JP2000208600A - Processing method for wafer and wafer carrier case - Google Patents

Processing method for wafer and wafer carrier case

Info

Publication number
JP2000208600A
JP2000208600A JP671099A JP671099A JP2000208600A JP 2000208600 A JP2000208600 A JP 2000208600A JP 671099 A JP671099 A JP 671099A JP 671099 A JP671099 A JP 671099A JP 2000208600 A JP2000208600 A JP 2000208600A
Authority
JP
Japan
Prior art keywords
wafer
pedestal
wafers
carrier case
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP671099A
Other languages
Japanese (ja)
Inventor
Tadao Hiwatari
忠夫 樋渡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP671099A priority Critical patent/JP2000208600A/en
Publication of JP2000208600A publication Critical patent/JP2000208600A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent the forward end part of a take-out jig from coming into contact with an adjacent wafer by disposing a base inclined to abut against the circumference of a wafer on the bottom of a wafer carrier case thereby providing a level difference at the upper end between adjacent wafers when they are contained. SOLUTION: A carrier guide 3 is provided on the inside of a wafer carrier case 1 and a base 4 having a specified inclination is disposed on the bottom in the direction orthogonal to a wafer being contained. Under a state where a plurality of wafers are contained, circumference of the wafer abuts on the base 4 and the wafers are arranged stepwise with a level difference appearing at the upper end between adjacent wafers arranged along the inclination of the base 4. Since a level difference is provided at the upper end between adjacent wafers by disposing an inclining base 4, the wafer can be taken out using the level difference and an adjacent wafer can be protected against adhesion of foreign matters or damages.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体装置の製造工
程におけるウエハの処理方法及びそれに使用されるウエ
ハキャリアケースに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of processing a wafer in a semiconductor device manufacturing process and a wafer carrier case used for the method.

【0002】[0002]

【従来の技術】ウエハキャリアケースは、ウエハを収納
したキャリアを中に入れて保管、移動する場合に使用さ
れる。ウエハの処理を行うときは、キャリアケースから
キャリアを取り出し、更にキャリアからウエハを治具に
よって取り出して使用している。
2. Description of the Related Art A wafer carrier case is used for storing and moving a carrier containing a wafer therein. When processing a wafer, the carrier is taken out of the carrier case, and the wafer is taken out of the carrier with a jig and used.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、キャリ
アに収納されたウエハは、狭い間隔で、同じ高さで並列
に並んでおり、ウエハを取り出すために治具の先端部を
ウエハ間に差し込んだとき、治具が隣り合うウエハに接
触してしまうことがある。
However, the wafers housed in the carrier are arranged in parallel at a narrow interval at the same height, and when the tip of the jig is inserted between the wafers to take out the wafers. In some cases, the jig comes into contact with an adjacent wafer.

【0004】その結果、そのウエハに異物が付着した
り、傷が入ったりする。
As a result, foreign matter adheres to the wafer, or the wafer is damaged.

【0005】LSI(大規模集積回路)の微細化が進む
現状では、微小な異物の付着や傷は不良品発生の原因と
なっている。
In the current situation where LSIs (Large Scale Integrated Circuits) are miniaturized, the attachment and scratches of minute foreign matter cause defective products.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するた
め、本発明は、ウエハキャリアケースの底部に、ウエハ
の周縁部が当接する傾きを持った台座を設けることによ
って、ウエハを収納したキャリアをウエハキャリアケー
スに入れたときに隣り合うウエハの上端部に高低差を生
じさせるようにしたものである。
In order to solve the above-mentioned problems, the present invention provides a carrier accommodating a wafer by providing a pedestal at the bottom of a wafer carrier case with which the peripheral edge of the wafer abuts. When a wafer is placed in a wafer carrier case, a difference in height is generated at the upper end of an adjacent wafer.

【0007】[0007]

【発明の実施の形態】図1は本発明の第1の実施形態を
示す斜視図、図2は図1のウエハキャリアケースに入れ
るキャリアを示す斜視図である。
FIG. 1 is a perspective view showing a first embodiment of the present invention, and FIG. 2 is a perspective view showing a carrier to be placed in the wafer carrier case of FIG.

