ITMI20091507A1 - Procedimento per la produzione di un dispositivo sensore di rotazione e dispositivo sensore di rotazione - Google Patents

Procedimento per la produzione di un dispositivo sensore di rotazione e dispositivo sensore di rotazione

Info

Publication number
ITMI20091507A1
ITMI20091507A1 IT001507A ITMI20091507A ITMI20091507A1 IT MI20091507 A1 ITMI20091507 A1 IT MI20091507A1 IT 001507 A IT001507 A IT 001507A IT MI20091507 A ITMI20091507 A IT MI20091507A IT MI20091507 A1 ITMI20091507 A1 IT MI20091507A1
Authority
IT
Italy
Prior art keywords
rotation sensor
layer
oscillating mass
oscillating
spring
Prior art date
Application number
IT001507A
Other languages
English (en)
Inventor
Johannes Classen
Original Assignee
Bosch Gmbh Robert
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bosch Gmbh Robert filed Critical Bosch Gmbh Robert
Publication of ITMI20091507A1 publication Critical patent/ITMI20091507A1/it
Application granted granted Critical
Publication of IT1395366B1 publication Critical patent/IT1395366B1/it

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C25/00Manufacturing, calibrating, cleaning, or repairing instruments or devices referred to in the other groups of this subclass
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5705Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
    • G01C19/5712Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Manufacturing & Machinery (AREA)
  • Gyroscopes (AREA)
  • Pressure Sensors (AREA)
ITMI2009A001507A 2008-09-02 2009-08-27 Procedimento per la produzione di un dispositivo sensore di rotazione e dispositivo sensore di rotazione IT1395366B1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102008041757.2A DE102008041757B4 (de) 2008-09-02 2008-09-02 Herstellungsverfahren für eine Rotationssensorvorrichtung und Rotationssensorvorrichtung

Publications (2)

Publication Number Publication Date
ITMI20091507A1 true ITMI20091507A1 (it) 2010-03-03
IT1395366B1 IT1395366B1 (it) 2012-09-14

Family

ID=41605901

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI2009A001507A IT1395366B1 (it) 2008-09-02 2009-08-27 Procedimento per la produzione di un dispositivo sensore di rotazione e dispositivo sensore di rotazione

Country Status (4)

Country Link
US (1) US8573054B2 (it)
CN (1) CN101666647B (it)
DE (1) DE102008041757B4 (it)
IT (1) IT1395366B1 (it)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009109969A2 (en) * 2008-03-03 2009-09-11 Ramot At Tel-Aviv University Ltd. Micro scale mechanical rate sensors
ITUA20161498A1 (it) * 2016-03-09 2017-09-09 St Microelectronics Srl Struttura di rilevamento micromeccanica di un dispositivo sensore mems, in particolare di un giroscopio mems, con migliorate caratteristiche di azionamento
JP6903610B2 (ja) * 2018-08-27 2021-07-14 株式会社東芝 共振器およびそれを含む装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5203208A (en) * 1991-04-29 1993-04-20 The Charles Stark Draper Laboratory Symmetrical micromechanical gyroscope
EP0828992B1 (de) * 1995-05-31 2001-08-01 LITEF GmbH Mikromechanischer drehratensensor
DE19523895A1 (de) 1995-06-30 1997-01-02 Bosch Gmbh Robert Beschleunigungssensor
DE19617666B4 (de) * 1996-05-03 2006-04-20 Robert Bosch Gmbh Mikromechanischer Drehratensensor
DE19632060B4 (de) * 1996-08-09 2012-05-03 Robert Bosch Gmbh Verfahren zur Herstellung eines Drehratensensors
DE19937747C2 (de) * 1999-08-10 2001-10-31 Siemens Ag Mechanischer Resonator für Rotationssensor
US6393913B1 (en) * 2000-02-08 2002-05-28 Sandia Corporation Microelectromechanical dual-mass resonator structure
FI113704B (fi) * 2001-03-21 2004-05-31 Vti Technologies Oy Menetelmä piianturin valmistamiseksi sekä piianturi
US6715353B2 (en) * 2002-04-25 2004-04-06 Honeywell International, Inc. MEMS gyroscope with parametric gain
JP4102158B2 (ja) 2002-10-24 2008-06-18 富士通株式会社 マイクロ構造体の製造方法
DE102004017480B4 (de) * 2004-04-08 2009-04-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Rotations-Drehratensensor mit mechanisch entkoppelten Schwingungsmoden
US7066004B1 (en) * 2004-09-02 2006-06-27 Sandia Corporation Inertial measurement unit using rotatable MEMS sensors
JP4365308B2 (ja) * 2004-12-02 2009-11-18 富士通株式会社 マイクロ揺動素子
US9045329B2 (en) * 2005-11-25 2015-06-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Micromechanical element which can be deflected
US7934423B2 (en) * 2007-12-10 2011-05-03 Invensense, Inc. Vertically integrated 3-axis MEMS angular accelerometer with integrated electronics
JP4477659B2 (ja) * 2007-06-29 2010-06-09 富士通株式会社 マイクロ揺動素子およびマイクロ揺動素子アレイ
US7677099B2 (en) * 2007-11-05 2010-03-16 Invensense Inc. Integrated microelectromechanical systems (MEMS) vibrating mass Z-axis rate sensor
US8273610B2 (en) * 2010-11-18 2012-09-25 Monolithic 3D Inc. Method of constructing a semiconductor device and structure

Also Published As

Publication number Publication date
US8573054B2 (en) 2013-11-05
CN101666647A (zh) 2010-03-10
US20100058863A1 (en) 2010-03-11
CN101666647B (zh) 2015-11-25
DE102008041757A1 (de) 2010-03-04
DE102008041757B4 (de) 2019-01-03
IT1395366B1 (it) 2012-09-14

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