IN170221B - - Google Patents
Info
- Publication number
- IN170221B IN170221B IN849/DEL/86A IN849DE1986A IN170221B IN 170221 B IN170221 B IN 170221B IN 849DE1986 A IN849DE1986 A IN 849DE1986A IN 170221 B IN170221 B IN 170221B
- Authority
- IN
- India
- Prior art keywords
- film
- support material
- surrogate substrate
- affixing
- separating
- Prior art date
Links
- 239000010408 film Substances 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1892—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof methods involving the use of temporary, removable substrates
- H01L31/1896—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof methods involving the use of temporary, removable substrates for thin-film semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03921—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/786,782 US4663828A (en) | 1985-10-11 | 1985-10-11 | Process and apparatus for continuous production of lightweight arrays of photovoltaic cells |
Publications (1)
Publication Number | Publication Date |
---|---|
IN170221B true IN170221B (fr) | 1992-02-29 |
Family
ID=25139576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN849/DEL/86A IN170221B (fr) | 1985-10-11 | 1986-09-25 |
Country Status (9)
Country | Link |
---|---|
US (1) | US4663828A (fr) |
EP (1) | EP0218193B1 (fr) |
JP (1) | JPH0746732B2 (fr) |
AT (1) | ATE76221T1 (fr) |
CA (1) | CA1290719C (fr) |
DE (1) | DE3685287D1 (fr) |
ES (1) | ES2031812T3 (fr) |
GR (1) | GR3004642T3 (fr) |
IN (1) | IN170221B (fr) |
Families Citing this family (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2667616B1 (fr) * | 1990-10-05 | 1993-01-15 | Aerospatiale | Procede et installation de metallisation en continu d'une meche de fibres etalee. |
DE4324320B4 (de) * | 1992-07-24 | 2006-08-31 | Fuji Electric Co., Ltd., Kawasaki | Verfahren und Vorrichtung zur Herstellung einer als dünne Schicht ausgebildeten fotovoltaischen Umwandlungsvorrichtung |
US6001432A (en) * | 1992-11-19 | 1999-12-14 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus for forming films on a substrate |
US6001431A (en) * | 1992-12-28 | 1999-12-14 | Semiconductor Energy Laboratory Co., Ltd. | Process for fabricating a magnetic recording medium |
US7264850B1 (en) | 1992-12-28 | 2007-09-04 | Semiconductor Energy Laboratory Co., Ltd. | Process for treating a substrate with a plasma |
US5674325A (en) * | 1995-06-07 | 1997-10-07 | Photon Energy, Inc. | Thin film photovoltaic device and process of manufacture |
US6093290A (en) * | 1997-05-14 | 2000-07-25 | Canon Kabushiki Kaisha | Method of generating a reciprocating plurality of magnetic fluxes on a target |
NL1013900C2 (nl) * | 1999-12-21 | 2001-06-25 | Akzo Nobel Nv | Werkwijze voor de vervaardiging van een zonnecelfolie met in serie geschakelde zonnecellen. |
US6441298B1 (en) | 2000-08-15 | 2002-08-27 | Nec Research Institute, Inc | Surface-plasmon enhanced photovoltaic device |
US20020117199A1 (en) * | 2001-02-06 | 2002-08-29 | Oswald Robert S. | Process for producing photovoltaic devices |
US20030044539A1 (en) * | 2001-02-06 | 2003-03-06 | Oswald Robert S. | Process for producing photovoltaic devices |
US6649901B2 (en) | 2002-03-14 | 2003-11-18 | Nec Laboratories America, Inc. | Enhanced optical transmission apparatus with improved aperture geometry |
