JP2000035411A - Count rate display system of x-rays analytic apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To monitor the best measurement condition at any time. SOLUTION: In the X-rays analytic apparatus which irradiates the electron beam to a sample, and detects and analyzes characteristic X ray radiated from the sample, a display means 5 to display X-ray count rates of energy values in all ranges detected from a X-ray detector 2 is installed, and display areas of the X-ray count rate are set in a part of an energy spectrum screen and of the element mapping screen of a display device 9 to always display the X-ray count rates on the display areas.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a count rate display method of an X-ray analyzer for irradiating a sample with an electron beam to detect and analyze characteristic X-rays emitted from the sample.

[0002]

2. Description of the Related Art In an X-ray analyzer for analyzing the surface of a sample, a secondary electron detector for detecting secondary electrons emitted from the sample, etc., for irradiating the sample with an electron beam and observing a scanned image. In addition, energy for detecting characteristic X-rays emitted from the sample in order to perform a visual field search while observing the sample surface with a scanning image and perform qualitative analysis and quantitative analysis of contained elements at the determined analysis position A dispersive spectroscope EDS is provided.

FIG. 4 is a view for explaining a configuration example of a conventional X-ray analyzer. Reference numeral 11 denotes a filament, 12 denotes Wehnelt, 13 denotes an electron beam, 14 denotes a converging lens, 15 denotes an objective lens, and 16 denotes a sample. , 17 is a sample stage, 18 is a deflecting lens, 19 is a secondary electron detector, 20 is an EDS detector, 21 is an EDS analyzer, 22 is a magnification unit, 23 is a scan generator, 24 is a scanning image observation device, and 25 is an analysis. The processing unit 26 indicates a switch.

In the X-ray analyzer shown in FIG. 4, a filament 11, a Wehnelt 12, a converging lens 14, and an objective lens 15 generate a narrowed electron beam 13 in a vacuum and irradiate a sample 16 held on a sample stage 17. Then, secondary electrons or characteristic X-rays emitted from the sample are detected to observe a scanning image and analyze the sample. In this case, in observing the scanned image, the electron beam 13 is scanned and irradiated on the sample 16 by controlling the deflection lens 18 by the scan generator 23 at the magnification set by the magnification unit 22, and emitted from the sample 16. Secondary electrons are detected by a secondary electron detector 19.
The scanning image (SEM image) is detected by the scanning image observation device 24.
Observe with. When an analysis position is designated by, for example, moving a cursor on the scanned image, the deflection lens 18 is switched and connected to the EDS analyzer 21 side by the switch 26, and the electron beam 13 is moved to a designated point or an analysis position in a limited area. , And measurement of characteristic X-rays is started by the EDS detector 20, and qualitative and quantitative analysis is performed by the analysis processing device 25.

[0005]

However, the conventional X-ray analyzer has a problem that monitoring the optimum measurement conditions is wasteful. That is, in the conventional X-ray analyzer, the EDS of the analysis processing device 25 during X-ray collection is used.
An X-ray count value of a channel having a specific energy value designated by a cursor is displayed on a screen, and an optimum measurement condition is monitored based on the value. During the element mapping measurement, only the element mapping image is displayed. Therefore, even when monitoring the measurement conditions and adjusting the probe current, for example, to set the optimum measurement conditions, it is necessary to repeatedly collect X-rays, and there is a problem that wasteful X-ray collection increases. Was.

[0006]

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is an object of the present invention to always monitor an optimum measurement condition.

For this purpose, the present invention provides an X-ray analyzer for irradiating a sample with an electron beam to detect and analyze characteristic X-rays emitted from the sample. Display means for displaying an X-ray count rate is provided, a display area of the X-ray count rate is set in a part of an energy spectrum screen or an element mapping screen, and the X-ray count rate is always displayed in the display area. It is characterized by the following.

[0008]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing an embodiment of a count rate display method of an X-ray analyzer according to the present invention, FIG. 2 is a diagram showing a count rate display example on an EDS spectrum screen, and FIG. 3 is an example of input / output characteristics of a linear amplifier. FIG. In the figure, 1 is a deflection lens, 2 is an EDS detector, 3 is an EDS analyzer, 4 is an analysis processing device, and 5 is X
Line count rate display processing unit, 6 is a quantitative analysis processing unit, 7
Denotes an element mapping analysis processing unit, 8 denotes a display control processing unit, 9
Indicates a display device.

