IT1220053B - Porcedimento per far crescere cristalli a nastri dendritici di silicio - Google Patents

Porcedimento per far crescere cristalli a nastri dendritici di silicio

Info

Publication number
IT1220053B
IT1220053B IT41733/87A IT4173387A IT1220053B IT 1220053 B IT1220053 B IT 1220053B IT 41733/87 A IT41733/87 A IT 41733/87A IT 4173387 A IT4173387 A IT 4173387A IT 1220053 B IT1220053 B IT 1220053B
Authority
IT
Italy
Prior art keywords
concession
tapes
grow crystals
silicon dendritic
dendritic
Prior art date
Application number
IT41733/87A
Other languages
English (en)
Other versions
IT8741733A0 (it
Inventor
Donovan Leigh Barrett
Richard Noel Thomas
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of IT8741733A0 publication Critical patent/IT8741733A0/it
Application granted granted Critical
Publication of IT1220053B publication Critical patent/IT1220053B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14Heating of the melt or the crystallised materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/30Mechanisms for rotating or moving either the melt or the crystal
    • C30B15/305Stirring of the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IT41733/87A 1986-12-09 1987-12-02 Porcedimento per far crescere cristalli a nastri dendritici di silicio IT1220053B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93983786A 1986-12-09 1986-12-09

Publications (2)

Publication Number Publication Date
IT8741733A0 IT8741733A0 (it) 1987-12-02
IT1220053B true IT1220053B (it) 1990-06-06

Family

ID=25473822

Family Applications (1)

Application Number Title Priority Date Filing Date
IT41733/87A IT1220053B (it) 1986-12-09 1987-12-02 Porcedimento per far crescere cristalli a nastri dendritici di silicio

Country Status (5)

Country Link
JP (1) JPS63185887A (it)
KR (1) KR960006261B1 (it)
AU (1) AU8110187A (it)
GB (1) GB2198966A (it)
IT (1) IT1220053B (it)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3598634B2 (ja) * 1996-01-30 2004-12-08 信越半導体株式会社 シリコン単結晶の製造方法
US6402839B1 (en) * 1998-08-14 2002-06-11 Ebara Solar, Inc. System for stabilizing dendritic web crystal growth
US6395085B2 (en) 1999-07-14 2002-05-28 Seh America, Inc. Purity silicon wafer for use in advanced semiconductor devices
US6454852B2 (en) 1999-07-14 2002-09-24 Seh America, Inc. High efficiency silicon wafer optimized for advanced semiconductor devices
US6632277B2 (en) 1999-07-14 2003-10-14 Seh America, Inc. Optimized silicon wafer gettering for advanced semiconductor devices
US6228165B1 (en) 1999-07-28 2001-05-08 Seh America, Inc. Method of manufacturing crystal of silicon using an electric potential
US6482261B2 (en) * 2000-12-29 2002-11-19 Ebara Solar, Inc. Magnetic field furnace

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5777094A (en) * 1980-10-28 1982-05-14 Nippon Telegr & Teleph Corp <Ntt> Manufacture of platelike crystal
JPS5815099A (ja) * 1981-07-14 1983-01-28 Nippon Denso Co Ltd リボン結晶成長装置
JPS5850951A (ja) * 1981-09-22 1983-03-25 セイコーエプソン株式会社 歯列矯正用ブラケツト
IN161924B (it) * 1984-10-29 1988-02-27 Westinghouse Electric Corp

Also Published As

Publication number Publication date
AU8110187A (en) 1988-06-09
GB8725963D0 (en) 1987-12-09
KR880008466A (ko) 1988-08-31
GB2198966A (en) 1988-06-29
IT8741733A0 (it) 1987-12-02
KR960006261B1 (ko) 1996-05-13
JPS63185887A (ja) 1988-08-01

Similar Documents

Publication Publication Date Title
IT1187888B (it) Dispositivo per regolare l inclinazione di una tastiera
GB8626074D0 (en) Silicon monocrystal substrate
EP0215462A3 (en) Paste for bonding semi-conductors to ceramic underlayers
KR890013228A (ko) 반도체 결정의 인상 방법
GB8501876D0 (en) Single-crystal semi-conductor devices
IT1220053B (it) Porcedimento per far crescere cristalli a nastri dendritici di silicio
GB8709962D0 (en) Growing single crystals
GB2125705B (en) Growing semiconductor single crystals
IT1200719B (it) Apparacchiatura per la crescita di monocristalli
DE3751982T2 (de) Verankerungsvorrichtung
GB8725962D0 (en) Growing dendritic web crystals
GB8530093D0 (en) Growth of semiconductor crystals
GB8709963D0 (en) Growing single crystals
FR2577928B1 (fr) Analogues d&#39;amino-prostaglandines a substituant thiabicycloheptane
GB2206424B (en) Growth of semiconductor single crystals
GB8717968D0 (en) Growth of compound semiconductor crystal
IT1220634B (it) Apparecchiatura per la crescita di nastri di cristalli dendritici di silicio
BR8705635A (pt) Suporte ortodontico
IT1213495B (it) Processo per la preparazione dell&#39;alfa-n-[(ipoxatin-9-il)pentilossicarbonil-]arginina
ES2025084B3 (es) Colocacion para transportar un disco de diagrama
IT1226404B (it) Metodo per accrescere un cristallo di silicio di struttura dendritica.
IT1175935B (it) Dispositivo per coltivare un monocristallo da un crogiuolo
ES2006697B3 (es) Modificaciones en un dispositivo de cizallado de cintas de tejido
IT8768101A0 (it) Nastro per chiusure lampo
KR910000117B1 (en) Semiconductor device having recess pole structure