CA1000870A - Pattern delineation method and product so produced - Google Patents

Pattern delineation method and product so produced

Info

Publication number
CA1000870A
CA1000870A CA195,833A CA195833A CA1000870A CA 1000870 A CA1000870 A CA 1000870A CA 195833 A CA195833 A CA 195833A CA 1000870 A CA1000870 A CA 1000870A
Authority
CA
Canada
Prior art keywords
produced
product
delineation method
pattern delineation
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA195,833A
Other languages
English (en)
Inventor
Martin Feldman
Denis L. Rousseau
William R. Sinclair
Walter W. Weick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Inc
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA1000870A publication Critical patent/CA1000870A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2042—Photolithographic processes using lasers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA195,833A 1973-05-09 1974-03-25 Pattern delineation method and product so produced Expired CA1000870A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US358730A US3924093A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced

Publications (1)

Publication Number Publication Date
CA1000870A true CA1000870A (en) 1976-11-30

Family

ID=23410798

Family Applications (1)

Application Number Title Priority Date Filing Date
CA195,833A Expired CA1000870A (en) 1973-05-09 1974-03-25 Pattern delineation method and product so produced

Country Status (8)

Country Link
US (1) US3924093A (enExample)
JP (1) JPS5017578A (enExample)
CA (1) CA1000870A (enExample)
DE (1) DE2421833A1 (enExample)
FR (1) FR2229084B1 (enExample)
GB (1) GB1465109A (enExample)
IT (1) IT1014143B (enExample)
NL (1) NL7406177A (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2214934B1 (enExample) * 1973-01-18 1978-03-24 Thomson Csf
DE2521543A1 (de) * 1974-05-16 1975-11-27 Crosfield Electronics Ltd Verfahren und vorrichtung zur wiedergabe von bildern
US4190759A (en) * 1975-08-27 1980-02-26 Hitachi, Ltd. Processing of photomask
US4259433A (en) * 1976-10-22 1981-03-31 Fuji Photo Film Co., Ltd. Method for producing disk-recording plates
US4918281A (en) * 1980-07-02 1990-04-17 Rohr Industries, Inc. Method of manufacturing lightweight thermo-barrier material
DE3245272A1 (de) * 1982-12-07 1984-06-07 Ernst Roederstein Spezialfabrik für Kondensatoren GmbH, 8300 Landshut Verfahren zur herstellung miniaturisierter dick- und duennschichtschaltungen
US4794680A (en) * 1985-12-20 1989-01-03 Union Carbide Corporation Novel wear-resistant laser-engraved ceramic or metallic carbide surfaces for friction rolls for working elongate members, method for producing same and method for working elongate members using the novel friction roll
US5104481A (en) * 1988-09-28 1992-04-14 Lasa Industries, Inc. Method for fabricating laser generated I.C. masks
EP0627123A4 (en) * 1992-02-28 1995-11-22 Lasa Ind Inc GENERATION OF A MASK FOR INTEGRATED CIRCUIT USING A LASER.
DE69601432T2 (de) * 1995-03-16 1999-10-07 Minnesota Mining And Mfg. Co., Saint Paul Schwarz-Metall wärmebildbare Transparenz-Elemente
BR9611537A (pt) * 1995-09-29 2000-04-25 Sage Technology Inc Sistema e processo para codificar regiões de dados em meios óticos
US5958630A (en) * 1997-12-30 1999-09-28 Kabushiki Kaisha Toshiba Phase shifting mask and method of manufacturing the same
US6180318B1 (en) 1999-05-19 2001-01-30 3M Innovative Properties Company Method of imaging an article
US6814332B2 (en) * 2003-01-15 2004-11-09 Ultimate Support Systems, Inc. Microphone support boom movement control apparatus and method with differential motion isolation capability

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1047390A (enExample) * 1963-05-20 1900-01-01
US3668028A (en) * 1970-06-10 1972-06-06 Du Pont Method of making printing masks with high energy beams
US3695908A (en) * 1970-06-29 1972-10-03 Raymond E Szupillo Thin films of alpha fe2o3 and method of forming

Also Published As

Publication number Publication date
US3924093A (en) 1975-12-02
NL7406177A (enExample) 1974-11-12
JPS5017578A (enExample) 1975-02-24
FR2229084A1 (enExample) 1974-12-06
FR2229084B1 (enExample) 1980-04-04
IT1014143B (it) 1977-04-20
DE2421833A1 (de) 1974-12-05
GB1465109A (en) 1977-02-23

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