JPS5399071A - Removing apparatus of exhaust gas - Google Patents

Removing apparatus of exhaust gas

Info

Publication number
JPS5399071A
JPS5399071A JP1437777A JP1437777A JPS5399071A JP S5399071 A JPS5399071 A JP S5399071A JP 1437777 A JP1437777 A JP 1437777A JP 1437777 A JP1437777 A JP 1437777A JP S5399071 A JPS5399071 A JP S5399071A
Authority
JP
Japan
Prior art keywords
exhaust gas
removing apparatus
gas
reacting
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1437777A
Other languages
Japanese (ja)
Inventor
Yukinobu Tanno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP1437777A priority Critical patent/JPS5399071A/en
Publication of JPS5399071A publication Critical patent/JPS5399071A/en
Pending legal-status Critical Current

Links

Landscapes

  • Treating Waste Gases (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE: The above mentioned apparatus, being able to carry out continuous operation without clogging etc. and taken in metal material able to make alloy with Si, reacting with gas, containing Si(compound) in high temperature state.
COPYRIGHT: (C)1978,JPO&Japio
JP1437777A 1977-02-10 1977-02-10 Removing apparatus of exhaust gas Pending JPS5399071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1437777A JPS5399071A (en) 1977-02-10 1977-02-10 Removing apparatus of exhaust gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1437777A JPS5399071A (en) 1977-02-10 1977-02-10 Removing apparatus of exhaust gas

Publications (1)

Publication Number Publication Date
JPS5399071A true JPS5399071A (en) 1978-08-30

Family

ID=11859348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1437777A Pending JPS5399071A (en) 1977-02-10 1977-02-10 Removing apparatus of exhaust gas

Country Status (1)

Country Link
JP (1) JPS5399071A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173826A (en) * 1982-04-05 1983-10-12 Hitachi Ltd Manufacturing device for semiconductor
JPS60175522A (en) * 1984-02-23 1985-09-09 World Giken:Kk Composition for treating waste gas during semiconductor manufacturing process
US5051117A (en) * 1988-12-22 1991-09-24 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds
JPH04176118A (en) * 1990-11-08 1992-06-23 Nec Kyushu Ltd Low pressure cvd device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173826A (en) * 1982-04-05 1983-10-12 Hitachi Ltd Manufacturing device for semiconductor
JPS60175522A (en) * 1984-02-23 1985-09-09 World Giken:Kk Composition for treating waste gas during semiconductor manufacturing process
JPS6331252B2 (en) * 1984-02-23 1988-06-23 Waarudo Giken Kk
US5051117A (en) * 1988-12-22 1991-09-24 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds
JPH04176118A (en) * 1990-11-08 1992-06-23 Nec Kyushu Ltd Low pressure cvd device

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