In FIG. 1, an EDS analyzer 3 controls a deflecting lens 1 to set an electron beam to be irradiated on a sample at an analysis position, and detects an X-ray detected by an EDS detector 2.
The line measurement data is sent to the analysis processing device 4 in correspondence with the analysis position of the sample. The analysis processing device 4 takes in the measurement data of the X-rays detected by the EDS detector 2 from the EDS analyzer 3 and performs each processing of the display of the X-ray count rate, the quantitative analysis, and the element mapping analysis. In addition to displaying an EDS spectrum screen and an element mapping screen, an X-ray count rate is displayed. The processing is performed by an X-ray count rate display processing section 5, a quantitative analysis processing section 6, an element mapping analysis processing. A display control processing unit 8;

The X-ray count rate display processing section 5 constantly monitors the EDS analyzer 3 to obtain the X-ray count rate in order to display the X-ray count rate on a part of the screen of the display device 9, and obtains the quantitative analysis processing section. The element 6 and the element mapping analysis processing section 7 are activated in response to the analysis instruction, and take in the measurement data of the X-rays detected by the EDS detector 2 to perform the spectrum analysis and the element mapping analysis processing.
The display control processing unit 8 performs processing for displaying an X-ray count rate display, an EDS spectrum screen, and an element mapping screen on the display device 9 based on these processings. FIG. 2 shows an example in which the X-ray count rate display “2097 cps” is performed on the area. “18%” displayed in parallel with the X-ray count rate display indicates the dead time D
T. By setting the display area in a part such as the lower right corner of the screen in this way, the X-ray count rate display is always performed even when the EDS spectrum screen, the element mapping screen, and other screens are displayed.

[0011] The input / output characteristics of the linear amplifier are determined by the input count rate (cps) to the EDS analyzer (linear amplifier).
FIG. 3 shows, for example, the relationship between and the output count rate (cps). As the X-ray count rate, the input count rate (cps) is displayed. In addition to the X-ray count rate, dead time DT (%) is displayed as an element for monitoring the optimum measurement condition in FIG. Dead time DT
Is represented by (RT-LT) / RT, and RT
Is the real time (elapsed time), and LT is the effective count time of X-rays. As the dead time DT increases, the output count rate decreases. However, even if the X-ray count rate DT is as low as several percent, the output count rate is too small to obtain a sufficient X-ray intensity. Therefore, in the EDS measurement, the dead time DT of about 20% to 30% is the optimum measurement condition.

The present invention is not limited to the above embodiment, but can be variously modified. For example, in the above embodiment, the display area of the X-ray count rate is set at the lower right of the screen, but may be set to another area.

[0013]

As is apparent from the above description, according to the present invention, display means for displaying the X-ray count rate of the energy value in the entire range detected by the X-ray detector is provided.
Since a display area of the X-ray count rate is set in a part of an energy spectrum screen or an element mapping screen, and the X-ray count rate is always displayed in the display area,
By always displaying the X-ray count rate and also displaying the dead time, the optimum measurement conditions can be monitored.

[Brief description of the drawings]

FIG. 1 is a diagram showing an embodiment of a count rate display method of an X-ray analyzer according to the present invention.

FIG. 2 is a diagram showing a count rate display example on an EDS spectrum screen.

FIG. 3 is a diagram illustrating an example of input / output characteristics of a linear amplifier.

FIG. 4 is a diagram illustrating a configuration example of a conventional X-ray analyzer.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Deflection lens, 2 ... EDS detector, 3 ... EDS analyzer, 4 ... Analysis processing apparatus, 5 ... X-ray count rate display processing part, 6 ... Quantitative analysis processing part, 7 ... Element mapping analysis processing part, 8 ... Display Control processing unit 9, display device

Continued on the front page (72) Inventor Yasunori Ota 3-1-2 Musashino, Akishima-shi, Tokyo Japan Electronic Engineering Co., Ltd. (72) Inventor Kiyoshi Jumon 3-1-2-1, Musashino, Akishima-shi, Tokyo Japan Electronic Engineering Stock In-house F term (reference) 2G001 AA03 BA05 EA03 FA10 GA01 GA06 HA13 KA01 5C033 PP06

Claims (2)

[Claims] 1. An X-ray analyzer for irradiating a sample with an electron beam to detect and analyze characteristic X-rays emitted from the sample, the X-ray count rate of energy values in the entire range detected by the X-ray detector. Is provided, a display area of the X-ray count rate is set in a part of an energy spectrum screen or an element mapping screen, and the X-ray count rate is always displayed in the display area. X-ray analyzer count rate display method. 2. The count rate display method for an X-ray analyzer according to claim 1, wherein a dead time is displayed together with the X-ray count rate.