IL73947A - Method of and system for opto-electronic inspection of a two-dimensional pattern on an object - Google Patents

Method of and system for opto-electronic inspection of a two-dimensional pattern on an object

Info

Publication number
IL73947A
IL73947A IL73947A IL7394784A IL73947A IL 73947 A IL73947 A IL 73947A IL 73947 A IL73947 A IL 73947A IL 7394784 A IL7394784 A IL 7394784A IL 73947 A IL73947 A IL 73947A
Authority
IL
Israel
Prior art keywords
opto
dimensional pattern
electronic inspection
inspection
electronic
Prior art date
Application number
IL73947A
Other languages
English (en)
Other versions
IL73947A0 (en
Original Assignee
Pietzsch Ludwig Gmbh & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pietzsch Ludwig Gmbh & Co filed Critical Pietzsch Ludwig Gmbh & Co
Publication of IL73947A0 publication Critical patent/IL73947A0/xx
Publication of IL73947A publication Critical patent/IL73947A/xx

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30141—Printed circuit board [PCB]

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Image Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Analysis (AREA)
IL73947A 1983-12-30 1984-12-27 Method of and system for opto-electronic inspection of a two-dimensional pattern on an object IL73947A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3347645A DE3347645C1 (de) 1983-12-30 1983-12-30 Verfahren und Einrichtung zum opto-elektronischen Pruefen eines Flaechenmusters an einem Objekt

Publications (2)

Publication Number Publication Date
IL73947A0 IL73947A0 (en) 1985-03-31
IL73947A true IL73947A (en) 1989-09-10

Family

ID=6218499

Family Applications (1)

Application Number Title Priority Date Filing Date
IL73947A IL73947A (en) 1983-12-30 1984-12-27 Method of and system for opto-electronic inspection of a two-dimensional pattern on an object

Country Status (5)

Country Link
US (1) US4692943A (fr)
EP (1) EP0149852A3 (fr)
JP (1) JPS60215286A (fr)
DE (1) DE3347645C1 (fr)
IL (1) IL73947A (fr)

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US4953100A (en) * 1986-10-03 1990-08-28 Omron Tateisi Electronics Co. Apparatus for inspecting packaged electronic device
US4748330A (en) * 1986-12-22 1988-05-31 Rca Licensing Corporation Method and apparatus for measuring periodic matrix spaces
US4949390A (en) * 1987-04-16 1990-08-14 Applied Vision Systems, Inc. Interconnect verification using serial neighborhood processors
US5051825A (en) * 1989-04-07 1991-09-24 Pressco, Inc. Dual image video inspection apparatus
JPH0737892B2 (ja) * 1988-01-12 1995-04-26 大日本スクリーン製造株式会社 パターン欠陥検査方法
US5018212A (en) * 1988-03-25 1991-05-21 Texas Instruments Incorporated Defect area consolidation for pattern inspector
US4908702A (en) * 1988-04-29 1990-03-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Real-time image difference detection using a polarization rotation spacial light modulator
US4899219A (en) * 1988-10-31 1990-02-06 Amoco Corporation Macroview and microview video record of core
JP3132565B2 (ja) * 1989-08-30 2001-02-05 株式会社日立製作所 欠陥検査方法及びその装置
JPH03188358A (ja) * 1989-12-19 1991-08-16 Hajime Sangyo Kk 物体の表面検査装置
US5058178A (en) * 1989-12-21 1991-10-15 At&T Bell Laboratories Method and apparatus for inspection of specular, three-dimensional features
EP0435660B1 (fr) * 1989-12-29 1997-06-04 Canon Kabushiki Kaisha Méthode de traitement d'image pour l'évaluation d'objets, et appareil d'inspection mettant en oeuvre cette méthode
JPH03210679A (ja) * 1990-01-12 1991-09-13 Hiyuutec:Kk パターンマッチング方法および装置
US5272763A (en) * 1990-03-02 1993-12-21 Matsushita Electric Industrial Co., Ltd. Apparatus for inspecting wiring pattern formed on a board
JPH0469777A (ja) * 1990-07-10 1992-03-04 Dainippon Screen Mfg Co Ltd プリント基板のパターン検査装置
US5184217A (en) * 1990-08-02 1993-02-02 Doering John W System for automatically inspecting a flat sheet part
US5327252A (en) * 1990-09-21 1994-07-05 Canon Kabushiki Kaisha Print evaluation apparatus
GB2249690B (en) * 1990-11-07 1994-07-06 Gec Ferranti Defence Syst Security system
JPH0820214B2 (ja) * 1990-11-27 1996-03-04 大日本スクリーン製造株式会社 プリント基板のライン幅検査方法
US5586058A (en) 1990-12-04 1996-12-17 Orbot Instruments Ltd. Apparatus and method for inspection of a patterned object by comparison thereof to a reference
IL125216A (en) * 1990-12-04 2001-07-24 Orbot Instr Ltd Apparatus and method for microscopic inspection of articles
US5119434A (en) * 1990-12-31 1992-06-02 Beltronics, Inc. Method of and apparatus for geometric pattern inspection employing intelligent imaged-pattern shrinking, expanding and processing to identify predetermined features and tolerances
US5459795A (en) * 1991-02-26 1995-10-17 Matsushita Electric Industrial Co., Ltd. Wiring pattern inspection apparatus for printed circuit board
US5083313A (en) * 1991-03-04 1992-01-21 Reinsch Roger A Video signal digitizer
FI90150C (fi) * 1991-05-14 1993-12-27 Valtion Teknillinen Filter
US5172420A (en) * 1991-05-28 1992-12-15 At&T Bell Laboratories Method for monitoring the dimensions and other aspects linewidth thickness and discoloration of specular patterns
JPH0581408A (ja) * 1991-09-19 1993-04-02 Hiyuutec:Kk 欠点画像表示方法
US5351314A (en) * 1991-10-04 1994-09-27 Canon Information Systems, Inc. Method and apparatus for image enhancement using intensity dependent spread filtering
US5359416A (en) * 1992-10-19 1994-10-25 Thiokol Corporation System and process for detecting and monitoring surface defects
US5452368A (en) * 1993-08-02 1995-09-19 Motorola, Inc. Method of detecting defects in semiconductor package leads
EP1383084A3 (fr) * 1993-10-27 2004-07-14 Toshiba Engineering Corporation Méthode et appareil d'inspection des irrégularités de surface d'un objet
US5781667A (en) * 1995-07-31 1998-07-14 Neopath, Inc. Apparatus for high speed morphological processing
WO1998015919A1 (fr) * 1996-10-09 1998-04-16 Dai Nippon Printing Co., Ltd. Procede et appareil de detection de defauts de raies sur des documents imprimes
AU4975497A (en) * 1997-09-30 1999-04-23 Siemens Aktiengesellschaft A method of and apparatus for inspecting printed information
WO2000028309A1 (fr) * 1998-11-05 2000-05-18 Samsung Electronics Co., Ltd. Procede permettant d'inspecter une anomalie dans une forme
US6455354B1 (en) * 1998-12-30 2002-09-24 Micron Technology, Inc. Method of fabricating tape attachment chip-on-board assemblies
JP4017285B2 (ja) * 1999-06-02 2007-12-05 松下電器産業株式会社 パターン欠陥検出方法
US20020038510A1 (en) * 2000-10-04 2002-04-04 Orbotech, Ltd Method for detecting line width defects in electrical circuit inspection
DE10212133A1 (de) * 2002-03-19 2003-10-09 Siemens Ag Verfahren und Vorrichtung zur Kontrolle von Objekten
TWI245169B (en) * 2002-10-28 2005-12-11 Asml Netherlands Bv Method for detecting defect in mask, computer program, and reference substrate
JP3948728B2 (ja) * 2003-03-17 2007-07-25 オルボテック リミテッド パターン検査装置
GB2414545A (en) * 2004-05-28 2005-11-30 Leisure Link Holdings Ltd Method for identifying and sorting objects
JP4981410B2 (ja) * 2006-10-31 2012-07-18 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡、走査型電子顕微鏡を用いたパターンの複合検査方法、および走査型電子顕微鏡の制御装置
US8027537B1 (en) * 2007-05-18 2011-09-27 The United States Of America As Represented By The Secretary Of The Air Force Visual object identification by computational majority voting
US8144973B2 (en) * 2009-03-24 2012-03-27 Orbotech Ltd. Multi-modal imaging
DE102010060376A1 (de) 2010-11-05 2012-05-10 Hseb Dresden Gmbh Inspektionsverfahren
TWI622725B (zh) 2012-10-13 2018-05-01 恩特葛瑞斯股份有限公司 用於流體分配閥之光電檢測品質確保系統

