JP2000147774A5 - - Google Patents
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- Publication number
- JP2000147774A5 JP2000147774A5 JP1998323783A JP32378398A JP2000147774A5 JP 2000147774 A5 JP2000147774 A5 JP 2000147774A5 JP 1998323783 A JP1998323783 A JP 1998323783A JP 32378398 A JP32378398 A JP 32378398A JP 2000147774 A5 JP2000147774 A5 JP 2000147774A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- positive resist
- combining
- single bond
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 125000003368 amide group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32378398A JP3835786B2 (ja) | 1998-11-13 | 1998-11-13 | ポジ型レジスト液 |
| US09/438,789 US6420082B1 (en) | 1998-11-13 | 1999-11-12 | Positive resist fluid and positive resist composition |
| KR1019990050397A KR100553942B1 (ko) | 1998-11-13 | 1999-11-13 | 포지티브형 레지스트액 및 포지티브형 레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32378398A JP3835786B2 (ja) | 1998-11-13 | 1998-11-13 | ポジ型レジスト液 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000147774A JP2000147774A (ja) | 2000-05-26 |
| JP2000147774A5 true JP2000147774A5 (no) | 2005-02-24 |
| JP3835786B2 JP3835786B2 (ja) | 2006-10-18 |
Family
ID=18158577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32378398A Expired - Fee Related JP3835786B2 (ja) | 1998-11-13 | 1998-11-13 | ポジ型レジスト液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3835786B2 (no) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001188386A (ja) * | 1999-10-22 | 2001-07-10 | Sekisui Chem Co Ltd | 荷電制御樹脂、電子写真用トナー用樹脂組成物及び電子写真用トナー |
| JP4579117B2 (ja) * | 2005-09-26 | 2010-11-10 | 富士フイルム株式会社 | ポジ型感光性組成物、該ポジ型感光性組成物に用いられる化合物、該ポジ型感光性組成物に用いられる樹脂及び該ポジ型感光性組成物を用いたパターン形成方法 |
| JPWO2007125845A1 (ja) * | 2006-04-28 | 2009-09-10 | 国立大学法人横浜国立大学 | スルホンイミド型モノマー及びその重合体 |
| JP2009256595A (ja) * | 2008-03-26 | 2009-11-05 | Fujifilm Corp | 水不溶性色材分散体、水不溶性色材含有物の製造方法、水不溶性色材の微粒子、水不溶性色材用分散剤、並びにこれらを用いた記録液、インクセット、印画物、画像形成方法、及び画像形成装置 |
| JP2011523398A (ja) * | 2008-04-24 | 2011-08-11 | スリーエム イノベイティブ プロパティズ カンパニー | プロトン伝導性材料 |
| JP5588706B2 (ja) * | 2010-03-12 | 2014-09-10 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜及びパターン形成方法 |
| WO2021065549A1 (ja) * | 2019-09-30 | 2021-04-08 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法 |
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1998
- 1998-11-13 JP JP32378398A patent/JP3835786B2/ja not_active Expired - Fee Related