IT943816B - Procedimento per la copertura autoaggiostante di parti di una superficie di un corpo semicon duttore con una vernice di coper tura fotosensibile - Google Patents

Procedimento per la copertura autoaggiostante di parti di una superficie di un corpo semicon duttore con una vernice di coper tura fotosensibile

Info

Publication number
IT943816B
IT943816B IT32216/71A IT3221671A IT943816B IT 943816 B IT943816 B IT 943816B IT 32216/71 A IT32216/71 A IT 32216/71A IT 3221671 A IT3221671 A IT 3221671A IT 943816 B IT943816 B IT 943816B
Authority
IT
Italy
Prior art keywords
covering
self
procedure
parts
adjusting
Prior art date
Application number
IT32216/71A
Other languages
English (en)
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT943816B publication Critical patent/IT943816B/it

Links

Classifications

    • H10W74/47—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H10P95/00—
    • H10W20/40—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Materials For Photolithography (AREA)
  • Electrodes Of Semiconductors (AREA)
IT32216/71A 1970-12-11 1971-12-10 Procedimento per la copertura autoaggiostante di parti di una superficie di un corpo semicon duttore con una vernice di coper tura fotosensibile IT943816B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2061202A DE2061202C3 (de) 1970-12-11 1970-12-11 Verfahren zur selbstjustierenden Abdeckung von Flächenteilen auf der Oberfläche eines Halbleiterkörpers mit fotoempfindlichem Abdecklack

Publications (1)

Publication Number Publication Date
IT943816B true IT943816B (it) 1973-04-10

Family

ID=5790759

Family Applications (1)

Application Number Title Priority Date Filing Date
IT32216/71A IT943816B (it) 1970-12-11 1971-12-10 Procedimento per la copertura autoaggiostante di parti di una superficie di un corpo semicon duttore con una vernice di coper tura fotosensibile

Country Status (10)

Country Link
US (1) US3816270A (cg-RX-API-DMAC10.html)
JP (1) JPS5145475B1 (cg-RX-API-DMAC10.html)
BE (1) BE776538A (cg-RX-API-DMAC10.html)
CA (1) CA949230A (cg-RX-API-DMAC10.html)
DE (1) DE2061202C3 (cg-RX-API-DMAC10.html)
FR (1) FR2117915B1 (cg-RX-API-DMAC10.html)
GB (1) GB1317697A (cg-RX-API-DMAC10.html)
IT (1) IT943816B (cg-RX-API-DMAC10.html)
LU (1) LU64425A1 (cg-RX-API-DMAC10.html)
NL (1) NL7117001A (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142893A (en) * 1977-09-14 1979-03-06 Raytheon Company Spray etch dicing method
US4179802A (en) * 1978-03-27 1979-12-25 International Business Machines Corporation Studded chip attachment process
JPS59124722A (ja) * 1982-12-30 1984-07-18 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション レジスト・マスクの形成方法

Also Published As

Publication number Publication date
GB1317697A (en) 1973-05-23
DE2061202C3 (de) 1974-05-09
JPS5145475B1 (cg-RX-API-DMAC10.html) 1976-12-03
LU64425A1 (cg-RX-API-DMAC10.html) 1972-06-20
DE2061202B2 (de) 1973-10-11
FR2117915B1 (cg-RX-API-DMAC10.html) 1977-04-22
CA949230A (en) 1974-06-11
FR2117915A1 (cg-RX-API-DMAC10.html) 1972-07-28
DE2061202A1 (de) 1972-06-22
NL7117001A (cg-RX-API-DMAC10.html) 1972-06-13
US3816270A (en) 1974-06-11
BE776538A (fr) 1972-04-04

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