IL233797A0 - Chemical mechanical polishing (cmp) composition comprising a protein - Google Patents

Chemical mechanical polishing (cmp) composition comprising a protein

Info

Publication number
IL233797A0
IL233797A0 IL233797A IL23379714A IL233797A0 IL 233797 A0 IL233797 A0 IL 233797A0 IL 233797 A IL233797 A IL 233797A IL 23379714 A IL23379714 A IL 23379714A IL 233797 A0 IL233797 A0 IL 233797A0
Authority
IL
Israel
Prior art keywords
mechanical polishing
chemical mechanical
preparation containing
containing protein
polishing preparation
Prior art date
Application number
IL233797A
Other languages
English (en)
Hebrew (he)
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of IL233797A0 publication Critical patent/IL233797A0/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/06—Other polishing compositions
    • C09G1/14—Other polishing compositions based on non-waxy substances
    • C09G1/18—Other polishing compositions based on non-waxy substances on other substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
IL233797A 2012-02-10 2014-07-24 Chemical mechanical polishing (cmp) composition comprising a protein IL233797A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261597210P 2012-02-10 2012-02-10
PCT/IB2013/050647 WO2013118015A1 (en) 2012-02-10 2013-01-25 Chemical mechanical polishing (cmp) composition comprising a protein

Publications (1)

Publication Number Publication Date
IL233797A0 true IL233797A0 (en) 2014-09-30

Family

ID=48946960

Family Applications (1)

Application Number Title Priority Date Filing Date
IL233797A IL233797A0 (en) 2012-02-10 2014-07-24 Chemical mechanical polishing (cmp) composition comprising a protein

Country Status (11)

Country Link
US (1) US9777192B2 (cg-RX-API-DMAC7.html)
EP (1) EP2812911B1 (cg-RX-API-DMAC7.html)
JP (1) JP6114312B2 (cg-RX-API-DMAC7.html)
KR (1) KR20140122271A (cg-RX-API-DMAC7.html)
CN (1) CN104081501B (cg-RX-API-DMAC7.html)
IL (1) IL233797A0 (cg-RX-API-DMAC7.html)
MY (1) MY171093A (cg-RX-API-DMAC7.html)
RU (1) RU2631875C2 (cg-RX-API-DMAC7.html)
SG (1) SG11201404747UA (cg-RX-API-DMAC7.html)
TW (1) TWI606102B (cg-RX-API-DMAC7.html)
WO (1) WO2013118015A1 (cg-RX-API-DMAC7.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9701760B2 (en) * 2012-02-13 2017-07-11 National University Corporation Kyoto Institute Of Technology Peptide having affinity for silicon nitride (Si3N4), and use therefor
US9340706B2 (en) 2013-10-10 2016-05-17 Cabot Microelectronics Corporation Mixed abrasive polishing compositions
US9551075B2 (en) * 2014-08-04 2017-01-24 Sinmat, Inc. Chemical mechanical polishing of alumina
KR102605140B1 (ko) * 2015-12-17 2023-11-24 솔브레인 주식회사 화학 기계적 연마 슬러리 조성물 및 이를 이용한 연마 방법
US11326076B2 (en) * 2019-01-25 2022-05-10 Versum Materials Us, Llc Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives
US11608451B2 (en) * 2019-01-30 2023-03-21 Versum Materials Us, Llc Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates
KR20210076571A (ko) * 2019-12-16 2021-06-24 주식회사 케이씨텍 Sti 공정용 연마 슬러리 조성물
WO2021231090A1 (en) * 2020-05-11 2021-11-18 Versum Materials Us, Llc Novel pad-1 n-a-bottle (pib) technology for advanced chemical-mechanical planarization (cmp) slurries and processes
US12009339B2 (en) 2020-08-18 2024-06-11 Seoul National University R&Db Foundation Electronic device and method of transferring electronic element using stamping and magnetic field alignment
KR102928760B1 (ko) 2023-10-10 2026-02-20 주식회사 케이씨텍 표면 개질된 나노 세리아 입자를 포함하는 cmp 슬러리 조성물
CN118240485B (zh) * 2024-05-27 2024-08-16 嘉兴市小辰光伏科技有限公司 一种具有云朵状塔基硅片碱抛添加剂及其使用方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436835B1 (en) * 1998-02-24 2002-08-20 Showa Denko K.K. Composition for polishing a semiconductor device and process for manufacturing a semiconductor device using the same
JP3560484B2 (ja) * 1998-08-05 2004-09-02 昭和電工株式会社 Ｌｓｉデバイス研磨用研磨材組成物及び研磨方法
WO2001033620A1 (fr) 1999-11-04 2001-05-10 Seimi Chemical Co., Ltd. Compose a polir pour semi-conducteur contenant un peptide
JP2002110596A (ja) * 2000-10-02 2002-04-12 Mitsubishi Electric Corp 半導体加工用研磨剤およびこれに用いる分散剤、並びに上記半導体加工用研磨剤を用いた半導体装置の製造方法
TWI281493B (en) * 2000-10-06 2007-05-21 Mitsui Mining & Smelting Co Polishing material
US20040175942A1 (en) 2003-01-03 2004-09-09 Chang Song Y. Composition and method used for chemical mechanical planarization of metals
US7241734B2 (en) * 2004-08-18 2007-07-10 E. I. Du Pont De Nemours And Company Thermophilic hydrophobin proteins and applications for surface modification
JP4027929B2 (ja) * 2004-11-30 2007-12-26 花王株式会社 半導体基板用研磨液組成物
US20060216935A1 (en) * 2005-03-28 2006-09-28 Ferro Corporation Composition for oxide CMP in CMOS device fabrication
TW200714696A (en) 2005-08-05 2007-04-16 Advanced Tech Materials High throughput chemical mechanical polishing composition for metal film planarization
CN101437918B (zh) * 2006-05-02 2012-11-21 卡伯特微电子公司 用于半导体材料的化学机械抛光的组合物及方法
CN101573420A (zh) 2006-12-04 2009-11-04 巴斯夫欧洲公司 用于金属表面的包含水合氧化铝研磨剂的平整化组合物
JP4784614B2 (ja) * 2008-02-25 2011-10-05 Ｊｓｒ株式会社 化学機械研磨用水系分散体
KR101686255B1 (ko) * 2008-10-03 2016-12-13 바스프 에스이 향상된 성능의 화학적 기계적 연마(ｃｍｐ) 연마 용액
CA2752808A1 (en) * 2009-03-09 2010-09-16 Basf Se Use of a synergistic mixture of water-soluble polymers and hydrophobins for thickening aqueous phases
JP2012028747A (ja) * 2010-06-24 2012-02-09 Hitachi Chem Co Ltd Ｃｍｐ研磨液及び基板の研磨方法

Also Published As

Publication number Publication date
CN104081501A (zh) 2014-10-01
EP2812911A1 (en) 2014-12-17
WO2013118015A1 (en) 2013-08-15
KR20140122271A (ko) 2014-10-17
RU2631875C2 (ru) 2017-09-28
TW201339258A (zh) 2013-10-01
RU2014136534A (ru) 2016-03-27
SG11201404747UA (en) 2014-09-26
EP2812911A4 (en) 2015-08-12
CN104081501B (zh) 2019-02-01
JP2015511258A (ja) 2015-04-16
US9777192B2 (en) 2017-10-03
EP2812911B1 (en) 2017-06-28
MY171093A (en) 2019-09-25
US20150017454A1 (en) 2015-01-15
TWI606102B (zh) 2017-11-21
JP6114312B2 (ja) 2017-04-12

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