IT1197434B - Procedimento per regolare impurezze metalliche nella placcatura anelettrolitica di rame - Google Patents

Procedimento per regolare impurezze metalliche nella placcatura anelettrolitica di rame

Info

Publication number
IT1197434B
IT1197434B IT49324/82A IT4932482A IT1197434B IT 1197434 B IT1197434 B IT 1197434B IT 49324/82 A IT49324/82 A IT 49324/82A IT 4932482 A IT4932482 A IT 4932482A IT 1197434 B IT1197434 B IT 1197434B
Authority
IT
Italy
Prior art keywords
anelectrolytic
plating
copper
procedure
metallic impurities
Prior art date
Application number
IT49324/82A
Other languages
English (en)
Other versions
IT8249324A0 (it
Inventor
Donald Alan Arcilesi
Original Assignee
Occidental Chem Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Occidental Chem Co filed Critical Occidental Chem Co
Publication of IT8249324A0 publication Critical patent/IT8249324A0/it
Application granted granted Critical
Publication of IT1197434B publication Critical patent/IT1197434B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
IT49324/82A 1981-10-23 1982-10-21 Procedimento per regolare impurezze metalliche nella placcatura anelettrolitica di rame IT1197434B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31428081A 1981-10-23 1981-10-23

Publications (2)

Publication Number Publication Date
IT8249324A0 IT8249324A0 (it) 1982-10-21
IT1197434B true IT1197434B (it) 1988-11-30

Family

ID=23219330

Family Applications (1)

Application Number Title Priority Date Filing Date
IT49324/82A IT1197434B (it) 1981-10-23 1982-10-21 Procedimento per regolare impurezze metalliche nella placcatura anelettrolitica di rame

Country Status (7)

Country Link
AU (1) AU544591B2 (it)
BE (1) BE894789A (it)
CA (1) CA1184359A (it)
DE (1) DE3238921C2 (it)
GB (1) GB2109013A (it)
IT (1) IT1197434B (it)
SE (1) SE8205982L (it)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3404270A1 (de) * 1984-02-04 1985-08-08 Schering AG, 1000 Berlin und 4709 Bergkamen Waessriges alkalisches bad zur chemischen abscheidung von kupfer, nickel, kobalt und deren legierungen
DE3504150A1 (de) * 1984-02-17 1985-10-17 Omi International Corp. (eine Gesellschaft n.d.Ges.d. Staates Delaware), Warren, Mich. Waessriges alkalisches bad zur stromlosen verkupferung und ein verfahren zur stromlosen verkupferung unter verwendung dieses bades
DE3806306A1 (de) * 1988-02-27 1989-09-07 Basf Ag Verwendung von polyacetalen als komplexbildner zur chemischen abscheidung von kupfer und verfahren zur chemischen abscheidung von kupfer
US6331239B1 (en) 1997-04-07 2001-12-18 Okuno Chemical Industries Co., Ltd. Method of electroplating non-conductive plastic molded products
EP2937447B1 (en) 2012-12-21 2018-10-10 Okuno Chemical Industries Co., Ltd. Conductive coating film forming bath
WO2015111291A1 (ja) 2014-01-27 2015-07-30 奥野製薬工業株式会社 導電性皮膜形成浴
CN105132973A (zh) * 2015-09-22 2015-12-09 太原工业学院 一种环保型无氰电镀铜锌合金溶液及其电镀铜锌合金工艺

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3383224A (en) * 1965-11-09 1968-05-14 Shipley Co Electroless copper deposition
US3329512A (en) * 1966-04-04 1967-07-04 Shipley Co Chemical deposition of copper and solutions therefor
BE757573A (fr) * 1969-10-16 1971-04-15 Philips Nv Depot sans courant de cuivre flexible
US3650777A (en) * 1971-02-11 1972-03-21 Kollmorgen Corp Electroless copper plating

Also Published As

Publication number Publication date
CA1184359A (en) 1985-03-26
SE8205982D0 (sv) 1982-10-21
DE3238921A1 (de) 1983-05-05
AU8915282A (en) 1983-04-28
SE8205982L (sv) 1983-04-24
BE894789A (fr) 1983-04-22
AU544591B2 (en) 1985-06-06
GB2109013A (en) 1983-05-25
IT8249324A0 (it) 1982-10-21
DE3238921C2 (de) 1985-06-13

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