【0008】図1において、ウエハキャリアケース1は
例えば合成樹脂で一体に射出成型され、上部には移動時
などに利用される枠2が設けられ、内側部にはキャリア
を入れるときのガイド3が設けられ、また底部には所定
の傾きをもった台座4が収納するウエハと直交する方向
に設けられている。
In FIG. 1, a wafer carrier case 1 is integrally injection-molded with, for example, a synthetic resin, and a frame 2 used for moving or the like is provided at an upper portion, and a guide 3 for inserting a carrier is provided at an inner portion. A pedestal 4 having a predetermined inclination is provided on the bottom in a direction orthogonal to the wafer to be stored.

【0009】台座4はウエハキャリアケース1の成型時
に一体に成型しても、また別個に形成して接着剤等で固
着しても良い。
The pedestal 4 may be integrally molded when the wafer carrier case 1 is molded, or may be separately formed and fixed with an adhesive or the like.

【0010】図2に示したキャリア5は、従来のものと
同じで合成樹脂で射出成型され、例えば6インチ又は8
インチのウエハを、キャリア5の側面部6に設けた溝7
にはめ込んで収納する。
The carrier 5 shown in FIG. 2 is the same as the conventional one and is injection-molded with a synthetic resin.
7 inch wafer provided in the side surface 6 of the carrier 5
Fit and store.

【0011】このキャリア5にウエハを例えば25枚収
納した状態で、ウエハキャリアケース1に入れると、ウ
エハの周縁部が台座4に当接する。台座4は傾きを持っ
ているので、ウエハは段状に整列する。
When 25 wafers are stored in the carrier 5 and the wafer 5 is placed in the wafer carrier case 1, the peripheral portion of the wafer comes into contact with the pedestal 4. Since the pedestal 4 has an inclination, the wafers are arranged in a stepped manner.

【0012】図3はウエハが階段状に整列した状態を示
す側面図で、台座4の傾きに沿って整列した隣り合うウ
エハ8の上端部には高低差hが生じる。
FIG. 3 is a side view showing a state in which the wafers are arranged in a stepwise manner. A height difference h occurs at the upper end of adjacent wafers 8 arranged along the inclination of the pedestal 4.

【0013】この高低差hはウエハ8を治具によって取
り出すときに利用されるので、大きい程良いが、現在の
ウエハキャリアケースの構造上、5〜6mm程度が適当
である。
Since the height difference h is used when the wafer 8 is taken out by a jig, the larger the difference, the better. However, it is appropriate to be about 5 to 6 mm in view of the structure of the current wafer carrier case.

【0014】そのためには、台座4の傾きを6インチの
ウエハの場合に50°以上、8インチのウエハの場合に
45°以上にすることが望まれる。
For this purpose, it is desired that the inclination of the pedestal 4 be 50 ° or more for a 6-inch wafer and 45 ° or more for an 8-inch wafer.

【0015】さて、ウエハ8を治具により1枚ずつ取り
出すのであるが、治具を手作業により又は自動機械に治
具が設置されている場合にはその操作により、真空吸着
や静電チャックなどの手段で治具の先端部にウエハ8を
密着させて取り出す。
Now, the wafers 8 are taken out one by one by a jig. When the jig is manually installed or when the jig is installed in an automatic machine, vacuum suction, an electrostatic chuck, or the like is performed. Then, the wafer 8 is brought into close contact with the tip of the jig and taken out.

【0016】治具の先端部の大きさは、製品によって異
なるが、例えば縦20mm、横15mm、厚さ3mmで
ある。これに対し、ウエハ8の間隔は5〜6mmで、上
端部の高低差hは5〜6mm程度である。
The size of the tip of the jig depends on the product, but is, for example, 20 mm long, 15 mm wide and 3 mm thick. On the other hand, the interval between the wafers 8 is 5 to 6 mm, and the height difference h at the upper end is about 5 to 6 mm.

【0017】吸着する治具の先端部を高低差hにそっく
り当てられるのが理想的であるが、高低差hをあまり大
きくすることはウエハキャリアケース1の構造上不可能
である。
Ideally, the tip end of the jig to be sucked is exactly applied to the height difference h, but it is impossible to make the height difference h too large due to the structure of the wafer carrier case 1.

【0018】しかしながら、5〜6mm程度の高低差h
であっても、実験によれば隣り合うウエハ8に治具が接
触することはなく、異物の付着や傷を十分防止できるこ
とがわかった。
However, the height difference h of about 5 to 6 mm
However, according to the experiment, the jig did not come into contact with the adjacent wafer 8, and it was found that the adhesion and the damage of the foreign matter could be sufficiently prevented.

【0019】また、台座4の低い方の端部の高さtは、
ウエハ8から落下した異物が再びウエハ8に付着しない
ように、10mm程度以上に構成している。
The height t of the lower end of the pedestal 4 is
The thickness is set to about 10 mm or more so that foreign matter dropped from the wafer 8 does not adhere to the wafer 8 again.

【0020】なお、オリフラを持ったウエハを用いた場
合は、オリフラを下方向に向けてセットすると、台座4
にオリフラが当接して、収納されたウエハ8が安定す
る。
When a wafer having an orientation flat is used, if the orientation flat is set downward, the pedestal 4
And the stored wafer 8 is stabilized.

【0021】以上のように、第1の実施形態によれば、
傾きを持った台座4を設けることにより隣り合うウエハ
8の上端部に高低差hを生じさせ、これを利用してウエ
ハ8を取り出すので、隣り合うウエハ8への異物の付着
や傷を防止することができる。
As described above, according to the first embodiment,
By providing the pedestal 4 having an inclination, a height difference h is generated at the upper end portion of the adjacent wafers 8 and the wafers 8 are taken out by using the height difference h. Therefore, adhesion of foreign substances to the adjacent wafers 8 and scratches are prevented. be able to.

【0022】図4は本発明の第2の実施形態を示す斜視
図で、台座のみを示し、他は省略している。
FIG. 4 is a perspective view showing a second embodiment of the present invention, in which only a pedestal is shown, and other components are omitted.

【0023】第1の実施形態と異なる点は、台座9が1
本でなく複数本であることである。図では3本の同じ台
座9をその長手方向が収納されるウエハと直向する方向
に互いに平行に設置される。
The difference from the first embodiment is that the pedestal 9 is
It is not a book but a plurality. In the figure, three identical pedestals 9 are installed parallel to each other in a direction in which the longitudinal direction thereof is directly opposed to the wafer to be stored.

【0024】3本の台座9にウエハのオリフラが当接す
るように、3本の台座9は間隔を狭めて配置される。
The three pedestals 9 are arranged with a narrow interval so that the wafer orientation flat comes into contact with the three pedestals 9.

【0025】このように構成することにより、一旦キャ
リアからウエハを取り出してウエハ処理をした後、処理
の終了したウエハを再びキャリアの入ったウエハキャリ
アケースに直接治具で収納するようなとき、ウエハの落
下によるウエハと台座9との衝撃を小さくすることがで
きる。
With this configuration, once the wafer is once taken out of the carrier, the wafer is processed, and when the processed wafer is directly stored again in the wafer carrier case containing the carrier by the jig, Impact between the wafer and the pedestal 9 due to the falling of the wafer can be reduced.

【0026】以上のように、第2の実施形態によれば、
第1の実施形態の効果に加えて、台座9を複数本設けた
ので、衝撃によるウエハからの微小異物の発生を低減す
ることができる。
As described above, according to the second embodiment,
In addition to the effects of the first embodiment, since a plurality of pedestals 9 are provided, it is possible to reduce the generation of minute foreign matter from the wafer due to impact.

【0027】図5は本発明の第3の実施形態を示す斜視
図で、台座のみを示し、他は省略している。
FIG. 5 is a perspective view showing a third embodiment of the present invention, in which only a pedestal is shown, and other components are omitted.

【0028】第2の実施形態とは、台座を少くとも3本
設け、ウエハの周縁部の曲線に合致して当接するように
両側の台座に対して中央の台座の高さを低くしたことが
異なっている。
The second embodiment is different from the second embodiment in that at least three pedestals are provided, and the height of the central pedestal is lowered with respect to the pedestals on both sides so that the pedestals coincide with the curve of the peripheral portion of the wafer. Is different.

【0029】両側の台座10と中央の台座11は、傾き
は同じで、高さのみ異なっている。また、ウエハの周縁
部の曲線が当接するように、台座10と台座11の間隔
は図4の場合より広くなっている。
The pedestals 10 on both sides and the pedestal 11 at the center have the same inclination and differ only in height. Also, the interval between the pedestal 10 and the pedestal 11 is wider than in the case of FIG. 4 so that the curve of the peripheral edge of the wafer abuts.

