IL106018A - Device and method for optimal scanning of a two-dimensional surface of one or more objects - Google Patents
Device and method for optimal scanning of a two-dimensional surface of one or more objectsInfo
- Publication number
- IL106018A IL106018A IL10601893A IL10601893A IL106018A IL 106018 A IL106018 A IL 106018A IL 10601893 A IL10601893 A IL 10601893A IL 10601893 A IL10601893 A IL 10601893A IL 106018 A IL106018 A IL 106018A
- Authority
- IL
- Israel
- Prior art keywords
- chemical etching
- instrument probe
- probe
- wafer
- semiconductor wafers
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 64
- 235000012431 wafers Nutrition 0.000 claims description 128
- 238000003486 chemical etching Methods 0.000 claims description 84
- 239000000523 sample Substances 0.000 claims description 76
- 238000005530 etching Methods 0.000 claims description 27
- 230000014759 maintenance of location Effects 0.000 claims description 24
- 239000004065 semiconductor Substances 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 description 27
- 238000001020 plasma etching Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000013459 approach Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20221—Translation
- H01J2237/20228—Mechanical X-Y scanning
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/899,419 US5282921A (en) | 1992-06-16 | 1992-06-16 | Apparatus and method for optimally scanning a two-dimensional surface of one or more objects |
Publications (2)
Publication Number | Publication Date |
---|---|
IL106018A0 IL106018A0 (en) | 1993-10-20 |
IL106018A true IL106018A (en) | 1995-03-30 |
Family
ID=25410933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL10601893A IL106018A (en) | 1992-06-16 | 1993-06-14 | Device and method for optimal scanning of a two-dimensional surface of one or more objects |
Country Status (6)
Country | Link |
---|---|
US (2) | US5282921A (no) |
EP (1) | EP0579380A1 (no) |
JP (1) | JPH0653178A (no) |
IL (1) | IL106018A (no) |
NO (1) | NO932203L (no) |
TW (1) | TW234785B (no) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL112511A0 (en) * | 1994-02-18 | 1995-05-26 | Hughes Aircraft Co | System for improving the total thickness variation of a wafer |
DE4432304C2 (de) * | 1994-09-10 | 1996-10-17 | Forschungszentrum Juelich Gmbh | Verfahren zum Scannen einer Probenoberfläche mit einer Rastersonde eines Rastersondenmikroskops |
US5811021A (en) * | 1995-02-28 | 1998-09-22 | Hughes Electronics Corporation | Plasma assisted chemical transport method and apparatus |
US6139678A (en) * | 1997-11-20 | 2000-10-31 | Trusi Technologies, Llc | Plasma processing methods and apparatus |
JP4212707B2 (ja) * | 1998-11-26 | 2009-01-21 | スピードファム株式会社 | ウエハ平坦化システム及びウエハ平坦化方法 |
US6287976B1 (en) | 1999-05-19 | 2001-09-11 | Tru-Si Technologies, Inc. | Plasma processing methods and apparatus |
US6749764B1 (en) * | 2000-11-14 | 2004-06-15 | Tru-Si Technologies, Inc. | Plasma processing comprising three rotational motions of an article being processed |
US6500681B1 (en) * | 2002-01-11 | 2002-12-31 | Advanced Micro Devices, Inc. | Run-to-run etch control by feeding forward measured metal thickness |
DE10320143A1 (de) | 2003-05-06 | 2004-12-16 | Pari GmbH Spezialisten für effektive Inhalation | Vernebleranschlussvorrichtung für Beatmungsgeräte oder dergleichen |
US6991948B2 (en) * | 2003-11-05 | 2006-01-31 | Solid State Measurements, Inc. | Method of electrical characterization of a silicon-on-insulator (SOI) wafer |
