FR2117915A1 - - Google Patents
Info
- Publication number
- FR2117915A1 FR2117915A1 FR7143812A FR7143812A FR2117915A1 FR 2117915 A1 FR2117915 A1 FR 2117915A1 FR 7143812 A FR7143812 A FR 7143812A FR 7143812 A FR7143812 A FR 7143812A FR 2117915 A1 FR2117915 A1 FR 2117915A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W74/47—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- H10P95/00—
-
- H10W20/40—
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Materials For Photolithography (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2061202A DE2061202C3 (de) | 1970-12-11 | 1970-12-11 | Verfahren zur selbstjustierenden Abdeckung von Flächenteilen auf der Oberfläche eines Halbleiterkörpers mit fotoempfindlichem Abdecklack |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2117915A1 true FR2117915A1 (cg-RX-API-DMAC10.html) | 1972-07-28 |
| FR2117915B1 FR2117915B1 (cg-RX-API-DMAC10.html) | 1977-04-22 |
Family
ID=5790759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7143812A Expired FR2117915B1 (cg-RX-API-DMAC10.html) | 1970-12-11 | 1971-12-07 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3816270A (cg-RX-API-DMAC10.html) |
| JP (1) | JPS5145475B1 (cg-RX-API-DMAC10.html) |
| BE (1) | BE776538A (cg-RX-API-DMAC10.html) |
| CA (1) | CA949230A (cg-RX-API-DMAC10.html) |
| DE (1) | DE2061202C3 (cg-RX-API-DMAC10.html) |
| FR (1) | FR2117915B1 (cg-RX-API-DMAC10.html) |
| GB (1) | GB1317697A (cg-RX-API-DMAC10.html) |
| IT (1) | IT943816B (cg-RX-API-DMAC10.html) |
| LU (1) | LU64425A1 (cg-RX-API-DMAC10.html) |
| NL (1) | NL7117001A (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0114949A3 (en) * | 1982-12-30 | 1986-11-20 | International Business Machines Corporation | Self-aligning resist mask |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4142893A (en) * | 1977-09-14 | 1979-03-06 | Raytheon Company | Spray etch dicing method |
| US4179802A (en) * | 1978-03-27 | 1979-12-25 | International Business Machines Corporation | Studded chip attachment process |
-
1970
- 1970-12-11 DE DE2061202A patent/DE2061202C3/de not_active Expired
-
1971
- 1971-12-06 GB GB5647171A patent/GB1317697A/en not_active Expired
- 1971-12-07 FR FR7143812A patent/FR2117915B1/fr not_active Expired
- 1971-12-09 LU LU64425D patent/LU64425A1/xx unknown
- 1971-12-09 US US00206280A patent/US3816270A/en not_active Expired - Lifetime
- 1971-12-10 NL NL7117001A patent/NL7117001A/xx unknown
- 1971-12-10 BE BE776538A patent/BE776538A/xx unknown
- 1971-12-10 CA CA129,847A patent/CA949230A/en not_active Expired
- 1971-12-10 IT IT32216/71A patent/IT943816B/it active
- 1971-12-11 JP JP46100595A patent/JPS5145475B1/ja active Pending
Non-Patent Citations (1)
| Title |
|---|
| NEANT * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0114949A3 (en) * | 1982-12-30 | 1986-11-20 | International Business Machines Corporation | Self-aligning resist mask |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1317697A (en) | 1973-05-23 |
| DE2061202C3 (de) | 1974-05-09 |
| JPS5145475B1 (cg-RX-API-DMAC10.html) | 1976-12-03 |
| LU64425A1 (cg-RX-API-DMAC10.html) | 1972-06-20 |
| IT943816B (it) | 1973-04-10 |
| DE2061202B2 (de) | 1973-10-11 |
| FR2117915B1 (cg-RX-API-DMAC10.html) | 1977-04-22 |
| CA949230A (en) | 1974-06-11 |
| DE2061202A1 (de) | 1972-06-22 |
| NL7117001A (cg-RX-API-DMAC10.html) | 1972-06-13 |
| US3816270A (en) | 1974-06-11 |
| BE776538A (fr) | 1972-04-04 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |