JP2000212000A5 - - Google Patents

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Publication number
JP2000212000A5
JP2000212000A5 JP1999015931A JP1593199A JP2000212000A5 JP 2000212000 A5 JP2000212000 A5 JP 2000212000A5 JP 1999015931 A JP1999015931 A JP 1999015931A JP 1593199 A JP1593199 A JP 1593199A JP 2000212000 A5 JP2000212000 A5 JP 2000212000A5
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JP
Japan
Prior art keywords
substrate
film
film forming
forming
spacer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999015931A
Other languages
English (en)
Japanese (ja)
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JP2000212000A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11015931A priority Critical patent/JP2000212000A/ja
Priority claimed from JP11015931A external-priority patent/JP2000212000A/ja
Publication of JP2000212000A publication Critical patent/JP2000212000A/ja
Publication of JP2000212000A5 publication Critical patent/JP2000212000A5/ja
Pending legal-status Critical Current

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JP11015931A 1999-01-25 1999-01-25 超伝導膜の成膜方法 Pending JP2000212000A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11015931A JP2000212000A (ja) 1999-01-25 1999-01-25 超伝導膜の成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11015931A JP2000212000A (ja) 1999-01-25 1999-01-25 超伝導膜の成膜方法

Publications (2)

Publication Number Publication Date
JP2000212000A JP2000212000A (ja) 2000-08-02
JP2000212000A5 true JP2000212000A5 (enrdf_load_stackoverflow) 2006-03-02

Family

ID=11902529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11015931A Pending JP2000212000A (ja) 1999-01-25 1999-01-25 超伝導膜の成膜方法

Country Status (1)

Country Link
JP (1) JP2000212000A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4771632B2 (ja) * 2001-10-12 2011-09-14 富士通株式会社 高温超伝導体膜の形成方法
JP4315859B2 (ja) 2004-05-19 2009-08-19 富士通株式会社 超伝導フィルタ
JP5721144B2 (ja) * 2012-02-07 2015-05-20 株式会社日本製鋼所 超電導多層構造薄膜

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