IT1014143B - Procedimento per la fabbricazione di pellicole sopportate specialmen te per maschere usate nella produ zione di circuiti stampati - Google Patents

Procedimento per la fabbricazione di pellicole sopportate specialmen te per maschere usate nella produ zione di circuiti stampati

Info

Publication number
IT1014143B
IT1014143B IT68451/74A IT6845174A IT1014143B IT 1014143 B IT1014143 B IT 1014143B IT 68451/74 A IT68451/74 A IT 68451/74A IT 6845174 A IT6845174 A IT 6845174A IT 1014143 B IT1014143 B IT 1014143B
Authority
IT
Italy
Prior art keywords
procedure
production
printed circuits
masks used
supported films
Prior art date
Application number
IT68451/74A
Other languages
English (en)
Italian (it)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Application granted granted Critical
Publication of IT1014143B publication Critical patent/IT1014143B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2042—Photolithographic processes using lasers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laser Beam Processing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
IT68451/74A 1973-05-09 1974-05-08 Procedimento per la fabbricazione di pellicole sopportate specialmen te per maschere usate nella produ zione di circuiti stampati IT1014143B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US358730A US3924093A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced

Publications (1)

Publication Number Publication Date
IT1014143B true IT1014143B (it) 1977-04-20

Family

ID=23410798

Family Applications (1)

Application Number Title Priority Date Filing Date
IT68451/74A IT1014143B (it) 1973-05-09 1974-05-08 Procedimento per la fabbricazione di pellicole sopportate specialmen te per maschere usate nella produ zione di circuiti stampati

Country Status (8)

Country Link
US (1) US3924093A (enExample)
JP (1) JPS5017578A (enExample)
CA (1) CA1000870A (enExample)
DE (1) DE2421833A1 (enExample)
FR (1) FR2229084B1 (enExample)
GB (1) GB1465109A (enExample)
IT (1) IT1014143B (enExample)
NL (1) NL7406177A (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2214934B1 (enExample) * 1973-01-18 1978-03-24 Thomson Csf
DE2521543A1 (de) * 1974-05-16 1975-11-27 Crosfield Electronics Ltd Verfahren und vorrichtung zur wiedergabe von bildern
US4190759A (en) * 1975-08-27 1980-02-26 Hitachi, Ltd. Processing of photomask
US4259433A (en) * 1976-10-22 1981-03-31 Fuji Photo Film Co., Ltd. Method for producing disk-recording plates
US4918281A (en) * 1980-07-02 1990-04-17 Rohr Industries, Inc. Method of manufacturing lightweight thermo-barrier material
DE3245272A1 (de) * 1982-12-07 1984-06-07 Ernst Roederstein Spezialfabrik für Kondensatoren GmbH, 8300 Landshut Verfahren zur herstellung miniaturisierter dick- und duennschichtschaltungen
US4794680A (en) * 1985-12-20 1989-01-03 Union Carbide Corporation Novel wear-resistant laser-engraved ceramic or metallic carbide surfaces for friction rolls for working elongate members, method for producing same and method for working elongate members using the novel friction roll
US5104481A (en) * 1988-09-28 1992-04-14 Lasa Industries, Inc. Method for fabricating laser generated I.C. masks
EP0627123A4 (en) * 1992-02-28 1995-11-22 Lasa Ind Inc LASER SHAPED INTEGRATED CIRCUIT MASK.
EP0732221B1 (en) * 1995-03-16 1999-01-27 Minnesota Mining And Manufacturing Company Black metal thermally imageable transparency elements
AP9801217A0 (en) * 1995-09-29 1998-03-31 Sage Tech Incorporated Optical digital media recording and reproduction system.
US5958630A (en) * 1997-12-30 1999-09-28 Kabushiki Kaisha Toshiba Phase shifting mask and method of manufacturing the same
US6180318B1 (en) 1999-05-19 2001-01-30 3M Innovative Properties Company Method of imaging an article
US6814332B2 (en) * 2003-01-15 2004-11-09 Ultimate Support Systems, Inc. Microphone support boom movement control apparatus and method with differential motion isolation capability

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1047390A (enExample) * 1963-05-20 1900-01-01
US3668028A (en) * 1970-06-10 1972-06-06 Du Pont Method of making printing masks with high energy beams
US3695908A (en) * 1970-06-29 1972-10-03 Raymond E Szupillo Thin films of alpha fe2o3 and method of forming

Also Published As

Publication number Publication date
JPS5017578A (enExample) 1975-02-24
US3924093A (en) 1975-12-02
GB1465109A (en) 1977-02-23
CA1000870A (en) 1976-11-30
NL7406177A (enExample) 1974-11-12
FR2229084B1 (enExample) 1980-04-04
DE2421833A1 (de) 1974-12-05
FR2229084A1 (enExample) 1974-12-06

Similar Documents

Publication Publication Date Title
IT1063426B (it) Procedimento per la fabbricazione di sottili pellicole,in particolare di sottili pellicole metalliche nella fabbricazione di circuiti integrati
IT1063394B (it) Procedimento perfezionato per la fabbricazione di circuiti integrati
IT1037603B (it) Metodo di laminazione in particolare per la fabbricazione di circuiti standpati
IT1044131B (it) Apparecchio laser per rimozione di materiale ad esempio per la fabbricazione di microcircuiti
IT973370B (it) Derivati ureici silil sostituiti e procedimento per la loro produ zione
IT1064451B (it) Procedimento per la fabbricazione di pannelli di circuiti stampati
CH500065A (de) Extrusionswerkzeug zum Herstellen von Mehrschichtblasfolien
IT1014143B (it) Procedimento per la fabbricazione di pellicole sopportate specialmen te per maschere usate nella produ zione di circuiti stampati
CA1007098A (en) Process for the manufacture of printed multi-layer circuits
IT942955B (it) Procedimento per la fabbricazione di articoli stampati di vermiculi te espansa
NL7607074A (nl) Werkwijze ter vervaardiging van sluiervrije halfgeleideroppervlakken.
IT1056281B (it) Apparecchio per la produzione di pezzi colati
IT1040269B (it) Miglioramenti nella produzionedi film polimeric
IT943583B (it) Maschere futografiche trasparenti da usarsi nella produzione di di spositivi microelettronici e meto do per la loro preparazione
IT967732B (it) Metodo per la fabbricazione di circuiti microelettronici
IT1063602B (it) Procedimento perfezionato per la fabbricazione di circuiti integrati
IT963413B (it) Procedimento di fotoincisione particolarmente per la fabbrica zione di circuiti integrati
IT1041366B (it) Procedimento per la fabbricazione di pasta dentifricia
IT979311B (it) Creatore conposto per la produ zione di ingraniaggi
IT1035743B (it) Prucedimento per la produzione di circuiti stampati e prodtto ottnuto
IT958053B (it) Procedimento per la produzione di derivati alchilguanamminici contenenti fosforo e loro im piego
FR2315772A1 (fr) Procede de fabrication de varistors sous forme de films epais
NL7606971A (nl) Werkwijze ter bereiding van carbamoylhaloge- nidesamenstellingen.
IT1016316B (it) Poliottenameri e procedimento per la loro produzione
IT1106059B (it) Cefem-derivati e procedimento per la loro produzione