【0030】図6は上記した第3の実施形態におけるウ
エハと台座との関係を示す図である。
FIG. 6 is a diagram showing the relationship between the wafer and the pedestal in the third embodiment.

【0031】ウエハ8はキャリア5の側面部6に設けら
れた溝に嵌合し、その周縁部の曲線12が両側の台座1
0及び中央の台座11に当接するようにしてキャリア5
に収納されている。
The wafer 8 fits into a groove provided in the side surface portion 6 of the carrier 5, and a curve 12 at the peripheral edge thereof fits the pedestal 1 on both sides.
0 and the carrier 5 so as to be in contact with the pedestal 11 at the center.
It is stored in.

【0032】ウエハ8のオリフラ13はいずれの台座に
も当接することはなく、実線で示した位置では右側の台
座10に接することなく、また下側に位置しても中央の
台座11に接することはない。
The orientation flat 13 of the wafer 8 does not come into contact with any of the pedestals, does not come into contact with the right pedestal 10 at the position shown by the solid line, and comes into contact with the central pedestal 11 even if it is located below. There is no.

【0033】このように、ウエハ8は少くとも2本の台
座に周縁部の曲線12が当接するので、オリフラ13の
方向、位置に関係なくキャリア5に収納しても、ウエハ
キャリアケースに入れたときにウエハ8は段状に整列す
る。
As described above, since the wafer 8 comes into contact with at least two pedestals with the curved line 12 at the peripheral edge, the wafer 8 is stored in the wafer carrier case irrespective of the orientation and position of the orientation flat 13 even if it is stored in the carrier 5. Sometimes, the wafers 8 are arranged in a stepped manner.

【0034】従って、オリフラ13のあるウエハ8の場
合に、オリフラ13を下方向にセットする必要がない。
Therefore, in the case of the wafer 8 having the orientation flat 13, it is not necessary to set the orientation flat 13 downward.

【0035】以上のように、第3の実施形態によれば、
第2の実施形態の効果に加えて、オリフラ13の方向、
位置に関係なく、オリフラ13を段状に整列できるよう
に常に定位置に安定して保持することができる。
As described above, according to the third embodiment,
In addition to the effects of the second embodiment, the orientation of the orientation flat 13
Regardless of the position, the orientation flat 13 can always be stably held at a fixed position so that the orientation flat 13 can be arranged in a stepped manner.

【0036】図7は本発明のウエハの取り出し方法を説
明する図である。
FIG. 7 is a view for explaining a method of taking out a wafer according to the present invention.

【0037】キャリアに収納されたウエハ8は、ウエハ
キャリアケース1にキャリアを入れることによって、傾
きを持った台座の作用で段状に整列し、隣り合うウエハ
8の上端部には上記したように高低差hが生じる。
The wafers 8 housed in the carrier are arranged in a step-like manner by the action of the inclined pedestal when the carrier is put in the wafer carrier case 1 and the upper ends of the adjacent wafers 8 are placed as described above. A height difference h occurs.

【0038】この高低差hを利用して治具14の先端部
15でウエハ8を吸着して1枚ずつ取り出す。取り出し
たウエハ8は所定の処理工程に搬送されて、ウエハ処理
がなされる。
Utilizing the height difference h, the wafers 8 are sucked by the tip 15 of the jig 14 and are taken out one by one. The taken out wafer 8 is transported to a predetermined processing step, where wafer processing is performed.

【0039】[0039]

【発明の効果】上記したように、本発明はウエハキャリ
アケースの底部に傾きを持った台座を設けたので、ウエ
ハを段状に整列させ、隣り合うウエハの上端部に高低差
を作ることができ、この高低差を利用してウエハを治具
によって取り出すときに異物を付着させたり、傷をつけ
たりすることを防止できる。
As described above, according to the present invention, the inclined pedestal is provided at the bottom of the wafer carrier case, so that the wafers can be arranged in a step-like manner and a height difference can be formed at the upper end of the adjacent wafer. Using this height difference, it is possible to prevent foreign matter from being attached or damaged when the wafer is taken out by the jig.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施形態を示す斜視図FIG. 1 is a perspective view showing a first embodiment of the present invention.

【図2】キャリアを示す斜視図FIG. 2 is a perspective view showing a carrier.

