IT8948599A0 - Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilano - Google Patents
Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilanoInfo
- Publication number
- IT8948599A0 IT8948599A0 IT48599A IT4859989A IT8948599A0 IT 8948599 A0 IT8948599 A0 IT 8948599A0 IT 48599 A IT48599 A IT 48599A IT 4859989 A IT4859989 A IT 4859989A IT 8948599 A0 IT8948599 A0 IT 8948599A0
- Authority
- IT
- Italy
- Prior art keywords
- compounds
- halogenosilan
- elimination
- procedure
- carrier gas
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title 2
- 239000003814 drug Substances 0.000 title 1
- 229940079593 drug Drugs 0.000 title 1
- 230000008030 elimination Effects 0.000 title 1
- 238000003379 elimination reaction Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S95/00—Gas separation: processes
- Y10S95/90—Solid sorbent
- Y10S95/902—Molecular sieve
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Separation Of Gases By Adsorption (AREA)
- Hydrogen, Water And Hydrids (AREA)
- Treating Waste Gases (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3843313A DE3843313A1 (de) | 1988-12-22 | 1988-12-22 | Verfahren zur entfernung von gasfoermigen kontaminierenden, insbesondere dotierstoffverbindungen aus halogensilanverbindungen enthaltenden traegergasen |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8948599A0 true IT8948599A0 (it) | 1989-11-24 |
IT8948599A1 IT8948599A1 (it) | 1991-05-24 |
IT1238349B IT1238349B (it) | 1993-07-13 |
Family
ID=6369903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT04859989A IT1238349B (it) | 1988-12-22 | 1989-11-24 | Procedimento per eliminare composti gassosi contaminanti, in particolare di droganti da gas vettori contenenti composti di alogenosilano. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5051117A (it) |
JP (1) | JPH02184501A (it) |
DE (1) | DE3843313A1 (it) |
IT (1) | IT1238349B (it) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2046325A1 (en) * | 1989-12-16 | 1991-06-17 | Hiroyuki Itoh | Concentration process of gaseous chlorine |
DE4113597C2 (de) * | 1990-04-28 | 1996-10-17 | Babcock Anlagen Gmbh | Verfahren zur Reinigung von Abgasen |
US5290342A (en) * | 1990-12-05 | 1994-03-01 | Ethyl Corporation | Silane compositions and process |
US5211931A (en) * | 1992-03-27 | 1993-05-18 | Ethyl Corporation | Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve |
US5453113A (en) * | 1994-04-11 | 1995-09-26 | Uop | Process for separation and recovery of methyl chloride from vent streams containing isobutane |
US5445742A (en) * | 1994-05-23 | 1995-08-29 | Dow Corning Corporation | Process for purifying halosilanes |
US6083298A (en) * | 1994-10-13 | 2000-07-04 | Advanced Technology Materials, Inc. | Process for fabricating a sorbent-based gas storage and dispensing system, utilizing sorbent material pretreatment |
US6204180B1 (en) | 1997-05-16 | 2001-03-20 | Advanced Technology Materials, Inc. | Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery |
US5704967A (en) * | 1995-10-13 | 1998-01-06 | Advanced Technology Materials, Inc. | Fluid storage and delivery system comprising high work capacity physical sorbent |
US6132492A (en) * | 1994-10-13 | 2000-10-17 | Advanced Technology Materials, Inc. | Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same |
US5518528A (en) * | 1994-10-13 | 1996-05-21 | Advanced Technology Materials, Inc. | Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds |
US5707424A (en) * | 1994-10-13 | 1998-01-13 | Advanced Technology Materials, Inc. | Process system with integrated gas storage and delivery unit |
US5693306A (en) * | 1994-11-28 | 1997-12-02 | Mitsui Toatsu Chemicals, Inc. | Production process for refined hydrogen iodide |
US6168652B1 (en) * | 1995-10-23 | 2001-01-02 | Dow Corning Corporation | Process for purifying halosilanes |
US5916245A (en) * | 1996-05-20 | 1999-06-29 | Advanced Technology Materials, Inc. | High capacity gas storage and dispensing system |
WO1997044118A1 (en) * | 1996-05-20 | 1997-11-27 | Advanced Technology Materials, Inc. | Fluid storage and delivery system comprising high work capacity physical sorbent |
US6019823A (en) * | 1997-05-16 | 2000-02-01 | Advanced Technology Materials, Inc. | Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members |
US6027547A (en) * | 1997-05-16 | 2000-02-22 | Advanced Technology Materials, Inc. | Fluid storage and dispensing vessel with modified high surface area solid as fluid storage medium |
US5851270A (en) * | 1997-05-20 | 1998-12-22 | Advanced Technology Materials, Inc. | Low pressure gas source and dispensing apparatus with enhanced diffusive/extractive means |
US5985008A (en) * | 1997-05-20 | 1999-11-16 | Advanced Technology Materials, Inc. | Sorbent-based fluid storage and dispensing system with high efficiency sorbent medium |
US5910292A (en) * | 1997-08-19 | 1999-06-08 | Aeronex, Inc. | Method for water removal from corrosive gas streams |
US5980608A (en) * | 1998-01-07 | 1999-11-09 | Advanced Technology Materials, Inc. | Throughflow gas storage and dispensing system |
