IT1101162B - Metodo per il controllo ottico delle dimensioni laterali di un disegno in un circuito integrato - Google Patents

Metodo per il controllo ottico delle dimensioni laterali di un disegno in un circuito integrato

Info

Publication number
IT1101162B
IT1101162B IT29828/78A IT2982878A IT1101162B IT 1101162 B IT1101162 B IT 1101162B IT 29828/78 A IT29828/78 A IT 29828/78A IT 2982878 A IT2982878 A IT 2982878A IT 1101162 B IT1101162 B IT 1101162B
Authority
IT
Italy
Prior art keywords
integrated circuit
optical control
side dimensions
dimensions
optical
Prior art date
Application number
IT29828/78A
Other languages
English (en)
Other versions
IT7829828A0 (it
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of IT7829828A0 publication Critical patent/IT7829828A0/it
Application granted granted Critical
Publication of IT1101162B publication Critical patent/IT1101162B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
IT29828/78A 1977-12-19 1978-11-15 Metodo per il controllo ottico delle dimensioni laterali di un disegno in un circuito integrato IT1101162B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/862,190 US4200396A (en) 1977-12-19 1977-12-19 Optically testing the lateral dimensions of a pattern

Publications (2)

Publication Number Publication Date
IT7829828A0 IT7829828A0 (it) 1978-11-15
IT1101162B true IT1101162B (it) 1985-09-28

Family

ID=25337882

Family Applications (1)

Application Number Title Priority Date Filing Date
IT29828/78A IT1101162B (it) 1977-12-19 1978-11-15 Metodo per il controllo ottico delle dimensioni laterali di un disegno in un circuito integrato

Country Status (8)

Country Link
US (1) US4200396A (it)
JP (1) JPS60602B2 (it)
DE (1) DE2853427A1 (it)
IN (1) IN150097B (it)
IT (1) IT1101162B (it)
PL (1) PL123001B1 (it)
SE (1) SE438552B (it)
YU (1) YU41324B (it)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4303341A (en) * 1977-12-19 1981-12-01 Rca Corporation Optically testing the lateral dimensions of a pattern
JPS5587904A (en) * 1978-12-29 1980-07-03 Ibm Scanning type optical apparatus for micromeasurement
US4330213A (en) * 1980-02-14 1982-05-18 Rca Corporation Optical line width measuring apparatus and method
JPS56124003A (en) * 1980-03-06 1981-09-29 Toshiba Corp Measuring device for pattern
US4408884A (en) * 1981-06-29 1983-10-11 Rca Corporation Optical measurements of fine line parameters in integrated circuit processes
JPS6076606A (ja) * 1983-10-03 1985-05-01 Nippon Kogaku Kk <Nikon> マスクの欠陥検査方法
US4806457A (en) * 1986-04-10 1989-02-21 Nec Corporation Method of manufacturing integrated circuit semiconductor device
FR2603379B1 (fr) * 1986-08-26 1988-12-02 Tissier Annie Procede de mesure du fluage d'un materiau et appareil de mise en oeuvre
JPS6426102A (en) * 1988-07-08 1989-01-27 Toshiba Corp Shape measuring instrument
US4964726A (en) * 1988-09-27 1990-10-23 General Electric Company Apparatus and method for optical dimension measurement using interference of scattered electromagnetic energy
DE3926199A1 (de) * 1989-08-08 1991-02-14 Siemens Ag Vorrichtung zur fehlererkennung in komplexen, relativ regelmaessigen strukturen
US5044750A (en) * 1990-08-13 1991-09-03 National Semiconductor Corporation Method for checking lithography critical dimensions
US5337146A (en) * 1992-03-30 1994-08-09 University Of New Orleans Diffraction-grating photopolarimeters and spectrophotopolarimeters
US5361137A (en) * 1992-08-31 1994-11-01 Texas Instruments Incorporated Process control for submicron linewidth measurement
US5666201A (en) * 1992-09-18 1997-09-09 J.A. Woollam Co. Inc. Multiple order dispersive optics system and method of use
US5805285A (en) * 1992-09-18 1998-09-08 J.A. Woollam Co. Inc. Multiple order dispersive optics system and method of use
JPH06296141A (ja) * 1993-03-02 1994-10-21 Murata Mach Ltd キャリア検出装置
DE19713362A1 (de) * 1997-03-29 1998-10-01 Zeiss Carl Jena Gmbh Konfokale mikroskopische Anordnung
US5984493A (en) * 1997-04-14 1999-11-16 Lucent Technologies Inc. Illumination system and method
US6483580B1 (en) * 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US20020030813A1 (en) * 1999-03-29 2002-03-14 Norton Adam E. Spectroscopic measurement system using an off-axis spherical mirror and refractive elements
US6057249A (en) * 1998-04-21 2000-05-02 Vanguard International Semiconductor Corp. Method for improving optical proximity effect in storage node pattern
US6184984B1 (en) 1999-02-09 2001-02-06 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample
US6429943B1 (en) * 2000-03-29 2002-08-06 Therma-Wave, Inc. Critical dimension analysis with simultaneous multiple angle of incidence measurements
US7382447B2 (en) * 2001-06-26 2008-06-03 Kla-Tencor Technologies Corporation Method for determining lithographic focus and exposure
JP4938219B2 (ja) * 2001-12-19 2012-05-23 ケーエルエー−テンカー コーポレイション 光学分光システムを使用するパラメトリック・プロフィーリング
US20030184769A1 (en) * 2002-03-27 2003-10-02 Houge Erik Cho Patterned implant metrology
US7515253B2 (en) 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
DE102011121532A1 (de) * 2010-12-23 2012-06-28 Carl Zeiss Sms Gmbh Verfahren zur Charakterisierung einer Struktur auf einer Maske und Vorrichtung zur Durchführung des Verfahrens
EP3221897A1 (en) * 2014-09-08 2017-09-27 The Research Foundation Of State University Of New York Metallic gratings and measurement methods thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3756695A (en) * 1970-07-14 1973-09-04 Minolta Camera Kk Optical low-pass filter
US3988564A (en) * 1972-07-17 1976-10-26 Hughes Aircraft Company Ion beam micromachining method
US4039370A (en) * 1975-06-23 1977-08-02 Rca Corporation Optically monitoring the undercutting of a layer being etched
US4030835A (en) * 1976-05-28 1977-06-21 Rca Corporation Defect detection system

