IL83893A - Photosensitive pixel with exposed blocking element - Google Patents

Photosensitive pixel with exposed blocking element

Info

Publication number
IL83893A
IL83893A IL83893A IL8389387A IL83893A IL 83893 A IL83893 A IL 83893A IL 83893 A IL83893 A IL 83893A IL 8389387 A IL8389387 A IL 8389387A IL 83893 A IL83893 A IL 83893A
Authority
IL
Israel
Prior art keywords
blocking element
photosensitive pixel
photogenerative
electrodes
exposed blocking
Prior art date
Application number
IL83893A
Other languages
English (en)
Other versions
IL83893A0 (en
Original Assignee
Ovonic Imaging Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ovonic Imaging Systems Inc filed Critical Ovonic Imaging Systems Inc
Publication of IL83893A0 publication Critical patent/IL83893A0/xx
Publication of IL83893A publication Critical patent/IL83893A/xx

Links

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/40—Picture signal circuits
    • H04N1/40056—Circuits for driving or energising particular reading heads or original illumination means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14643—Photodiode arrays; MOS imagers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/762—Charge transfer devices
    • H01L29/765—Charge-coupled devices
    • H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76808—Input structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Electromagnetism (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Light Receiving Elements (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electrophotography Configuration And Component (AREA)
IL83893A 1986-09-16 1987-09-14 Photosensitive pixel with exposed blocking element IL83893A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/907,926 US4714836A (en) 1986-09-16 1986-09-16 Photosensitive pixel with exposed blocking element

Publications (2)

Publication Number Publication Date
IL83893A0 IL83893A0 (en) 1988-02-29
IL83893A true IL83893A (en) 1991-03-10

Family

ID=25424863

Family Applications (1)

Application Number Title Priority Date Filing Date
IL83893A IL83893A (en) 1986-09-16 1987-09-14 Photosensitive pixel with exposed blocking element

Country Status (8)

Country Link
US (1) US4714836A (xx)
EP (1) EP0260824B1 (xx)
JP (1) JPS6386973A (xx)
AT (1) ATE87399T1 (xx)
CA (1) CA1325056C (xx)
DE (1) DE3784991T2 (xx)
ES (1) ES2040256T3 (xx)
IL (1) IL83893A (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4910412A (en) * 1987-04-17 1990-03-20 Stemcor Corporation Light biased photoresponsive array
FR2626128B1 (fr) * 1988-01-15 1990-05-04 Thomson Csf Matrice photosensible a deux diodes et une capacite par point, sans remise a niveau optique
DE3816660C1 (en) * 1988-05-17 1989-09-07 Messerschmitt-Boelkow-Blohm Gmbh, 8012 Ottobrunn, De Sensor, especially photodetector arrangement
US5335092A (en) * 1989-04-06 1994-08-02 Nippon Steel Corporation Contact type image sensor
JPH03209767A (ja) * 1990-01-11 1991-09-12 Fuji Xerox Co Ltd イメージセンサ
US5216274A (en) * 1991-01-11 1993-06-01 Fuji Xerox Co., Ltd. Image sensor
EP0515849A3 (en) * 1991-04-27 1993-05-19 Kanegafuchi Chemical Industry Co., Ltd. Image sensor
US5254848A (en) * 1991-06-21 1993-10-19 Fuji Xerox Co., Ltd. Image sensor and method of reading data out of the same having load capacitors being respectively continuously connected to common signal lines
JPH0522516A (ja) * 1991-07-17 1993-01-29 Fuji Xerox Co Ltd イメージセンサ
GB9209734D0 (en) * 1992-05-06 1992-06-17 Philips Electronics Uk Ltd An image sensor
EP0601200A4 (en) * 1992-06-15 1994-10-26 Kanegafuchi Chemical Ind SEMICONDUCTOR ARRANGEMENT.
WO1993026046A1 (en) * 1992-06-15 1993-12-23 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Semiconductor device
US5774180A (en) * 1992-12-04 1998-06-30 Fuji Xerox Co., Ltd. Image sensor capable of producing an image signal free from an afterimage
EP0619676A3 (en) * 1993-04-09 1995-05-24 Kanegafuchi Chemical Ind Method and device for reading images.
EP1786027A3 (en) * 2005-11-14 2009-03-04 Schott AG Plasma etching of tapered structures

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4369372A (en) * 1979-06-18 1983-01-18 Canon Kabushiki Kaisha Photo electro transducer device
US4500924A (en) * 1979-11-16 1985-02-19 Matsushita Electric Industrial Co., Ltd. Solid state imaging apparatus
EP0163956A3 (en) * 1984-05-04 1988-04-06 Energy Conversion Devices, Inc. Intergrated radiation sensing array
US4675739A (en) * 1984-05-04 1987-06-23 Energy Conversion Devices, Inc. Integrated radiation sensing array

Also Published As

Publication number Publication date
DE3784991T2 (de) 1993-10-14
ES2040256T3 (es) 1993-10-16
EP0260824A3 (en) 1989-03-15
DE3784991D1 (de) 1993-04-29
JPS6386973A (ja) 1988-04-18
EP0260824A2 (en) 1988-03-23
US4714836A (en) 1987-12-22
ATE87399T1 (de) 1993-04-15
IL83893A0 (en) 1988-02-29
CA1325056C (en) 1993-12-07
EP0260824B1 (en) 1993-03-24

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Legal Events

Date Code Title Description
RH Patent void