JPH04176118A - Low pressure cvd device - Google Patents
Low pressure cvd deviceInfo
- Publication number
- JPH04176118A JPH04176118A JP30348390A JP30348390A JPH04176118A JP H04176118 A JPH04176118 A JP H04176118A JP 30348390 A JP30348390 A JP 30348390A JP 30348390 A JP30348390 A JP 30348390A JP H04176118 A JPH04176118 A JP H04176118A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum pump
- cooling
- reactive product
- exhaust
- exhaust line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004518 low pressure chemical vapour deposition Methods 0.000 title claims description 6
- 238000001816 cooling Methods 0.000 claims abstract description 22
- 239000007795 chemical reaction product Substances 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 239000010453 quartz Substances 0.000 abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 230000008878 coupling Effects 0.000 abstract description 3
- 238000010168 coupling process Methods 0.000 abstract description 3
- 238000005859 coupling reaction Methods 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 230000006866 deterioration Effects 0.000 abstract description 2
- 239000003507 refrigerant Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000001556 precipitation Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は減圧ＣＶＤ装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a low pressure CVD apparatus.
従来の減圧ＣＶＤ装置は、石英管の反応炉と金属製排気
ラインを介して真空ポンプが接続されており、未反応ガ
スや反応生成物を真空ポンプによリダクｌ〜に排気する
構造になっていた。Conventional low-pressure CVD equipment has a structure in which a quartz tube reactor is connected to a vacuum pump via a metal exhaust line, and unreacted gases and reaction products are exhausted by the vacuum pump to a reduced pressure. Ta.
この従来の減圧ＣＶＤ装置は、反応生成物や未反応ガス
を、直接真空ポンプで排気しているので、真空ポンプの
腐食、オイル劣化、真空ポンプ過負荷による停止１又は
排気能力低下というような問題点があった。Since this conventional low-pressure CVD equipment directly exhausts reaction products and unreacted gases using a vacuum pump, problems such as corrosion of the vacuum pump, oil deterioration, and stoppage due to vacuum pump overload or reduction in exhaust capacity occur. There was a point.
本発明の減圧ＣＶＤ装置は、反応炉と、この反応炉に接
続する真空ポンプとを有する減圧ＣＶＤ装置において、
前期反応炉と真空ポンプとを接続する排気ラインに反応
生成物を付着させるための冷却手段を設けたものである
。The reduced pressure CVD apparatus of the present invention includes a reaction furnace and a vacuum pump connected to the reaction furnace.
A cooling means for depositing reaction products is provided in the exhaust line connecting the first reactor and the vacuum pump.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第１図は本発明の第１の実施例の断面図である。FIG. 1 is a sectional view of a first embodiment of the invention.
第１図において、石英反応管１はメインバルブ４を介し
てブースターポンプ５及び真空ポンプ６に接続されてい
る。そして特にその排気ラインの途中にはコネクター２
Ｂに接続されたコイル状の冷却管３を内蔵した冷却槽２
がカップリング２Ａにより接続されている。In FIG. 1, a quartz reaction tube 1 is connected to a booster pump 5 and a vacuum pump 6 via a main valve 4. And especially in the middle of that exhaust line is connector 2.
Cooling tank 2 with built-in coiled cooling pipe 3 connected to B
are connected by a coupling 2A.
このように構成された第１の実施例によれば、冷却管３
に水等の冷媒を流す事により、冷却槽２を通る高温の反
応生成物が急激に冷却されて、冷却管３の表面及び冷却
槽２の内壁に凝固して付着する。そして、反応生成物が
除去されたガスは、ブースターポンプ５と真空ポンプ６
を通り、排気ダクトへ１非出される。このなめ真空ポン
プ６の腐食等の問題はなくなる。According to the first embodiment configured in this way, the cooling pipe 3
By flowing a refrigerant such as water, the high temperature reaction products passing through the cooling tank 2 are rapidly cooled and solidify and adhere to the surface of the cooling pipe 3 and the inner wall of the cooling tank 2. The gas from which the reaction products have been removed is then transferred to the booster pump 5 and the vacuum pump 6.
through the exhaust duct. This eliminates problems such as corrosion of the vacuum pump 6.
第２図は本発明の第２の実施例の断面図である。FIG. 2 is a sectional view of a second embodiment of the invention.
水弟２の実施例では冷却槽２内に網状の冷却管３Ａを設
けたものである。冷却管を網状として排気ガスＥの接触
面積を増加させることにより、冷却効率が高くなり、反
応生成物の除去率もあがるという利点がある。In the embodiment of the water tank 2, a net-shaped cooling pipe 3A is provided inside the cooling tank 2. By making the cooling pipe into a net shape to increase the contact area of the exhaust gas E, there is an advantage that the cooling efficiency is increased and the removal rate of reaction products is also increased.
以上説明したように本発明は、排気ラインに反応生成物
を付着させるための冷却手段を設けることにより、真空
ポンプのオイル中への反応生成物の混入沈澱を防止し、
真空ポンプの負荷を低減して真空ポンプの停止、排気能
力の低下をなくすことができるという効果がある。又反
応生成物の付着による真空排気系配管のつまり、ポンプ
排気側の配管壁に反応生成物付着による背圧増加を防止
し、真空ポンプの故障を低減できる効果もある。As explained above, the present invention prevents the reaction products from mixing and precipitating in the oil of the vacuum pump by providing a cooling means for adhering the reaction products to the exhaust line.
This has the effect of reducing the load on the vacuum pump and eliminating the need to stop the vacuum pump and reduce the exhaust capacity. It also has the effect of preventing clogging of the vacuum exhaust system piping due to adhesion of reaction products and increase of back pressure due to adhesion of reaction products to the pipe wall on the pump exhaust side, thereby reducing failure of the vacuum pump.
第１図及び第２図は本発明の第１及び第２の実施例の断
面図である。
１・・・石英反応炉、２・・・冷却層、２Ａ・・カップ
リング、２Ｂ・コネクタ、３，３Ａ・・・冷却管、４・
・メインバルブ、５・・・ブースターポンプ、６・・真
空ポンプ。1 and 2 are cross-sectional views of first and second embodiments of the present invention. DESCRIPTION OF SYMBOLS 1... Quartz reactor, 2... Cooling layer, 2A... Coupling, 2B... Connector, 3, 3A... Cooling pipe, 4...
・Main valve, 5... Booster pump, 6... Vacuum pump.
Claims (1)
る減圧ＣＶＤ装置において、前期反応炉と真空ポンプと
を接続する排気ラインに反応生成物を付着させるための
冷却手段を設けたことを特徴とする減圧ＣＶＤ装置。A low-pressure CVD apparatus having a reactor and a vacuum pump connected to the reactor, characterized in that a cooling means for depositing reaction products is provided in the exhaust line connecting the first reactor and the vacuum pump. Low pressure CVD equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2303483A JP2641980B2 (en) | 1990-11-08 | 1990-11-08 | Low pressure CVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2303483A JP2641980B2 (en) | 1990-11-08 | 1990-11-08 | Low pressure CVD equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04176118A true JPH04176118A (en) | 1992-06-23 |
| JP2641980B2 JP2641980B2 (en) | 1997-08-20 |
Family
ID=17921496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2303483A Expired - Lifetime JP2641980B2 (en) | 1990-11-08 | 1990-11-08 | Low pressure CVD equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2641980B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113683136A (en) * | 2021-09-02 | 2021-11-23 | 上海泓济环保科技股份有限公司 | Heat exchange solidification separation switchable regeneration organic wastewater separation device and use method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5399071A (en) * | 1977-02-10 | 1978-08-30 | Nec Corp | Removing apparatus of exhaust gas |
| JPS62149841U (en) * | 1986-03-17 | 1987-09-22 | ||
| JPS6475031A (en) * | 1987-09-16 | 1989-03-20 | Hitachi Ltd | Evacuation apparatus |
| JPH0259002A (en) * | 1988-08-26 | 1990-02-28 | Tel Sagami Ltd | Trap device |
-
1990
- 1990-11-08 JP JP2303483A patent/JP2641980B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5399071A (en) * | 1977-02-10 | 1978-08-30 | Nec Corp | Removing apparatus of exhaust gas |
| JPS62149841U (en) * | 1986-03-17 | 1987-09-22 | ||
| JPS6475031A (en) * | 1987-09-16 | 1989-03-20 | Hitachi Ltd | Evacuation apparatus |
| JPH0259002A (en) * | 1988-08-26 | 1990-02-28 | Tel Sagami Ltd | Trap device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113683136A (en) * | 2021-09-02 | 2021-11-23 | 上海泓济环保科技股份有限公司 | Heat exchange solidification separation switchable regeneration organic wastewater separation device and use method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2641980B2 (en) | 1997-08-20 |
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