IL157691A0 - Line profile asymmetry measurement using scatterometry - Google Patents

Line profile asymmetry measurement using scatterometry

Info

Publication number
IL157691A0
IL157691A0 IL15769102A IL15769102A IL157691A0 IL 157691 A0 IL157691 A0 IL 157691A0 IL 15769102 A IL15769102 A IL 15769102A IL 15769102 A IL15769102 A IL 15769102A IL 157691 A0 IL157691 A0 IL 157691A0
Authority
IL
Israel
Prior art keywords
scatterometry
line profile
asymmetry measurement
profile asymmetry
measurement
Prior art date
Application number
IL15769102A
Other languages
English (en)
Original Assignee
Accent Optical Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Accent Optical Tech Inc filed Critical Accent Optical Tech Inc
Publication of IL157691A0 publication Critical patent/IL157691A0/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
IL15769102A 2001-03-02 2002-02-28 Line profile asymmetry measurement using scatterometry IL157691A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27303901P 2001-03-02 2001-03-02
PCT/US2002/006403 WO2002070985A1 (en) 2001-03-02 2002-02-28 Line profile asymmetry measurement using scatterometry

Publications (1)

Publication Number Publication Date
IL157691A0 true IL157691A0 (en) 2004-03-28

Family

ID=23042286

Family Applications (2)

Application Number Title Priority Date Filing Date
IL15769102A IL157691A0 (en) 2001-03-02 2002-02-28 Line profile asymmetry measurement using scatterometry
IL157691A IL157691A (en) 2001-03-02 2003-09-01 Asymmetrical measurement of a line profile using spectrometry

Family Applications After (1)

Application Number Title Priority Date Filing Date
IL157691A IL157691A (en) 2001-03-02 2003-09-01 Asymmetrical measurement of a line profile using spectrometry

Country Status (8)

Country Link
US (1) US6856408B2 (zh)
EP (1) EP1370828B1 (zh)
JP (1) JP2004529330A (zh)
KR (1) KR100536646B1 (zh)
CN (1) CN1261736C (zh)
IL (2) IL157691A0 (zh)
TW (1) TW513553B (zh)
WO (1) WO2002070985A1 (zh)

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EP1370828B1 (en) 2016-11-23
EP1370828A1 (en) 2003-12-17
US6856408B2 (en) 2005-02-15
JP2004529330A (ja) 2004-09-24
KR100536646B1 (ko) 2005-12-14
IL157691A (en) 2007-06-03
TW513553B (en) 2002-12-11
KR20030080060A (ko) 2003-10-10
CN1509404A (zh) 2004-06-30
US20020149782A1 (en) 2002-10-17
CN1261736C (zh) 2006-06-28
EP1370828A4 (en) 2007-03-21

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