Co Ltd | Copper powder for conductive paste, conductive paste, and method for manufacturing copper powder for conductive paste |
WO2009097835A1 (en) * | 2008-02-06 | 2009-08-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for producing a metal powder and metal powder produced by this method |
CN113165065A (en) * | 2018-12-04 | 2021-07-23 | Mec株式会社 | Copper powder for laminated molding, method for producing laminated molded article, and laminated molded article |
JP2021134423A (en) * | 2020-02-28 | 2021-09-13 | 三菱マテリアル株式会社 | Copper alloy powder for laminated molding, and manufacturing method thereof |
JP7424108B2 (en) | 2020-02-28 | 2024-01-30 | 三菱マテリアル株式会社 | Heat-treated unsintered copper alloy powder for additive manufacturing and its manufacturing method |
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CN114464815B (en) * | 2022-03-11 | 2024-03-26 | 广汽埃安新能源汽车有限公司 | Metal foil, preparation method thereof and metal current collector |
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