US7170001B2 (en) * | 2003-06-26 | 2007-01-30 | Advent Solar, Inc. | Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias |
US7649141B2 (en) * | 2003-06-30 | 2010-01-19 | Advent Solar, Inc. | Emitter wrap-through back contact solar cells on thin silicon wafers |
US20050172996A1 (en) * | 2004-02-05 | 2005-08-11 | Advent Solar, Inc. | Contact fabrication of emitter wrap-through back contact silicon solar cells |
US20060060238A1 (en) * | 2004-02-05 | 2006-03-23 | Advent Solar, Inc. | Process and fabrication methods for emitter wrap through back contact solar cells |
US7335555B2 (en) * | 2004-02-05 | 2008-02-26 | Advent Solar, Inc. | Buried-contact solar cells with self-doping contacts |
US7144751B2 (en) * | 2004-02-05 | 2006-12-05 | Advent Solar, Inc. | Back-contact solar cells and methods for fabrication |
CN102097458B (zh) | 2004-06-04 | 2013-10-30 | 伊利诺伊大学评议会 | 用于制造并组装可印刷半导体元件的方法和设备 |
US7799699B2 (en) | 2004-06-04 | 2010-09-21 | The Board Of Trustees Of The University Of Illinois | Printable semiconductor structures and related methods of making and assembling |
WO2006053218A2 (fr) * | 2004-11-10 | 2006-05-18 | Daystar Technologies, Inc. | Systeme de commande de pression dans un appareil de depot de substrat photovoltaique |
JP2008520103A (ja) * | 2004-11-10 | 2008-06-12 | デイスター テクノロジーズ,インコーポレイティド | 連続プロセスを用いて薄膜太陽電池を形成するための方法及び装置 |
FR2879821B1 (fr) * | 2004-12-21 | 2007-06-08 | Solaforce Soc Par Actions Simp | Procede de fabrication de cellules photovoltaiques |
US20070221268A1 (en) * | 2006-03-21 | 2007-09-27 | Hasch Bruce M | Encapsulants for electronic components |
WO2008036837A2 (fr) * | 2006-09-20 | 2008-03-27 | The Board Of Trustees Of The University Of Illinois | Strategies de liberation mises en œuvre dans la fabrication de structures semiconductrices transferables, de dispositifs et de composants de dispositifs |
CA2568136C (fr) * | 2006-11-30 | 2008-07-29 | Tenxc Wireless Inc. | Implementation de matrice de butler |
AT504680B1 (de) * | 2006-12-20 | 2009-06-15 | 3S Swiss Solar Systems Ag | Verfahren und vorrichtung zum herstellen laminierter solarmodule |
US20080216887A1 (en) * | 2006-12-22 | 2008-09-11 | Advent Solar, Inc. | Interconnect Technologies for Back Contact Solar Cells and Modules |
EP2104954B1 (fr) | 2007-01-17 | 2022-03-16 | The Board of Trustees of the University of Illinois | Systèmes optiques fabriqués par un ensemble à base d'impression |
US20090126786A1 (en) * | 2007-11-13 | 2009-05-21 | Advent Solar, Inc. | Selective Emitter and Texture Processes for Back Contact Solar Cells |
CN102113130A (zh) * | 2008-04-29 | 2011-06-29 | 应用材料股份有限公司 | 使用单石模块组合技术制造的光伏打模块 |
US8886334B2 (en) | 2008-10-07 | 2014-11-11 | Mc10, Inc. | Systems, methods, and devices using stretchable or flexible electronics for medical applications |
US8389862B2 (en) | 2008-10-07 | 2013-03-05 | Mc10, Inc. | Extremely stretchable electronics |
US8372726B2 (en) | 2008-10-07 | 2013-02-12 | Mc10, Inc. | Methods and applications of non-planar imaging arrays |
EP2349440B1 (fr) | 2008-10-07 | 2019-08-21 | Mc10, Inc. | Ballonnet de cathéter comportant un circuit intégré étirable et un réseau de détecteurs |
