IT1056151B - Perfezionemento nei dispositivi a semicondottore di tipo mos - Google Patents

Perfezionemento nei dispositivi a semicondottore di tipo mos

Info

Publication number
IT1056151B
IT1056151B IT51832/75A IT5183275A IT1056151B IT 1056151 B IT1056151 B IT 1056151B IT 51832/75 A IT51832/75 A IT 51832/75A IT 5183275 A IT5183275 A IT 5183275A IT 1056151 B IT1056151 B IT 1056151B
Authority
IT
Italy
Prior art keywords
improvement
type semiconductor
semiconductor devices
mos type
mos
Prior art date
Application number
IT51832/75A
Other languages
English (en)
Italian (it)
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP49120856A external-priority patent/JPS5146886A/ja
Priority claimed from JP50100846A external-priority patent/JPS5224477A/ja
Priority claimed from JP50106750A external-priority patent/JPS5230183A/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of IT1056151B publication Critical patent/IT1056151B/it

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149Source or drain regions of field-effect devices
    • H10D62/151Source or drain regions of field-effect devices of IGFETs 
    • GPHYSICS
    • G10MUSICAL INSTRUMENTS; ACOUSTICS
    • G10HELECTROPHONIC MUSICAL INSTRUMENTS; INSTRUMENTS IN WHICH THE TONES ARE GENERATED BY ELECTROMECHANICAL MEANS OR ELECTRONIC GENERATORS, OR IN WHICH THE TONES ARE SYNTHESISED FROM A DATA STORE
    • G10H1/00Details of electrophonic musical instruments
    • G10H1/02Means for controlling the tone frequencies, e.g. attack or decay; Means for producing special musical effects, e.g. vibratos or glissandos
    • G10H1/04Means for controlling the tone frequencies, e.g. attack or decay; Means for producing special musical effects, e.g. vibratos or glissandos by additional modulation
    • G10H1/053Means for controlling the tone frequencies, e.g. attack or decay; Means for producing special musical effects, e.g. vibratos or glissandos by additional modulation during execution only
    • G10H1/055Means for controlling the tone frequencies, e.g. attack or decay; Means for producing special musical effects, e.g. vibratos or glissandos by additional modulation during execution only by switches with variable impedance elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126Top-view geometrical layouts of the regions or the junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/221Channel regions of field-effect devices of FETs
    • H10D62/235Channel regions of field-effect devices of FETs of IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/221Channel regions of field-effect devices of FETs
    • H10D62/235Channel regions of field-effect devices of FETs of IGFETs
    • H10D62/299Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/901MOSFET substrate bias

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Multimedia (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
IT51832/75A 1974-10-18 1975-10-17 Perfezionemento nei dispositivi a semicondottore di tipo mos IT1056151B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP49120856A JPS5146886A (en) 1974-10-18 1974-10-18 Kaheninpiidansusoshi
JP50100846A JPS5224477A (en) 1975-08-19 1975-08-19 Variable impedance element
JP50106750A JPS5230183A (en) 1975-09-02 1975-09-02 Mos semiconductor device and process for producing it

Publications (1)

Publication Number Publication Date
IT1056151B true IT1056151B (it) 1982-01-30

Family

ID=27309320

Family Applications (1)

Application Number Title Priority Date Filing Date
IT51832/75A IT1056151B (it) 1974-10-18 1975-10-17 Perfezionemento nei dispositivi a semicondottore di tipo mos

Country Status (5)

Country Link
US (1) US4025940A (online.php)
DE (1) DE2546609C3 (online.php)
FR (1) FR2288397A1 (online.php)
GB (1) GB1527773A (online.php)
IT (1) IT1056151B (online.php)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE32071E (en) * 1977-12-20 1986-01-21 International Business Machines Corporation Resistive gate FET flip-flop storage cell
US4163986A (en) * 1978-05-03 1979-08-07 International Business Machines Corporation Twin channel Lorentz coupled depletion width modulation effect magnetic field sensor
US4173022A (en) * 1978-05-09 1979-10-30 Rca Corp. Integrated gate field effect transistors having closed gate structure with controlled avalanche characteristics
JPS5727070A (en) * 1980-07-25 1982-02-13 Toshiba Corp Mos type semiconductor device
US4546453A (en) * 1982-06-22 1985-10-08 Motorola, Inc. Four-state ROM cell with increased differential between states
DE3235677A1 (de) * 1982-09-27 1984-03-29 Siemens AG, 1000 Berlin und 8000 München Feldeffekttransistor des verarmungstyps und verfahren zu seiner herstellung
JPH0620133B2 (ja) * 1987-05-28 1994-03-16 宮城工業高等専門学校長 Mosfet装置
US5258638A (en) * 1992-08-13 1993-11-02 Xerox Corporation Thermal ink jet power MOS device design/layout
WO2002052653A1 (fr) * 2000-12-25 2002-07-04 Lev Vasilievich Kozhitov Dispositifs semi-conducteurs non planaires munis d'une couche active close cylindrique
RU2175795C1 (ru) * 2000-12-25 2001-11-10 Московский государственный институт стали и сплавов (технологический университет) Полевой транзистор с изолированным затвором

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328601A (en) * 1964-04-06 1967-06-27 Northern Electric Co Distributed field effect devices
US3745426A (en) * 1970-06-01 1973-07-10 Rca Corp Insulated gate field-effect transistor with variable gain
JPS5137151B2 (online.php) * 1971-09-08 1976-10-14

Also Published As

Publication number Publication date
FR2288397A1 (fr) 1976-05-14
DE2546609A1 (de) 1976-04-22
FR2288397B1 (online.php) 1981-06-12
GB1527773A (en) 1978-10-11
DE2546609B2 (de) 1979-05-23
US4025940A (en) 1977-05-24
DE2546609C3 (de) 1980-01-31

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