LU64425A1 - - Google Patents

Info

Publication number
LU64425A1
LU64425A1 LU64425DA LU64425A1 LU 64425 A1 LU64425 A1 LU 64425A1 LU 64425D A LU64425D A LU 64425DA LU 64425 A1 LU64425 A1 LU 64425A1
Authority
LU
Luxembourg
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU64425A1 publication Critical patent/LU64425A1/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electrodes Of Semiconductors (AREA)
LU64425D 1970-12-11 1971-12-09 LU64425A1 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2061202A DE2061202C3 (de) 1970-12-11 1970-12-11 Verfahren zur selbstjustierenden Abdeckung von Flächenteilen auf der Oberfläche eines Halbleiterkörpers mit fotoempfindlichem Abdecklack

Publications (1)

Publication Number Publication Date
LU64425A1 true LU64425A1 (xx) 1972-06-20

Family

ID=5790759

Family Applications (1)

Application Number Title Priority Date Filing Date
LU64425D LU64425A1 (xx) 1970-12-11 1971-12-09

Country Status (10)

Country Link
US (1) US3816270A (xx)
JP (1) JPS5145475B1 (xx)
BE (1) BE776538A (xx)
CA (1) CA949230A (xx)
DE (1) DE2061202C3 (xx)
FR (1) FR2117915B1 (xx)
GB (1) GB1317697A (xx)
IT (1) IT943816B (xx)
LU (1) LU64425A1 (xx)
NL (1) NL7117001A (xx)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142893A (en) * 1977-09-14 1979-03-06 Raytheon Company Spray etch dicing method
US4179802A (en) * 1978-03-27 1979-12-25 International Business Machines Corporation Studded chip attachment process
JPS59124722A (ja) * 1982-12-30 1984-07-18 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション レジスト・マスクの形成方法

Also Published As

Publication number Publication date
US3816270A (en) 1974-06-11
GB1317697A (en) 1973-05-23
NL7117001A (xx) 1972-06-13
DE2061202B2 (de) 1973-10-11
FR2117915A1 (xx) 1972-07-28
FR2117915B1 (xx) 1977-04-22
CA949230A (en) 1974-06-11
DE2061202A1 (de) 1972-06-22
BE776538A (fr) 1972-04-04
JPS5145475B1 (xx) 1976-12-03
IT943816B (it) 1973-04-10
DE2061202C3 (de) 1974-05-09

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