JP2000061246A - 空気清浄装置 - Google Patents

空気清浄装置

Info

Publication number
JP2000061246A
JP2000061246A JP10247781A JP24778198A JP2000061246A JP 2000061246 A JP2000061246 A JP 2000061246A JP 10247781 A JP10247781 A JP 10247781A JP 24778198 A JP24778198 A JP 24778198A JP 2000061246 A JP2000061246 A JP 2000061246A
Authority
JP
Japan
Prior art keywords
air
water
temperature
chemical
outside air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10247781A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000061246A5 (https=
Inventor
Osamu Suenaga
修 末永
Taiji Fukazawa
泰司 深沢
Takenobu Matsuo
剛伸 松尾
Takeshi Wakabayashi
剛 若林
Tomoo Atomachi
智雄 後町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taisei Corp
Tokyo Electron Ltd
Original Assignee
Taisei Corp
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taisei Corp, Tokyo Electron Ltd filed Critical Taisei Corp
Priority to JP10247781A priority Critical patent/JP2000061246A/ja
Publication of JP2000061246A publication Critical patent/JP2000061246A/ja
Publication of JP2000061246A5 publication Critical patent/JP2000061246A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Gas Separation By Absorption (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
JP10247781A 1998-08-18 1998-08-18 空気清浄装置 Pending JP2000061246A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10247781A JP2000061246A (ja) 1998-08-18 1998-08-18 空気清浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10247781A JP2000061246A (ja) 1998-08-18 1998-08-18 空気清浄装置

Publications (2)

Publication Number Publication Date
JP2000061246A true JP2000061246A (ja) 2000-02-29
JP2000061246A5 JP2000061246A5 (https=) 2005-11-04

Family

ID=17168564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10247781A Pending JP2000061246A (ja) 1998-08-18 1998-08-18 空気清浄装置

Country Status (1)

Country Link
JP (1) JP2000061246A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004358436A (ja) * 2003-06-09 2004-12-24 Shimizu Corp 汚染物質除去装置
JP2005013792A (ja) * 2003-06-24 2005-01-20 Ricoh Elemex Corp 空気清浄機
JP2006250410A (ja) * 2005-03-09 2006-09-21 Techno Ryowa Ltd 水膜を備えた空気調和装置及び水膜への純水供給方法
JP2010172834A (ja) * 2009-01-30 2010-08-12 Shinryo Corp 空気中汚染物質の除去装置
JP2015218971A (ja) * 2014-05-19 2015-12-07 三菱電機株式会社 空気清浄換気装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004358436A (ja) * 2003-06-09 2004-12-24 Shimizu Corp 汚染物質除去装置
JP2005013792A (ja) * 2003-06-24 2005-01-20 Ricoh Elemex Corp 空気清浄機
JP2006250410A (ja) * 2005-03-09 2006-09-21 Techno Ryowa Ltd 水膜を備えた空気調和装置及び水膜への純水供給方法
JP2010172834A (ja) * 2009-01-30 2010-08-12 Shinryo Corp 空気中汚染物質の除去装置
JP2015218971A (ja) * 2014-05-19 2015-12-07 三菱電機株式会社 空気清浄換気装置

Similar Documents

Publication Publication Date Title
TW482881B (en) Air conditioning system for semiconductor clean room
JP4124665B2 (ja) 清浄空気ダクト及び清浄室用空気提供装置
US7025809B2 (en) Dual-type air purification system
WO1998000676A9 (en) Environmentally enhanced enclosure for managing cmp contamination
KR101754311B1 (ko) 공기 정화 가습 장치
JP3308278B2 (ja) 液体スプレー式空気浄化装置
US7326284B2 (en) Contamination control system and air-conditioning system of a substrate processing apparatus using the same
EP1312985A3 (en) Semiconductor manufacturing apparatus
JPH1174168A (ja) 処理システム
JP2000061246A (ja) 空気清浄装置
CN1180321A (zh) 液体喷雾空气净化装置
JP2000320865A (ja) 汚染ガス除去空気調和装置
JP3698548B2 (ja) エアワッシャ
JP3427921B2 (ja) 半導体装置生産用クリーンルームおよび半導体装置の生産方法
JPH0889747A (ja) クリーンルームシステム
JPH1054585A (ja) 空気調和装置
JP3718177B2 (ja) 空気中ガス成分の除去方法
JPH09101051A (ja) クリーンルーム内への空気導入方法、クリーンルーム、局所設備内への空気導入方法、および局所設備
JP3798993B2 (ja) 空気調和装置
JP3943213B2 (ja) 空気浄化方法
KR19990070053A (ko) 냉각응축기를 갖는 습식 공기청정장치
JP2006322616A (ja) 空気浄化装置
JP2004223477A (ja) クリーンルーム設備のガス除去装置
JP2000033221A (ja) クリ―ンル―ム汚染物質除去システム
JP2586754B2 (ja) 半導体製造環境の評価方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050815

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050815

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070404

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070410

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20070814