HK93192A - Embedded catalyst receptors for metallization of dielectrics - Google Patents

Embedded catalyst receptors for metallization of dielectrics

Info

Publication number
HK93192A
HK93192A HK931/92A HK93192A HK93192A HK 93192 A HK93192 A HK 93192A HK 931/92 A HK931/92 A HK 931/92A HK 93192 A HK93192 A HK 93192A HK 93192 A HK93192 A HK 93192A
Authority
HK
Hong Kong
Prior art keywords
dielectrics
metallization
receptors
embedded catalyst
catalyst
Prior art date
Application number
HK931/92A
Other languages
English (en)
Inventor
Abraham Bernard Cohen
Roxy N I Fan
John Athony Quinn
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of HK93192A publication Critical patent/HK93192A/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/18—Printed circuits structurally associated with non-printed electric components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
    • H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203—Fillers and particles
    • H05K2201/0206—Materials
    • H05K2201/0209—Inorganic, non-metallic particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0525—Patterning by phototackifying or by photopatterning adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1415—Applying catalyst after applying plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Chemically Coating (AREA)
HK931/92A 1986-12-30 1992-11-26 Embedded catalyst receptors for metallization of dielectrics HK93192A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/947,833 US4859571A (en) 1986-12-30 1986-12-30 Embedded catalyst receptors for metallization of dielectrics

Publications (1)

Publication Number Publication Date
HK93192A true HK93192A (en) 1992-12-04

Family

ID=25486857

Family Applications (1)

Application Number Title Priority Date Filing Date
HK931/92A HK93192A (en) 1986-12-30 1992-11-26 Embedded catalyst receptors for metallization of dielectrics

Country Status (10)

Country Link
US (2) US4859571A (de)
EP (1) EP0273376B1 (de)
JP (1) JP2523740B2 (de)
KR (1) KR900006652B1 (de)
CN (1) CN1015952B (de)
BR (1) BR8707101A (de)
CA (1) CA1286792C (de)
DE (1) DE3778136D1 (de)
HK (1) HK93192A (de)
SG (1) SG94392G (de)

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US5302494A (en) * 1985-06-10 1994-04-12 The Foxboro Company Multilayer circuit board having microporous layers and process for making same
WO1988005924A1 (en) * 1987-01-28 1988-08-11 Nissha Printing Co., Ltd. Color filter and production thereof
US5213850A (en) * 1989-03-24 1993-05-25 Nippon Paint Co., Ltd. Process for plating a metallic deposit between functional pattern lines on a substrate
US5198264A (en) * 1989-10-30 1993-03-30 Motorola, Inc. Method for adhering polyimide to a substrate
US5260170A (en) * 1990-01-08 1993-11-09 Motorola, Inc. Dielectric layered sequentially processed circuit board
DE4023566C1 (de) * 1990-07-25 1991-09-19 Rudolf 7129 Brackenheim De Fleischle
JP2725665B2 (ja) * 1996-01-29 1998-03-11 日本電気株式会社 プリント配線板製造方法
US5922517A (en) * 1996-06-12 1999-07-13 International Business Machines Corporation Method of preparing a substrate surface for conformal plating
US5888697A (en) * 1996-07-03 1999-03-30 E. I. Du Pont De Nemours And Company Flexographic printing element having a powder layer
US5795647A (en) * 1996-09-11 1998-08-18 Aluminum Company Of America Printing plate having improved wear resistance
US6141870A (en) 1997-08-04 2000-11-07 Peter K. Trzyna Method for making electrical device
JPH11297532A (ja) * 1998-04-15 1999-10-29 Murata Mfg Co Ltd 電子部品及びその製造方法
JP2000100985A (ja) * 1998-09-17 2000-04-07 Nitto Denko Corp 半導体素子実装用基板およびその製造方法と用途
US6703114B1 (en) * 2002-10-17 2004-03-09 Arlon Laminate structures, methods for production thereof and uses therefor
JP2007042683A (ja) * 2005-07-29 2007-02-15 Fujifilm Holdings Corp 導電性パターン形成方法
JP4478115B2 (ja) * 2006-01-27 2010-06-09 三共化成株式会社 導電性回路の形成方法
EP2230890A1 (de) * 2009-03-20 2010-09-22 Laird Technologies AB Verfahren zur Bereitstellung einer leitfähigen Materialstruktur auf einem Träger
US8369668B1 (en) * 2009-04-23 2013-02-05 Superior Essex Communications Lp Water blocked fiber optic cable
JP2011097038A (ja) * 2009-10-02 2011-05-12 Ibiden Co Ltd セラミック配線基板およびその製造方法
CN101873768B (zh) * 2010-05-28 2012-07-11 中山大学 一种采用催化型纳米颗粒制备印制电子的方法
JP2012057210A (ja) * 2010-09-08 2012-03-22 Nikon Corp めっき用部材、めっき処理品の製造方法、表示デバイス
DE102011000138A1 (de) * 2011-01-14 2012-07-19 Lpkf Laser & Electronics Ag Verfahren zur selektiven Metallisierung eines Substrats sowie ein nach diesem Verfahren hergestellter Schaltungsträger
US8904631B2 (en) 2011-04-15 2014-12-09 General Electric Company Method of fabricating an interconnect device
US9435978B1 (en) 2012-06-14 2016-09-06 Superior Essex Communications Lp Water-resistant optical fiber cables
JP6314376B2 (ja) * 2013-07-01 2018-04-25 株式会社リコー 導電性パターンを有する三次元構造体の製造方法及び三次元構造体
US9380700B2 (en) * 2014-05-19 2016-06-28 Sierra Circuits, Inc. Method for forming traces of a printed circuit board
US10573610B2 (en) * 2014-05-19 2020-02-25 Catlam, Llc Method for wafer level packaging
US9899330B2 (en) * 2014-10-03 2018-02-20 Mc10, Inc. Flexible electronic circuits with embedded integrated circuit die
WO2016208006A1 (ja) * 2015-06-24 2016-12-29 株式会社メイコー 立体配線基板の製造方法、立体配線基板、立体配線基板用基材
US9706650B1 (en) 2016-08-18 2017-07-11 Sierra Circuits, Inc. Catalytic laminate apparatus and method
US10849233B2 (en) 2017-07-10 2020-11-24 Catlam, Llc Process for forming traces on a catalytic laminate
US9922951B1 (en) 2016-11-12 2018-03-20 Sierra Circuits, Inc. Integrated circuit wafer integration with catalytic laminate or adhesive
WO2018089798A1 (en) * 2016-11-12 2018-05-17 Sierra Circuits, Inc. Integrated circuit wafer integration with catalytic laminate or adhesive
US10750623B2 (en) * 2017-05-12 2020-08-18 International Business Machines Corporation Forming conductive vias using healing layer
US10349520B2 (en) 2017-06-28 2019-07-09 Catlam, Llc Multi-layer circuit board using interposer layer and conductive paste
US10765012B2 (en) 2017-07-10 2020-09-01 Catlam, Llc Process for printed circuit boards using backing foil
US10827624B2 (en) 2018-03-05 2020-11-03 Catlam, Llc Catalytic laminate with conductive traces formed during lamination