【図3】ウエハの整列状態を示す側面図FIG. 3 is a side view showing an aligned state of wafers.

【図4】本発明の第2の実施形態を示す斜視図FIG. 4 is a perspective view showing a second embodiment of the present invention.

【図5】本発明の第3の実施形態を示す斜視図FIG. 5 is a perspective view showing a third embodiment of the present invention.

【図6】ウエハと台座との関係を示す図FIG. 6 is a diagram showing a relationship between a wafer and a pedestal;

【図7】本発明のウエハの取り出し方法を説明する図FIG. 7 is a view for explaining a method of taking out a wafer according to the present invention.

【符号の説明】[Explanation of symbols]

1 ウエハキャリアケース 4,9,10,11 台座 5 キャリア 8 ウエハ 12 曲線 13 オリフラ 14 治具 Reference Signs List 1 wafer carrier case 4, 9, 10, 11 base 5 carrier 8 wafer 12 curve 13 orientation flat 14 jig

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 ウエハを収納したキャリアを、傾きを持
った台座を底部に設置したキャリアケースに入れること
によって、ウエハを段状に整列させ、隣り合うウエハの
上端部に生じた高低差を利用して治具によりウエハを取
り出し、取り出したウエハを所定の処理工程に搬送して
処理することを特徴とするウエハの処理方法。
1. A wafer containing a wafer is placed in a carrier case having a tilted pedestal at the bottom, so that the wafers are arranged in a step-like manner, and a height difference generated at an upper end of an adjacent wafer is used. A wafer is taken out by a jig, and the taken out wafer is transported to a predetermined processing step for processing.
【請求項2】 ウエハを収納したキャリアを入れるウエ
ハキャリアケースにおいて、 前記ウエハキャリアケースの底部に、前記ウエハの周縁
部が当接する傾きを持った台座を設けたことを特徴とす
るウエハキャリアケース。
2. A wafer carrier case for accommodating a carrier accommodating a wafer, wherein a pedestal is provided at the bottom of the wafer carrier case, the pedestal having a peripheral edge of the wafer abutting thereon.
【請求項3】 前記傾きが45°以上であることを特徴
とする請求項2記載のウエハキャリアケース。
3. The wafer carrier case according to claim 2, wherein said inclination is 45 ° or more.
【請求項4】 前記ウエハのオリフラが前記台座に当接
することを特徴とする請求項2又は請求項3記載のウエ
ハキャリアケース。
4. The wafer carrier case according to claim 2, wherein the orientation flat of the wafer is in contact with the pedestal.
【請求項5】 前記台座を複数本設けたことを特徴とす
る請求項2〜4のいずれかに記載のウエハキャリアケー
ス。
5. The wafer carrier case according to claim 2, wherein a plurality of said pedestals are provided.
【請求項6】 前記台座を少なくとも3本設け、前記ウ
エハの周縁部の曲線に合致して当接するように両側の台
座に対して中央の台座の高さを低くしたことを特徴とす
る請求項2又は請求項3記載のウエハキャリアケース。
6. The apparatus according to claim 1, wherein at least three pedestals are provided, and a height of a central pedestal is lowered with respect to the pedestals on both sides so that the pedestals coincide with a curve of a peripheral portion of the wafer. The wafer carrier case according to claim 2 or claim 3.
JP671099A 1999-01-13 1999-01-13 Processing method for wafer and wafer carrier case Pending JP2000208600A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP671099A JP2000208600A (en) 1999-01-13 1999-01-13 Processing method for wafer and wafer carrier case

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP671099A JP2000208600A (en) 1999-01-13 1999-01-13 Processing method for wafer and wafer carrier case

Publications (1)

Publication Number Publication Date
JP2000208600A true JP2000208600A (en) 2000-07-28

Family

ID=11645856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP671099A Pending JP2000208600A (en) 1999-01-13 1999-01-13 Processing method for wafer and wafer carrier case

Country Status (1)

Country Link
JP (1) JP2000208600A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115910874A (en) * 2023-03-09 2023-04-04 四川上特科技有限公司 Wafer storage frame

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115910874A (en) * 2023-03-09 2023-04-04 四川上特科技有限公司 Wafer storage frame
CN115910874B (en) * 2023-03-09 2023-05-23 四川上特科技有限公司 Wafer storage frame

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