JP2000034416A5 - - Google Patents
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- Publication number
- JP2000034416A5 JP2000034416A5 JP1999126842A JP12684299A JP2000034416A5 JP 2000034416 A5 JP2000034416 A5 JP 2000034416A5 JP 1999126842 A JP1999126842 A JP 1999126842A JP 12684299 A JP12684299 A JP 12684299A JP 2000034416 A5 JP2000034416 A5 JP 2000034416A5
- Authority
- JP
- Japan
- Prior art keywords
- water
- soluble substance
- polymer
- thermoplastic polymer
- insoluble thermoplastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 claims description 11
- 229920001169 thermoplastic Polymers 0.000 claims description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 229920000642 polymer Polymers 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 3
- 229930182556 Polyacetal Natural products 0.000 claims description 3
- 239000004952 Polyamide Substances 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 3
- 229920002647 polyamide Polymers 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 229920005672 polyolefin resin Polymers 0.000 claims description 3
- 229920006324 polyoxymethylene Polymers 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229920002725 thermoplastic elastomer Polymers 0.000 claims description 3
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12684299A JP3918359B2 (ja) | 1998-05-15 | 1999-05-07 | 研磨パッド用重合体組成物および研磨パッド |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-133527 | 1998-05-15 | ||
| JP13352798 | 1998-05-15 | ||
| JP12684299A JP3918359B2 (ja) | 1998-05-15 | 1999-05-07 | 研磨パッド用重合体組成物および研磨パッド |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000034416A JP2000034416A (ja) | 2000-02-02 |
| JP2000034416A5 true JP2000034416A5 (https=) | 2004-12-16 |
| JP3918359B2 JP3918359B2 (ja) | 2007-05-23 |
Family
ID=26462949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12684299A Expired - Lifetime JP3918359B2 (ja) | 1998-05-15 | 1999-05-07 | 研磨パッド用重合体組成物および研磨パッド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3918359B2 (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6953388B2 (en) | 1999-12-22 | 2005-10-11 | Toray Industries, Inc. | Polishing pad, and method and apparatus for polishing |
| JP3925041B2 (ja) | 2000-05-31 | 2007-06-06 | Ｊｓｒ株式会社 | 研磨パッド用組成物及びこれを用いた研磨パッド |
| JP2002190460A (ja) * | 2000-10-12 | 2002-07-05 | Toshiba Corp | 研磨布、研磨装置および半導体装置の製造方法 |
| JP3826702B2 (ja) * | 2000-10-24 | 2006-09-27 | Ｊｓｒ株式会社 | 研磨パッド用組成物及びこれを用いた研磨パッド |
| KR100858392B1 (ko) * | 2001-04-25 | 2008-09-11 | 제이에스알 가부시끼가이샤 | 반도체 웨이퍼용 연마 패드와, 이를 구비한 반도체웨이퍼용 연마 적층체와, 반도체 웨이퍼의 연마 방법 |
| JP2003100682A (ja) * | 2001-09-25 | 2003-04-04 | Jsr Corp | 半導体ウエハ用研磨パッド |
| JP2003311604A (ja) * | 2002-04-26 | 2003-11-05 | Chiyoda Kk | 研磨パッド |
| US20040058623A1 (en) * | 2002-09-20 | 2004-03-25 | Lam Research Corporation | Polishing media for chemical mechanical planarization (CMP) |
| JP4039214B2 (ja) | 2002-11-05 | 2008-01-30 | Ｊｓｒ株式会社 | 研磨パッド |
| US20040224622A1 (en) | 2003-04-15 | 2004-11-11 | Jsr Corporation | Polishing pad and production method thereof |
| JP4292025B2 (ja) | 2003-05-23 | 2009-07-08 | Ｊｓｒ株式会社 | 研磨パッド |
| US7086932B2 (en) * | 2004-05-11 | 2006-08-08 | Freudenberg Nonwovens | Polishing pad |
| US7442116B2 (en) | 2003-11-04 | 2008-10-28 | Jsr Corporation | Chemical mechanical polishing pad |
| KR100640141B1 (ko) | 2004-04-21 | 2006-10-31 | 제이에스알 가부시끼가이샤 | 화학 기계 연마 패드 및 그 제조 방법 및 화학 기계 연마방법 |
| DE602005007125D1 (de) | 2004-09-17 | 2008-07-10 | Jsr Corp | Chemisch-mechanisches Polierkissen und chemisch-mechanisches Polierverfahren |
| JP4475404B2 (ja) | 2004-10-14 | 2010-06-09 | Ｊｓｒ株式会社 | 研磨パッド |
| KR20070070094A (ko) | 2005-12-28 | 2007-07-03 | 제이에스알 가부시끼가이샤 | 화학 기계 연마 패드 및 화학 기계 연마 방법 |
| EP1975985A4 (en) | 2006-01-25 | 2011-08-10 | Jsr Corp | CHEMICAL-MECHANICAL POLISHING ELEMENT AND METHOD OF MANUFACTURING THEREOF |
| KR20080090496A (ko) | 2006-02-03 | 2008-10-08 | 제이에스알 가부시끼가이샤 | 화학 기계 연마 패드 |
| JP2009117815A (ja) | 2007-10-18 | 2009-05-28 | Jsr Corp | 化学機械研磨パッドの製造方法 |
| JPWO2009072405A1 (ja) * | 2007-12-07 | 2011-04-21 | Jsr株式会社 | 化学機械研磨パッドおよび化学機械研磨方法 |
| JP2008149458A (ja) * | 2008-03-03 | 2008-07-03 | Jsr Corp | 研磨パッド用組成物及びこれを用いた研磨パッド |
| JP5248954B2 (ja) | 2008-09-02 | 2013-07-31 | スリーエム イノベイティブ プロパティズ カンパニー | 抱接化合物を含む研磨材製品 |
| JP5062455B2 (ja) | 2010-07-12 | 2012-10-31 | Ｊｓｒ株式会社 | 化学機械研磨パッドおよび化学機械研磨方法 |
| KR101656414B1 (ko) * | 2014-10-22 | 2016-09-12 | 주식회사 케이씨텍 | 분산성이 개선된 슬러리 조성물 |
| KR102638363B1 (ko) | 2018-12-03 | 2024-02-19 | 주식회사 쿠라레 | 연마층용 폴리우레탄, 연마층 및 연마 패드 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63212464A (ja) * | 1987-02-26 | 1988-09-05 | Nikko Rika Kk | 研磨板 |
| US5453312A (en) * | 1993-10-29 | 1995-09-26 | Minnesota Mining And Manufacturing Company | Abrasive article, a process for its manufacture, and a method of using it to reduce a workpiece surface |
| JPH07214473A (ja) * | 1994-02-01 | 1995-08-15 | Takino Gomme Seisakusho:Kk | ゴム質研磨材とその製法 |
| JPH10204418A (ja) * | 1997-01-27 | 1998-08-04 | Kao Corp | 研磨材組成物及びこれを用いたカーボン材料からなる基板の製造方法 |
| EP1011919B1 (en) * | 1997-08-06 | 2004-10-20 | Rodel Holdings, Inc. | Method of manufacturing a polishing pad |
| JPH11285961A (ja) * | 1998-04-03 | 1999-10-19 | Nikon Corp | 研磨パッド及び研磨方法 |
-
1999
- 1999-05-07 JP JP12684299A patent/JP3918359B2/ja not_active Expired - Lifetime
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