ITPD20130310A1 - Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico - Google Patents

Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico

Info

Publication number
ITPD20130310A1
ITPD20130310A1 IT000310A ITPD20130310A ITPD20130310A1 IT PD20130310 A1 ITPD20130310 A1 IT PD20130310A1 IT 000310 A IT000310 A IT 000310A IT PD20130310 A ITPD20130310 A IT PD20130310A IT PD20130310 A1 ITPD20130310 A1 IT PD20130310A1
Authority
IT
Italy
Prior art keywords
plasma
duct
frequency generator
electrodes
pair
Prior art date
Application number
IT000310A
Other languages
English (en)
Italian (it)
Inventor
Alessandro Patelli
Roberto Pierobon
Paolo Scopece
Falzacappa Emanuele Verga
Simone Vezzu
Original Assignee
Nadir S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nadir S R L filed Critical Nadir S R L
Priority to IT000310A priority Critical patent/ITPD20130310A1/it
Priority to CN201480073099.6A priority patent/CN105900532B/zh
Priority to AU2014349815A priority patent/AU2014349815B2/en
Priority to PCT/IB2014/002459 priority patent/WO2015071746A1/en
Priority to CA2930208A priority patent/CA2930208C/en
Priority to JP2016529887A priority patent/JP6569954B2/ja
Priority to EP14815000.6A priority patent/EP3069577B1/en
Priority to US15/035,759 priority patent/US9693441B2/en
Publication of ITPD20130310A1 publication Critical patent/ITPD20130310A1/it

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/2465—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/60—Portable devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
IT000310A 2013-11-14 2013-11-14 Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico ITPD20130310A1 (it)

Priority Applications (8)

Application Number Priority Date Filing Date Title
IT000310A ITPD20130310A1 (it) 2013-11-14 2013-11-14 Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico
CN201480073099.6A CN105900532B (zh) 2013-11-14 2014-11-14 用于生成大气等离子体射流的方法以及大气等离子体小型火炬设备
AU2014349815A AU2014349815B2 (en) 2013-11-14 2014-11-14 Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device
PCT/IB2014/002459 WO2015071746A1 (en) 2013-11-14 2014-11-14 Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device
CA2930208A CA2930208C (en) 2013-11-14 2014-11-14 Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device
JP2016529887A JP6569954B2 (ja) 2013-11-14 2014-11-14 大気プラズマジェットの生成方法及び大気プラズマミニトーチ装置
EP14815000.6A EP3069577B1 (en) 2013-11-14 2014-11-14 Method for producing an atmospheric plasma jet and atmospheric pressure plasma minitorch device
US15/035,759 US9693441B2 (en) 2013-11-14 2014-11-14 Method for generating an atmospheric plasma jet and atmospheric plasma minitorch device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000310A ITPD20130310A1 (it) 2013-11-14 2013-11-14 Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico

Publications (1)

Publication Number Publication Date
ITPD20130310A1 true ITPD20130310A1 (it) 2015-05-15

Family

ID=49920480

Family Applications (1)

Application Number Title Priority Date Filing Date
IT000310A ITPD20130310A1 (it) 2013-11-14 2013-11-14 Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico

Country Status (8)

