JP1696666S - - Google Patents

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Publication number
JP1696666S
JP1696666S JPD2020-19524F JP2020019524F JP1696666S JP 1696666 S JP1696666 S JP 1696666S JP 2020019524 F JP2020019524 F JP 2020019524F JP 1696666 S JP1696666 S JP 1696666S
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JP
Japan
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Active
Application number
JPD2020-19524F
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Publication of JP1696666S publication Critical patent/JP1696666S/ja
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JPD2020-19524F 2020-03-20 2020-09-14 Active JP1696666S (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/728,820 USD941371S1 (en) 2020-03-20 2020-03-20 Process shield for a substrate processing chamber

Publications (1)

Publication Number Publication Date
JP1696666S true JP1696666S (ja) 2021-10-11

Family

ID=78000911

Family Applications (2)

Application Number Title Priority Date Filing Date
JPD2020-19524F Active JP1696666S (ja) 2020-03-20 2020-09-14
JPD2021-4565F Active JP1696763S (ja) 2020-03-20 2020-09-14

Family Applications After (1)

Application Number Title Priority Date Filing Date
JPD2021-4565F Active JP1696763S (ja) 2020-03-20 2020-09-14

Country Status (3)

Country Link
US (1) USD941371S1 (ja)
JP (2) JP1696666S (ja)
TW (2) TWD215401S (ja)

Families Citing this family (7)

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USD937329S1 (en) * 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD973609S1 (en) * 2020-04-22 2022-12-27 Applied Materials, Inc. Upper shield with showerhead for a process chamber
USD940765S1 (en) * 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD980887S1 (en) * 2021-03-18 2023-03-14 Illinois Tool Works Inc. Chamber
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD990441S1 (en) * 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus

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USD351450S (en) * 1993-05-19 1994-10-11 Riteflite Pty. Limited Target for shooting
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USD381030S (en) * 1995-11-21 1997-07-15 Avi Tepman Sputtering target
AU129071S (en) * 1996-06-07 1997-01-14 Riteflite Pty Ltd Target
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USD401252S (en) * 1998-01-27 1998-11-17 Semiconductor Equipment Technology Shield and cover for target of sputter coating apparatus
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USD491963S1 (en) * 2002-11-20 2004-06-22 Tokyo Electron Limited Inner wall shield for a process chamber for manufacturing semiconductors
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US9127362B2 (en) 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
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USD616389S1 (en) * 2008-10-20 2010-05-25 Ebara Corporation Vacuum contact pad
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WO2014107558A1 (en) * 2013-01-04 2014-07-10 Tosoh Smd, Inc. Silicon sputtering target with enhanced surface profile and improved performance and methods of making the same
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WO2017007729A1 (en) 2015-07-03 2017-01-12 Applied Materials, Inc. Process kit having tall deposition ring and deposition ring clamp
US10174437B2 (en) * 2015-07-09 2019-01-08 Applied Materials, Inc. Wafer electroplating chuck assembly
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US10103012B2 (en) 2015-09-11 2018-10-16 Applied Materials, Inc. One-piece process kit shield for reducing the impact of an electric field near the substrate
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD819580S1 (en) * 2016-04-01 2018-06-05 Veeco Instruments, Inc. Self-centering wafer carrier for chemical vapor deposition
TWD178424S (zh) * 2016-01-08 2016-09-21 ＡＳＭ知識產權私人控股有&#x9 用於半導體製造設備的氣流控制板
WO2018094024A1 (en) 2016-11-19 2018-05-24 Applied Materials, Inc. Process kit having a floating shadow ring
KR102674265B1 (ko) * 2017-06-01 2024-06-11 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 취성 재료의 안전하고 경제적인 증발을 위한 타깃 조립체
US10998172B2 (en) 2017-09-22 2021-05-04 Applied Materials, Inc. Substrate processing chamber having improved process volume sealing
JP1605779S (ja) 2017-12-19 2018-06-04
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD877101S1 (en) * 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD888903S1 (en) * 2018-12-17 2020-06-30 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
USD891382S1 (en) * 2019-02-08 2020-07-28 Applied Materials, Inc. Process shield for a substrate processing chamber
JP1646366S (ja) 2019-03-19 2019-11-25
USD913979S1 (en) * 2019-08-28 2021-03-23 Applied Materials, Inc. Inner shield for a substrate processing chamber

Also Published As

Publication number Publication date
TWD215400S (zh) 2021-11-21
USD941371S1 (en) 2022-01-18
JP1696763S (ja) 2021-10-11
TWD215401S (zh) 2021-11-21

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