IT1142150B - Procedimento di deposizione di vapori di h3 po4 e di formazione di un sottile strato di fosforo su substrati si silicio - Google Patents

Procedimento di deposizione di vapori di h3 po4 e di formazione di un sottile strato di fosforo su substrati si silicio

Info

Publication number
IT1142150B
IT1142150B IT25705/81A IT2570581A IT1142150B IT 1142150 B IT1142150 B IT 1142150B IT 25705/81 A IT25705/81 A IT 25705/81A IT 2570581 A IT2570581 A IT 2570581A IT 1142150 B IT1142150 B IT 1142150B
Authority
IT
Italy
Prior art keywords
vapors
phosphorus
deposition
procedure
formation
Prior art date
Application number
IT25705/81A
Other languages
English (en)
Italian (it)
Other versions
IT8125705A0 (it
Inventor
Timothy D Koval
Original Assignee
Solarex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solarex Corp filed Critical Solarex Corp
Publication of IT8125705A0 publication Critical patent/IT8125705A0/it
Application granted granted Critical
Publication of IT1142150B publication Critical patent/IT1142150B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H01L21/02129—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/02—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
IT25705/81A 1980-12-18 1981-12-18 Procedimento di deposizione di vapori di h3 po4 e di formazione di un sottile strato di fosforo su substrati si silicio IT1142150B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/217,742 US4360393A (en) 1980-12-18 1980-12-18 Vapor deposition of H3 PO4 and formation of thin phosphorus layer on silicon substrates

Publications (2)

Publication Number Publication Date
IT8125705A0 IT8125705A0 (it) 1981-12-18
IT1142150B true IT1142150B (it) 1986-10-08

Family

ID=22812324

Family Applications (1)

Application Number Title Priority Date Filing Date
IT25705/81A IT1142150B (it) 1980-12-18 1981-12-18 Procedimento di deposizione di vapori di h3 po4 e di formazione di un sottile strato di fosforo su substrati si silicio

Country Status (7)

Country Link
US (1) US4360393A (OSRAM)
BE (1) BE891509A (OSRAM)
ES (1) ES8303819A1 (OSRAM)
FR (1) FR2496704A1 (OSRAM)
GB (1) GB2091709B (OSRAM)
IT (1) IT1142150B (OSRAM)
NL (1) NL8105737A (OSRAM)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60153119A (ja) * 1984-01-20 1985-08-12 Fuji Electric Corp Res & Dev Ltd 不純物拡散方法
AU644025B2 (en) * 1990-10-24 1993-12-02 Schott Solar, Inc. Method and apparatus for forming diffusion junctions in solar cell substrates
US5270248A (en) * 1992-08-07 1993-12-14 Mobil Solar Energy Corporation Method for forming diffusion junctions in solar cell substrates
JPH08153784A (ja) * 1994-11-28 1996-06-11 Nec Corp 半導体装置の製造方法
US6143633A (en) * 1995-10-05 2000-11-07 Ebara Solar, Inc. In-situ diffusion of dopant impurities during dendritic web growth of crystal ribbon
US7790574B2 (en) 2004-12-20 2010-09-07 Georgia Tech Research Corporation Boron diffusion in silicon devices
DE102005019686B3 (de) * 2005-04-22 2006-04-13 Schmid Technology Systems Gmbh Einrichtung und Verfahren zum Aufbringen einer gleichmäßigen, dünnen Flüssigkeitsschicht auf Substrate
US8659668B2 (en) 2005-10-07 2014-02-25 Rearden, Llc Apparatus and method for performing motion capture using a random pattern on capture surfaces
US20080057686A1 (en) * 2006-08-31 2008-03-06 Melgaard Hans L Continuous dopant addition
US10699944B2 (en) 2018-09-28 2020-06-30 Taiwan Semiconductor Manufacturing Company, Ltd. Surface modification layer for conductive feature formation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3173802A (en) * 1961-12-14 1965-03-16 Bell Telephone Labor Inc Process for controlling gas phase composition
GB1037284A (en) * 1963-11-27 1966-07-27 Associated Semiconductor Mft Improvements in and relating to methods of heat treating semiconductor crystal bodies
DE1257989B (de) * 1964-07-09 1968-01-04 Telefunken Patent Verfahren zum Herstellen eines Silizium-Halbleiterkoerpers fuer eine Sonnenzelle
US3486951A (en) * 1967-06-16 1969-12-30 Corning Glass Works Method of manufacturing semiconductor devices
DE2754833A1 (de) * 1977-12-09 1979-06-13 Ibm Deutschland Phosphordiffusionsverfahren fuer halbleiteranwendungen

Also Published As

Publication number Publication date
BE891509A (fr) 1982-06-17
FR2496704B1 (OSRAM) 1984-11-30
NL8105737A (nl) 1982-07-16
GB2091709A (en) 1982-08-04
ES508088A0 (es) 1983-02-01
GB2091709B (en) 1984-12-05
IT8125705A0 (it) 1981-12-18
ES8303819A1 (es) 1983-02-01
FR2496704A1 (fr) 1982-06-25
US4360393A (en) 1982-11-23

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