JP2000169929A - ダイヤモンド含有複合材料 - Google Patents
ダイヤモンド含有複合材料Info
- Publication number
- JP2000169929A JP2000169929A JP10347081A JP34708198A JP2000169929A JP 2000169929 A JP2000169929 A JP 2000169929A JP 10347081 A JP10347081 A JP 10347081A JP 34708198 A JP34708198 A JP 34708198A JP 2000169929 A JP2000169929 A JP 2000169929A
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- composite material
- containing composite
- matrix
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 74
- 239000010432 diamond Substances 0.000 title claims abstract description 74
- 239000002131 composite material Substances 0.000 title claims abstract description 30
- 239000002245 particle Substances 0.000 claims abstract description 40
- 238000005245 sintering Methods 0.000 claims abstract description 34
- 239000011159 matrix material Substances 0.000 claims abstract description 18
- 239000000919 ceramic Substances 0.000 claims abstract description 13
- 239000013078 crystal Substances 0.000 claims abstract description 11
- 239000007791 liquid phase Substances 0.000 claims abstract description 11
- 150000004767 nitrides Chemical class 0.000 claims abstract description 5
- 239000006104 solid solution Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 11
- 229910000831 Steel Inorganic materials 0.000 claims description 9
- 239000010959 steel Substances 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 239000011247 coating layer Substances 0.000 claims description 6
- 229910052582 BN Inorganic materials 0.000 claims description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 239000011195 cermet Substances 0.000 claims description 2
- 229910010293 ceramic material Inorganic materials 0.000 abstract description 4
- 150000001247 metal acetylides Chemical class 0.000 abstract description 4
- 239000000243 solution Substances 0.000 abstract description 2
- 239000000843 powder Substances 0.000 description 19
- 239000010410 layer Substances 0.000 description 7
- 231100000241 scar Toxicity 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000005452 bending Methods 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000280 densification Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000013011 mating Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000007088 Archimedes method Methods 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- 241000316887 Saissetia oleae Species 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910017083 AlN Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- -1 iron group metals Chemical class 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 102200082816 rs34868397 Human genes 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Powder Metallurgy (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10347081A JP2000169929A (ja) | 1998-12-07 | 1998-12-07 | ダイヤモンド含有複合材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10347081A JP2000169929A (ja) | 1998-12-07 | 1998-12-07 | ダイヤモンド含有複合材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000169929A true JP2000169929A (ja) | 2000-06-20 |
| JP2000169929A5 JP2000169929A5 (https=) | 2006-06-08 |
Family
ID=18387796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10347081A Withdrawn JP2000169929A (ja) | 1998-12-07 | 1998-12-07 | ダイヤモンド含有複合材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000169929A (https=) |
-
1998
- 1998-12-07 JP JP10347081A patent/JP2000169929A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5952102A (en) | Diamond coated WC and WC-based composites with high apparent toughness | |
| KR100227879B1 (ko) | Ivb족 붕화물 베이스 절삭공구 | |
| JPH0513103B2 (https=) | ||
| Skirl et al. | Processing and mechanical properties of Al2O3/Ni3Al composites with interpenetrating network microstructure | |
| KR100683105B1 (ko) | 초경질 입자 함유 복합 재료 | |
| SE513938C2 (sv) | Skärverktygsmaterial av kiselnitrid | |
| JP2012246172A (ja) | 金属材とセラミックス−炭素複合材との接合体及びその製造方法 | |
| EP0183965A2 (en) | Composite sintered silicon nitride material and cutting tool made therefrom | |
| JP4191268B2 (ja) | 焼結セラミック材料、その材料の焼結方法及び高速機械加工方法 | |
| Attia et al. | Hot pressed Si3N4 ceramics using MgO–Al2O3 as sintering additive for vehicle engine parts | |
| Kim et al. | Mechanical properties of binderless tungsten carbide by spark plasma sintering | |
| JP2000169929A (ja) | ダイヤモンド含有複合材料 | |
| US6420294B1 (en) | Titanium diboride sintered body with silicon nitride as a sintering aid and a method for manufacture thereof | |
| JPH05186844A (ja) | 高密度相窒化ホウ素基焼結体 | |
| JP2002180222A (ja) | 溶融金属めっき浴用浸漬部材 | |
| JP2002194474A (ja) | 炭化タングステン系超硬基複合材料焼結体 | |
| JP2604155B2 (ja) | 被覆層を有するセラミックス工具 | |
| JP5825962B2 (ja) | 窒化珪素質焼結体およびこれを用いた溶湯金属用部材ならびに耐磨耗性部材 | |
| JP4976626B2 (ja) | 焼結合金材料、その製造方法、およびそれらを用いた機械構造部材 | |
| Zhu et al. | Development of sintered reaction-bonded Si3N4 materials with high thermal conductivity | |
| JP2001187431A (ja) | 積層構造材料 | |
| JP3560629B2 (ja) | 工具用高靱性硬質焼結体の製造法 | |
| JP3853438B2 (ja) | 窒化珪素焼結体の製造方法 | |
| JP3603950B2 (ja) | 超硬質粒子含有複合材料 | |
| Sobczak et al. | Nitride and carbide preforms for infiltration process |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050524 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20060308 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060413 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20061025 |