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DE1248985C2 (de) * 1959-10-08 1968-03-21 The Perkm-Elmer Corporation, Norwalk Conn (V St A) E Golay, Rumson N J (V St A) I Verfahren zum Ab zahlen zusammenhangender Flachenbereiche
DE1250166B (de) * 1962-05-21 1967-09-14 International Business Machines Corporation Armonk, NY (V St A) Vorrichtung zur maschinellen Zeichen erkennung
JPS5811562B2 (ja) * 1975-05-08 1983-03-03 松下電器産業株式会社 イロブンカイソウチ
DE2929846A1 (de) * 1979-07-23 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Opto-elektronisches pruefsystem zur automatischen beschaffenheitspruefung von leiterplatten, deren zwischenprodukte und druckwerkzeuge
US4414685A (en) * 1979-09-10 1983-11-08 Sternberg Stanley R Method and apparatus for pattern recognition and detection
US4270863A (en) * 1979-11-01 1981-06-02 Owens-Illinois, Inc. Method and apparatus for inspecting objects for defects
EP0054596B1 (fr) * 1980-12-18 1985-05-29 International Business Machines Corporation Procédé d'inspection et de tri automatique d'objets présentant des configurations avec des tolérances dimensionnelles et des critères de rejet variables selon l'emplacement, équipement et circuits de mise en oeuvre
JPS57178486A (en) * 1981-04-25 1982-11-02 Nippon Kogaku Kk <Nikon> Smoothing device for binary image signal
JPS5892869A (ja) * 1981-11-27 1983-06-02 Hitachi Ltd 配線パターンの欠陥判定方法およびその装置
US4441207A (en) * 1982-01-19 1984-04-03 Environmental Research Institute Of Michigan Design rule checking using serial neighborhood processors
US4589140A (en) * 1983-03-21 1986-05-13 Beltronics, Inc. Method of and apparatus for real-time high-speed inspection of objects for identifying or recognizing known and unknown portions thereof, including defects and the like
US4532650A (en) * 1983-05-12 1985-07-30 Kla Instruments Corporation Photomask inspection apparatus and method using corner comparator defect detection algorithm
US4556317A (en) * 1984-02-22 1985-12-03 Kla Instruments Corporation X-Y Stage for a patterned wafer automatic inspection system

Also Published As

Publication number Publication date
DE3347645C1 (de) 1985-10-10
JPS60215286A (ja) 1985-10-28
IL73947A0 (en) 1985-03-31
EP0149852A2 (fr) 1985-07-31
EP0149852A3 (fr) 1985-08-28
US4692943A (en) 1987-09-08

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