WO2008011903A1 (en) * | 2006-07-28 | 2008-01-31 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Apparatus and method for processing a wafer |
TWI401426B (zh) * | 2008-02-15 | 2013-07-11 | Veeco Instr Inc | 用於批次非接觸式材料特性化之裝置及方法 |
US8022372B2 (en) * | 2008-02-15 | 2011-09-20 | Veeco Instruments Inc. | Apparatus and method for batch non-contact material characterization |
US8958061B2 (en) | 2011-05-31 | 2015-02-17 | Veeco Instruments Inc. | Heated wafer carrier profiling |
US20140380531A1 (en) | 2013-06-24 | 2014-12-25 | Dcg Systems, Inc. | Probe-based data collection system with adaptive mode of probing controlled by local sample properties |
US9287085B2 (en) * | 2014-05-12 | 2016-03-15 | Varian Semiconductor Equipment Associates, Inc. | Processing apparatus and method of treating a substrate |
WO2015200719A1 (en) | 2014-06-25 | 2015-12-30 | Dcg Systems, Inc. | Through process flow intra-chip and inter-chip electrical analysis and process control using in-line nanoprobing |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2967907A (en) * | 1952-06-02 | 1961-01-10 | Hogan Faximile Corp | Continuous facsimile scanning apparatus |
US2912497A (en) * | 1955-12-21 | 1959-11-10 | Western Union Telegraph Co | Optical scanner |
US3806643A (en) * | 1966-09-01 | 1974-04-23 | Battelle Development Corp | Photographic records of digital information and playback systems including optical scanners |
US3993909A (en) * | 1973-03-16 | 1976-11-23 | U.S. Philips Corporation | Substrate holder for etching thin films |
JPS55104057A (en) * | 1979-02-02 | 1980-08-09 | Hitachi Ltd | Ion implantation device |
US4423137A (en) * | 1980-10-28 | 1983-12-27 | Quixote Corporation | Contact printing and etching method of making high density recording medium |
US4509162A (en) * | 1980-10-28 | 1985-04-02 | Quixote Corporation | High density recording medium |
JPS57161641A (en) * | 1981-03-31 | 1982-10-05 | Olympus Optical Co Ltd | Inspecting device for defect of surface |
US4668366A (en) * | 1984-08-02 | 1987-05-26 | The Perkin-Elmer Corporation | Optical figuring by plasma assisted chemical transport and etching apparatus therefor |
JPH07114226B2 (ja) * | 1986-10-28 | 1995-12-06 | 東京エレクトロン株式会社 | プローブ装置及びプロービング方法 |
JPH0480919A (ja) * | 1990-07-24 | 1992-03-13 | Sony Corp | プラズマ診断装置 |
JPH0499626A (ja) * | 1990-08-17 | 1992-03-31 | Ishizaka Shoji Kk | 捺染スクリーンの製造方法 |
JPH0834198B2 (ja) * | 1990-11-28 | 1996-03-29 | 信越半導体株式会社 | Soi基板における単結晶薄膜層の膜厚制御方法 |
US5254830A (en) * | 1991-05-07 | 1993-10-19 | Hughes Aircraft Company | System for removing material from semiconductor wafers using a contained plasma |
-
1992
- 1992-06-16 US US07/899,419 patent/US5282921A/en not_active Expired - Lifetime
-
1993
- 1993-03-24 US US08/036,310 patent/US5312510A/en not_active Expired - Lifetime
- 1993-06-14 EP EP93304592A patent/EP0579380A1/en not_active Withdrawn
- 1993-06-14 IL IL10601893A patent/IL106018A/en not_active IP Right Cessation
- 1993-06-15 NO NO932203A patent/NO932203L/no unknown
- 1993-06-16 JP JP5145217A patent/JPH0653178A/ja active Pending
- 1993-07-14 TW TW082105621A patent/TW234785B/zh active
Also Published As
Publication number | Publication date |
---|---|
IL106018A0 (en) | 1993-10-20 |
US5282921A (en) | 1994-02-01 |
NO932203D0 (no) | 1993-06-15 |
TW234785B (no) | 1994-11-21 |
US5312510A (en) | 1994-05-17 |
NO932203L (no) | 1993-12-17 |
EP0579380A1 (en) | 1994-01-19 |
JPH0653178A (ja) | 1994-02-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RH | Patent void |