US8097926B2 (en) | 2008-10-07 | 2012-01-17 | Mc10, Inc. | Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy |
CN102301456A (zh) * | 2008-12-17 | 2011-12-28 | 奥塔装置公司 | 基于带的外延剥离设备和方法 |
WO2010132552A1 (fr) * | 2009-05-12 | 2010-11-18 | The Board Of Trustees Of The University Of Illinois | Ensembles imprimés de diodes électroluminescentes inorganiques microscopiques ultraminces pour dispositifs d'affichage déformables et semi-transparents |
US20110030773A1 (en) * | 2009-08-06 | 2011-02-10 | Alliance For Sustainable Energy, Llc | Photovoltaic cell with back-surface reflectivity scattering |
US8466447B2 (en) | 2009-08-06 | 2013-06-18 | Alliance For Sustainable Energy, Llc | Back contact to film silicon on metal for photovoltaic cells |
US9723122B2 (en) | 2009-10-01 | 2017-08-01 | Mc10, Inc. | Protective cases with integrated electronics |
US10918298B2 (en) | 2009-12-16 | 2021-02-16 | The Board Of Trustees Of The University Of Illinois | High-speed, high-resolution electrophysiology in-vivo using conformal electronics |
US9936574B2 (en) | 2009-12-16 | 2018-04-03 | The Board Of Trustees Of The University Of Illinois | Waterproof stretchable optoelectronics |
US10441185B2 (en) | 2009-12-16 | 2019-10-15 | The Board Of Trustees Of The University Of Illinois | Flexible and stretchable electronic systems for epidermal electronics |
US8759664B2 (en) | 2009-12-28 | 2014-06-24 | Hanergy Hi-Tech Power (Hk) Limited | Thin film solar cell strings |
CN102892356B (zh) | 2010-03-17 | 2016-01-13 | 伊利诺伊大学评议会 | 基于生物可吸收基质的可植入生物医学装置 |
EP2395567B1 (fr) | 2010-06-10 | 2018-10-03 | Solarwave AB | Procédé pour produire un module de cellule solaire |
KR101648563B1 (ko) * | 2010-06-29 | 2016-08-16 | 한화테크윈 주식회사 | 그래핀 전사필름 제조방법 및 그래핀 전사필름 제조장치 |
US9442285B2 (en) | 2011-01-14 | 2016-09-13 | The Board Of Trustees Of The University Of Illinois | Optical component array having adjustable curvature |
WO2012158709A1 (fr) | 2011-05-16 | 2012-11-22 | The Board Of Trustees Of The University Of Illinois | Barrettes de del à gestion thermique assemblées par impression |
JP2014523633A (ja) | 2011-05-27 | 2014-09-11 | エムシー10 インコーポレイテッド | 電子的、光学的、且つ/又は機械的装置及びシステム並びにこれらの装置及びシステムを製造する方法 |
WO2012167096A2 (fr) | 2011-06-03 | 2012-12-06 | The Board Of Trustees Of The University Of Illinois | Réseau d'électrodes de surface conformables, multiplexées de manière active et à haute densité, pour un interfaçage avec le cerveau |
EP2786644B1 (fr) | 2011-12-01 | 2019-04-10 | The Board of Trustees of the University of Illionis | Dispositifs transitoires conçus pour subir des transformations programmables |
JP2015521303A (ja) | 2012-03-30 | 2015-07-27 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシ | 表面への形状適合可能な付属物装着可能電子デバイス |
CN104412357B (zh) | 2012-04-17 | 2017-09-22 | 环球太阳能公司 | 积体薄膜太阳能晶胞电池的互连 |
US9171794B2 (en) | 2012-10-09 | 2015-10-27 | Mc10, Inc. | Embedding thin chips in polymer |
CN105164816B (zh) | 2013-01-28 | 2017-03-08 | 环球太阳能公司 | 光伏互连系统、装置和方法 |
JP2018524677A (ja) | 2015-06-01 | 2018-08-30 | ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ | 無線電力及び近距離無線通信機能を備えた小型電子システム |
KR20180034342A (ko) | 2015-06-01 | 2018-04-04 | 더 보드 오브 트러스티즈 오브 더 유니버시티 오브 일리노이 | 대안적인 자외선 감지방법 |