Country Link
US (1) US9693441B2 (OSRAM)
EP (1) EP3069577B1 (OSRAM)
JP (1) JP6569954B2 (OSRAM)
CN (1) CN105900532B (OSRAM)
AU (1) AU2014349815B2 (OSRAM)
CA (1) CA2930208C (OSRAM)
IT (1) ITPD20130310A1 (OSRAM)
WO (1) WO2015071746A1 (OSRAM)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6333157B2 (ja) * 2014-11-12 2018-05-30 エア・ウォーター株式会社 大気圧プラズマ処理装置、それを用いた大気圧プラズマ処理方法、および、導電性材料からなる粉体の大気圧プラズマ処理方法
WO2016120998A1 (ja) * 2015-01-27 2016-08-04 富士機械製造株式会社 大気圧プラズマ発生装置
RU2616445C1 (ru) * 2015-11-20 2017-04-17 Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук (ИСЭ СО РАН) Источник плазменной струи
RU2633705C1 (ru) * 2016-06-20 2017-10-17 Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук (ИСЭ СО РАН) Способ получения плазменной струи и устройство для его осуществления
US11313040B2 (en) * 2017-03-24 2022-04-26 Embraco Indústria De Compressores E Soluçôes Em Refrigeraçâo Ltda. Plasma-assisted process of ceramization of polymer precursor on surface, surface comprising ceramic polymer
JP6991543B2 (ja) * 2017-03-30 2022-01-12 国立大学法人大阪大学 プラズマ生成装置及びこれを用いたプラズマ生成方法
US11871978B2 (en) 2017-04-20 2024-01-16 Boise State University Plasma scalpel for selective removal of microbes and microbial biofilms
EP3639289A2 (de) * 2017-06-16 2020-04-22 Plasmion Gmbh Vorrichtung und verfahren zur ionisation eines analyten sowie vorrichtung und verfahren zur analyse eines ionisierten analyten
US10293303B2 (en) 2017-07-28 2019-05-21 Thrivaltech, Llc Modular plasma reformer treatment system
JP2021501710A (ja) * 2017-10-01 2021-01-21 スペース ファウンドリー インコーポレイテッド プラズマジェット印刷用のモジュール式プリントヘッドアセンブリ
CN111886934A (zh) * 2018-03-20 2020-11-03 株式会社富士 等离子体装置、等离子体生成方法
CN108834298A (zh) * 2018-08-16 2018-11-16 东华大学 一种通过辅助放电控制射频射流长度的装置与方法
US11532455B2 (en) * 2018-12-31 2022-12-20 En2Core Technology, Inc. Plasma generating apparatus and method for operating same
KR102031713B1 (ko) * 2019-01-29 2019-10-14 (주)에스제이글로벌 창상치료용 플라즈마 전극 패드 및 플라즈마 치료 장치
CN112188716B (zh) * 2019-07-01 2023-02-03 上海宏澎能源科技有限公司 等离子束发生装置及产生等离子束的方法
JP2023500427A (ja) * 2019-09-10 2023-01-06 ユーシーエル ビジネス リミテッド プラズマジェット堆積プロセス
JP7293379B2 (ja) * 2019-09-30 2023-06-19 富士フイルム株式会社 成膜装置
CN111465160A (zh) * 2020-05-14 2020-07-28 国网重庆市电力公司电力科学研究院 一种等离子体射流发生装置及系统
CN116114387A (zh) * 2020-06-08 2023-05-12 智像控股有限责任公司 用于利用非热等离子体灭活微生物的装置和方法
CN112074069A (zh) * 2020-09-07 2020-12-11 深圳先进技术研究院 一种常压射频低温等离子体装置
EP3992330A1 (en) * 2020-10-29 2022-05-04 PartiX Powder coating method
RU2764165C1 (ru) * 2021-05-31 2022-01-13 Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук (ИСЭ СО РАН) Устройство для получения плазменной струи
KR20240038658A (ko) 2021-06-02 2024-03-25 리메르, 엘엘씨 마이크로파를 이용한 플라즈마 생성 시스템 및 방법
WO2024192184A1 (en) * 2023-03-14 2024-09-19 TellaPure, LLC Methods and apparatus for generating atmospheric pressure, low temperature plasma with changing parameters
KR102867645B1 (ko) * 2023-11-09 2025-10-01 국립한국해양대학교산학협력단 대기압 플라즈마 제트를 이용한 표면처리 방법
WO2025114736A1 (en) * 2023-11-30 2025-06-05 Állatorvostudományi Egyetem Non-contact, non-invasive treatment device
DE102024104886A1 (de) 2024-02-21 2025-08-21 OrelTech GmbH Verfahren zur Bildung einer metallischen Beschichtung aus einer Metallisierungslösung
FR3164340A1 (fr) * 2024-07-04 2026-01-09 Ecole Polytechnique Dispositif à jet de plasma

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1096837A2 (en) * 1999-10-25 2001-05-02 Matsushita Electric Works, Ltd. Plasma treatment apparatus and plasma generation method using the apparatus
WO2002013222A1 (en) * 2000-08-04 2002-02-14 General Atomics Improved apparatus and method for forming a high pressure plasma discharge column
US20040012319A1 (en) * 2002-07-10 2004-01-22 Shun'ko Evgeny V. Rf loaded line type capacitive plasma source for broad range of operating gas pressure
EP2312612A2 (en) * 2009-10-16 2011-04-20 Korea Institute Of Machinery & Materials Plasma reactor for abating hazardous materials and driving method thereof
US20110298376A1 (en) * 2009-01-13 2011-12-08 River Bell Co. Apparatus And Method For Producing Plasma

