IT958100B - Composto e composizione sensibili alla luce adatti in particolare per lastre da stampa litografica - Google Patents

Composto e composizione sensibili alla luce adatti in particolare per lastre da stampa litografica

Info

Publication number
IT958100B
IT958100B IT5054072A IT5054072A IT958100B IT 958100 B IT958100 B IT 958100B IT 5054072 A IT5054072 A IT 5054072A IT 5054072 A IT5054072 A IT 5054072A IT 958100 B IT958100 B IT 958100B
Authority
IT
Italy
Prior art keywords
composition
lithographic printing
light sensitive
printing plates
composition suitable
Prior art date
Application number
IT5054072A
Other languages
English (en)
Italian (it)
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed by Polychrome Corp filed Critical Polychrome Corp
Application granted granted Critical
Publication of IT958100B publication Critical patent/IT958100B/it

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
IT5054072A 1971-05-28 1972-05-26 Composto e composizione sensibili alla luce adatti in particolare per lastre da stampa litografica IT958100B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (1)

Publication Number Publication Date
IT958100B true IT958100B (it) 1973-10-20

Family

ID=27386662

Family Applications (1)

Application Number Title Priority Date Filing Date
IT5054072A IT958100B (it) 1971-05-28 1972-05-26 Composto e composizione sensibili alla luce adatti in particolare per lastre da stampa litografica

Country Status (9)

Country Link
JP (2) JPS5724341B1 (enrdf_load_stackoverflow)
BE (1) BE783962A (enrdf_load_stackoverflow)
CA (1) CA977338A (enrdf_load_stackoverflow)
CH (1) CH566574A5 (enrdf_load_stackoverflow)
FR (1) FR2139981B1 (enrdf_load_stackoverflow)
GB (1) GB1398641A (enrdf_load_stackoverflow)
IT (1) IT958100B (enrdf_load_stackoverflow)
NL (1) NL171264C (enrdf_load_stackoverflow)
SE (1) SE394811B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0489469A (ja) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2−ジアゾ−1,2−キノン誘導体、及びそれを用いた画像形成材料

Also Published As

Publication number Publication date
NL171264C (nl) 1983-03-01
GB1398641A (en) 1975-06-25
DE2224843A1 (de) 1972-12-14
JPS552615B2 (enrdf_load_stackoverflow) 1980-01-21
SE394811B (sv) 1977-07-11
CA977338A (en) 1975-11-04
JPS5724341B1 (enrdf_load_stackoverflow) 1982-05-24
FR2139981B1 (enrdf_load_stackoverflow) 1973-07-13
FR2139981A1 (enrdf_load_stackoverflow) 1973-01-12
BE783962A (fr) 1972-11-27
JPS5494024A (en) 1979-07-25
NL7207131A (enrdf_load_stackoverflow) 1972-11-30
CH566574A5 (enrdf_load_stackoverflow) 1975-09-15
DE2224843B2 (de) 1976-07-29

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