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US3330695A (en) * 1962-05-21 1967-07-11 First Safe Deposit Nat Bank Of Method of manufacturing electric circuit structures
US3259559A (en) * 1962-08-22 1966-07-05 Day Company Method for electroless copper plating
GB1095117A (en) * 1963-12-26 1967-12-13 Matsushita Electric Ind Co Ltd Method of making printed circuit board
AT310285B (de) * 1966-02-22 1973-09-25 Photocircuits Corp Verfahren zur Herstellung eines Schichtkörpers für gedruckte Schaltungen
DE1615961A1 (de) * 1967-04-12 1970-06-25 Degussa Verfahren zur Herstellung von gedruckten Schaltungen
US3506482A (en) * 1967-04-25 1970-04-14 Matsushita Electric Ind Co Ltd Method of making printed circuits
US3993802A (en) * 1971-07-29 1976-11-23 Photocircuits Division Of Kollmorgen Corporation Processes and products for making articles for electroless plating
US3822128A (en) * 1971-10-22 1974-07-02 Horizons Inc Metal-plated images
JPS4978173A (de) * 1972-12-05 1974-07-27
US4287253A (en) * 1975-04-08 1981-09-01 Photocircuits Division Of Kollmorgen Corp. Catalytic filler for electroless metallization of hole walls
JPS5288772A (en) * 1976-01-20 1977-07-25 Matsushita Electric Ind Co Ltd Method of producing printed circuit board
US4110147A (en) * 1976-03-24 1978-08-29 Macdermid Incorporated Process of preparing thermoset resin substrates to improve adherence of electrolessly plated metal deposits
US4229518A (en) * 1976-07-08 1980-10-21 E. I. Du Pont De Nemours And Company Photohardenable elements with a non-tacky matte finish
US4054479A (en) * 1976-12-22 1977-10-18 E. I. Du Pont De Nemours And Company Additive process for producing printed circuit elements using a self-supported photosensitive sheet
US4054483A (en) * 1976-12-22 1977-10-18 E. I. Du Pont De Nemours And Company Additives process for producing plated holes in printed circuit elements
WO1980000294A1 (en) * 1978-07-13 1980-02-21 Tokyo Shibaura Electric Co Method of fabricating printed circuits
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US4501810A (en) * 1981-09-30 1985-02-26 Howard A. Fromson Lithographic printing plate with resin reinforced image and process
DE3237775A1 (de) * 1981-10-12 1983-04-28 Daishin Kagaku Kogyo K.K., Niiza, Saitama Material fuer eine plandruckplatte und verfahren zu dessen herstellung
US4478883A (en) * 1982-07-14 1984-10-23 International Business Machines Corporation Conditioning of a substrate for electroless direct bond plating in holes and on surfaces of a substrate
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US4448804A (en) * 1983-10-11 1984-05-15 International Business Machines Corporation Method for selective electroless plating of copper onto a non-conductive substrate surface
US4567062A (en) * 1984-10-26 1986-01-28 E. I. Du Pont De Nemours And Company Process for photoformed plastic multistrate using two layer film
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
US4737446A (en) * 1986-12-30 1988-04-12 E. I. Du Pont De Nemours And Company Method for making multilayer circuits using embedded catalyst receptors

Also Published As

Publication number Publication date
DE3778136D1 (de) 1992-05-14
US5112726A (en) 1992-05-12
KR880008716A (ko) 1988-08-31
CN1015952B (zh) 1992-03-18
KR900006652B1 (ko) 1990-09-15
JP2523740B2 (ja) 1996-08-14
US4859571A (en) 1989-08-22
CN87105998A (zh) 1988-08-10
SG94392G (en) 1992-12-04
EP0273376A1 (de) 1988-07-06
JPS63170990A (ja) 1988-07-14
CA1286792C (en) 1991-07-23
BR8707101A (pt) 1988-08-02
EP0273376B1 (de) 1992-04-08

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