ITPD20130310A1 - Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico - Google Patents
Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosfericoInfo
- Publication number
- ITPD20130310A1 ITPD20130310A1 IT000310A ITPD20130310A ITPD20130310A1 IT PD20130310 A1 ITPD20130310 A1 IT PD20130310A1 IT 000310 A IT000310 A IT 000310A IT PD20130310 A ITPD20130310 A IT PD20130310A IT PD20130310 A1 ITPD20130310 A1 IT PD20130310A1
- Authority
- IT
- Italy
- Prior art keywords
- plasma
- duct
- frequency generator
- electrodes
- pair
- Prior art date
Links
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
- H05H1/2465—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/60—Portable devices
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Fluid Mechanics (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000310A ITPD20130310A1 (it) | 2013-11-14 | 2013-11-14 | Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico |
| PCT/IB2014/002459 WO2015071746A1 (en) | 2013-11-14 | 2014-11-14 | Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device |
| US15/035,759 US9693441B2 (en) | 2013-11-14 | 2014-11-14 | Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device |
| CN201480073099.6A CN105900532B (zh) | 2013-11-14 | 2014-11-14 | 用于生成大气等离子体射流的方法以及大气等离子体小型火炬设备 |
| CA2930208A CA2930208C (en) | 2013-11-14 | 2014-11-14 | Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device |
| JP2016529887A JP6569954B2 (ja) | 2013-11-14 | 2014-11-14 | 大気プラズマジェットの生成方法及び大気プラズマミニトーチ装置 |
| AU2014349815A AU2014349815B2 (en) | 2013-11-14 | 2014-11-14 | Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device |
| EP14815000.6A EP3069577B1 (en) | 2013-11-14 | 2014-11-14 | Method for producing an atmospheric plasma jet and atmospheric pressure plasma minitorch device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000310A ITPD20130310A1 (it) | 2013-11-14 | 2013-11-14 | Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ITPD20130310A1 true ITPD20130310A1 (it) | 2015-05-15 |
Family
ID=49920480
Family Applications (1)
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| CA (1) | CA2930208C (https=) |
| IT (1) | ITPD20130310A1 (https=) |
| WO (1) | WO2015071746A1 (https=) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6333157B2 (ja) * | 2014-11-12 | 2018-05-30 | エア・ウォーター株式会社 | 大気圧プラズマ処理装置、それを用いた大気圧プラズマ処理方法、および、導電性材料からなる粉体の大気圧プラズマ処理方法 |
| EP3253183B1 (en) * | 2015-01-27 | 2023-11-08 | FUJI Corporation | Atmospheric-pressure plasma generation device |
| RU2616445C1 (ru) * | 2015-11-20 | 2017-04-17 | Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук (ИСЭ СО РАН) | Источник плазменной струи |
| RU2633705C1 (ru) * | 2016-06-20 | 2017-10-17 | Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук (ИСЭ СО РАН) | Способ получения плазменной струи и устройство для его осуществления |
| US11313040B2 (en) * | 2017-03-24 | 2022-04-26 | Embraco Indústria De Compressores E Soluçôes Em Refrigeraçâo Ltda. | Plasma-assisted process of ceramization of polymer precursor on surface, surface comprising ceramic polymer |
| JP6991543B2 (ja) * | 2017-03-30 | 2022-01-12 | 国立大学法人大阪大学 | プラズマ生成装置及びこれを用いたプラズマ生成方法 |
| US11871978B2 (en) | 2017-04-20 | 2024-01-16 | Boise State University | Plasma scalpel for selective removal of microbes and microbial biofilms |
| US11201045B2 (en) * | 2017-06-16 | 2021-12-14 | Plasmion Gmbh | Apparatus and method for ionizing an analyte, and apparatus and method for analysing an ionized analyte |
| US10293303B2 (en) | 2017-07-28 | 2019-05-21 | Thrivaltech, Llc | Modular plasma reformer treatment system |
| SG11202002725UA (en) * | 2017-10-01 | 2020-04-29 | Space Foundry Inc | Modular print head assembly for plasma jet printing |
