CA949230A - Method of producing thick schottky-barrier contacts - Google Patents

Method of producing thick schottky-barrier contacts

Info

Publication number
CA949230A
CA949230A CA129,847A CA129847A CA949230A CA 949230 A CA949230 A CA 949230A CA 129847 A CA129847 A CA 129847A CA 949230 A CA949230 A CA 949230A
Authority
CA
Canada
Prior art keywords
producing thick
barrier contacts
schottky
thick schottky
barrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA129,847A
Other languages
English (en)
Other versions
CA129847S (en
Inventor
Hermann Kniepkamp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Application granted granted Critical
Publication of CA949230A publication Critical patent/CA949230A/en
Expired legal-status Critical Current

Links

Classifications

    • H10W74/47—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H10P95/00—
    • H10W20/40—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Materials For Photolithography (AREA)
  • Electrodes Of Semiconductors (AREA)
CA129,847A 1970-12-11 1971-12-10 Method of producing thick schottky-barrier contacts Expired CA949230A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2061202A DE2061202C3 (de) 1970-12-11 1970-12-11 Verfahren zur selbstjustierenden Abdeckung von Flächenteilen auf der Oberfläche eines Halbleiterkörpers mit fotoempfindlichem Abdecklack

Publications (1)

Publication Number Publication Date
CA949230A true CA949230A (en) 1974-06-11

Family

ID=5790759

Family Applications (1)

Application Number Title Priority Date Filing Date
CA129,847A Expired CA949230A (en) 1970-12-11 1971-12-10 Method of producing thick schottky-barrier contacts

Country Status (10)

Country Link
US (1) US3816270A (cg-RX-API-DMAC10.html)
JP (1) JPS5145475B1 (cg-RX-API-DMAC10.html)
BE (1) BE776538A (cg-RX-API-DMAC10.html)
CA (1) CA949230A (cg-RX-API-DMAC10.html)
DE (1) DE2061202C3 (cg-RX-API-DMAC10.html)
FR (1) FR2117915B1 (cg-RX-API-DMAC10.html)
GB (1) GB1317697A (cg-RX-API-DMAC10.html)
IT (1) IT943816B (cg-RX-API-DMAC10.html)
LU (1) LU64425A1 (cg-RX-API-DMAC10.html)
NL (1) NL7117001A (cg-RX-API-DMAC10.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142893A (en) * 1977-09-14 1979-03-06 Raytheon Company Spray etch dicing method
US4179802A (en) * 1978-03-27 1979-12-25 International Business Machines Corporation Studded chip attachment process
JPS59124722A (ja) * 1982-12-30 1984-07-18 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション レジスト・マスクの形成方法

Also Published As

Publication number Publication date
GB1317697A (en) 1973-05-23
DE2061202C3 (de) 1974-05-09
JPS5145475B1 (cg-RX-API-DMAC10.html) 1976-12-03
LU64425A1 (cg-RX-API-DMAC10.html) 1972-06-20
IT943816B (it) 1973-04-10
DE2061202B2 (de) 1973-10-11
FR2117915B1 (cg-RX-API-DMAC10.html) 1977-04-22
FR2117915A1 (cg-RX-API-DMAC10.html) 1972-07-28
DE2061202A1 (de) 1972-06-22
NL7117001A (cg-RX-API-DMAC10.html) 1972-06-13
US3816270A (en) 1974-06-11
BE776538A (fr) 1972-04-04

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