Also Published As

Publication number Publication date
DE2853427A1 (de) 1979-06-21
DE2853427C2 (it) 1988-06-23
IT7829828A0 (it) 1978-11-15
SE438552B (sv) 1985-04-22
JPS5492286A (en) 1979-07-21
JPS60602B2 (ja) 1985-01-09
PL123001B1 (en) 1982-09-30
PL211454A1 (it) 1980-04-21
YU292878A (en) 1982-06-30
YU41324B (en) 1987-02-28
IN150097B (it) 1982-07-17
US4200396A (en) 1980-04-29
SE7812035L (sv) 1979-06-20

Similar Documents

Publication Publication Date Title
IT1101162B (it) Metodo per il controllo ottico delle dimensioni laterali di un disegno in un circuito integrato
IT7867931A0 (it) Procedimento e dispositivo per la costituzione di un collegamento filettato
IT1100803B (it) Struttura di circuito integrato
IT1139988B (it) Procedimento per la fabbricazione di un dispositivo a circuito integrato
IT1138540B (it) Circuito di selezione di orologio
JPS5394193A (en) Optical electronic semiconductor unit
SE7714269L (sv) Anpassbar korrelator for optisk teckenlesare
ES505077A0 (es) Un dispositivo enfocador optico
DK546480A (da) Afrimningsanordning for et koeleanlaegs fordamper
IT8003599A0 (it) Dispositivo di misura per il controllo dimensionale di un pezzo meccanico.
IT1195063B (it) Dispositivo di riscaldamento
IT8125813A0 (it) Circuito di verifica di tolleranza di impulsi di orologio.
ES492322A0 (es) Un dispositivo de enfoque optico
SE7801993L (sv) Mikrokapslar
IT7822112A0 (it) Metodo per formare un contatto per un circuito integrato.
JPS5316644A (en) Integrated optical device
IT1137923B (it) Dispositivo ottico di focalizzazione
AR215918A1 (es) Circuito integrado
IT1096784B (it) Metodo per la fabbricazione di dispositivi ottici
IT8125474A0 (it) Procedimento per la fabbricazione di un dispositivo a circuito integrato.
IT1169232B (it) Dispositivo di trafilatura
JPS5386199A (en) Device for recognizing plane optically* preferably visually
IT1146027B (it) Circuito di interfaccia di controllo
IT1074343B (it) Apparato di comando microprogrammabile
IT1100271B (it) Circuito integrato