JP2000352822A5 - - Google Patents
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- Publication number
- JP2000352822A5 JP2000352822A5 JP1999165862A JP16586299A JP2000352822A5 JP 2000352822 A5 JP2000352822 A5 JP 2000352822A5 JP 1999165862 A JP1999165862 A JP 1999165862A JP 16586299 A JP16586299 A JP 16586299A JP 2000352822 A5 JP2000352822 A5 JP 2000352822A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- optionally substituted
- carbon atoms
- general formula
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002253 acid Substances 0.000 claims 2
- 125000004432 carbon atoms Chemical group C* 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 125000005156 substituted alkylene group Chemical group 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16586299A JP3894260B2 (ja) | 1999-06-11 | 1999-06-11 | ポジ型フォトレジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16586299A JP3894260B2 (ja) | 1999-06-11 | 1999-06-11 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000352822A JP2000352822A (ja) | 2000-12-19 |
| JP2000352822A5 true JP2000352822A5 (no) | 2005-07-07 |
| JP3894260B2 JP3894260B2 (ja) | 2007-03-14 |
Family
ID=15820410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16586299A Expired - Fee Related JP3894260B2 (ja) | 1999-06-11 | 1999-06-11 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3894260B2 (no) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4414721B2 (ja) * | 2002-11-22 | 2010-02-10 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| KR101036501B1 (ko) | 2002-11-22 | 2011-05-24 | 후지필름 가부시키가이샤 | 포지티브형 레지스트 조성물 및 그것을 사용한 패턴형성방법 |
| JP4281741B2 (ja) * | 2003-03-05 | 2009-06-17 | Ｊｓｒ株式会社 | 酸発生剤、スルホン酸、スルホニルハライド化合物および感放射線性樹脂組成物 |
| JP2004307387A (ja) * | 2003-04-07 | 2004-11-04 | Tosoh F-Tech Inc | ２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルフィン酸塩または２−（ビシクロ［２．２．１］ヘプト−２−イル）−１，１−ジフルオロエチルスルホン酸塩およびそれらの製造方法 |
| CN100354257C (zh) | 2003-07-18 | 2007-12-12 | 住友化学工业株式会社 | 磺酸盐和光刻胶组合物 |
| US8182975B2 (en) | 2007-03-28 | 2012-05-22 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
| US7498116B2 (en) | 2007-03-30 | 2009-03-03 | Fujifilm Corporation | Resist composition and pattern formation method using the same |
| JP5039492B2 (ja) | 2007-09-28 | 2012-10-03 | 富士フイルム株式会社 | ポジ型レジスト組成物およびこれを用いたパターン形成方法 |
| JP5039493B2 (ja) | 2007-09-28 | 2012-10-03 | 富士フイルム株式会社 | ポジ型レジスト組成物およびこれを用いたパターン形成方法 |
| JP5537920B2 (ja) | 2009-03-26 | 2014-07-02 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、これを用いたレジスト膜、及び、パターン形成方法 |
| KR102230622B1 (ko) * | 2017-11-24 | 2021-03-22 | 주식회사 엘지화학 | 포토레지스트 조성물 및 이를 이용한 포토레지스트 필름 |
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1999
- 1999-06-11 JP JP16586299A patent/JP3894260B2/ja not_active Expired - Fee Related