IT1175016B - Supporto fotografico antistatico metodo per prepararlo ed elemento fotografico che comprende detto supporto - Google Patents

Supporto fotografico antistatico metodo per prepararlo ed elemento fotografico che comprende detto supporto

Info

Publication number
IT1175016B
IT1175016B IT65210/83A IT6521083A IT1175016B IT 1175016 B IT1175016 B IT 1175016B IT 65210/83 A IT65210/83 A IT 65210/83A IT 6521083 A IT6521083 A IT 6521083A IT 1175016 B IT1175016 B IT 1175016B
Authority
IT
Italy
Prior art keywords
support
photographic
prepare
antistatic
support method
Prior art date
Application number
IT65210/83A
Other languages
English (en)
Other versions
IT8365210A0 (it
Inventor
Alberto Valsecchi
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of IT8365210A0 publication Critical patent/IT8365210A0/it
Priority to IT65210/83A priority Critical patent/IT1175016B/it
Priority to EP84105635A priority patent/EP0127820B1/en
Priority to DE8484105635T priority patent/DE3479247D1/de
Priority to CA000456025A priority patent/CA1246381A/en
Priority to MX201562A priority patent/MX158976A/es
Priority to AU29128/84A priority patent/AU566937B2/en
Priority to BR8402726A priority patent/BR8402726A/pt
Priority to JP59117433A priority patent/JPH0660993B2/ja
Priority to AR84296863A priority patent/AR242453A1/es
Priority to US06/618,876 priority patent/US4582782A/en
Application granted granted Critical
Publication of IT1175016B publication Critical patent/IT1175016B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/89—Macromolecular substances therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31971—Of carbohydrate

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
IT65210/83A 1983-06-07 1983-06-07 Supporto fotografico antistatico metodo per prepararlo ed elemento fotografico che comprende detto supporto IT1175016B (it)

Priority Applications (10)

Application Number Priority Date Filing Date Title
IT65210/83A IT1175016B (it) 1983-06-07 1983-06-07 Supporto fotografico antistatico metodo per prepararlo ed elemento fotografico che comprende detto supporto
EP84105635A EP0127820B1 (en) 1983-06-07 1984-05-17 Antistatic photographic base, method for preparing it and photographic element comprising said base
DE8484105635T DE3479247D1 (en) 1983-06-07 1984-05-17 Antistatic photographic base, method for preparing it and photographic element comprising said base
MX201562A MX158976A (es) 1983-06-07 1984-06-06 Elemento fotografico antiestatico
CA000456025A CA1246381A (en) 1983-06-07 1984-06-06 Antistatic photographic base, method for preparing it and photographic element comprising said base
AU29128/84A AU566937B2 (en) 1983-06-07 1984-06-06 Antistatic photographic base
BR8402726A BR8402726A (pt) 1983-06-07 1984-06-06 Base fotografica,elemento fotografico e metodo para formacao de uma camada antiestatica para um elemento fotografico
JP59117433A JPH0660993B2 (ja) 1983-06-07 1984-06-07 帯電防止写真ベ−ス
AR84296863A AR242453A1 (es) 1983-06-07 1984-06-07 Base fotografica antiestatica, procedimiento para su preparacion y elemento fotografico que comprende a dicha base.
US06/618,876 US4582782A (en) 1983-06-07 1984-06-08 Antistatic photographic multi-layer base having a hydrophilic and hydrophoetic layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT65210/83A IT1175016B (it) 1983-06-07 1983-06-07 Supporto fotografico antistatico metodo per prepararlo ed elemento fotografico che comprende detto supporto

Publications (2)

Publication Number Publication Date
IT8365210A0 IT8365210A0 (it) 1983-06-07
IT1175016B true IT1175016B (it) 1987-07-01

Family

ID=11297731

Family Applications (1)

Application Number Title Priority Date Filing Date
IT65210/83A IT1175016B (it) 1983-06-07 1983-06-07 Supporto fotografico antistatico metodo per prepararlo ed elemento fotografico che comprende detto supporto

Country Status (10)