US6406519B1 (en) * | 1998-03-27 | 2002-06-18 | Advanced Technology Materials, Inc. | Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
US6660063B2 (en) | 1998-03-27 | 2003-12-09 | Advanced Technology Materials, Inc | Sorbent-based gas storage and delivery system |
US6070576A (en) * | 1998-06-02 | 2000-06-06 | Advanced Technology Materials, Inc. | Adsorbent-based storage and dispensing system |
US6444013B1 (en) * | 2000-09-19 | 2002-09-03 | The Boc Group, Inc. | Purification of methylsilanes |
US7105037B2 (en) * | 2002-10-31 | 2006-09-12 | Advanced Technology Materials, Inc. | Semiconductor manufacturing facility utilizing exhaust recirculation |
JP2004149393A (ja) * | 2002-11-01 | 2004-05-27 | Japan Pionics Co Ltd | 不活性ガスの精製方法 |
US6991671B2 (en) | 2002-12-09 | 2006-01-31 | Advanced Technology Materials, Inc. | Rectangular parallelepiped fluid storage and dispensing vessel |
US7494530B2 (en) * | 2002-12-10 | 2009-02-24 | Advanced Technology Materials, Inc. | Gas storage and dispensing system with monolithic carbon adsorbent |
US6743278B1 (en) | 2002-12-10 | 2004-06-01 | Advanced Technology Materials, Inc. | Gas storage and dispensing system with monolithic carbon adsorbent |
US8002880B2 (en) | 2002-12-10 | 2011-08-23 | Advanced Technology Materials, Inc. | Gas storage and dispensing system with monolithic carbon adsorbent |
US8679231B2 (en) | 2011-01-19 | 2014-03-25 | Advanced Technology Materials, Inc. | PVDF pyrolyzate adsorbent and gas storage and dispensing system utilizing same |
EP2855009A4 (en) | 2012-05-29 | 2016-04-13 | Entegris Inc | CARBON ADSORBENT FOR THE REMOVAL OF HYDROGEN SULFIDE FROM GAS, AND REGENERATION OF ADSORBENT |
JP6433867B2 (ja) * | 2015-08-28 | 2018-12-05 | 信越化学工業株式会社 | 水素ガス回収システムおよび水素ガスの分離回収方法 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL241272A (it) * | 1958-07-14 | |||
US3658696A (en) * | 1969-06-17 | 1972-04-25 | Texaco Inc | Selected adsorption with a silanized crystalline alumino-silicate |
US3982912A (en) * | 1971-03-31 | 1976-09-28 | Yoshifumi Yatsurugi | Method for preparation of an improved K-A type zeolite and for separation by adsorption polar and non-polar molecules |
US3698157A (en) * | 1971-06-01 | 1972-10-17 | Mobil Oil Corp | Separation of mixtures with modified zeolites |
JPS5529987B2 (it) * | 1972-07-13 | 1980-08-07 | ||
JPS5243195B2 (it) * | 1972-07-28 | 1977-10-28 | ||
US4019879A (en) * | 1975-09-26 | 1977-04-26 | Union Carbide Corporation | Selective adsorption of carbon monoxide from gas streams |
US4019880A (en) * | 1975-09-26 | 1977-04-26 | Union Carbide Corporation | Adsorption of carbon monoxide using silver zeolites |
US4257885A (en) * | 1976-02-04 | 1981-03-24 | Union Carbide Corporation | Novel zeolite compositions and processes for preparing and using same |
US4099936A (en) * | 1976-12-16 | 1978-07-11 | Union Carbide Corporation | Process for the purification of silane |
JPS5399071A (en) * | 1977-02-10 | 1978-08-30 | Nec Corp | Removing apparatus of exhaust gas |
IT1088820B (it) * | 1977-12-05 | 1985-06-10 | Smiel Spa | Processo di purificazione di clorosilani impiegabili nella preparazione di silicio per elettronica |
US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
US4309259A (en) * | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
NL8005645A (nl) * | 1980-10-13 | 1982-05-03 | Euratom | Werkwijze voor het omkeerbaar opsluiten van gassen of dampen in een natuurlijk of synthetisch zeoliet. |
DE3139705C2 (de) * | 1981-10-06 | 1983-11-10 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur Aufarbeitung der bei der Siliciumabscheidung und der Siliciumtetrachlorid-Konvertierung anfallenden Restgase |
DE3143993A1 (de) * | 1981-11-05 | 1983-05-11 | Bayer Ag, 5090 Leverkusen | Molekularsieb-zeolith fuer die gewinnung von wasserstoff mit der druckwechsel-adsorptions-technik |
JPS60225638A (ja) * | 1984-04-25 | 1985-11-09 | Nippon Atom Ind Group Co Ltd | ヨウ素吸着剤 |
US4554141A (en) * | 1984-05-14 | 1985-11-19 | Ethyl Corporation | Gas stream purification |
US4557921A (en) * | 1984-06-27 | 1985-12-10 | Ethyl Corporation | Purification of halide |
JPS61242901A (ja) * | 1985-04-17 | 1986-10-29 | Toyo Soda Mfg Co Ltd | 臭素回収用吸着剤及び臭素回収方法 |
US4663052A (en) * | 1985-12-12 | 1987-05-05 | Union Carbide Corporation | Drying process using chabazite-type adsorbents |
US4772296A (en) * | 1987-05-12 | 1988-09-20 | Eagle-Picher Industries, Inc. | Method of purifying and depositing group IIIa and group Va compounds to produce epitaxial films |
US4744221A (en) * | 1987-06-29 | 1988-05-17 | Olin Corporation | Zeolite based arsine storage and delivery system |
-
1988
- 1988-12-22 DE DE3843313A patent/DE3843313A1/de not_active Withdrawn
-
1989
- 1989-11-10 JP JP1291434A patent/JPH02184501A/ja active Pending
- 1989-11-24 IT IT04859989A patent/IT1238349B/it active IP Right Grant
-
1990
- 1990-12-20 US US07/631,190 patent/US5051117A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
IT8948599A1 (it) | 1991-05-24 |
DE3843313A1 (de) | 1990-06-28 |
IT1238349B (it) | 1993-07-13 |
US5051117A (en) | 1991-09-24 |
JPH02184501A (ja) | 1990-07-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted |