IL150726A0 - A method of correcting physically-conditioned errors in the measurement of microscopic objects - Google Patents

A method of correcting physically-conditioned errors in the measurement of microscopic objects

Info

Publication number
IL150726A0
IL150726A0 IL15072601A IL15072601A IL150726A0 IL 150726 A0 IL150726 A0 IL 150726A0 IL 15072601 A IL15072601 A IL 15072601A IL 15072601 A IL15072601 A IL 15072601A IL 150726 A0 IL150726 A0 IL 150726A0
Authority
IL
Israel
Prior art keywords
measurement
correcting
errors
conditioned
physically
Prior art date
Application number
IL15072601A
Other languages
English (en)
Original Assignee
Pdf Solutions Gmbh
Muetec Automatisierte Mikrosko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pdf Solutions Gmbh, Muetec Automatisierte Mikrosko filed Critical Pdf Solutions Gmbh
Publication of IL150726A0 publication Critical patent/IL150726A0/xx

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/04—Measuring microscopes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Arrangements For Transmission Of Measured Signals (AREA)
IL15072601A 2000-05-31 2001-05-31 A method of correcting physically-conditioned errors in the measurement of microscopic objects IL150726A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10027221A DE10027221A1 (de) 2000-05-31 2000-05-31 Verfahren zur Korrektur physikalisch bedingter Fehler bei der Messung mikroskopischer Objekte
PCT/EP2001/006200 WO2001092818A1 (de) 2000-05-31 2001-05-31 Verfahren zur korrektur physikalisch bedingter fehler bei der messung mikroskopischer objekte

Publications (1)

Publication Number Publication Date
IL150726A0 true IL150726A0 (en) 2003-02-12

Family

ID=7644366

Family Applications (2)

Application Number Title Priority Date Filing Date
IL15072601A IL150726A0 (en) 2000-05-31 2001-05-31 A method of correcting physically-conditioned errors in the measurement of microscopic objects
IL150726A IL150726A (en) 2000-05-31 2002-07-14 A method for correcting errors caused by physical conditions in the measurement of microscopic objects

Family Applications After (1)

Application Number Title Priority Date Filing Date
IL150726A IL150726A (en) 2000-05-31 2002-07-14 A method for correcting errors caused by physical conditions in the measurement of microscopic objects

Country Status (8)

Country Link
US (1) US6795574B1 (xx)
EP (1) EP1330628B1 (xx)
JP (1) JP2001343217A (xx)
KR (1) KR100470217B1 (xx)
AT (1) ATE267383T1 (xx)
DE (2) DE10027221A1 (xx)
IL (2) IL150726A0 (xx)
WO (1) WO2001092818A1 (xx)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10235437B4 (de) * 2002-08-02 2007-09-20 Pdf Solutions Gmbh Verfahren zur Korrektur physikalisch bedingter Fehler bei der Messung eines Objekts
DE102005025535A1 (de) * 2005-06-03 2006-12-07 Leica Microsystems Semiconductor Gmbh Vorrichtung und Verfahren zur Verbesserung der Messgenauigkeit bei der Bestimmung von Strukturdaten
DE102007032626A1 (de) 2007-07-11 2009-01-22 Vistec Semiconductor Systems Gmbh Vorrichtung und Verfahren zur Verbesserung der Messgenauigkeit in einem optischen CD-Messsystem

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07281413A (ja) * 1994-04-05 1995-10-27 Mitsubishi Electric Corp 減衰型位相シフトマスクおよびその製造方法
JPH0883753A (ja) * 1994-09-13 1996-03-26 Nikon Corp 焦点検出方法
WO1997006461A1 (en) * 1995-08-07 1997-02-20 Computed Anatomy, Incorporated Reflecting microscope device
JP3469422B2 (ja) * 1996-02-23 2003-11-25 株式会社東芝 荷電ビーム描画方法及び描画装置
JP2001511247A (ja) * 1996-12-23 2001-08-07 ルプレヒト−カールス−ウニヴェルジテート ハイデルベルク 対象物構造間の間隔測定方法および間隔測定装置
US5966677A (en) * 1997-02-28 1999-10-12 Fiekowsky; Peter J. High accuracy particle dimension measurement system
US6178360B1 (en) * 1998-02-05 2001-01-23 Micron Technology, Inc. Methods and apparatus for determining optimum exposure threshold for a given photolithographic model
AU2958299A (en) * 1998-03-26 1999-10-18 Nikon Corporation Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
IL127359A0 (en) * 1998-12-01 1999-10-28 Yeda Res & Dev Computerized adaptive imaging

Also Published As

Publication number Publication date
KR100470217B1 (ko) 2005-02-05
US6795574B1 (en) 2004-09-21
DE50102355D1 (de) 2004-06-24
IL150726A (en) 2006-10-31
WO2001092818A1 (de) 2001-12-06
JP2001343217A (ja) 2001-12-14
EP1330628A1 (de) 2003-07-30
KR20030003228A (ko) 2003-01-09
WO2001092818A8 (de) 2002-02-21
EP1330628B1 (de) 2004-05-19
DE10027221A1 (de) 2002-04-18
ATE267383T1 (de) 2004-06-15

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