IL26756A - Tantalum alloy capacitor and method for the preparation thereof - Google Patents

Tantalum alloy capacitor and method for the preparation thereof

Info

Publication number
IL26756A
IL26756A IL26756A IL2675666A IL26756A IL 26756 A IL26756 A IL 26756A IL 26756 A IL26756 A IL 26756A IL 2675666 A IL2675666 A IL 2675666A IL 26756 A IL26756 A IL 26756A
Authority
IL
Israel
Prior art keywords
preparation
tantalum alloy
capacitor
alloy capacitor
tantalum
Prior art date
Application number
IL26756A
Other languages
English (en)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of IL26756A publication Critical patent/IL26756A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/005—Electrodes
    • H01G4/008—Selection of materials
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G2/00—Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
IL26756A 1965-12-27 1966-10-25 Tantalum alloy capacitor and method for the preparation thereof IL26756A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US516655A US3320500A (en) 1965-12-27 1965-12-27 Tantalum alloy capacitor

Publications (1)

Publication Number Publication Date
IL26756A true IL26756A (en) 1970-07-19

Family

ID=24056559

Family Applications (1)

Application Number Title Priority Date Filing Date
IL26756A IL26756A (en) 1965-12-27 1966-10-25 Tantalum alloy capacitor and method for the preparation thereof

Country Status (7)

Country Link
US (1) US3320500A (enEXAMPLES)
BE (1) BE690127A (enEXAMPLES)
DE (1) DE1589079B2 (enEXAMPLES)
FR (1) FR1501459A (enEXAMPLES)
GB (1) GB1162709A (enEXAMPLES)
IL (1) IL26756A (enEXAMPLES)
NL (1) NL6618117A (enEXAMPLES)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710474A (en) * 1970-05-22 1973-01-16 Fansteel Inc Vanadium-modified tantalum foil
FR2218633B1 (enEXAMPLES) * 1973-02-19 1977-07-22 Lignes Telegraph Telephon
FR2327620A1 (fr) * 1975-10-06 1977-05-06 Lignes Telegraph Telephon Perfectionnements aux condensateurs a electrolyte solide
DE2719988C2 (de) * 1977-05-04 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Amorphe, Tantal enthaltende mindestens bis 300 Grad C temperaturstabile Metallschicht und Verfahren zu ihrer Herstellung
JPS6026288B2 (ja) * 1979-04-10 1985-06-22 松下電器産業株式会社 固体電解コンデンサ用焼結電極
JPS6026287B2 (ja) * 1978-11-25 1985-06-22 松下電器産業株式会社 電解コンデンサ用多孔質電極の製造方法
DE2947359A1 (de) * 1978-11-25 1980-06-04 Matsushita Electric Ind Co Ltd Anode fuer einen trockenelektrolytkondensator und verfahren zu dessen herstellung
US4471405A (en) * 1981-12-28 1984-09-11 International Business Machines Corporation Thin film capacitor with a dual bottom electrode structure
US4423087A (en) * 1981-12-28 1983-12-27 International Business Machines Corporation Thin film capacitor with a dual bottom electrode structure
JPH0627328B2 (ja) * 1985-07-16 1994-04-13 ソニー株式会社 高誘電率薄膜
US4982309A (en) * 1989-07-17 1991-01-01 National Semiconductor Corporation Electrodes for electrical ceramic oxide devices
EP2221840B1 (en) † 2000-08-10 2013-10-09 Showa Denko K.K. Niobium powder, sintered body and capacitor using the body
JP6750462B2 (ja) * 2016-11-04 2020-09-02 Tdk株式会社 薄膜コンデンサ及び電子部品内蔵基板

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2299288A (en) * 1940-03-21 1942-10-20 Nat Sugar Refining Company Sugar
NL131589C (enEXAMPLES) * 1958-06-16
US3203793A (en) * 1963-01-28 1965-08-31 Du Pont Porous columbium and tantalum materials

Also Published As

Publication number Publication date
FR1501459A (fr) 1967-11-10
DE1589079A1 (de) 1970-01-02
DE1589079B2 (de) 1972-05-18
NL6618117A (enEXAMPLES) 1967-06-28
BE690127A (enEXAMPLES) 1967-05-02
GB1162709A (en) 1969-08-27
US3320500A (en) 1967-05-16

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