IT1043638B - Memoria perfezionata - Google Patents

Memoria perfezionata

Info

Publication number
IT1043638B
IT1043638B IT28648/75A IT2864875A IT1043638B IT 1043638 B IT1043638 B IT 1043638B IT 28648/75 A IT28648/75 A IT 28648/75A IT 2864875 A IT2864875 A IT 2864875A IT 1043638 B IT1043638 B IT 1043638B
Authority
IT
Italy
Prior art keywords
improved memory
memory
improved
Prior art date
Application number
IT28648/75A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1043638B publication Critical patent/IT1043638B/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B10/00—Static random access memory [SRAM] devices
    • H10B10/10—SRAM devices comprising bipolar components
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/411—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using bipolar transistors only
    • G11C11/4113—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using bipolar transistors only with at least one cell access to base or collector of at least one of said transistors, e.g. via access diodes, access transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0711—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
    • H01L27/0716—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with vertical bipolar transistors and diodes, or capacitors, or resistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Static Random-Access Memory (AREA)
  • Semiconductor Memories (AREA)
IT28648/75A 1974-12-19 1975-10-24 Memoria perfezionata IT1043638B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2460150A DE2460150C2 (de) 1974-12-19 1974-12-19 Monolitisch integrierbare Speicheranordnung

Publications (1)

Publication Number Publication Date
IT1043638B true IT1043638B (it) 1980-02-29

Family

ID=5933872

Family Applications (1)

Application Number Title Priority Date Filing Date
IT28648/75A IT1043638B (it) 1974-12-19 1975-10-24 Memoria perfezionata

Country Status (6)

Country Link
US (1) US3986173A (it)
JP (1) JPS5727550B2 (it)
DE (1) DE2460150C2 (it)
FR (1) FR2295527A1 (it)
GB (1) GB1472817A (it)
IT (1) IT1043638B (it)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4016551A (en) * 1976-03-10 1977-04-05 Data General Corporation Dynamic MOS memory with reduced propagation delay
US4150392A (en) * 1976-07-31 1979-04-17 Nippon Gakki Seizo Kabushiki Kaisha Semiconductor integrated flip-flop circuit device including merged bipolar and field effect transistors
GB1565146A (en) * 1976-08-16 1980-04-16 Fairchild Camera Instr Co Random access momory cells
US4290185A (en) * 1978-11-03 1981-09-22 Mostek Corporation Method of making an extremely low current load device for integrated circuit
US4251876A (en) * 1978-11-03 1981-02-17 Mostek Corporation Extremely low current load device for integrated circuit
JPS58213450A (ja) * 1982-06-04 1983-12-12 Toshiba Corp 半導体装置の多層配線構造
DE3330013A1 (de) * 1983-08-19 1985-02-28 Siemens AG, 1000 Berlin und 8000 München Statische speicherzelle
US4868628A (en) * 1984-08-22 1989-09-19 Signetics Corporation CMOS RAM with merged bipolar transistor
DE3529422A1 (de) * 1985-08-16 1987-02-26 Stabilus Gmbh Dichtung fuer pneumatische, hydraulische oder hydropneumatische aggregate
US4821235A (en) * 1986-04-17 1989-04-11 Fairchild Semiconductor Corporation Translinear static memory cell with bipolar and MOS devices
US4991138A (en) * 1989-04-03 1991-02-05 International Business Machines Corporation High speed memory cell with multiple port capability
SE9002558D0 (sv) * 1990-08-02 1990-08-02 Carlstedt Elektronik Ab Processor
JPH04318395A (ja) * 1991-02-13 1992-11-09 Internatl Business Mach Corp <Ibm> メモリセル回路
JP3400894B2 (ja) * 1995-07-14 2003-04-28 三菱電機株式会社 スタティック型半導体記憶装置
US5717629A (en) * 1996-10-24 1998-02-10 Yin; Ronald Loh-Hwa Memory circuit and method of operation therefor
US5671182A (en) * 1996-10-24 1997-09-23 Yin; Ronald Loh-Hwa SRAM memory circuit and method of operation therefor
US5875127A (en) * 1996-10-24 1999-02-23 Yin; Ronald Loh-Hwa Non-volatile semiconductor memory device having a floating gate storage capacitor and method of operating thereof
US5825687A (en) * 1996-12-04 1998-10-20 Yin; Ronald Loh-Hwa Low voltage memory cell, circuit array formed thereby and method of operation therefor
JP3741053B2 (ja) * 2002-02-18 2006-02-01 ソニー株式会社 画像処理装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1564148A (it) * 1967-05-25 1969-04-18
DE1774128A1 (de) * 1968-04-13 1971-07-08 Ibm Deutschland Monolithische Speicherzelle
US3815106A (en) * 1972-05-11 1974-06-04 S Wiedmann Flip-flop memory cell arrangement
US3553541A (en) * 1969-04-17 1971-01-05 Bell Telephone Labor Inc Bilateral switch using combination of field effect transistors and bipolar transistors
NL7107040A (it) * 1971-05-22 1972-11-24
GB1390034A (en) * 1971-09-22 1975-04-09 Ferranti Ltd Semiconductor information storage devices
US3747078A (en) * 1972-06-28 1973-07-17 Ibm Compensation technique for variations in bit line impedance
US3849675A (en) * 1973-01-05 1974-11-19 Bell Telephone Labor Inc Low power flip-flop circuits
US3879621A (en) * 1973-04-18 1975-04-22 Ibm Sense amplifier

Also Published As

Publication number Publication date
GB1472817A (en) 1977-05-11
DE2460150C2 (de) 1984-07-12
FR2295527A1 (fr) 1976-07-16
FR2295527B1 (it) 1978-04-07
JPS5183740A (it) 1976-07-22
DE2460150A1 (de) 1976-06-24
JPS5727550B2 (it) 1982-06-11
US3986173A (en) 1976-10-12

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