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2657850B2 (ja) 1990-10-23 1997-09-30 株式会社半導体エネルギー研究所 プラズマ発生装置およびそれを用いたエッチング方法
US5414324A (en) 1993-05-28 1995-05-09 The University Of Tennessee Research Corporation One atmosphere, uniform glow discharge plasma
JP3899597B2 (ja) * 1997-01-30 2007-03-28 セイコーエプソン株式会社 大気圧プラズマ生成方法および装置並びに表面処理方法
US6406759B1 (en) 1998-01-08 2002-06-18 The University Of Tennessee Research Corporation Remote exposure of workpieces using a recirculated plasma
DE29805999U1 (de) 1998-04-03 1998-06-25 Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen Vorrichtung zur Plasmabehandlung von Oberflächen
US6958063B1 (en) * 1999-04-22 2005-10-25 Soring Gmbh Medizintechnik Plasma generator for radio frequency surgery
DE29919142U1 (de) 1999-10-30 2001-03-08 Agrodyn Hochspannungstechnik GmbH, 33803 Steinhagen Plasmadüse
JP2002008894A (ja) * 2000-06-27 2002-01-11 Matsushita Electric Works Ltd プラズマ処理装置及びプラズマ点灯方法
DE10145131B4 (de) 2001-09-07 2004-07-08 Pva Tepla Ag Vorrichtung zum Erzeugen eines Aktivgasstrahls
JP3846303B2 (ja) * 2001-12-19 2006-11-15 松下電工株式会社 表面処理装置及び表面処理方法
JP4023302B2 (ja) * 2002-11-22 2007-12-19 松下電工株式会社 プラズマ処理装置及びプラズマ処理方法
KR100608012B1 (ko) 2004-11-05 2006-08-02 삼성전자주식회사 데이터 백업 방법 및 장치
US20060156983A1 (en) 2005-01-19 2006-07-20 Surfx Technologies Llc Low temperature, atmospheric pressure plasma generation and applications
EP1689216A1 (en) 2005-02-04 2006-08-09 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) Atmospheric-pressure plasma jet
US8328982B1 (en) 2005-09-16 2012-12-11 Surfx Technologies Llc Low-temperature, converging, reactive gas source and method of use
US8267884B1 (en) 2005-10-07 2012-09-18 Surfx Technologies Llc Wound treatment apparatus and method
JP2007250445A (ja) * 2006-03-17 2007-09-27 Seiko Epson Corp プラズマ装置
US7799237B2 (en) * 2006-05-25 2010-09-21 Sony Corporation Method and apparatus for etching a structure in a plasma chamber
DE102006060942A1 (de) 2006-12-20 2008-06-26 Plasma Treat Gmbh Vorrichtung und Verfahren zur Erzeugung eines Plasmastrahls
US20080220175A1 (en) * 2007-01-22 2008-09-11 Lorenzo Mangolini Nanoparticles wtih grafted organic molecules
US8053699B2 (en) * 2007-11-27 2011-11-08 General Electric Company Electrical pulse circuit
EP2702840A1 (en) * 2011-04-27 2014-03-05 Dow Corning France Plasma treatment of substrates
US9697993B2 (en) * 2013-11-06 2017-07-04 Tokyo Electron Limited Non-ambipolar plasma ehncanced DC/VHF phasor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1096837A2 (en) * 1999-10-25 2001-05-02 Matsushita Electric Works, Ltd. Plasma treatment apparatus and plasma generation method using the apparatus
WO2002013222A1 (en) * 2000-08-04 2002-02-14 General Atomics Improved apparatus and method for forming a high pressure plasma discharge column
US20040012319A1 (en) * 2002-07-10 2004-01-22 Shun'ko Evgeny V. Rf loaded line type capacitive plasma source for broad range of operating gas pressure
US20110298376A1 (en) * 2009-01-13 2011-12-08 River Bell Co. Apparatus And Method For Producing Plasma
EP2312612A2 (en) * 2009-10-16 2011-04-20 Korea Institute Of Machinery & Materials Plasma reactor for abating hazardous materials and driving method thereof

Also Published As

Publication number Publication date
CN105900532B (zh) 2018-10-09
EP3069577A1 (en) 2016-09-21
JP2017504928A (ja) 2017-02-09
JP6569954B2 (ja) 2019-09-04
EP3069577B1 (en) 2021-06-23
US20160295676A1 (en) 2016-10-06
CA2930208A1 (en) 2015-05-21
AU2014349815A1 (en) 2016-05-26
CA2930208C (en) 2021-12-07
CN105900532A (zh) 2016-08-24
AU2014349815B2 (en) 2019-07-18
WO2015071746A1 (en) 2015-05-21
US9693441B2 (en) 2017-06-27

Similar Documents

Publication Publication Date Title
EP3069577B1 (en) Method for producing an atmospheric plasma jet and atmospheric pressure plasma minitorch device
Kostov et al. Surface modification of polymeric materials by cold atmospheric plasma jet
Pappas Status and potential of atmospheric plasma processing of materials
JP5180585B2 (ja) プラズマ処理装置及び方法
US7608839B2 (en) Plasma source and applications thereof
US20090068375A1 (en) Atmospheric Pressure Plasma
TW200308187A (en) An atmospheric pressure plasma assembly
US20130108804A1 (en) Plasma treatment of substrates
US20140248444A1 (en) Plasma Treatment Of Substrates
WO2012146348A1 (en) Plasma treatment of substrates
Song et al. Patterned superhydrophobic surface fabrication by coupled atmospheric pressure RF and pulsed volume dielectric barrier discharges
Fei et al. Influence of additive gas on electrical and optical characteristics of non-equilibrium atmospheric pressure argon plasma jet
JP7075666B2 (ja) 線状の基材用の放電後プラズマ被覆装置
CN101437352B (zh) 等离子体接力装置
Babij et al. Miniature plasma jet for mass spectrometry
Korzec et al. Pre‐and Post‐processes
Nozaki et al. Controlled Growth of Carbon Nanotubes Using Pulsed Glow‐Barrier Discharge