IT1227653B - Deposizione chimica da vapori mediante laser usante erogazione di fascio ottico attraverso fibre - Google Patents

Deposizione chimica da vapori mediante laser usante erogazione di fascio ottico attraverso fibre

Info

Publication number
IT1227653B
IT1227653B IT8822803A IT2280388A IT1227653B IT 1227653 B IT1227653 B IT 1227653B IT 8822803 A IT8822803 A IT 8822803A IT 2280388 A IT2280388 A IT 2280388A IT 1227653 B IT1227653 B IT 1227653B
Authority
IT
Italy
Prior art keywords
dispensing
fibers
laser
optical beam
chemical deposition
Prior art date
Application number
IT8822803A
Other languages
English (en)
Italian (it)
Other versions
IT8822803A0 (it
Inventor
Shashikant Chande Tushar
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of IT8822803A0 publication Critical patent/IT8822803A0/it
Application granted granted Critical
Publication of IT1227653B publication Critical patent/IT1227653B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IT8822803A 1987-11-30 1988-11-30 Deposizione chimica da vapori mediante laser usante erogazione di fascio ottico attraverso fibre IT1227653B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12698887A 1987-11-30 1987-11-30

Publications (2)

Publication Number Publication Date
IT8822803A0 IT8822803A0 (it) 1988-11-30
IT1227653B true IT1227653B (it) 1991-04-23

Family

ID=22427741

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8822803A IT1227653B (it) 1987-11-30 1988-11-30 Deposizione chimica da vapori mediante laser usante erogazione di fascio ottico attraverso fibre

Country Status (5)

Country Link
JP (1) JPH01212770A (ja)
DE (1) DE3840042A1 (ja)
FR (1) FR2623820A1 (ja)
GB (1) GB2212819A (ja)
IT (1) IT1227653B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3926023A1 (de) * 1988-09-06 1990-03-15 Schott Glaswerke Cvd-beschichtungsverfahren zur herstellung von schichten und vorrichtung zur durchfuehrung des verfahrens
US5097793A (en) * 1989-05-11 1992-03-24 Mitsubishi Denki Kabushiki Kaisha Thin film vacuum evaporation device
HU203585B (en) * 1989-08-07 1991-08-28 Mta Koezponti Fiz Kutato Intez Process for laser-activated chemical gas-phase precipitation on carier
GB2250751B (en) * 1990-08-24 1995-04-12 Kawasaki Heavy Ind Ltd Process for the production of dielectric thin films
FR2685127B1 (fr) * 1991-12-13 1994-02-04 Christian Licoppe Photonanographe a gaz pour la fabrication et l'analyse optique de motifs a l'echelle nanometrique.
FR2709763B1 (fr) * 1993-09-08 1995-10-13 Commissariat Energie Atomique Dispositif de traitement d'un matériau, à tête photo-ionique miniaturisée.
JP3268443B2 (ja) * 1998-09-11 2002-03-25 科学技術振興事業団 レーザ加熱装置
JP4274409B2 (ja) * 2002-09-30 2009-06-10 富士フイルム株式会社 レーザ装置
KR20080103567A (ko) * 2006-02-17 2008-11-27 코넬 리서치 파운데이션 인코포레이티드 막 성장 중의 특성 변경
JP6212543B2 (ja) * 2012-04-23 2017-10-11 ローレンス リバモア ナショナル セキュリティー， エルエルシー 局在的大気レーザー化学蒸着
US10179948B2 (en) 2014-04-24 2019-01-15 United Technologies Corporation Method and system for controlling coating in non-line-of-sight locations
US10865477B2 (en) * 2016-02-08 2020-12-15 Illinois Tool Works Inc. Method and system for the localized deposit of metal on a surface

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676586A (en) * 1982-12-20 1987-06-30 General Electric Company Apparatus and method for performing laser material processing through a fiber optic
DE3300449A1 (de) * 1983-01-08 1984-07-12 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur herstellung einer elektrode fuer eine hochdruckgasentladungslampe
FR2548218B1 (fr) * 1983-06-29 1987-03-06 Pauleau Yves Procede de depot de couches minces par reaction chimique en phase gazeuse utilisant deux rayonnements differents
JPS6066896A (ja) * 1983-09-16 1985-04-17 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 基体に金属銅を付着するための方法
CA1245726A (en) * 1984-01-19 1988-11-29 Francis A. L'esperance Laser incisional device
US4581248A (en) * 1984-03-07 1986-04-08 Roche Gregory A Apparatus and method for laser-induced chemical vapor deposition
GB2155357B (en) * 1984-03-10 1987-09-09 Standard Telephones Cables Ltd Optical fibres
JPS60260125A (ja) * 1984-06-06 1985-12-23 Hitachi Ltd 半導体基板の選択的加工方法
US4681396A (en) * 1984-10-09 1987-07-21 General Electric Company High power laser energy delivery system
US4782787A (en) * 1986-01-08 1988-11-08 Roche Gregory A Apparatus for laser-induced chemical vapor deposition
GB2185494B (en) * 1986-01-18 1989-11-15 Stc Plc Vapour phase deposition process
US4748045A (en) * 1986-04-09 1988-05-31 Massachusetts Institute Of Technology Method and apparatus for photodeposition of films on surfaces

Also Published As

Publication number Publication date
GB8827836D0 (en) 1988-12-29
JPH01212770A (ja) 1989-08-25
GB2212819A (en) 1989-08-02
FR2623820A1 (fr) 1989-06-02
IT8822803A0 (it) 1988-11-30
DE3840042A1 (de) 1989-06-08

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