US10925543B2 (en) | 2015-11-11 | 2021-02-23 | The Board Of Trustees Of The University Of Illinois | Bioresorbable silicon electronics for transient implants |
EP3551778A1 (fr) * | 2016-11-08 | 2019-10-16 | Nanovate OY | Système et procédé de production de graphène continu et monolithique |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE622403A (fr) * | ||||
US3969163A (en) * | 1974-09-19 | 1976-07-13 | Texas Instruments Incorporated | Vapor deposition method of forming low cost semiconductor solar cells including reconstitution of the reacted gases |
DE2638270C2 (de) * | 1976-08-25 | 1983-01-27 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur Herstellung großflächiger, freitragender Platten aus Silicium |
ES465638A1 (es) * | 1977-12-30 | 1978-10-01 | Complisa Sa | Procedimiento para la metalizacion especular de cualquier soporte en bandas y hojas. |
GB2033355B (en) * | 1978-09-07 | 1982-05-06 | Standard Telephones Cables Ltd | Semiconductor processing |
DE3000889C2 (de) * | 1980-01-11 | 1984-07-26 | Siemens AG, 1000 Berlin und 8000 München | Verwendung einer um zwei Rollen umlaufenden Metallfolie zum Stranggießen von amorphem Silizium |
EP0191505A3 (fr) * | 1980-04-10 | 1986-09-10 | Massachusetts Institute Of Technology | Méthode de fabrication de feuilles en matériau cristallin |
US4323419A (en) * | 1980-05-08 | 1982-04-06 | Atlantic Richfield Company | Method for ribbon solar cell fabrication |
US4410558A (en) * | 1980-05-19 | 1983-10-18 | Energy Conversion Devices, Inc. | Continuous amorphous solar cell production system |
US4379020A (en) * | 1980-06-16 | 1983-04-05 | Massachusetts Institute Of Technology | Polycrystalline semiconductor processing |
US4370288A (en) * | 1980-11-18 | 1983-01-25 | Motorola, Inc. | Process for forming self-supporting semiconductor film |
US4419178A (en) * | 1981-06-19 | 1983-12-06 | Rode Daniel L | Continuous ribbon epitaxy |
JPS5848473A (ja) * | 1981-09-17 | 1983-03-22 | Konishiroku Photo Ind Co Ltd | アモルフアスシリコン太陽電池の製造方法 |
US4492181A (en) * | 1982-03-19 | 1985-01-08 | Sovonics Solar Systems | Apparatus for continuously producing tandem amorphous photovoltaic cells |
-
1985
- 1985-10-11 US US06/786,782 patent/US4663828A/en not_active Expired - Lifetime
-
1986
- 1986-09-25 CA CA000519110A patent/CA1290719C/fr not_active Expired - Lifetime
- 1986-09-25 IN IN849/DEL/86A patent/IN170221B/en unknown
- 1986-10-02 EP EP86113552A patent/EP0218193B1/fr not_active Expired - Lifetime
- 1986-10-02 AT AT86113552T patent/ATE76221T1/de not_active IP Right Cessation
- 1986-10-02 ES ES198686113552T patent/ES2031812T3/es not_active Expired - Lifetime
- 1986-10-02 DE DE8686113552T patent/DE3685287D1/de not_active Expired - Lifetime
- 1986-10-09 JP JP61241171A patent/JPH0746732B2/ja not_active Expired - Lifetime
-
1992
- 1992-05-18 GR GR920400974T patent/GR3004642T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
JPS6288372A (ja) | 1987-04-22 |
ATE76221T1 (de) | 1992-05-15 |
EP0218193A3 (en) | 1989-05-10 |
EP0218193B1 (fr) | 1992-05-13 |
CA1290719C (fr) | 1991-10-15 |
US4663828A (en) | 1987-05-12 |
DE3685287D1 (de) | 1992-06-17 |
GR3004642T3 (fr) | 1993-04-28 |
JPH0746732B2 (ja) | 1995-05-17 |
EP0218193A2 (fr) | 1987-04-15 |
ES2031812T3 (es) | 1993-01-01 |
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