IL112008A - Photoresists carried in water have a neutralizing substance that has been neutralized with amino acrylates - Google Patents
Photoresists carried in water have a neutralizing substance that has been neutralized with amino acrylatesInfo
- Publication number
- IL112008A IL112008A IL11200894A IL11200894A IL112008A IL 112008 A IL112008 A IL 112008A IL 11200894 A IL11200894 A IL 11200894A IL 11200894 A IL11200894 A IL 11200894A IL 112008 A IL112008 A IL 112008A
- Authority
- IL
- Israel
- Prior art keywords
- photoimageable composition
- emulsion
- aminoacrylate
- acid
- photoimageable
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18687594A | 1994-01-25 | 1994-01-25 | |
US08/199,037 US5364737A (en) | 1994-01-25 | 1994-02-18 | Waterbone photoresists having associate thickeners |
US08/238,133 US5393643A (en) | 1994-01-25 | 1994-05-04 | Waterborne photoresists having binders neutralized with amino acrylates |
Publications (2)
Publication Number | Publication Date |
---|---|
IL112008A0 IL112008A0 (en) | 1995-03-15 |
IL112008A true IL112008A (en) | 1999-03-12 |
Family
ID=27392162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL11200894A IL112008A (en) | 1994-01-25 | 1994-12-16 | Photoresists carried in water have a neutralizing substance that has been neutralized with amino acrylates |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP0664488B1 (fr) |
JP (1) | JPH07234507A (fr) |
CN (1) | CN1071911C (fr) |
AT (1) | ATE164012T1 (fr) |
AU (1) | AU660881B1 (fr) |
BR (1) | BR9500257A (fr) |
CA (1) | CA2133148C (fr) |
DE (1) | DE69408969T2 (fr) |
ES (1) | ES2115886T3 (fr) |
HK (1) | HK1005069A1 (fr) |
IL (1) | IL112008A (fr) |
SG (1) | SG49621A1 (fr) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5925499A (en) * | 1995-08-01 | 1999-07-20 | Morton International, Inc. | Epoxy-containing waterborne photoimageable composition |
NL1013300C2 (nl) * | 1999-10-15 | 2001-04-18 | Stahl Int Bv | Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden. |
NL1013299C2 (nl) | 1999-10-15 | 2001-04-18 | Stahl Int Bv | Dispersies in water van een polyurethaan met geblokkeerde reactieve groepen. |
JP4397601B2 (ja) * | 2003-02-06 | 2010-01-13 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物 |
US8703385B2 (en) * | 2012-02-10 | 2014-04-22 | 3M Innovative Properties Company | Photoresist composition |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2443785A1 (de) * | 1974-09-13 | 1976-04-01 | Basf Ag | Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten |
US4079028A (en) * | 1975-10-03 | 1978-03-14 | Rohm And Haas Company | Polyurethane thickeners in latex compositions |
US4767826A (en) * | 1985-07-18 | 1988-08-30 | Polytechnic Institute Of New York | Radiation-sensitive polymers |
US4743698A (en) * | 1985-10-01 | 1988-05-10 | Alco Chemical Corp. | Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein |
DE3639955A1 (de) * | 1986-11-22 | 1988-05-26 | Wolfen Filmfab Veb | Verfahren zur herstellung fotopolymerisierbarer materialien |
JPH0246460A (ja) * | 1988-08-08 | 1990-02-15 | Toyobo Co Ltd | 感光性樹脂組成物 |
US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
JP3040202B2 (ja) * | 1991-07-12 | 2000-05-15 | ダブリュー・アール・グレース・アンド・カンパニー−コーン | 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法 |
JP3240769B2 (ja) * | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
JPH06258832A (ja) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | 感光性樹脂組成物 |
JPH06230573A (ja) * | 1993-01-29 | 1994-08-19 | Japan Synthetic Rubber Co Ltd | レジスト組成物 |
DE69502741T2 (de) * | 1994-01-10 | 1998-10-01 | Du Pont | Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung |
-
1994
- 1994-09-27 AU AU74215/94A patent/AU660881B1/en not_active Ceased
- 1994-09-28 CA CA002133148A patent/CA2133148C/fr not_active Expired - Fee Related
- 1994-10-27 SG SG1996001170A patent/SG49621A1/en unknown
- 1994-10-27 DE DE69408969T patent/DE69408969T2/de not_active Expired - Lifetime
- 1994-10-27 EP EP94307900A patent/EP0664488B1/fr not_active Expired - Lifetime
- 1994-10-27 ES ES94307900T patent/ES2115886T3/es not_active Expired - Lifetime
- 1994-10-27 AT AT94307900T patent/ATE164012T1/de not_active IP Right Cessation
- 1994-11-21 CN CN94118622.9A patent/CN1071911C/zh not_active Expired - Lifetime
- 1994-12-16 IL IL11200894A patent/IL112008A/en not_active IP Right Cessation
-
1995
- 1995-01-19 BR BR9500257A patent/BR9500257A/pt not_active Application Discontinuation
- 1995-01-23 JP JP7008091A patent/JPH07234507A/ja active Pending
-
1998
- 1998-05-15 HK HK98104211A patent/HK1005069A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
IL112008A0 (en) | 1995-03-15 |
EP0664488B1 (fr) | 1998-03-11 |
CN1071911C (zh) | 2001-09-26 |
CA2133148C (fr) | 1999-06-15 |
SG49621A1 (en) | 1998-06-15 |
DE69408969T2 (de) | 1998-07-02 |
BR9500257A (pt) | 1995-10-17 |
EP0664488A1 (fr) | 1995-07-26 |
ES2115886T3 (es) | 1998-07-01 |
AU660881B1 (en) | 1995-07-06 |
DE69408969D1 (de) | 1998-04-16 |
HK1005069A1 (en) | 1998-12-18 |
JPH07234507A (ja) | 1995-09-05 |
CA2133148A1 (fr) | 1995-07-26 |
CN1106935A (zh) | 1995-08-16 |
ATE164012T1 (de) | 1998-03-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
MM9K | Patent not in force due to non-payment of renewal fees |