JP1782473S - - Google Patents
Info
- Publication number
- JP1782473S JP1782473S JP2024012086F JP2024012086F JP1782473S JP 1782473 S JP1782473 S JP 1782473S JP 2024012086 F JP2024012086 F JP 2024012086F JP 2024012086 F JP2024012086 F JP 2024012086F JP 1782473 S JP1782473 S JP 1782473S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024012086F JP1782473S (oth) | 2024-06-14 | 2024-06-14 | |
| TW113306107F TWD243689S (zh) | 2024-06-14 | 2024-11-20 | 半導體製造裝置用處理管 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024012086F JP1782473S (oth) | 2024-06-14 | 2024-06-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1782473S true JP1782473S (oth) | 2024-10-17 |
Family
ID=93058186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024012086F Active JP1782473S (oth) | 2024-06-14 | 2024-06-14 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1782473S (oth) |
| TW (1) | TWD243689S (oth) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD406113S (en) | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405429S (en) | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| USD405062S (en) | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD518884S1 (en) | 2002-11-22 | 2006-04-11 | Tokyo Electron Limited | Heating tube for semiconductor-making furnace |
| TWD125600S1 (zh) | 2006-10-12 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| TWD125601S (zh) | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加工處理管 |
| JP5470149B2 (ja) | 2010-04-23 | 2014-04-16 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法およびクリーニング方法 |
| JP1534829S (oth) | 2015-02-23 | 2015-10-13 | ||
| JP1605460S (oth) | 2017-08-09 | 2021-05-31 | ||
| USD931823S1 (en) | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| JP1678273S (ja) | 2020-03-10 | 2021-02-01 | 反応管 |
-
2024
- 2024-06-14 JP JP2024012086F patent/JP1782473S/ja active Active
- 2024-11-20 TW TW113306107F patent/TWD243689S/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWD243689S (zh) | 2026-04-01 |