IL134926A0 - Vacuum plasma processor having coil with added conducting segments to its peripheral part - Google Patents

Vacuum plasma processor having coil with added conducting segments to its peripheral part

Info

Publication number
IL134926A0
IL134926A0 IL13492698A IL13492698A IL134926A0 IL 134926 A0 IL134926 A0 IL 134926A0 IL 13492698 A IL13492698 A IL 13492698A IL 13492698 A IL13492698 A IL 13492698A IL 134926 A0 IL134926 A0 IL 134926A0
Authority
IL
Israel
Prior art keywords
coil
plasma
segments
magnetic flux
output terminal
Prior art date
Application number
IL13492698A
Other languages
English (en)
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL134926A0 publication Critical patent/IL134926A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Particle Accelerators (AREA)
IL13492698A 1997-09-16 1998-09-16 Vacuum plasma processor having coil with added conducting segments to its peripheral part IL134926A0 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/931,504 US6028395A (en) 1997-09-16 1997-09-16 Vacuum plasma processor having coil with added conducting segments to its peripheral part
PCT/US1998/019122 WO1999014784A2 (en) 1997-09-16 1998-09-16 Vacuum plasma processor having coil with added conducting segments to its peripheral part

Publications (1)

Publication Number Publication Date
IL134926A0 true IL134926A0 (en) 2001-05-20

Family

ID=25460884

Family Applications (2)

Application Number Title Priority Date Filing Date
IL13492698A IL134926A0 (en) 1997-09-16 1998-09-16 Vacuum plasma processor having coil with added conducting segments to its peripheral part
IL134926A IL134926A (en) 1997-09-16 2000-03-07 Vacuum plasma processor with coil with conductive sections added to its circumference

Family Applications After (1)

Application Number Title Priority Date Filing Date
IL134926A IL134926A (en) 1997-09-16 2000-03-07 Vacuum plasma processor with coil with conductive sections added to its circumference

Country Status (8)

Country Link
US (1) US6028395A (de)
EP (1) EP1018135B1 (de)
JP (1) JP4409762B2 (de)
KR (1) KR100645280B1 (de)
AT (1) ATE457521T1 (de)
DE (1) DE69841496D1 (de)
IL (2) IL134926A0 (de)
WO (1) WO1999014784A2 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5731565A (en) * 1995-07-27 1998-03-24 Lam Research Corporation Segmented coil for generating plasma in plasma processing equipment
US6268700B1 (en) * 1996-06-10 2001-07-31 Lam Research Corporation Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil
JP3332857B2 (ja) * 1998-04-15 2002-10-07 三菱重工業株式会社 高周波プラズマ発生装置及び給電方法
US6164241A (en) * 1998-06-30 2000-12-26 Lam Research Corporation Multiple coil antenna for inductively-coupled plasma generation systems
US6239553B1 (en) * 1999-04-22 2001-05-29 Applied Materials, Inc. RF plasma source for material processing
US6518705B2 (en) * 1999-11-15 2003-02-11 Lam Research Corporation Method and apparatus for producing uniform process rates
US6320320B1 (en) 1999-11-15 2001-11-20 Lam Research Corporation Method and apparatus for producing uniform process rates
US6744213B2 (en) * 1999-11-15 2004-06-01 Lam Research Corporation Antenna for producing uniform process rates
ATE394789T1 (de) * 1999-11-15 2008-05-15 Lam Res Corp Behandlungsvorrichtungen
EP1301938A2 (de) * 2000-07-06 2003-04-16 Applied Materials, Inc. Antenne mit symetrischer, aus parallelen leitern gefertigte spule für plasmareaktor
US6694915B1 (en) 2000-07-06 2004-02-24 Applied Materials, Inc Plasma reactor having a symmetrical parallel conductor coil antenna
US6685798B1 (en) 2000-07-06 2004-02-03 Applied Materials, Inc Plasma reactor having a symmetrical parallel conductor coil antenna
US6583572B2 (en) 2001-03-30 2003-06-24 Lam Research Corporation Inductive plasma processor including current sensor for plasma excitation coil
US6527912B2 (en) 2001-03-30 2003-03-04 Lam Research Corporation Stacked RF excitation coil for inductive plasma processor
US7096819B2 (en) * 2001-03-30 2006-08-29 Lam Research Corporation Inductive plasma processor having coil with plural windings and method of controlling plasma density
US6899787B2 (en) * 2001-06-29 2005-05-31 Alps Electric Co., Ltd. Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
US7571697B2 (en) * 2001-09-14 2009-08-11 Lam Research Corporation Plasma processor coil
JP3897620B2 (ja) * 2002-03-14 2007-03-28 三菱重工業株式会社 高周波電力供給構造およびそれを備えたプラズマｃｖｄ装置
KR100479718B1 (ko) * 2002-05-02 2005-03-30 (주)아이씨디 유도안테나를 구비한 플라즈마 발생용 안테나 구조 및유도안테나를 이용한 플라즈마발생장치
JP3823069B2 (ja) * 2002-06-12 2006-09-20 株式会社アルバック 磁気中性線放電プラズマ処理装置
KR100486724B1 (ko) 2002-10-15 2005-05-03 삼성전자주식회사 사행 코일 안테나를 구비한 유도결합 플라즈마 발생장치
CN100429740C (zh) * 2005-12-02 2008-10-29 北京北方微电子基地设备工艺研究中心有限责任公司 一种可调整局部耦合强度的icp线圈
KR100777635B1 (ko) * 2006-01-17 2007-11-21 (주)아이씨디 평판 타입 고밀도 ｉｃｐ 안테나
JP5479867B2 (ja) * 2009-01-14 2014-04-23 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP5443127B2 (ja) * 2009-10-28 2014-03-19 東京エレクトロン株式会社 プラズマ処理装置
JP2013522477A (ja) * 2010-03-22 2013-06-13 アプライド マテリアルズ インコーポレイテッド 遠隔プラズマ源を用いた誘電体堆積
JP5597071B2 (ja) * 2010-09-06 2014-10-01 東京エレクトロン株式会社 アンテナユニットおよび誘導結合プラズマ処理装置
KR101921222B1 (ko) * 2011-06-30 2018-11-23 삼성디스플레이 주식회사 플라즈마를 이용한 기판 처리장치 및 이를 이용한 유기 발광 표시장치의 제조 방법
JP6010305B2 (ja) * 2012-02-07 2016-10-19 東京エレクトロン株式会社 誘導結合プラズマ用アンテナユニット、誘導結合プラズマ処理装置および誘導結合プラズマ処理方法
JP6001963B2 (ja) * 2012-08-31 2016-10-05 東京エレクトロン株式会社 プラズマ処理装置、プラズマ生成装置、アンテナ構造体及びプラズマ生成方法
US20140175055A1 (en) * 2012-12-21 2014-06-26 Qualcomm Mems Technologies, Inc. Adjustable coil for inductively coupled plasma
US10332725B2 (en) * 2015-03-30 2019-06-25 Lam Research Corporation Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network
KR101934889B1 (ko) * 2016-11-09 2019-01-03 엘지전자 주식회사 코일기판
KR102735887B1 (ko) * 2021-11-18 2024-12-02 피에스케이 주식회사 기판 처리 장치 및 기판 처리 방법
TW202336805A (zh) * 2021-11-23 2023-09-16 美商應用材料股份有限公司 用於大面積電感耦合電漿處理設備的天線單元
US12074390B2 (en) 2022-11-11 2024-08-27 Tokyo Electron Limited Parallel resonance antenna for radial plasma control

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4948458A (en) * 1989-08-14 1990-08-14 Lam Research Corporation Method and apparatus for producing magnetically-coupled planar plasma
JPH04120277A (ja) * 1990-09-10 1992-04-21 Mitsubishi Heavy Ind Ltd プラズマｃｖｄ装置
JPH04362091A (ja) * 1991-06-05 1992-12-15 Mitsubishi Heavy Ind Ltd プラズマ化学気相成長装置
US6165311A (en) * 1991-06-27 2000-12-26 Applied Materials, Inc. Inductively coupled RF plasma reactor having an overhead solenoidal antenna
US6077384A (en) * 1994-08-11 2000-06-20 Applied Materials, Inc. Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
US5280154A (en) * 1992-01-30 1994-01-18 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil
US5433812A (en) * 1993-01-19 1995-07-18 International Business Machines Corporation Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination
US5309063A (en) * 1993-03-04 1994-05-03 David Sarnoff Research Center, Inc. Inductive coil for inductively coupled plasma production apparatus
US5401350A (en) * 1993-03-08 1995-03-28 Lsi Logic Corporation Coil configurations for improved uniformity in inductively coupled plasma systems
JP3043215B2 (ja) * 1994-02-22 2000-05-22 東京エレクトロン株式会社 プラズマ発生装置
WO1995015672A1 (en) * 1993-12-01 1995-06-08 Wisconsin Alumni Research Foundation Method and apparatus for planar plasma processing
US5540824A (en) * 1994-07-18 1996-07-30 Applied Materials Plasma reactor with multi-section RF coil and isolated conducting lid
US5777289A (en) * 1995-02-15 1998-07-07 Applied Materials, Inc. RF plasma reactor with hybrid conductor and multi-radius dome ceiling
US5753044A (en) * 1995-02-15 1998-05-19 Applied Materials, Inc. RF plasma reactor with hybrid conductor and multi-radius dome ceiling
ATE181637T1 (de) * 1994-10-31 1999-07-15 Applied Materials Inc Plasmareaktoren zur halbleiterscheibenbehandlung
JP3640420B2 (ja) * 1994-11-16 2005-04-20 アネルバ株式会社 プラズマ処理装置
US5589737A (en) * 1994-12-06 1996-12-31 Lam Research Corporation Plasma processor for large workpieces
EP0756309A1 (de) * 1995-07-26 1997-01-29 Applied Materials, Inc. Plasmavorrichtungen zur Bearbeitung von Substraten
KR100290813B1 (ko) * 1995-08-17 2001-06-01 히가시 데쓰로 플라스마 처리장치
JP3153743B2 (ja) * 1995-08-31 2001-04-09 東京エレクトロン株式会社 プラズマ処理装置
US5847918A (en) * 1995-09-29 1998-12-08 Lam Research Corporation Electrostatic clamping method and apparatus for dielectric workpieces in vacuum processors
US5683548A (en) * 1996-02-22 1997-11-04 Motorola, Inc. Inductively coupled plasma reactor and process
JP3111883B2 (ja) * 1996-02-28 2000-11-27 松下電器産業株式会社 プラズマ処理方法及びその装置
CA2207154A1 (en) * 1996-06-10 1997-12-10 Lam Research Corporation Inductively coupled source for deriving substantially uniform plasma flux
US5800619A (en) * 1996-06-10 1998-09-01 Lam Research Corporation Vacuum plasma processor having coil with minimum magnetic field in its center

Also Published As

Publication number Publication date
JP4409762B2 (ja) 2010-02-03
US6028395A (en) 2000-02-22
WO1999014784A2 (en) 1999-03-25
ATE457521T1 (de) 2010-02-15
KR20010024018A (ko) 2001-03-26
KR100645280B1 (ko) 2006-11-13
EP1018135A2 (de) 2000-07-12
EP1018135B1 (de) 2010-02-10
IL134926A (en) 2007-07-24
DE69841496D1 (de) 2010-03-25
JP2001516944A (ja) 2001-10-02
WO1999014784A3 (en) 1999-06-03

Similar Documents

Publication Publication Date Title
WO1999014784A3 (en) Vacuum plasma processor having coil with added conducting segments to its peripheral part
KR100645283B1 (ko) 대형 제품용 플라스마 처리기
US5541482A (en) Electrodeless discharge lamp including impedance matching and filter network
JP3456093B2 (ja) 非接触電力伝達装置
US5764500A (en) Switching power supply
US6724148B1 (en) Mechanism for minimizing ion bombardment energy in a plasma chamber
KR980005069A (ko) 균일 플라스마 플럭스를 유기시키기 위한 유도결합 발생원
ATE213869T1 (de) Niederinduktive, grossflächige spule für eine induktiv gekoppelte plasmaquelle
US5053738A (en) Magnetic leakage transformer
SE9800989L (sv) En induktansanordning
EP0818868A3 (de) Induktives Energieverteilungssystem
Roshen et al. High-efficiency, high-density MHz magnetic components for low profile converters
MX9802615A (es) Sensor de corriente alterna.
EP0468509A2 (de) Anpassungsnetzwerk
KR950021006A (ko) 프라스마발생장치 및 방법
AU5213901A (en) High-frequency matching network
US6822549B2 (en) Method for increased coupling coefficient in a pulse type transformer through coil configuration and varied core area
CN1280947C (zh) 寄生型天线
EP0641510B1 (de) Elektrodenlose entladungslampe mit filter und impedanzanpassungsschaltung
US4680686A (en) Electric 3-phase supply device for an ozonizer
US5486739A (en) Ballasting system for fluorescent lamps having improved energy transfer
Kaplan A new interpretation of the relationship existing between demagnetizing factor and inductance
KR100606622B1 (ko) 대형제품용플라스마처리기
AU7018200A (en) Method for measuring and determining electromagnetic radiation
KR100230360B1 (ko) 유도 결합형 플라즈마 형성 장치

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed
KB Patent renewed