JPS5399071A - Removing apparatus of exhaust gas - Google Patents
Removing apparatus of exhaust gasInfo
- Publication number
- JPS5399071A JPS5399071A JP1437777A JP1437777A JPS5399071A JP S5399071 A JPS5399071 A JP S5399071A JP 1437777 A JP1437777 A JP 1437777A JP 1437777 A JP1437777 A JP 1437777A JP S5399071 A JPS5399071 A JP S5399071A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust gas
- removing apparatus
- gas
- reacting
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Treating Waste Gases (AREA)
- Silicon Compounds (AREA)
Abstract
PURPOSE: The above mentioned apparatus, being able to carry out continuous operation without clogging etc. and taken in metal material able to make alloy with Si, reacting with gas, containing Si(compound) in high temperature state.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1437777A JPS5399071A (en) | 1977-02-10 | 1977-02-10 | Removing apparatus of exhaust gas |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1437777A JPS5399071A (en) | 1977-02-10 | 1977-02-10 | Removing apparatus of exhaust gas |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5399071A true JPS5399071A (en) | 1978-08-30 |
Family
ID=11859348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1437777A Pending JPS5399071A (en) | 1977-02-10 | 1977-02-10 | Removing apparatus of exhaust gas |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5399071A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58173826A (en) * | 1982-04-05 | 1983-10-12 | Hitachi Ltd | Manufacturing device for semiconductor |
JPS60175522A (en) * | 1984-02-23 | 1985-09-09 | World Giken:Kk | Composition for treating waste gas during semiconductor manufacturing process |
US5051117A (en) * | 1988-12-22 | 1991-09-24 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds |
JPH04176118A (en) * | 1990-11-08 | 1992-06-23 | Nec Kyushu Ltd | Low pressure cvd device |
-
1977
- 1977-02-10 JP JP1437777A patent/JPS5399071A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58173826A (en) * | 1982-04-05 | 1983-10-12 | Hitachi Ltd | Manufacturing device for semiconductor |
JPS60175522A (en) * | 1984-02-23 | 1985-09-09 | World Giken:Kk | Composition for treating waste gas during semiconductor manufacturing process |
JPS6331252B2 (en) * | 1984-02-23 | 1988-06-23 | Waarudo Giken Kk | |
US5051117A (en) * | 1988-12-22 | 1991-09-24 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds |
JPH04176118A (en) * | 1990-11-08 | 1992-06-23 | Nec Kyushu Ltd | Low pressure cvd device |
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