| EP3771297B1 (en) * | 2018-03-20 | 2024-07-03 | FUJI Corporation | Plasma device, plasma generation method |
| CN108834298A (zh) * | 2018-08-16 | 2018-11-16 | 东华大学 | 一种通过辅助放电控制射频射流长度的装置与方法 |
| WO2020141806A2 (ko) * | 2018-12-31 | 2020-07-09 | 인투코어테크놀로지 주식회사 | 플라즈마 발생 장치 및 그 동작 방법 |
| KR102031713B1 (ko) * | 2019-01-29 | 2019-10-14 | (주)에스제이글로벌 | 창상치료용 플라즈마 전극 패드 및 플라즈마 치료 장치 |
| CN112188716B (zh) * | 2019-07-01 | 2023-02-03 | 上海宏澎能源科技有限公司 | 等离子束发生装置及产生等离子束的方法 |
| EP4585717A3 (en) * | 2019-09-10 | 2025-10-08 | UCL Business Ltd | Plasma jet deposition process |
| WO2021065357A1 (ja) * | 2019-09-30 | 2021-04-08 | 富士フイルム株式会社 | 成膜装置 |
| CN111465160A (zh) * | 2020-05-14 | 2020-07-28 | 国网重庆市电力公司电力科学研究院 | 一种等离子体射流发生装置及系统 |
| JP2023529709A (ja) * | 2020-06-08 | 2023-07-11 | チスキャン ホールディングス、エルエルシー | 非熱プラズマを用いた微生物を不活性化する装置および方法 |
| CN112074069A (zh) * | 2020-09-07 | 2020-12-11 | 深圳先进技术研究院 | 一种常压射频低温等离子体装置 |
| EP3992330A1 (en) * | 2020-10-29 | 2022-05-04 | PartiX | Powder coating method |
| RU2764165C1 (ru) * | 2021-05-31 | 2022-01-13 | Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук (ИСЭ СО РАН) | Устройство для получения плазменной струи |
| EP4348696A4 (en) | 2021-06-02 | 2025-03-05 | Rimere, LLC | SYSTEMS AND METHODS FOR GENERATING PLASMA WITH MICROWAVE ENERGY |
| WO2024192184A1 (en) * | 2023-03-14 | 2024-09-19 | TellaPure, LLC | Methods and apparatus for generating atmospheric pressure, low temperature plasma with changing parameters |
| KR102867645B1 (ko) * | 2023-11-09 | 2025-10-01 | 국립한국해양대학교산학협력단 | 대기압 플라즈마 제트를 이용한 표면처리 방법 |
| WO2025114736A1 (en) * | 2023-11-30 | 2025-06-05 | Állatorvostudományi Egyetem | Non-contact, non-invasive treatment device |
| DE102024104886A1 (de) | 2024-02-21 | 2025-08-21 | OrelTech GmbH | Verfahren zur Bildung einer metallischen Beschichtung aus einer Metallisierungslösung |
| FR3164340A1 (fr) * | 2024-07-04 | 2026-01-09 | Ecole Polytechnique | Dispositif à jet de plasma |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1096837A2 (en) * | 1999-10-25 | 2001-05-02 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and plasma generation method using the apparatus |
| WO2002013222A1 (en) * | 2000-08-04 | 2002-02-14 | General Atomics | Improved apparatus and method for forming a high pressure plasma discharge column |
| US20040012319A1 (en) * | 2002-07-10 | 2004-01-22 | Shun'ko Evgeny V. | Rf loaded line type capacitive plasma source for broad range of operating gas pressure |
| EP2312612A2 (en) * | 2009-10-16 | 2011-04-20 | Korea Institute Of Machinery & Materials | Plasma reactor for abating hazardous materials and driving method thereof |
| US20110298376A1 (en) * | 2009-01-13 | 2011-12-08 | River Bell Co. | Apparatus And Method For Producing Plasma |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2657850B2 (ja) | 1990-10-23 | 1997-09-30 | 株式会社半導体エネルギー研究所 | プラズマ発生装置およびそれを用いたエッチング方法 |
| US5414324A (en) | 1993-05-28 | 1995-05-09 | The University Of Tennessee Research Corporation | One atmosphere, uniform glow discharge plasma |
| JP3899597B2 (ja) * | 1997-01-30 | 2007-03-28 | セイコーエプソン株式会社 | 大気圧プラズマ生成方法および装置並びに表面処理方法 |
| US6406759B1 (en) | 1998-01-08 | 2002-06-18 | The University Of Tennessee Research Corporation | Remote exposure of workpieces using a recirculated plasma |
| DE29805999U1 (de) | 1998-04-03 | 1998-06-25 | Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen | Vorrichtung zur Plasmabehandlung von Oberflächen |
| US6958063B1 (en) * | 1999-04-22 | 2005-10-25 | Soring Gmbh Medizintechnik | Plasma generator for radio frequency surgery |
| DE29919142U1 (de) | 1999-10-30 | 2001-03-08 | Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen | Plasmadüse |
| JP2002008894A (ja) * | 2000-06-27 | 2002-01-11 | Matsushita Electric Works Ltd | プラズマ処理装置及びプラズマ点灯方法 |
| DE10145131B4 (de) | 2001-09-07 | 2004-07-08 | Pva Tepla Ag | Vorrichtung zum Erzeugen eines Aktivgasstrahls |
| JP3846303B2 (ja) * | 2001-12-19 | 2006-11-15 | 松下電工株式会社 | 表面処理装置及び表面処理方法 |
| JP4023302B2 (ja) * | 2002-11-22 | 2007-12-19 | 松下電工株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| KR100608012B1 (ko) | 2004-11-05 | 2006-08-02 | 삼성전자주식회사 | 데이터 백업 방법 및 장치 |
| US20060156983A1 (en) | 2005-01-19 | 2006-07-20 | Surfx Technologies Llc | Low temperature, atmospheric pressure plasma generation and applications |
| EP1689216A1 (en) | 2005-02-04 | 2006-08-09 | Vlaamse Instelling Voor Technologisch Onderzoek (Vito) | Atmospheric-pressure plasma jet |
| US8328982B1 (en) | 2005-09-16 | 2012-12-11 | Surfx Technologies Llc | Low-temperature, converging, reactive gas source and method of use |
| US8267884B1 (en) | 2005-10-07 | 2012-09-18 | Surfx Technologies Llc | Wound treatment apparatus and method |
| JP2007250445A (ja) * | 2006-03-17 | 2007-09-27 | Seiko Epson Corp | プラズマ装置 |
| US7799237B2 (en) * | 2006-05-25 | 2010-09-21 | Sony Corporation | Method and apparatus for etching a structure in a plasma chamber |
| DE102006060942A1 (de) | 2006-12-20 | 2008-06-26 | Plasma Treat Gmbh | Vorrichtung und Verfahren zur Erzeugung eines Plasmastrahls |
| US20080220175A1 (en) * | 2007-01-22 | 2008-09-11 | Lorenzo Mangolini | Nanoparticles wtih grafted organic molecules |
| US8053699B2 (en) * | 2007-11-27 | 2011-11-08 | General Electric Company | Electrical pulse circuit |
| CN103609203A (zh) * | 2011-04-27 | 2014-02-26 | 道康宁法国公司 | 基材的等离子体处理 |
| US9697993B2 (en) * | 2013-11-06 | 2017-07-04 | Tokyo Electron Limited | Non-ambipolar plasma ehncanced DC/VHF phasor |
-
2013
- 2013-11-14 IT IT000310A patent/ITPD20130310A1/it unknown
-
2014
- 2014-11-14 AU AU2014349815A patent/AU2014349815B2/en active Active
- 2014-11-14 CA CA2930208A patent/CA2930208C/en active Active
- 2014-11-14 JP JP2016529887A patent/JP6569954B2/ja active Active
- 2014-11-14 WO PCT/IB2014/002459 patent/WO2015071746A1/en not_active Ceased
- 2014-11-14 CN CN201480073099.6A patent/CN105900532B/zh active Active
- 2014-11-14 EP EP14815000.6A patent/EP3069577B1/en active Active
- 2014-11-14 US US15/035,759 patent/US9693441B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1096837A2 (en) * | 1999-10-25 | 2001-05-02 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and plasma generation method using the apparatus |
| WO2002013222A1 (en) * | 2000-08-04 | 2002-02-14 | General Atomics | Improved apparatus and method for forming a high pressure plasma discharge column |
| US20040012319A1 (en) * | 2002-07-10 | 2004-01-22 | Shun'ko Evgeny V. | Rf loaded line type capacitive plasma source for broad range of operating gas pressure |
| US20110298376A1 (en) * | 2009-01-13 | 2011-12-08 | River Bell Co. | Apparatus And Method For Producing Plasma |
| EP2312612A2 (en) * | 2009-10-16 | 2011-04-20 | Korea Institute Of Machinery & Materials | Plasma reactor for abating hazardous materials and driving method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017504928A (ja) | 2017-02-09 |
| EP3069577A1 (en) | 2016-09-21 |
| CN105900532B (zh) | 2018-10-09 |
| CA2930208C (en) | 2021-12-07 |
| EP3069577B1 (en) | 2021-06-23 |
| CA2930208A1 (en) | 2015-05-21 |
| US9693441B2 (en) | 2017-06-27 |
| CN105900532A (zh) | 2016-08-24 |
| JP6569954B2 (ja) | 2019-09-04 |
| AU2014349815A1 (en) | 2016-05-26 |
| AU2014349815B2 (en) | 2019-07-18 |
| US20160295676A1 (en) | 2016-10-06 |
| WO2015071746A1 (en) | 2015-05-21 |
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