Country Link
US (1) US4582782A (it)
EP (1) EP0127820B1 (it)
JP (1) JPH0660993B2 (it)
AR (1) AR242453A1 (it)
AU (1) AU566937B2 (it)
BR (1) BR8402726A (it)
CA (1) CA1246381A (it)
DE (1) DE3479247D1 (it)
IT (1) IT1175016B (it)
MX (1) MX158976A (it)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4585730A (en) * 1985-01-16 1986-04-29 E. I. Du Pont De Nemours And Company Antistatic backing layer with auxiliary layer for a silver halide element
DE3542233A1 (de) * 1985-11-29 1987-06-04 Agfa Gevaert Ag Waessriges bad und verfahren zur verbesserung der eigenschaften fotografischer aufzeichnungsmaterialien
US4863801A (en) * 1987-11-20 1989-09-05 Minnesota Mining And Manufacturing Company Surface treatment of pet film
US4886739A (en) * 1988-08-10 1989-12-12 Eastman Kodak Company Thermally processable imaging element and process
JP2829645B2 (ja) * 1989-10-18 1998-11-25 コニカ株式会社 帯電防止されたハロゲン化銀写真感光材料
JPH03253844A (ja) * 1990-03-02 1991-11-12 Konica Corp ガラス支持体を有するハロゲン化銀写真感光材料
US5126405A (en) * 1990-05-23 1992-06-30 Eastman Kodak Company Cross-linked conductive polymers and antistat coatings employing the same
DE69126859T2 (de) * 1991-03-28 1998-02-12 Agfa Gevaert Nv Aufzeichnungsmaterial mit antistatischen Eigenschaften
DE4211461A1 (de) * 1992-04-06 1993-10-07 Agfa Gevaert Ag Antistatische Kunststoffteile
CA2159199A1 (en) * 1993-04-20 1994-10-27 David R. Boston Photographic elements comprising antistatic layers
US5589324A (en) * 1993-07-13 1996-12-31 International Paper Company Antistatic layer for photographic elements comprising polymerized polyfunctional aziridine monomers
EP0655646A1 (en) * 1993-11-29 1995-05-31 Minnesota Mining And Manufacturing Company Radiographic material with improved antistatic properties
US5447832A (en) * 1994-03-31 1995-09-05 Eastman Kodak Company Imaging element
NL1007190C2 (nl) * 1997-10-01 1999-04-07 Saehan Ind Inc Werkwijze voor het vervaardigen van fotografische film Werkwijze voor het vervaardigen van fotografische film met uitstekend antistatisch vermogen.

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3525621A (en) * 1968-02-12 1970-08-25 Eastman Kodak Co Antistatic photographic elements
US3856530A (en) * 1969-10-29 1974-12-24 Agfa Gevaert Photographic polyester film material comprising antistatic layer
US3786902A (en) * 1972-05-08 1974-01-22 Knickerbocker Co Load-lifting mechanism for a lift truck
US4089997A (en) * 1974-05-14 1978-05-16 Agfa-Gevaert N.V. Process of applying antistatic coating compositions to polyester films
JPS5748405Y2 (it) * 1974-07-16 1982-10-23
US4293606A (en) * 1978-03-13 1981-10-06 Minnesota Mining And Manufacturing Company Low friction, abrasion resistant coating for transparent film
JPS55140834A (en) * 1979-04-19 1980-11-04 Konishiroku Photo Ind Co Ltd Photographic material having antistatic layer
JPS5862045A (ja) * 1981-10-09 1983-04-13 富士写真フイルム株式会社 帯電防止されたプラスチツクフイルム

Also Published As

Publication number Publication date
EP0127820B1 (en) 1989-08-02
JPH0660993B2 (ja) 1994-08-10
EP0127820A3 (en) 1987-09-30
BR8402726A (pt) 1985-05-14
MX158976A (es) 1989-04-04
EP0127820A2 (en) 1984-12-12
DE3479247D1 (en) 1989-09-07
CA1246381A (en) 1988-12-13
IT8365210A0 (it) 1983-06-07
JPS6017741A (ja) 1985-01-29
AU566937B2 (en) 1987-11-05
AR242453A1 (es) 1993-03-31
AU2912884A (en) 1984-12-13
US4582782A (en) 1986-04-15

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940627